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Matches 1 - 50 out of 105,092

Document Document Title
WO/2019/171653A1
This surface-coated cutting tool comprises a substrate and a coating layer which coats the substrate, the coating layer comprising alternating layers obtained by alternately laminating first unit layers and second unit layers upon one an...  
WO/2019/171545A1
A film formation device according to an embodiment is provided with: a substrate holder for holding a substrate in an upright position relative to the horizontal plane, the substrate having a vapor deposition surface on which a vapor-dep...  
WO/2019/171648A1
This surface-coated cutting tool contains a substrate and a coating layer which covers the substrate, the coating layer containing first unit layers and second unit layers alternately laminated upon one another. The first unit layers com...  
WO/2019/171432A1
A vapor deposition mask is provided with: a resin film, which has at least one of first to third opening patterns in which first to third openings, for forming first to third subpixels that configure one pixel of a display panel, are dis...  
WO/2019/172996A1
A method for producing high-temperature sputtered stoichiometric TiN thin films. A substrate is placed in a sputtering chamber a Ti target to be sputtered and the substrate temperature is controlled to be between room temperature and abo...  
WO/2019/172252A1
The objective of the invention is to enable handling of larger sizes of substrates by employing an elongated antenna, while generating plasma uniform along the length direction of the antenna. The invention comprises: a first detection u...  
WO/2019/172081A1
An optical recording medium is provided with a recording layer containing an oxide of a metal MA, an oxide of a metal MB, an oxide of a metal MC, an oxide of a metal MD and an oxide of a metal ME. The metal MA comprises at least one meta...  
WO/2019/173730A1
Methods and apparatus for physical vapor deposition (PVD) are provided herein. In some embodiments, an apparatus includes a linear PVD source to provide a stream of material flux comprising material to be deposited on a substrate; and a ...  
WO/2019/171455A1
Provided is a method for producing a vapor deposition mask with which a masking sheet can be welded to a frame without generating wrinkles or distortions in the sheet even when the masking sheet is thinned. The method for producing a vap...  
WO/2019/170252A1
A vacuum processing system for processing a substrate is described. The processing system includes a first processing chamber connected to a first cluster chamber; a first processing station for processing the substrate in the first proc...  
WO/2019/172321A1
Provided is a coating that has exceptional breaking resistance and separation resistance, and that can produce exceptional adhesion and has sufficient durability even when used in applications where substantial contact stress repeatedly ...  
WO/2019/171901A1
The present invention provides a production method for a silicon carbide single crystal wherein a solid silicon carbide raw material is sublimated inside a growth container to grow a silicon carbide single crystal on a seed crystal subst...  
WO/2019/169110A1
Methods, devices and systems for providing optical coatings for large and arbitrary-shaped components are disclosed. One example method includes obtaining a plurality of glass substrates, where each substrate has a flat surface and a pre...  
WO/2019/165749A1
A substrate film forming machine table and a usage method. The substrate film forming machine table comprises: a first substrate bearing inlet and outlet chamber (11); a second substrate bearing inlet and outlet chamber (12); a film form...  
WO/2019/167674A1
Provided is a covering member capable of suppressing the occurrence of pitting corrosion caused by droplets and the occurrence of intergranular corrosion, and suppressing the progress of corrosion to the base material even if fine pittin...  
WO/2019/167438A1
[Problem] In plasma sputtering, it is possible to improve the utilization efficiency of a target material by expanding an erosion region of a target, but since the target utilization efficiency is limited when an existing magnetron plasm...  
WO/2019/167121A1
This display device production method comprises the step of forming a film of resin layer over a substrate, the step of placing into a first chamber the substrate having formed thereon the film of the resin layer and reducing the pressur...  
WO/2019/168013A1
The present invention contains, relative to 100% by mass of total metal components, 58%–75% by mass Zn, 1%–30% by mass Ga, and 2%–40% by mass In, with the remainder being Si and unavoidable metallic element impurities. Furthermore,...  
WO/2019/166285A1
A method for forming an aluminum nitride layer (310, 320) comprises the provision of a substrate (100) and the forming of a patterned metal nitride layer (110). A bottom electrode metal layer (210) is formed on the the exposed portions (...  
WO/2019/167715A1
A thin film is formed on the surface of a substrate 22 by performing the reactive sputtering of a gallium nitride target 33 while introducing a sputtering gas and a nitrogen gas both for use in the formation of a gallium nitride thin fil...  
WO/2019/166103A1
According to one aspect of the present disclosure, a method for forming a coating on a substrate (10) in a vacuum processing chamber (100) is provided. The method includes: forming a liquid film (110) on the substrate (10) by spraying a ...  
WO/2019/167657A1
A potassium sodium niobate sputtering target which is characterized by having a relative density of 95% or more. A method for producing a potassium sodium niobate sputtering target, which is characterized by: mixing an Nb2O5 powder, a K2...  
WO/2019/165760A1
A cooling system, comprising: a lining plate (1) and a cover plate (3), the peripheries of the lining plate (1) and of the cover plate (3) being connected sealedly to form a closed space (6); and at least one baffle (2), the at least one...  
WO/2019/166472A1
The invention relates to a spectacle lens which comprises at least one substrate and at least one nanostructured and/or microstructured layer, and to a method for manufacturing a spectacle lens.  
WO/2019/167115A1
A film forming mask (50a) that is to be disposed facing a substrate on which a film is to be formed, the film forming mask (50a) including a frame-shaped mask body (41), and a projection (42a) which is provided so as to project from the ...  
