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Matches 1 - 50 out of 101,477

Document Document Title
WO/2018/073309A1
The invention relates to a device for coating one or more substrates (1), having a gas inlet element (2) for introducing a gaseous starting material, which condenses or reacts on the substrate (1) and on a mask (3) masking said substrate...  
WO/2018/072367A1
A boron-doped diamond electrode (3). The electrode (3) is formed by disposing a modification layer on the surface of a foam metal skeleton, and then disposing a boron-doped or nitrogen-doped diamond layer or a boron-doped or nitrogen-dop...  
WO/2018/073656A1
A novel material and a transistor including the novel material are provided. One embodiment of the present invention is a composite oxide including at least two regions. One of the regions includes In, Zn and an element M1 (the element M...  
WO/2018/075659A1
Devices and techniques are provided for depositing material on a substrate, such as for fabrication of OLEDs and layers used in OLEDs. A depositor block includes one or more delivery apertures, one or more exhaust apertures, and one or m...  
WO/2018/072774A1
Device and method for producing defined properties of gradient layers in a system of multilayered coatings in sputtering installations with the following features: a) a pair of cathodes arranged in a common process chamber and consisting...  
WO/2018/073231A1
The invention relates to a method and to a device for processing a surface of a substrate by means of a particle beam. The method comprises an irradiating of the surface (302) of the substrate (114), wherein in a first region (308) of th...  
WO/2018/069130A1
The present invention is in the field of processes for the generation of thin inorganic films on substrates, in particular atomic layer deposition processes. It relates to a process for preparing metal films comprising (a) depositing a m...  
WO/2018/068833A1
According to one aspect of the present disclosure, a magnet arrangement (100) for a sputter deposition source is provided. The magnet arrangement comprises a first magnet (110) and a second magnet (120) adapted to confine a plasma in a p...  
WO/2018/068389A1
A vacuum evaporation apparatus. A magnetic plate (120) is designed to comprise a plurality of magnetic plate units (121) respectively corresponding to different regions on a metal mask plate (200), and the magnetic plate (120) forms an a...  
WO/2018/070195A1
A surface-coated cutting tool which comprises: a substrate that has a rake face and a clearance; and a coating film that covers the surface of the substrate. The substrate is a cBN sintered body or a ceramic sintered body; the coating fi...  
WO/2018/068971A1
The invention relates to a method for producing a light-guiding element (102). In this case, a light-guiding body (106) is coated at least in some sections with a light-permeable metal layer (108) by sputtering at least one metallic scat...  
WO/2018/069091A1
A sputtering source comprises two facing plate shaped targets (5, 7) and a magnet arrangement (185,187) along each of the targets. An open coating outlet area (12) from the reaction space between the targets is limited by facing rims (9,...  
WO/2018/067463A1
Methods and apparatus to minimize electromagnetic interference between adjacent process chambers of a cluster tool are described. The start time of the subject recipe is controlled based on the electromagnetic process window of the subje...  
WO/2018/066410A1
This hot extruded material for a cylindrical sputtering target contains copper at a purity in the range of 99.99-99.9995% by mass, and has an Al content of 0.5 mass ppm or less, an Si content of 1 mass ppm or less, a C content of 1 mass ...  
WO/2018/066904A1
The present invention provides a substrate-processing device comprising: a process chamber (10) for providing a process environment isolated from the outside; at least one distance measurement part for measuring a distance between a subs...  
WO/2018/066844A1
The present invention relates to: a deposition mask having a plurality of fine through-holes formed on a metal foil; a metal foil to be used therein; manufacturing methods therefor; and an organic EL device manufacturing method using the...  
WO/2018/066547A1
An oxide sintered body which contains a perovskite phase and a bixbyite phase represented by In2O3.  
WO/2018/066611A1
This method for producing a vapor deposition mask is used to produce a vapor deposition mask in which a metal mask 10 having a metal mask opening 15 is laminated on one surface of a resin mask 20 having resin mask openings 25 correspondi...  
WO/2018/066325A1
[Problem] The present invention addresses the problem of manufacturing a vapor deposition mask wherein deformation of long sides is suppressed. [Solution] This vapor deposition mask manufacturing method is provided with: a step for prepa...  
WO/2018/059019A1
A crucible, an evaporation deposition device and an evaporation deposition system, wherein the crucible includes a receiving chamber (1) for containing materials to be heated, the crucible further includes a collector (2) located in the ...  
WO/2018/062710A1
A ground clamping unit for grounding a hollow member having a hollow and a ground load mounted in the hollow comprises: a clamping body having a penetration groove so as to encompass an external part of the ground load; an elastic connec...  
WO/2018/061757A1
This vapor deposition mask package is provided with: a receiving section; a cover section that faces the receiving section; and a vapor deposition mask that is disposed between the receiving section and the cover section and has effectiv...  
WO/2018/063857A1
A method of forming a high strength aluminum alloy. The method comprises heating an aluminum material including scandium to a solutionizing temperature of the aluminum material such that scandium is dispersed throughout the aluminum mate...  
WO/2018/061336A1
Provided are a stage for precisely controlling the temperature of a substrate, and a method for fabricating the stage. Also provided are a film forming device having the stage, and a film processing device . The stage for placing a subst...  
WO/2018/058521A1
Provided are a metal mask (100) for OLED evaporation deposition and an OLED evaporation deposition method. A blocking wall (30) is arranged at the edge of an opening (20) in the metal mask (100) and the blocking wall (30) can reflect and...  
