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Matches 1 - 50 out of 103,800

Document Document Title
WO/2019/052669A1
A vacuum processing system (100) for vacuum processing one or more substrates along a substrate transport direction, including a first substrate-handling chamber (101); a separation (W) partitioning the first substrate-handling chamber i...  
WO/2019/054717A2
The present invention relates to a frame-integrated mask. The present invention provides a frame-integrated mask in which a plurality of masks (100) and a frame (200) for supporting the masks (100) are integrally formed, wherein the fram...  
WO/2019/052090A1
A reinforced toughened filter, comprising a substrate (110) and a film layer (120). The film layer (120) is formed by alternately stacking a dielectric layer consisting of Al2O3 and a metal film layer consisting of Ti; the film layer (12...  
WO/2019/051977A1
Disclosed are a mask plate used for OLED device evaporation and an OLED device manufactured thereby. The mask plate comprises: first groove-shaped mask portions (101) arranged at intervals in a pre-set direction; and second groove-shaped...  
WO/2019/054718A2
The present invention relates to a method for manufacturing a frame-integrated mask. The method for manufacturing a frame-integrated mask, according to the present invention, is a method for manufacturing a frame-integrated mask having a...  
WO/2019/052024A1
A sputter coating machine, comprising: a rail (10); a carrier (20) provided on the rail (10) and capable of moving along the rail (10), the carrier (20) comprising a frame-shaped substrate (21), a frame-shaped boss (22) connected to the ...  
WO/2019/051975A1
An ultraviolet irradiation device, comprising: a chamber (101), used for accommodating base materials; a sample table (102), used for bearing the base materials and positioned at the top or the bottom of the chamber (101); ultraviolet la...  
WO/2019/054530A1
The technical objective of the present invention is to provide a vacuum evaporation source enabling effective heating of the bottom surface of a crucible. To this end, a vacuum evaporation source of the present invention, having a crucib...  
WO/2019/021192A4
Thin films of nickel-copper binary oxynitride (NiCuOxNy) were deposited on the surface of substrates of AISI 3161 stainless steel and glass using reactive RF sputtering, with a thickness between 700 and 2100 nm, under various depositing ...  
WO/2019/051931A1
Disclosed are a mask plate (30), and a manufacturing method and an evaporation method therefor. The mask plate (30) comprises a mask plate body (31) and evaporation holes (32) and bulges (33) formed on the mask plate body (31), wherein t...  
WO/2019/054713A1
The present invention relates to a ventilator for preventing oil attachment and a manufacturing method therefor, whereby an oil attachment prevention layer is formed on the surface of a ventilator, thereby preventing oil from attaching t...  
WO/2019/054531A1
The technical objective of the present invention is to provide a vacuum evaporation source which has a heating wire having enhanced straightness. To this end, a vacuum evaporation source of the present invention comprising a crucible com...  
WO/2019/053257A1
The present invention relates to a method for producing an Al-Cr-O-based coatings comprising at least one Al-Cr-O-based or Al-O-based film on a workpiece surface, wherein the method comprises following steps: a) placing at least one work...  
WO/2019/054462A1
The present invention includes: interposing a resin layer between a metal plate made of an iron-nickel-based alloy and a glass substrate, and bonding the metal plate to the glass substrate with the resin layer therebetween; forming, from...  
WO/2019/053254A1
Summary The present invention relates to a method for producing coated substrate bodies, wherein a plurality of substrate bodies comprising surfaces to be coated are provided with a colored coating surface, the method comprising followin...  
WO/2019/054489A1
This sputtering target is characterized by: being mainly composed of Zn, Sn and O, and containing Zn and Sn in amounts such that the Zn/(Zn + Sn) atomic ratio is within the range of from 0.1 to 0.6 (inclusive); and comprising tin oxide p...  
WO/2019/052282A1
A mask cassette (100), comprising: a cassette body (10); at least one slot (20) formed in the cassette body (10) and used for placement of a mask (200); and stop blocks (2) provided at the periphery of the slot (20) and used for limiting...  
WO/2019/049600A1
This production method for a vapor deposition mask device comprises a step for preparing a vapor deposition mask including a plurality of through-holes extending from a first surface to a second surface, and a welding step for welding th...  
WO/2019/050483A1
A sputtering system and a sputtering method are provided. The sputtering system includes a first electrode, a magnet and a second electrode. The first electrode is an elongated tube having a first end and a second end downstream of the f...  
WO/2019/047167A1
A system for preparing a composite material by means of high-throughput magnetron sputtering: a device (100) comprises a vacuum chamber (110), and a plurality of magnetron sputtering cathodes (120) and a substrate (130) that are disposed...  
WO/2019/047464A1
An evaporator, being used for evaporating a glass substrate (1). The evaporator comprises a vacuum evaporation chamber (2), and an evaporation source (3), a metal mask plate (4), a movable part (5) and a bracket (6) which are housed in t...  
WO/2019/048367A1
The invention relates to a device for depositing layers that are laterally structured by the use of masks on at least one substrate (20), in particular by feeding a vapour into a deposition chamber (19) and condensing the vapour on the s...  
WO/2019/049453A1
The present invention provides a deposition mask. The deposition mask has a metal plate that has: an upper surface; a lower surface, which is positioned below the upper surface, and which is disposed further than the upper surface from a...  
WO/2019/050377A1
The present invention provides a dry plating apparatus which can perform continuous plating by continued smooth supply of solid raw materials. An embodiment provides a dry plating apparatus comprising: a vapor chamber configured such tha...  
WO/2019/050198A2
A metallic material deposition mask for OLED pixel deposition according to an embodiment of the present invention includes a deposition region for forming a deposition pattern and a non-deposition region other than the deposition region....  