WO/2019/167622A1
Provided is a mask blank for a phase-shift mask, said mask blank being provided with an etching stopper film that has a high transmittance with respect to ArF exposure light and being capable of achieving a high contrast ratio with respe...  
WO/2019/167355A1
A first chamber (100) has a target housing section (110) for housing a target (T1). A second chamber (200) has a substrate support section (210) for supporting a substrate (S1). A partition part (300) has: a cylindrically-shaped section ...  
WO/2019/167564A1
A Cu-Ni alloy sputtering target containing Ni, with the remainder comprising Cu and unavoidable impurities, said target characterized in that Ni oxide phases are present at grain boundaries in a matrix phase comprising a solid solution o...  
WO/2019/162041A1
The stress in a layer deposited on a substrate is stabilized with respect to thermal loading by performing sputter deposition of the layer, maintaining all the elements of the material of the layer throughout the thickness of the layer a...  
WO/2019/163439A1
Provided is a film formation method by which an aluminum oxide film having stress lower than or equal to a predetermined value can be efficiently formed while maintaining a predetermined film formation rate. The film formation method inc...  
WO/2019/162681A1
The actual concentration, or partial pressure (58), of a target gas species in a partially-evacuated atmosphere (10) containing several gas species can be ascertained by generating a plasma (21) and by measuring (20) the intensity (24) o...  
WO/2019/162314A1
The invention relates to a coating (2) for tools (1, 4, 5) for handling lithium metal (3), containing a lithium-repelling material. The invention also relates to a tool (1, 4, 5) having such a coating (2) and to a method (6, 7) for produ...  
WO/2019/163745A1
The present invention is characterized in having a composition that consists of In and/or Sn in a range of 0.1 mass% to 1.5 mass% total and the balance Ag and unavoidable impurities and in that the arithmetic average surface roughness Ra...  
WO/2019/164454A1
A system and method for in-situ characterization of functional devices. The system comprises a vacuum chamber; a pump system coupled to the vacuum chamber for evacuation the vacuum chamber to near ultra high vacuum pressures of about 10-...  
WO/2019/163811A1
The present invention is characterized by: having, as the main phase thereof, an oxide including Al, Si, and Zn as the metal components thereof; containing 0.5–20 at.% nitrogen; and having the nitrogen present as a nitride. Ideally, th...  
WO/2019/164422A1
The invention relates to vacuum magnetron sputtering apparatus and can be used in various technical fields for applying thin films of metals and metal compounds. The present apparatus comprises: an airlock chamber (6) having a work table...  
WO/2019/163605A1
Provided is a copper foil with a glass carrier in which a copper layer does not peel off easily at a cut part even when downsized to be mounted on a circuit, and with which an intended circuit pattern is easily formed and a fine-pitch ci...  
WO/2019/163494A1
Provided is a piezoelectric film (1) containing an AlN crystal and a first element and a second element that have been added to the AlN crystal. The first element is an element of which the ion radius is greater than that of Al. The seco...  
WO/2019/163282A1
A fluorine-containing ether compound is provided which can form a surface layer with excellent fingerprint stain removability and abrasion resistance on the same level as in the prior art, and better-than-conventional light resistance. T...  
WO/2019/160228A1
The technical objective of the present invention is to provide a heater and insulator assembly for a vacuum evaporation source, the assembly facilitating assembly, enabling assembly time to be reduced, and enabling short circuiting of a ...  
WO/2019/157824A1
Disclosed is a vapor deposition device, comprising: an evaporator source, comprising a housing (101, 201), a nozzle (102, 213) being provided at the top of the housing (101, 201); and a first limiting plate (103, 203) and a second limiti...  
WO/2019/160273A1
According to one embodiment, a magnet assembly of a magnetron sputtering device can comprise: a yoke; an electromagnet arranged on the yoke and having magnetic poles differing from each other with respect to a direction orthogonal to the...  
WO/2019/160674A1
Embodiments described herein provide methods of forming amorphous or nano-crystalline ceramic films. The methods include depositing a ceramic layer on a substrate using a physical vapor deposition (PVD) process, discontinuing the PVD pro...  
WO/2019/158225A1
In a magnetron sputtering reaction space (I) a magnetron magnetic field (Bm) is generated. A further magnetic field (Ba) is generated in the reaction space (I) whereby a resultant magnetic field (Br) has a directional component parallel ...  
WO/2019/159856A1
The present invention addresses the problem of providing a target material (2) that is not prone to cracking during sputtering, and in order to solve this problem, the present invention provides a sputtering target material (2) including...  
WO/2019/160122A1
This member for use in a plasma treatment device is provided with a substrate, and, on at least part of the substrate, a film of an oxide of a rare earth element. The film thickness has a coefficient of variation of less than or equal to...  
WO/2019/157872A1
Provided are a flexible single-layer conductive microstructure artificial cochlear electrode and a manufacturing method thereof. An artificial cochlear electrode array component is designed according to the cochlear auditory nerve ending...  
WO/2019/160121A1
This member for use in a plasma treatment device is provided with a substrate, and, on the substrate, a film primarily composed of yttrium oxide. In the film, closed pores occupy no more than 0.2% of the surface area, and the half width ...  
WO/2019/160011A1
Provided is a method for suppressing the contact angle of an amorphous carbon film to water from being increased during storage of the amorphous carbon film, wherein the amorphous carbon film is stored in a state of contact with an aqueo...  
WO/2019/159768A1
Provided are: a tin oxide-based sintered body having a lower volume resistivity than conventional tin oxide-based sintered bodies; and a method for manufacturing a tin oxide-based sintered body. This tin oxide-based sintered body consist...  

Matches 1 - 50 out of 105,092