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Matches 1 - 50 out of 103,370

Document Document Title
WO/2019/007207A1
Disclosed are a semi-conductor apparatus and an impedance regulation method therefor. The semi-conductor apparatus comprises a chamber (100), a base (110) for bearing a substrate (200) being arranged in the chamber (100); and an impedanc...  
WO/2019/007699A1
The invention relates to a method for the surface treatment of a metal powder material, the method comprising the step of providing a powder composed of a plurality of particles of the metal material to be treated, and subjecting the met...  
WO/2019/009050A1
A vapor deposition mask (20) comprises: a first mask (30) having an opening (35) formed therein; a second mask (40) that overlaps the first mask (30) and that has formed therein a plurality of through holes (45) having a planar dimension...  
WO/2019/007515A1
The present disclosure provides an apparatus (100) for holding a substrate (10) or a mask in a vacuum deposition process. The apparatus (100) includes one or more first electrodes and one or more second electrodes connectable to a first ...  
WO/2019/009118A1
The placing table structure according to one embodiment of the present invention has: a refrigeration heat transfer body that is fixedly disposed; a rotatable outer pipe that is disposed around the refrigeration heat transfer body; and a...  
WO/2019/008031A1
The invention relates to a method of forming a surface texture on a process chamber component in the form of an annular shield element for use in a substrate processing chamber which is designed for manufacturing wafers, chips or dies, t...  
WO/2019/008889A1
This substrate mounting stand for heating a semiconductor substrate comprises: a ceramic disc-shaped part that has a mounting surface on the upper surface thereof, said mounting surface being configured such that a semiconductor substrat...  
WO/2019/003242A1
Embodiments herein provide a method for diamond wire cutting (DWC) multicrystalline silicon (multi-Si) wafer texturing. The method includes preparing an acid texturing solution comprising of a specific concentration of nitric acid and hy...  
WO/2019/000532A1
Disclosed in the present application is an ionization chamber, applied to an ion implanting device. The ionization chamber comprises a chamber, gas supply tubes and filaments, the gas supply tubes and the filaments being located within t...  
WO/2019/003499A1
Provided is a sensor head for a crystal-oscillation-type film thickness monitor that is capable of suppressing the stepping out of a stepper motor and the increase of motor excitation current. The sensor head comprises a sensor head body...  
WO/2019/001608A1
The invention relates to a method for producing a sliding surface (1) on a machine element (2), wherein the sliding surface (1) of the machine element (2) is intended for sliding contact with at least one further machine element, wherein...  
WO/2019/004188A1
A plasma treatment device, provided with: a balun having a first input terminal, a second input terminal, a first output terminal, and a second output terminal; a vacuum container; a first electrode electrically connected to the first ou...  
WO/2019/004187A1
A plasma treatment device, comprising: a balun that has a first unbalanced terminal, a second unbalanced terminal, a first balanced terminal, and a second balanced terminal; a grounded vacuum container; a first electrode that is electric...  
WO/2019/001055A1
Provided is a mask (100), comprising a mask frame (1) and a mask strip (2). The mask frame (1) comprises a transition layer (11) on a first surface of the mask frame, and the mask strip (2) is welded to the mask frame (1) through the tra...  
WO/2019/001297A1
A feed structure (100) for a physical vapor deposition device, comprising a first lead-in component (110) for receiving power, a second lead-in component (120) coupled to the first lead-in component (110), and a plurality of distributors...  
WO/2019/004183A1
A plasma treatment device, comprising: a balun that has a first input terminal, a second input terminal, a first output terminal, and a second output terminal; a vacuum container; a first electrode that is insulated from the vacuum conta...  
WO/2019/003534A1
This vapor deposition mask includes a frame and a metal film held by the frame, wherein the metal film has a first opening and a plurality of second openings disposed around the first opening, and the maximum width of the second openings...  
WO/2019/001682A1
A deposition apparatus is provided. The deposition apparatus includes a first deposition source and a second deposition source configured for depositing material in a substrate receiving area. The deposition apparatus includes a masking ...  
WO/2019/001298A1
The present disclosure provides a carrying device and a physical vapor deposition apparatus. The carrying device comprises: a base, for supporting a workpiece to be processed; and a first support member, disposed on the base, for pushing...  
WO/2019/004351A1
A sputtering device according to the present invention is a device which uses a sputtering method to form a film on a to-be-processed substrate, the sputtering device being provided with: a vacuum chamber; a target provided on the surfac...  
WO/2019/004192A1
A plasma processing device is provided with: a balun comprising a first unbalanced terminal, a second unbalanced terminal, a first balanced terminal, and a second balanced terminal; a vacuum container connected to ground; a first electro...  
WO/2019/004186A1
This plasma processing device is provided with: a balun having a first unbalanced terminal, a second unbalanced terminal, a first balanced terminal and a second balanced terminal; a grounded vacuum container; a first electrode electrical...  
WO/2019/000600A1
A mask plate (1), comprising an outer frame (10) and a plurality of sub-mask plates (20). The outer frame (10) is a hollow structure, and comprises a first side (101), a second side (102), a third side (103) and a fourth side (104), wher...  
WO/2019/000484A1
An evaporation source heating system, comprising a vacuum heating container (10), a first heating source (20) provided around the peripheral surface of the heating container (10) and a heat equalizing layer (30) provided in the heating c...  
WO/2019/004359A1
A film deposition device for depositing film on a substrate being treated, comprising a supply device which supplies film deposition material and is disposed in an evacuable chamber, and a holding device for holding the substrate being t...  
