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Matches 1 - 50 out of 102,698

Document Document Title
WO/2018/190474A1
One embodiment of the present invention provides a nonferrous metal coating-dry plating method comprising: a primer coating step of primer-coating a nonferrous metal material with a paint; an intermediate coating step of intermediate-coa...  
WO/2018/189906A1
According to one embodiment, the production method for an organic EL display device involves performing a reforming treatment on a vapor deposition mask at a surface thereof that faces a vapor deposition source (S2), mounting a support s...  
WO/2018/190802A1
Examples of a cover for a device are described herein. The cover includes a substrate, which may be placed in proximity to an antenna. A primary layer may be applied on the substrate and over the primary layer a metal luster layer may be...  
WO/2018/190672A1
The present invention relates to a method for producing a metal-organic complex comprising a Group 4B element, and more specifically, to a method for producing a metal-organic complex exhibiting an excellent function of removing chemical...  
WO/2018/188804A1
The invention concerns a method for implanting multiply-charged ions on a surface of an object to be treated (30), this method comprising the step consisting of directing a beam (12) of multiply-charged ions produced by an electron cyclo...  
WO/2018/191708A1
The disclosure provides an insulated metal substrate (IMS) including a substrate having a first side and a second side. The IMS may also include a first dielectric layer on the first side of the substrate. The dielectric layer may includ...  
WO/2018/190408A1
Provided is an optical thin film having both hydrophilic properties and antireflective function. A multilayer film (102) as an optical thin film, wherein a film of a topmost layer is a hydrophilic film (111) that is a porous film. A film...  
WO/2018/189833A1
The vapor deposition device disclosed in the embodiments is structured such that an electromagnet (3) is used to attract a vapor deposition mask (1). The electromagnet (3) includes: a first electromagnet (3A) that generates a magnetic fi...  
WO/2018/189147A1
The invention relates to a coating apparatus (100), which is configured for reactive vapor phase deposition on a substrate under vacuum, in particular for forming perowskite layers, which comprises an evacuable vacuum chamber (10), an ev...  
WO/2018/190268A1
The present invention discloses a film formation device. The film formation device is provided with: a vacuum container; an exhaust mechanism communicating with the interior of the vacuum container; a substrate holding means capable of h...  
WO/2018/189965A1
Provided are: a wiring film which is able to be patterned by a single etching process, and which exhibits strong adhesion to a resin substrate; a semiconductor element which uses this wiring film; and a display device. According to the p...  
WO/2018/190461A1
The present invention relates to a method for preparing, from waste ITO scraps, a powder for a high-purity ITO target having a high relative density by using nitric acid, and the powder prepared thereby and, more specifically, to: a meth...  
WO/2018/186901A1
A method of sputtering using a high energy density plasma (HEDP) magnetron includes configuring an anode and cathode target magnet assembly in a vacuum chamber with a sputtering cathode target and substrate, applying regulated unipolar v...  
WO/2018/187139A1
Methods and apparatus for reducing defects in a film deposited atop a workpiece via physical vapor deposition are provided herein. In some embodiments, a sputter deposition target includes: a dielectric compound having a predefined avera...  
WO/2018/187782A1
Provided herein are methods for the controlled, independent modification of the surface of polymer-based materials and compositions generated thereby. The methods include use of low temperature plasma for surface modification. The method...  
WO/2018/186038A1
According to the present invention, a layer composition on a substrate is conveniently modified by a sputtering method. This forming device is provided with a vacuum container, a substrate carrying mechanism, a film formation source, and...  
WO/2018/184949A1
The present disclosure provides a method (100) for cleaning a vacuum chamber (210). The method (100) includes reducing a pressure in the vacuum chamber (210) to evaporate at least a part of a solvent contained in the vacuum chamber (210).  
WO/2018/185860A1
A vapor deposition device according to an embodiment of the present invention has a structure in which a vapor deposition mask is chucked by an electromagnet (3), and includes a control circuit (7) for gradually varying a magnetic field ...  
WO/2018/187758A1
Provided herein are systems and methods for the controlled surface modification of a material substrate, including, for example, generation of nanostructures, crystallographic or morphologic alterations and the removal of defects, change...  
WO/2018/186697A1
Provided is a fine metal mask manufacturing method reducing material costs and having improved productivity. According to the present invention, the fine metal mask manufacturing method comprises: a step of preparing a manufacturing subs...  
WO/2018/185967A1
The purpose of the present invention is to provide a feature with which it is possible to suppress light having a harmful wavelength from reaching an active layer. A thin-film transistor substrate comprises: an active layer 5 arranged on...  
WO/2018/184690A1
A supply line guide (100) for guiding a plurality of supply lines in a vacuum chamber of a processing system is described. The supply line guide includes a guiding arrangement (110) including a plurality of connected elements (115), wher...  
WO/2018/186621A1
The present invention relates to a radio wave transmitting laminate. Provided is a radio wave transmitting laminate comprising: a substrate; a primer coating layer positioned on the upper surface of the substrate and comprising a polymer...  
WO/2018/184456A1
A microwave dielectric component (100) comprises a microwave dielectric substrate (101) and a metal layer, the metal layer being bonded to a surface of the microwave dielectric substrate (101). The metal layer comprises a conductive seed...  
WO/2018/186385A1
The present invention includes: a surface treatment step in which a surface treating bonding material is applied to an inner circumferential surface, i.e. a bonding surface, of a cylindrical target (2), and/or an outer circumferential su...  