WO/2019/049254A1
The cylindrical sputtering target according to the present invention is provided with a cylindrical-shaped target member and a packing tube that is joined via a joining layer to the inner circumferential side of the target member. Therma...  
WO/2019/049876A1
The present invention addresses: the problem of providing a high-quality epitaxial silicon thin film having few defects in the production of an epitaxial silicon thin film using double layer porous silicon (DLPS); and the problem of prov...  
WO/2019/049472A1
The present invention provides a sputtering device capable of forming a predetermined thin film inside holes and trenches formed on the surface of a substrate with preferable symmetry and good coverage. This sputtering device is provided...  
WO/2019/047856A1
A base support component (10), comprising a support plate (1) which is configured to support a base (5) in a film forming process. The support plate (1) has a working surface configured to face the base (5), wherein a plurality of openin...  
WO/2019/050246A1
The present invention is characterized by comprising: a base plate having a first view port formed therein; a vacuum chamber disposed on the base plate, maintained in a sealed state from the outside, and having a second view port formed ...  
WO/2019/049632A1
Disclosed is a method for manufacturing a semiconductor device (30), said method including: forming a semiconductor layer (31) having an oxide semiconductor as a main component; and forming, on a surface (31s) of the semiconductor layer ...  
WO/2019/048507A1
This invention relates to a coating comprising at least one AlTiN-based film deposited by means of a PVD process, wherein the at least one AlTiN-based film deposited is comprising an Al-content - in relation to the Ti-content - in atomic...  
WO/2019/043422A1
The present invention relates to a coated metallic substrate comprising at least a first coating based on aluminum comprising optionally less than 50% of zinc, such first coating having a thickness below 5pm and being directly topped by ...  
WO/2019/043129A1
A system (1) is disclosed, comprising a gas source (2), a rotor (3), at least one positioning device (4) and a target holder (13). The gas source is configured to provide a source jet of gas (5) towards the rotor. The rotor is configured...  
WO/2019/045519A1
The present invention provides a target for physical vapor deposition, the target being formed of a Zr-Cu-Si based alloy in order to form a low-friction coating film, wherein the target comprises 82-90 at% of Zr, 4-14 at% of Cu, and 4-8 ...  
WO/2019/043866A1
According to the present invention, a step for forming an opening in a mask base material includes: step A for forming openings inside a first region (R1) including openings of consecutive columns the number of which is a and which inclu...  
WO/2019/042033A1
Disclosed are a negative thermal expansion material, and a preparation method therefor, wherein the negative thermal expansion material comprises Eu 0.85Cu 0.15Mn 3- δ, wherein 0≤ δ ≤2, and a thin film prepared by using the negativ...  
WO/2019/043424A1
The present invention relates to a coated metallic substrate comprising at least a first coating based on aluminum comprising optionally less than 50% of zinc, such first coating having a thickness between 1.0 and 4.5pm and being directl...  
WO/2019/043095A1
A coated cutting tool comprising a substrate with a coating having a total thickness of 0.25-30 μm, wherein the coating comprises a first layer and a second layer, the first layer is a wear resistant PVD deposited layer having a thickne...  
WO/2019/042580A1
The invention relates to a micromechanical structure comprising a substrate (1), an adhesion layer (3) which is applied onto the substrate (1); a first metal layer (4) which is applied onto the adhesion layer (3); a ferroelectric layer (...  
WO/2019/043472A1
The present invention relates to a coated metallic substrate comprising at least a first coating consisting of aluminum, such first coating having a thickness below 5µm and being directly topped by a second coating comprising from 0.5 t...  
WO/2019/044850A1
This component is provided with a film that contains yttrium oxide. A cross-sectional surface of the film has a first portion, a second portion and a third portion; and the first to third portions are away from each other by 0.5 mm or mo...  
WO/2019/045240A1
The present invention relates to a method for producing a frame-integrated mask. A method for producing a frame-integrated mask according to the present invention is a method for producing a frame-integrated mask in which a mask (100) an...  
WO/2019/044896A1
Provided is a transparent conductor 10 comprising a transparent substrate 11, a first metal oxide layer 12, a metal layer 18 including a silver alloy, a third metal oxide layer 14, and a second metal oxide layer 16 in this order. The fir...  
WO/2019/043473A1
The present invention relates to a coated metallic substrate comprising at least a first coating consisting of aluminum, such first coating having a thickness between 1.0 and 4.5µm and being directly topped by a second coating based on ...  
WO/2019/044714A1
This coated tool comprises a base and a coating layer located on the base. The coating layer has a plurality of each of AlTi layers containing aluminum and titanium and AlCr layers containing aluminum and chromium, the AlTi layers and th...  
WO/2019/043167A1
The invention relates to a coated cutting tool and a process for the production thereof, the coated cutting tool consisting of a substrate and a hard material coating, the substrate being selected from cemented carbide, cermet, ceramics,...  
WO/2019/042565A1
The present disclosure relates to a holder for holding a substrate. The holder includes a surface configured to face the substrate, and an adhesive provided over the surface and comprising a plurality of adhesive structures. The pluralit...  
WO/2019/044715A1
This coated tool comprises a base and a coating layer located on the base. The coating layer has a plurality of each of AlTi layers containing aluminum and titanium and AlCr layers containing aluminum and chromium, the AlTi layers and th...  
WO/2019/045235A1
The purpose of the present invention is to provide a hard coating having improved abrasion resistance and toughness, formed by a PVD method, and comprising a first hard layer and a second layer, wherein: the first hard layer has a thickn...  

Matches 1 - 50 out of 103,800