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Patent Searching and Data


Matches 1 - 50 out of 102,037

Document Document Title
WO/2018/131362A1
A substrate treatment device is provided with: a substrate holder (H) heated in a reduced-pressure heat treatment chamber, the substrate holder retaining a substrate (W); a transmission window (23) for transmitting radiant heat rays (La)...  
WO/2018/132788A1
A method and device are disclosed herein for distributing a gas into a vessel. The method and device utilize a gas distribution apparatus, which has an exposed surface including a material that is chemically repulsive to the gas and the ...  
WO/2018/131960A1
The present invention relates to a technology for fabricating a three-dimensional electroformed object or circuit, a flexible circuit board, a mesh, a filter, a three-dimensional MEMS component, a three-dimensional circuit, a three-dimen...  
WO/2018/131964A1
The carrier-foil-attached ultra-thin copper foil according to one embodiment of the present invention comprises a carrier foil, a release layer, a first ultra-thin copper foil, an A1 layer, and a second ultra-thin copper foil, wherein th...  
WO/2018/131328A1
Provided is a Cr alloy target material with which formation of craters on the surface of the Cr alloy target material during film formation can be limited and the adhesion of droplets on the material being treated can be limited. The Cr ...  
WO/2018/131474A1
Provided is a vapor deposition mask such that, letting X1 be a dimension from point P1 to point Q1, X2 a dimension from point P2 to point Q2, and αx a prescribed value, (AA) and (BB) are satisfied.  
WO/2018/128009A1
In order to suppress deformation of a flexible substrate, this film forming method according to an embodiment of the present invention includes a preliminary process in which a vacuum container is exhausted until the moisture pressure in...  
WO/2018/128025A1
[Problem] To suppress heat damage to a film when a lithium layer is formed on the film by a rolling method. [Solution] A rolling-type film formation device is provided with a vacuum container, a film running mechanism, a lithium source, ...  
WO/2018/129049A1
Embodiments of a method and apparatus for annealing a substrate are disclosed herein. In some embodiments, a substrate support includes a substrate support pedestal having an upper surface to support a substrate and an opposing bottom su...  
WO/2018/128634A1
The present disclosure provides a method for material deposition on a substrate in a vacuum deposition process having a sputtering target is provided. The method includes providing a target temperature of the sputtering target during ope...  
WO/2018/127543A1
Provided herein is a method of coating a substrate is provided. The method includes providing at least one test substrate, b) a programmed physical thickness (T) for at least one layer of the multi-layered coating, and c) a design file c...  
WO/2018/125676A1
A coated article includes a substrate having a major surface, and an optical coating disposed on the major surface of the substrate. At least a portion of the optical coating includes a residual compressive stress of about 50 MPa or more...  
WO/2018/124630A1
Disclosed are a single layer zinc alloy plated steel material and a fabrication method therefor, the single layer zinc alloy plated steel material comprising a base iron and a zinc alloy plating layer formed on the base iron, wherein the...  
WO/2018/124392A1
The present invention relates to a reduced pressure drying method and a reduced pressure drying apparatus, and is characterised by the reduced pressure drying method comprising the steps of: loading a target treatment object with a clean...  
WO/2018/123500A1
A magnetic material sputtering target including an oxide having a melting point of 500°C or lower, the magnetic material sputtering target being characterized in that the average number density of oxides having a particle diameter of 10...  
WO/2018/120727A1
The invention discloses a mask plate body, a method for making a mask plate and a mask plate. A mask plate body (10) comprises at least one masked region (M) and a non-masked region (NM) surrounding the masked region (M). A portion of th...  
WO/2018/119735A1
An evaporator alignment system (100) and a method for selecting an evaporator alignment system. By means of the evaporator alignment system (100) and the method for selecting an evaporator alignment system, the alignment operation of a s...  
WO/2018/125971A1
Certain example embodiments relate to silver nano-metal mesh inclusive electrodes, and/or methods of making the same. The techniques described herein may be used, for example, in projected capacitive touch panels, display devices, and/or...  
WO/2018/124921A1
The invention relates to processes for producing an organosol which contains metal and can be used particularly for 3D printing, by means of a method of magnetron-sputtered metal target deposition. The technical result of the claimed inv...  
WO/2018/124649A1
Disclosed is a zinc alloy plated steel comprising a base iron, and multiple layers of alloy layers formed on top of the base iron, wherein each of the alloy layers in the multiple layers is either an Mg plated layer or a Zn-Mg alloy plat...  
WO/2018/121196A1
Disclosed is a mask frame assembly (7), comprising: a hollow frame (10) provided with a hollow region (X); and a first support bar (30) provided across the hollow region (X) of the hollow frame (10) in a first direction (I). The mask fra...  
WO/2018/120381A1
Provided is a high-frequency induced evaporation source apparatus, comprising an internal crucible (1) for carrying an evaporation material, an induction coil (2) sleeved around the inner crucible (1), a radio frequency generator (3) con...  
WO/2018/123183A1
In the present invention, on the surface of a rectangular plate-shaped target material (10), a groove section (13) that extends in the longitudinal direction is formed in the width-direction center of the target material (10) as a virtua...  
WO/2018/119600A1
Provided is a magnetron sputtering cathode system, comprising an annular target and a magnetic component rotatably disposed within the annular target. The magnetic component has magnetic field lines passing through the annular target. Th...  
WO/2018/123940A1
[Problem] To provide a halftone mask with which both a finer pattern and multi-gradation can be achieved. [Solution] A first semitransparent region comprising a first semitransparent film, a second semitransparent region comprising a lam...  