WO/2019/003809A1
The present invention discloses a treatment method performed by a film treatment apparatus 1 that is provided with: a first electric discharge electrode unit 3 and second electric discharge electrode unit 4 that have respective magnets 3...  
WO/2019/004185A1
A plasma processing device, comprising: a balun that has a first unbalanced terminal, a second unbalanced terminal, a first balanced terminal, and a second balanced terminal; a grounded vacuum container; a first electrode that is electri...  
WO/2019/004189A1
A plasma treatment device, provided with: a balun having a first unbalanced terminal, a second unbalanced terminal, a first balanced terminal, and a second balanced terminal; a grounded vacuum container; a first electrode electrically co...  
WO/2019/003605A1
Provided is a method for washing a mask for vacuum vapor deposition, the method comprising washing a mask by using a washing composition that contains at least one selected from N-methyl-2-pyrrolidinone and N,N-dimethylformamide, and the...  
WO/2019/000491A1
An evaporation source device for vapor deposition. The evaporation source device comprises a heating vessel (10) having an opening in the top surface and a first baffle (20) and a second baffle (30) covering the opening of the heating ve...  
WO/2019/003827A1
This film forming device has a mask alignment means for aligning substantially perpendicularly retained mask frame with respect to a substrate for film formation in a chamber, the mask alignment means having engaging parts provided at bo...  
WO/2019/004598A1
The present invention relates to an alloy-coated steel sheet and a manufacturing method thereof, the alloy-coated steel sheet comprising: a steel sheet; and an Al-Mg-Si alloy layer disposed on the steel sheet, wherein the Al-Mg-Si alloy ...  
WO/2019/002198A1
The present application relates to a method for preparing a homogeneous composition which comprises at least two vaporizable organic compounds, which method comprises mixing said compounds under heating and rotating in a rotatable vessel...  
WO/2019/004191A1
A plasma treatment device, comprising: a balun that has a first unbalanced terminal, a second unbalanced terminal, a first balanced terminal, and a second balanced terminal; a grounded vacuum container; a first electrode that is placed i...  
WO/2019/004190A1
A plasma treatment device, comprising: a first balun that has a first unbalanced terminal, a second unbalanced terminal, a first balanced terminal, and a second balanced terminal; a second balun that has a third unbalanced terminal, a fo...  
WO/2019/004184A1
A plasma treatment device provided with: a balun having a first unbalanced terminal, a second unbalanced terminal, a first balanced terminal, and a second balanced terminal; a grounded vacuum container; a first electrode electrically con...  
WO/2019/000274A1
A film forming device and a film forming method. The film forming device (10) comprises a machine (11). At least two material containers (14, 16) and at least two secondary driving means (13, 15) are provided on the machine (11) side by ...  
WO/2018/235889A1
A sputtering target material (2) comprises aluminum having a purity of 99.999 mass% or higher, and incidental impurities. The sputtering target material satisfies formulae: Ds≤230; Dq≤280; Dc≤300; 1.2≤Dq/Ds; and 1.3≤Dc/Ds, wher...  
WO/2018/236572A1
An electrochemical electrode and method for making same that provides enhanced characteristics for use in biosensors, such as blood glucose sensors. The electrode comprises a substrate, a conductive layer deposited on the substrate, and ...  
WO/2018/235750A1
[Problem] To provide: a sliding member having a coating film exhibiting constant and stable chipping resistance and wear resistance and having excellent peel resistance (adhesiveness); and the coating film. [Solution] The problem is addr...  
WO/2018/236881A1
Techniques for depositing a functionally integrated coating structure on a substrate are provided. An example method according to the disclosure includes receiving the substrate into a process chamber of a multi-process ion beam assisted...  
WO/2018/234285A1
To provide a solid material container that facilitates filling of a solid material and can supply more solid material vapor at a constant concentration. A solid material container 1 is a solid material container for supplying solid mater...  
WO/2018/235721A1
Provided is a substrate (110) with a multilayer reflective film, which is used for the purpose of producing a reflective mask (200) having a multilayer reflective film (5) that has a high reflectance with respect to exposure light, while...  
WO/2018/236559A1
Techniques for depositing a functionally integrated coating structure on a substrate are provided. An example method according to the disclosure includes receiving the substrate into a process chamber of a multi-process ion beam assisted...  
WO/2018/235747A1
A coated tool according to one mode of embodiment of the present invention is provided with a substrate and a coating layer. The coating layer includes a plurality of first AlTi layers represented by Al1-x1Tix1, and a plurality of second...  
WO/2018/237213A1
Films including a water-soluble polymeric layer and a vapor-deposited inorganic coating are disclosed. The films exhibit enhanced barrier properties. The inorganic coating comprises a metal oxide and comprises a plurality of microfractur...  
WO/2018/236071A1
The present invention relates to a ball and a valve seat for a fuel injector, in which an SiO-DLC functional layer having low friction properties is formed as an outermost layer in order to reduce a friction coefficient, an Mo-based mate...  
WO/2018/231837A1
An electrical power pulse generator system and a method of the system's operation are described herein. A main energy storage capacitor supplies a negative DC power and a kick energy storage capacitor supplies a positive DC power. A main...  
WO/2018/230126A1
Provided is a sputtering target 100 used for forming a positive electrode layer of a lithium ion secondary battery, the sputtering target 100 being constituted by a sintered compact of a plurality of first particles 110 each containing l...  
WO/2018/227961A1
A method for designing a metal mask plate (3), comprising steps of: respectively calculating deformation degrees of the metal mask plate (3) in two perpendicular directions according to a tensile strength of the metal mask plate (3) when...  

Matches 1 - 50 out of 103,370