WO/2018/184264A1
A treatment method of a raw material of a light-emitting layer in an OLED comprises the following steps: (1) providing a raw material of a light-emitting layer, the raw material of the light-emitting layer comprising a host light-emittin...  
WO/2018/182167A1
The present invention relates to a magnet and the like which can be used for a magnetron sputtering device. A magnet structure for a magnetron sputtering device of the present invention comprises: a permanent magnet; and a wire surroundi...  
WO/2018/180276A1
The present invention provides a piezoelectric body membrane, a piezoelectric element, and a piezoelectric element manufacturing method with which excellent piezoelectric characteristics can be obtained even under a high temperature envi...  
WO/2018/180476A1
In order to achieve the above-described purpose, a structure according to one embodiment of the present technique is provided with a decorative part and a member. The decorative part comprises a single metal layer which has fine cracks a...  
WO/2018/176918A1
A conveying apparatus, comprising at least one first conveying member (101) and at least one second conveying member (102); the first conveying member (101) comprises a first bearing pad (103) in contact with a conveying object; the seco...  
WO/2018/177853A1
The invention relates to a device for determining the partial pressure or concentration of a vapor in a volume (2) having a sensor element (5), which can be caused to oscillate and temperature-controlled to a temperature below the conden...  
WO/2018/177900A1
A piston ring that is pre-treated by grit blasting to a defined roughness, followed by PVD coating with a metal nitride to a thickness of at least 10┬Ám, leaving peaks and valleys in the coated piston ring. The coated piston ring is then...  
WO/2018/180975A1
One objective of the present invention is to provide an inorganic film that exhibits superior gas barrier properties and suppresses light transmittance from being degraded even when laminated with a resin material. Further, another objec...  
WO/2018/177852A1
The invention relates to a device for determining the partial pressure or the concentration of a steam in a volume (2), comprising a sensor body (5) which can be oscillated, the temperature of which can be controlled to a temperature bel...  
WO/2018/180961A1
The present invention provides: a transparent conductive laminate that simultaneously exhibits excellent optical properties and flexibility and that has, on a transparent base material, at least an embedded resin layer, an auxiliary elec...  
WO/2018/179263A1
A laminated film 22 is formed in a display region (DA) of an active matrix substrate (20), and a single-layer deposition film (23) is formed outside of the display region (DA) of the active matrix substrate (20) such that at least a part...  
WO/2018/181335A1
A golf club head (10, 10A) according to one embodiment of the present invention is provided with: a head main body (1) which is formed from a metal; and a cover film (2) which covers at least a part of the head main body. The cover film ...  
WO/2018/179709A1
The present disclosure pertains to a slide member. This slide member comprises a base material and an amorphous hard carbon film formed on the surface of the base material, wherein the amorphous hard carbon film has an sp2 ratio that inc...  
WO/2018/181097A1
The purpose of the present invention is to provide a coating film that can not only sufficiently improve both low frictional properties and abrasion resistance, but also further improve seize resistance. The present invention provides a ...  
WO/2018/176563A1
An evaporation source (100) comprising a housing (120), a crucible (106) for disposing an evaporation material (105), a spray nozzle (101), a first heating filament (108) for heating a heating surface (1051), and a lifting mechanism (107...  
WO/2018/177898A1
The invention relates to a device (100) for the electron-assisted coating of substrates (60), comprising a vacuum receptacle (90) designed for providing a vacuum (80). The device (100) also comprises at least one carrier element (70) des...  
WO/2018/184023A1
A chemical vapor deposition system for coating one or more workpieces is described herein. The deposition system includes a plurality of processing chambers which may be operated independently to increase throughput of the deposition sys...  
WO/2018/179770A1
Provided is a tungsten sputtering target with which a deposition speed that does not vary much over the life of the target is obtained. In the tungsten sputtering target, when a cross-section perpendicular to the sputtered plane is analy...  
WO/2018/181969A1
A vapor deposition mask created by laminating a metal mask having metal mask openings to a resin mask having resin mask openings which correspond to a pattern formed by means of vapor deposition on positions overlapping the positions of ...  
WO/2018/181642A1
[Problem] To provide a method for forming a nitride or oxide film on a surface of a group III-nitride semiconductor such as GaN or the like while reducing defects on the surface of the group III-nitride semiconductor; and an apparatus fo...  
WO/2018/179708A1
The present disclosure relates to a sliding member. This sliding member includes a base material and an amorphous hard carbon film formed on a surface of the base material, the amorphous hard carbon film having a graded composition where...  
WO/2018/180645A1
A sputtering target of one embodiment is a sputtering target in which a target part and a backing plate part, which are composed of copper and inevitable impurities, are integrally formed, wherein the Vickers hardness (Hv) is 90 or more,...  
WO/2018/179703A1
A mask (100) is provided with a flexible mask base material (30) wherein an opening (11) is provided corresponding to a pattern shape of a thin film to be formed on a substrate (1) on which the film is to be formed. The surface of the ma...  
WO/2018/179553A1
The segmented sputtering target (1) related to one aspect of an embodiment is formed by bonding multiple target materials (10) to a substrate (20), wherein flat surfaces (12) are formed on each of at least some of the side faces (11) of ...  
WO/2018/179904A1
To provide a metalized film with which it is possible to form a flat and smooth thin copper film on a flat and smooth fluorine resin using a physical vapor deposition method and to ensure adhesion strength between the fluorine resin and ...  

Matches 1 - 50 out of 102,698