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Matches 1 - 50 out of 100,773

Document Document Title
WO/2018/011614A1
Vapor deposition apparatuses, systems, and methods with a collapsible shutter are described. Embodiments of the present disclosure can be useful for covering evaporator sources within a vacuum chamber yet having a smaller footprint when ...  
WO/2018/013462A2
A coated article may comprise a substrate and an optical coating. The substrate may have a major surface comprising a first portion and a second portion. A first direction that is normal to the first portion of the major surface may not ...  
WO/2018/013909A1
A multi-layer coating for a surface of an article comprising a diffusion barrier layer and an erosion resistant layer. The diffusion barrier layer may be a nitride film including but not limited to TiNx, TaNx, Zr3N4, and TiZrxNy. The ero...  
WO/2018/011648A1
Provided is a novel metal oxide. Specifically provided is a metal oxide having a plurality of energy gaps, wherein the metal oxide is provided with a first layer in which the energy level at the bottom of the conduction band of the energ...  
WO/2018/012546A1
Provided is a manufacturing method for a semiconductor laminated film, which comprises a step for forming a semiconductor layer containing silicon and germanium on a silicon substrate via sputtering, wherein, during sputtering, the film ...  
WO/2018/011662A1
A power transfer system (100) is described for transfer of electrical power to a sputter target in a sputter device. It comprises a first part (110) comprising a contact surface (115) positionable against a first part (210) of an endbloc...  
WO/2018/012754A1
Disclosed is a tension mask frame assembly manufacturing apparatus for mounting a tension mask on a rectangular frame having: a pair of support frame parts to which mutually facing edges of a tension mask having a rectangular sheet shape...  
WO/2018/012461A1
This sputtering target manufacturing method involves heating with a heat plate while pressing, from above, the center portion of the top surface of the target member prior to the outer periphery of said top surface, and diffusion bonding...  
WO/2018/011646A1
A novel metal oxide is provided. A semiconductor device with favorable electrical characteristics is provided. The metal oxide has a plurality of energy gaps, and includes a first region having a high energy level of a conduction band mi...  
WO/2018/010926A1
The invention relates to a method for producing a component (10) comprising a metallic substrate (14), in particular made from messing or aluminium, and an anti-corrosion coating (16) provided on a surface of the substrate (10). The anti...  
WO/2018/012185A1
The present invention provides a laminate body substrate provided with a transparent substrate and a laminate body formed on at least one surface of the transparent substrate, wherein the laminate body comprises: an underlying metal laye...  
WO/2018/011645A1
A novel metal oxide or a novel sputtering target is provided. A sputtering target includes a conductive material and an insulating material. The insulating material includes an oxide, a nitride, or an oxynitride including an element M1. ...  
WO/2018/011151A1
A method of in situ monitoring a thin film deposition process on a substrate, the method comprising the steps of a) defining 10 a desired spectrum T, said desired spectrum being a transmission or a reflection spectrum defined in a range ...  
WO/2018/010439A1
An indium tin oxide film (7), a method for preparing same, an array substrate comprising the indium tin oxide film (7), and a display device comprising the array substrate. The method for preparing the indium tin oxide film (7) comprises...  
WO/2018/013387A1
A sintered compact magnesium oxide target for sputtering having a purity of 99.99 wt% or higher, a density of 3.58 g/cm3 or higher, and a transparency 10% or more. A sintered compact magnesium oxide target for sputtering having a purity ...  
WO/2018/010936A1
The invention relates to a method for arranging a protective coating for a thermally stressed structure, having at least one layer of alpha-aluminium oxide or of element-modified alpha-aluminium oxide, and wherein the protective coating ...  
WO/2018/010927A1
The invention relates to a component (10) comprising a metallic substrate (14), in particular made from messing or aluminium, and an anti-corrosion coating (16) which is provided on a surface of the substrate (10). The anti-corrosion coa...  
WO/2018/012460A1
This sputtering target manufacturing method involves: an integrating step for integrating a target member into the inside of a frame part of a backing plate member such that, in the height direction of the frame part of the backing plate...  
WO/2018/011647A1
A novel metal oxide is provided. The metal oxide has a plurality of energy gaps, and includes a first region having a high energy level of a conduction band minimum and a second region having an energy level of a conduction band minimum ...  
WO/2018/011453A1
The invention relates to a method for obtaining a graphene that is covalently functionalised with an organic molecule. The method comprises: a first step of forming monatomic vacancies/defects in the crystal lattice of the graphene by me...  
WO/2018/008651A1
The present invention improves the piezoelectric constant of a GaN piezoelectric film. A piezoelectric film which is formed of a gallium nitride crystal having a wurtzite structure, and wherein the gallium nitride crystal contains at lea...  
WO/2018/008533A1
Provided is a cluster ion beam generation method with which it is possible to increase the value of beam current in a cluster ion beam. The cluster beam ion generation method according to the present invention is for generating a cluster...  
WO/2018/009893A1
An automated masking system includes a substrate loading apparatus designed to hold a plurality of substrates, a first masking material application station designed to automatically apply a first masking material to a portion of the subs...  
WO/2018/008681A1
This film formation device is provided with: a chamber in which a target is contained; a stage which is disposed to face one surface of the target with a predetermined space therebetween and on which an object where a film is to be forme...  
WO/2018/006944A1
A method for forming a light emitting structure (500) on a substrate (501) is described. The method includes forming a first reflective electrode portion (400), forming an emitter layer (502) over the first reflective electrode portion a...  
WO/2018/001523A1
A deposition apparatus (100) for coating a flexible substrate (10) with a stack of layers is described. The deposition apparatus comprises: a first spool chamber (110) configured for housing a storage spool for providing the flexible sub...  
