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Matches 1 - 50 out of 107,910

Document Document Title
WO/2020/181347A1
The present invention relates to a composite material that includes a substrate that is thermochemically treated to harden the surface thereof and that is, therefore, not subject to deformations as a result of high stresses sustained by ...  
WO/2020/184352A1
In this surface-coated cutting tool: a hard coating layer is provided to the surface of a tool base body comprising a WC-based cemented carbide having WC particles as a hard phase component and Co as a bonding phase main component; an in...  
WO/2020/184531A1
A metallic copper/copper oxide-containing powder (10) comprising a metallic copper powder (11), a copper oxide powder (12), and unavoidable impurities, the metallic copper powder (11) being configured so as to have a larger average parti...  
WO/2020/184727A1
The present invention provides a method for producing an optical element which comprises a base material and a multilayer covering film that is formed on the base material. A production method according to the present disclosure comprise...  
WO/2020/184319A1
This sputtering target material is constituted of AlN, 0.08-0.82 moles of Al with respect to one mole of AlN, and unavoidable impurities. The sputtering target material preferably has a relative density of 85-100%. The bulk resistivity i...  
WO/2020/183777A1
Provided is a vacuum vapor deposition device in which, when vapor deposition is being performed on a part of a sheet-like substrate wound around a can roller, atmosphere can be separated between a vapor deposition chamber having a vapor ...  
WO/2020/182184A1
Disclosed in the present invention are an in-situ electrochemical detection chip, an in-situ liquid cell chip, and an in-situ heating chip for a transmission electron microscope, and a manufacturing method therefor. The in-situ electroch...  
WO/2020/183552A1
In this deposition device (100), a substrate (120) is lowered so that only a first end section (126) thereof makes contact with a mask sheet (111) and then, the entirety of the substrate (120) gradually makes contact with the mask sheet ...  
WO/2020/185284A1
A dry powder MOCVD vapor source system is disclosed that utilizes a gravimetric powder feeder, a feed rate measurement and feeder control system, an evaporator and a load lock system for continuous operation for thin film production, par...  
WO/2020/183827A1
The present invention addresses the problem of providing a film forming method with which the optimal values of the revolution angular velocity and the rotation angular velocity of a substrate to be treated can be simply set according to...  
WO/2020/185164A1
A method of forming a transition metal dichalcogenide layer on a substrate is provided. The method may include providing a transition metal oxide, a chalcogen source, a non-gaseous chalcogen scavenger, and a substrate, wherein the substr...  
WO/2020/182495A1
The invention relates to a susceptor arrangement for use in a CVD reactor (1) comprising a circular or annular susceptor (2) with a first susceptor broad side (3), on which a substrate holder (4) and at least one covering element (5, 15)...  
WO/2020/184473A1
Provided is a reflection-type mask blank which enables the further reduction of the shadowing effect of a reflection-type mask. A reflection-type mask blank (100) in which a multilayer reflection film (2) and an absorber film (3) are a...  
WO/2020/184192A1
[Problem] To provide a method for forming a nitride coating, whereby it becomes possible to coat a nitride more uniformly by a simple process and simple operations. [Solution] A base material 13 is placed in a powder 12 that contains, as...  
WO/2020/185360A1
A showerhead assembly includes a support structure and a porous plate. The support structure includes a support feature. The porous plate has a thermal conductivity of at least about 50 W/(mK) and includes a plurality of pores having an ...  
WO/2020/181849A1
A micro fine mask and a manufacturing method therefor, and an AMOLED display device. The manufacturing method comprises the following steps: S1, selecting a substrate (10) and cleaning; S2, manufacturing a mask body on the substrate (10)...  
WO/2020/179967A1
A multi-vacuum deposition apparatus comprises a chamber which has an inner space formed therein and includes a detachable and up-and-down-moving bottom airtight closure part at the bottom thereof. A plurality of crucible parts radially m...  
WO/2020/178456A1
Coated substrate comprising a surface coated with a coating comprising at least one coating layer of (TM1-xAlx)OyNz with (0.75 - y) ≤ z ≤ (1.2 - y) and 0.6 > y > 0, exhibiting a solid solution with B1 cubic structure, wherein x is th...  
WO/2020/179210A1
According to the present invention, a piezoelectric film having a single crystal structure is able to be formed, from various piezoelectric materials, on a film structure of the present invention. A film structure according to the presen...  
WO/2020/180584A1
A physical vapor deposition (PVD) chamber and a method of operation thereof are disclosed. Chambers and methods are described that provide a chamber comprising an upper shield with two holes that are positioned to permit alternate sputte...  
WO/2020/180585A1
A physical vapor deposition (PVD) chamber and a method of operation thereof are disclosed. Chambers and methods are described that provide a chamber comprising an upper shield with two holes that are positioned to permit alternate sputte...  
WO/2020/178064A1
The present invention relates to a fractioning device and an ion implantation device equipped with a channel provided with the said fractioning device, and a process of ion implantation carried out using said ion implantation device.  
WO/2020/180582A1
A physical vapor deposition (PVD) chamber and a method of operation thereof are disclosed. Chambers and methods are described that provide a chamber comprising an upper shield with two holes that are positioned to permit alternate sputte...  
WO/2020/178924A1
This vapor deposition device (3) is provided with a vapor deposition source (1) having: a case (4) that has an opening (4K) and in which a mixture of a first vapor deposition material (71) and a second vapor deposition material (72) is h...  