WO/2018/123549A1
Provided is a gas flow sputtering device suited to the long-term and stable production of a sputtering target starting material at a high sputtering rate. This gas flow sputtering device is equipped with: a sputtering chamber, the interi...  
WO/2018/123042A1
According to the present invention, at least one layer of a coating film located on an outer surface of a base member is a domain structure layer configured from at least two domains having different compositions and a thin layer having ...  
WO/2018/123132A1
An embodiment of the present invention is a method for repairing a backing plate 20 comprising a copper base 22 with a deficient area 24. The method comprises a step for polishing the surface of the deficient area 24, and a step after th...  
WO/2018/124629A1
Disclosed are a zinc alloy plated steel and a method for manufacturing same, the zinc alloy plated steel comprising: a base iron; a Zn plated layer formed on top of the base iron; and a Zn-Mg alloy layer formed on top of the Zn plated la...  
WO/2018/123955A1
This wiring structure (10) is provided with: a substrate (11); a copper-containing wiring layer (12) disposed on the substrate (11); a metal layer (14) that is disposed on the wiring layer (12) and comprises a copper-zirconium alloy; and...  
WO/2018/120382A1
A fine mask plate and a manufacturing method thereof are provided. The fine mask plate comprises a mask frame (15), a first mask formed of metal (11), and a second mask formed of an organic material (12). A plurality of first pixel openi...  
WO/2018/123550A1
Provided is a gas flow sputtering device suited to the long-term and stable production of a sputtering target starting material at a high sputtering rate. A gas flow sputtering device equipped with a pair of plate-shaped targets position...  
WO/2018/123776A1
The purpose of the present invention is to provide a sputtering device that can realize a lower resistance film quality by reducing interference between a high-density plasma and a restricting member. Provided is a sputtering device comp...  
WO/2018/117348A1
A filter unit according to an embodiment of the present invention may comprise: a cyclone body member which receives fluid introduced thereinto in one direction and has a circular internal sectional shape to form a rotational flow of the...  
WO/2018/112543A1
This application relates to nanoparticles, including nanoparticles derived from a plasma, and their use in the formation of conjugates. The nanoparticles can be stably conjugated to a wide variety of second species, forming conjugates wh...  
WO/2018/117701A1
The present invention relates to a plated steel sheet often used as materials for vehicles, home appliances, construction and the like and, more specifically, to a plated steel sheet having a multilayer structure and a method for manufac...  
WO/2018/117760A1
Disclosed is a Zn-Mg alloy plated steel material comprising: a base steel material; and first to third Zn-Mg alloy layers sequentially formed on the base steel material, wherein the first to third Zn-Mg alloy layers have a Zn single phas...  
WO/2018/114378A1
A long high-temperature high-output linear evaporation source apparatus (200) for atomic vapor deposition of metal atoms suited for the production of CIGS thin films, comprising at least one elongated horizontal crucible (50) for contain...  
WO/2018/114373A1
Along high-temperature high-output linear evaporation source apparatus (200) for vapor deposition applications comprises at least one elongated horizontal crucible (50) for containing material (55) to be melted and evaporated, and a heat...  
WO/2018/117717A1
The present invention relates to a sputtering target and a method for manufacturing the same, the sputtering target identifying a speed index according to a structure of internal organizational characteristics thereof, predicting the dep...  
WO/2018/117043A1
The present invention provides a gas barrier film which is provided with a polymer film, an anchor coat layer and a metal oxide layer. With respect to a gas barrier film 10 according to the present invention, a polymer film 1 and a metal...  
WO/2018/116831A1
Provided are: a grain-oriented electrical steel sheet that has excellent coating adhesiveness and an excellent magnetic property after stress relief annealing; and a production method for therefor. The grain-oriented electrical steel she...  
WO/2018/117498A1
The present invention relates to a system and method for manufacturing an organic light-emitting device, and a donor substrate set, the system comprising: a chamber; a first electric field application device installed in the chamber and ...  
WO/2018/115947A1
The present invention relates a method for the manufacture of a coated steel sheet.  
WO/2018/113053A1
Disclosed is a structural member with a diamond-like array. The structural member comprises a matrix (101, 201) and a diamond-like nano-needle array (1032, 2022) arranged on the matrix (101, 201) and having a tip structure. The diamond-l...  
WO/2018/116532A1
A corrosion-resistant member (10) provided with: a base material (16) made of aluminum or an aluminum alloy; a diamond-like carbon film (18) formed on a surface of the base material (16) and made of amorphous carbon (a-C) or hydrogenated...  
WO/2018/113904A1
According to one aspect of the present disclosure, a sputter deposition source (100, 200) is provided. The sputter deposition source comprises: an array of electrodes (110) having two or more pairs of electrodes, wherein each electrode (...  
WO/2018/114376A1
A long high-temperature high-output linear evaporation source apparatus (200) for vapor deposition applications comprises at least one elongated horizontal crucible (50) for containing material (55) to be melted and evaporated, and a hea...  
WO/2018/117759A2
Disclosed are: a zinc-base plated steel material comprising a base steel and a zinc-based plated layer and a post-treatment film, which are sequentially formed on the base steel, wherein the post-treatment film comprises an oxide or oxid...  
WO/2018/112910A1
A cutter composite coating, a cutter, and a method for preparing a cutter composite coating, applicable to the technical field of drilling tools. The cutter composite coating comprises a core layer (3) and a top layer (4). The core layer...  

Matches 1 - 50 out of 102,037