WO/2018/004280A1
The prevent invention provides a copper oxide thin film structure using a flawless single crystal copper thin film, and a manufacturing method therefor, and is technically characterized by comprising: a transparent substrate; a first cop...  
WO/2018/000949A1
A mask plate and a method for fabricating said mask plate. The mask plate comprises a first mask plate (1) and a second mask plate (2) arranged in a stack, the first mask plate (1) is provided with first openings (11), the first openings...  
WO/2018/005868A1
An apparatus has a cathode target with a cathode target outer perimeter. An inner magnetic array with an inner magnetic array inner perimeter is at the cathode target outer perimeter. An outer magnetic array has an outer magnetic array o...  
WO/2018/002764A1
Provided is a novel metal oxide. The present invention has a first sputtering target, a second sputtering target, a shutter, and a substrate holder, the first sputtering target including an oxide material having a first band gap, the sec...  
WO/2018/001521A1
According to one aspect of the present disclosure, a processing system (100) for processing a flexible substrate (10) is provided. The processing system includes: a vacuum chamber (11); a transport system configured to guide the flexible...  
WO/2018/003615A1
Provided is a sputtering apparatus film formation unit that has a simple structure and is easy to maintain without interfering with the function of free target movement relative to a magnet unit. On a support plate 1, this sputtering app...  
WO/2018/004884A1
The invention provides a sputter deposition assembly (100) that includes a sputtering chamber (200), a sputtering target (90), and a magnet assembly (300). The magnet assembly includes a two-part magnetic backing plate (60) that includes...  
WO/2018/002307A1
A coated cutting tool comprising a body and a hard and wear resistant coating on the body, the coating comprising at least one NbN layer with a thickness between 0.2 µm and 15 µm, wherein the NbN layer comprises a phase mixture of a cu...  
WO/2018/002072A1
The present invention relates to a sliding element for internal combustion engines having a coating of hard amorphous carbon comprising nanoparticles of a solid lubricant capable of bringing about a reduction in the friction and, consequ...  
WO/2018/004883A1
The invention provides a sputter deposition assembly that includes a sputtering chamber, a sputtering target, and a magnet assembly. The magnet assembly includes a magnetic backing plate with a blind recess into which a moveable magnetic...  
WO/2018/000977A1
A mask plate assembly (10), a method for installing the mask plate assembly (10) and an evaporation device. The mask plate assembly (10) comprises a support frame (300); a mask plate (200) fixed on the support frame (300), the mask plate...  
WO/2018/002482A1
This method for locating, in a deposition line comprising a succession of compartments, an origin of a defect affecting a stack of thin layers deposited on a substrate in the compartments, in which each thin layer of a material is deposi...  
WO/2018/003766A1
Provided is a vapor deposition mask formed by layering a resin mask having a plurality of resin mask openings that correspond to a pattern that is to be fabricated by vapor deposition, and a metal mask having a metal mask opening, said m...  
WO/2018/004007A1
A vehicle rack-and-pinion mechanism (1) which can be applied to a steering device (S) is provided with a pinion (11) that comprises gear teeth (12) and is supported so as to be rotatable about its axis and a rack shaft (21) that comprise...  
WO/2017/222682A1
A Me-B based alloy spherical powder for use in a sputtering target including a metal powder selected from the group consisting of: Mo, W, Ta, Nb, Hf and Ti; a BN powder; and optionally a binary or ternary compound powder, as well as W/B ...  
WO/2017/223132A1
An ion implantation system and method is provided for forming an ion beam from aluminum iodide. A water vapor source further introduces water to react residual aluminum iodide to form hydroiodic acid, where the residual aluminum iodide a...  
WO/2017/221821A1
Provided are a target device and a sputtering apparatus that have high efficiencies of target use. The front surface 33 of a ring-shaped high magnetic permeability plate 27 with a higher magnetic permeability than a backing plate 21 is d...  
WO/2017/221650A1
Provided is a film formation method capable of efficiently forming an aluminum oxide film with stress within specified values while maintaining a specified film formation rate. In the present invention, an aluminum oxide film is formed b...  
WO/2017/221172A2
A process for producing a medical device (100), which is coated with a thin film based on carbon, comprises the steps of: - positioning a medical device to be coated inside a processing chamber (3), in which there is provided a target el...  
WO/2017/222551A1
An amorphous thin metal film can include a combination of metals or metalloids including: 5 at% to 74 at% of a metalloid selected from the group of carbon, silicon, and boron; 5 at% to 74 at% of a first metal; 5 at% to 74 at% of a second...  
WO/2017/223130A1
An ion implantation system (101) is provided having an ion source (108) configured to form an ion beam (116) from aluminum iodide. A beamline assembly selectively transports the ion beam to an end station (106) configured to accept the i...  
WO/2017/222545A1
An amorphous thin metal film can comprise a combination of three metals or metalloids including: 5 at% to 90 at% of a metalloid selected from the group of carbon, silicon, and boron; 5 at% to 90 at% of a first metal selected from the gro...  
WO/2017/221649A1
A film structure (10), having: a substrate (11); a piezoelectric film (14) which is formed on the substrate (11) and which includes a first composite oxide represented by the composition formula Pb(Zr1-xTix)O3; and a piezoelectric film (...  
WO/2017/222009A1
A substrate mounting method for mounting a substrate on a mounting body, said method including: a first gripping step for gripping the peripheral edge of the substrate using a gripping mechanism; a releasing step for releasing the grip o...  

Matches 1 - 50 out of 100,773