WO/2020/178431A1
The present invention relates to a method for protecting surfaces of components against cavitation erosion and components provided with such cavitation protection surfaces, wherein in the surface a plurality of microcavities is provided ...  
WO/2020/179189A1
The antireflection film according to the present invention is provided in an optical element having a convex optical surface. The maximum inclination angle of an inclination angle θ of the convex optical surface, which is shown by an an...  
WO/2020/178080A1
The present invention is directed to a method for processing a fragile, e.g. (ultra-)thin and/or large, substrate (1) having a front side surface and a back side surface, the method comprising bonding the back side surface of the substra...  
WO/2020/178238A1
The invention relates to vacuum processing equipment for depositing thin-film coatings. The processing line comprises at least one lock- chamber, a buffer chamber, and a processing chamber, and substrate supports on the carriages configu...  
WO/2020/176942A1
A system for treating a substrate comprising an unwinder adapted to receive and unwind a roll of substrate and a rewinder adapted to rewind the substrate from the unwinder. The system further comprising a physical vapour deposition (PVD)...  
WO/2020/173413A1
A deposition-preventing assembly (10), comprising a main deposition-preventing panel (11), at least a portion of a surface of the main deposition-preventing panel (11) being a concave surface (111), the concave surface (111) being config...  
WO/2020/175354A1
Provided is a reflective mask blank with which it is possible to further reduce the shadowing effect of a reflective mask and form a fine and highly accurate absorber pattern. A reflective mask blank having a multilayer reflection film...  
WO/2020/174725A1
The present invention provides an SiC film structure that can be used as a sealing structure. An SiC film structure 10 in which an SiC film is formed on the outer periphery of a substrate 50 using a vapor phase epitaxial film formation m...  
WO/2020/175683A1
[Problem] The problem of the embodiments is to provide a method for manufacturing a multi-layered thin film having excellent optical transparency, a method for manufacturing a solar cell, a method for manufacturing a multi-junction solar...  
WO/2020/173598A1
An assembly for cathodic arc deposition of a material onto an article. The assembly includes a chamber for receiving an article to be coated and a rotating target. The rotatable target has a surface from which a plasma material is ejecte...  
WO/2020/174245A2
A method of making stable clusters of atoms that are of subcritical size, in which rapid expansion and rapid cooling of a vapor cloud takes place in which the vapor conditions or parameters are controlled so that multiple stable clusters...  
WO/2020/175424A1
The present invention addresses the problem of providing an alloy which is suitable for a sputtering target material and can be produced easily by an atomization method. For solving the problem, an alloy is provided, which comprises at l...  
WO/2020/174845A1
This film forming device comprises a chamber having a film forming room; a stage supporting a substrate; a light source unit; a gas supplying unit; and a heating unit. The light source unit includes an irradiation source that irradiates ...  
WO/2020/176536A1
A system is described that includes a sputter target and a magnetic element array including multiple sets of magnets arranged to have a Hall-Effect region that extends along a length of the sputter target. The elongated sputtering electr...  
WO/2020/169248A1
The present invention provides a solution for coating substrates which are moved on a carrier that can move from painting, coating or treatment modules in a continuous inline production facility having a system which allows to easily swi...  
WO/2020/126073A3
The present invention relates to a method for producing a spectral gradient filter on a substrate comprising the steps: - providing the substrate having a first surface to be coated; - providing a shadow mask which comprises at least one...  
WO/2020/170571A1
A cutting tool comprising a substrate and a coating that coats the substrate, wherein: the coating comprises an α-alumina layer provided on the substrate; the α-alumina layer comprises α-alumina crystal grains; the α-alumina layer co...  
WO/2020/122457A3
The present invention relates to a thin-film laminated heating element, and a manufacturing method therefor, wherein a first deposit and a second deposit are alternately stacked, the first deposit is any one selected from Ni, Ni alloys, ...  
WO/2020/172244A1
Fully automated batch production thin film deposition systems configured to deliver uniformity combined with high throughput at a low cost-per-wafer. In some examples, systems of the present disclosure include automated safe wafer handli...  
WO/2020/169847A1
Method for building up and/or finalizing a PVD target whereasthe method comprises a process step where target material is added using an additive method.  
WO/2020/170577A1
The present application discloses a sputtering film forming apparatus comprising: a vacuum container having an exhaust mechanism; a substrate holding means capable of holding a plurality of substrates; and a sputtering area and a reactio...  
WO/2020/169839A1
The invention relates to an interference layer system, comprising a plurality of optically transparent layers. The interference layer system does not have a carrier substrate, and the optically transparent layers are arranged so as to li...  
WO/2020/170570A1
A cutting tool comprising a substrate and a coating that coats the substrate, wherein: the coating comprises an α-alumina layer provided on the substrate; the α-alumina layer comprises α-alumina crystal grains; the α-alumina layer co...  
WO/2020/170068A1
Provided is a novel metal oxide. The metal oxide has a first region and a second region, and has a third region between the first region and the second region. An interface of the first region is covered by the third region. The crystall...  
WO/2020/170950A1
An oxide sintered body which has a surface having surface roughness Rz of less than 2.0 μm.  
WO/2020/170762A1
In order to realize a vapor deposition mask whereby a light-emitting element can be vapor-deposited with good precision in a pixel in manufacturing of a display device, the present invention has the following configuration: a vapor depos...  

Matches 1 - 50 out of 107,910