WO/2018/060643A1
The invention relates to a method for producing a nuclear component, comprising: i) a support containing a substrate based on a metal (1), the substrate (1) being coated or not with a spacer layer (3) positioned between the substrate (1)...  
WO/2018/062300A1
Provided is an evaporation mask that includes a resin mask having a resin mask opening part that corresponds to a pattern to be produced by vapor deposition, and a metal layer partially positioned on one surface of the resin mask.  
WO/2018/058158A1
The invention relates to a sputtering target which contains molybdenum and at least one metal of the group (tantalum, niobium), wherein the average content of the metal of the group (tantalum, niobium) is 5 to 15 at.% and the molybdenum ...  
WO/2018/058877A1
A degassing chamber and a semiconductor processing device. The degassing chamber comprises: a chamber (1) and a substrate container (2). A substrate transferring opening (11) is provided at a side wall of the chamber (1). The substrate c...  
WO/2018/062189A1
The present invention addresses the problem of providing: an Ni-Ta system alloy which is free from composition unevenness and has improved mechanical strength, and wherein Ta compound phases are finely dispersed by adding a predetermined...  
WO/2018/060644A1
The invention relates to a method for producing a composite nuclear component, comprising: i) a support containing a substrate comprising a metal material and a ceramic material (1), the substrate (1) being coated or not with a spacer la...  
WO/2018/063865A1
An apparatus designed to sputter a material onto a plurality of substrates includes a rotating metal frame, a plurality of carriers, and an insulator disposed between the metal frame and the plurality of carriers. The plurality of carrie...  
WO/2018/062329A1
The present invention provides a film that exhibits piercing resistance and heat resistance, and has gas-barrier properties. This film is provided with: a substrate; and a deposition layer which is disposed on the substrate and contains ...  
WO/2018/058898A1
Provided are a degassing method, a degassing chamber and semiconductor processing equipment. The degassing method comprises: step S1: heating the degassing chamber, so that the internal temperature therein reaches a preset temperature an...  
WO/2018/064500A1
Filter media including a filtration layer comprising fibers (e.g., synthetic fibers) comprising a flame retardant and related components, systems, and methods associated herewith are provided. In some embodiments, a filtration layer may ...  
WO/2018/061969A1
Provided is a semiconductor device that comprises a thin-film transistor 101 which includes a semiconductor layer 7, a gate electrode 3, a gate insulation layer 5, a source electrode 8, and a drain electrode 9. The semiconductor layer 7 ...  
WO/2018/059609A1
A method of controlling deposition rate of a film deposition in a vacuum multi-plasma-jet system utilizing plasma-chemical reactions in an active discharge zone, wherein the system comprises at least one series of plasma nozzles (4), the...  
WO/2018/054472A1
A nozzle (100) for being connected to a distribution assembly for guiding evaporated material from a material source into a vacuum chamber is described. The nozzle includes: a nozzle inlet (110) for receiving the evaporated material; a n...  
WO/2018/054306A1
A fine metal mask (100), comprising a pattern area (110) comprising a plurality of openings; and a plurality of alignment holes (120) located outside the pattern area (110). Also disclosed are a display substrate (200) and an alignment m...  
WO/2018/057158A1
A selectively chrome plated radome and its method of manufacture include molding a non-plateable resin to form one or more inner pieces, each inner piece defining an outer edge, inserting the one or more inner pieces into a final mold, i...  
WO/2018/057458A1
An article is provided. The article includes a first transparent conductive oxide layer, a transparent metal layer on the first transparent conductive oxide layer, wherein a thickness of the transparent metal layer continuously decreases...  
WO/2018/057396A1
In one implementation, a sputtering showerhead assembly is provided. The sputtering showerhead assembly comprises a faceplate comprising a sputtering surface comprising a target material and a second surface opposing the sputtering surfa...  
WO/2018/054168A1
A manufacturing equipment for making a mask frame assembly comprises a carrier (02) for bearing a frame (01), a drag reduction portion (03) located on the carrier (02). The drag reducing portion (03) is configured to reduce frictional re...  
WO/2018/055878A1
Through the present invention, a black film having good film quality can be formed stably and at lower cost than by the prior art. A film formation method provided with steps (S101, S102) for disposing a target material so as to face the...  
WO/2018/051444A1
A mask sheet for vapor deposition in which a first direction (D1) is defined as the longitudinal direction of the mask sheet, said mask sheet comprising a grippable first lateral end (G1) and a middle part (M) having multiple through hol...  
WO/2018/052713A1
A biosensor component is provided that provides enhanced characteristics for use in biosensors, such as blood glucose sensors. The biosensor component comprises a substrate, a conductive layer deposited on the substrate, and a resistive ...  
WO/2018/051939A1
Provided is a surface-coated cutting tool exhibiting excellent chipping resistance and wear resistance in intermittent cutting. A surface-coated cutting tool in which a hard coating layer including a TiAlN layer is provided on the surfac...  
WO/2018/051443A1
This mask sheet for deposition is provided with a lateral end (G1) that can be gripped, and a center part (M) that comprises an effective part, in which multiple deposition holes (H) are formed, and an edge (FA), which surrounds the effe...  
WO/2018/052698A1
Methods and systems for controlling processing state of a plasma reactor to initiate processing of production substrates. The method initiate processing of a substrate in the plasma reactor using settings for tuning knobs of the plasma r...  
WO/2018/052711A1
A biosensor component is provided that provides enhanced characteristics for use in biosensors, such as blood glucose sensors. The biosensor component comprises a substrate, a conductive layer deposited on the substrate, and a resistive ...  

Matches 1 - 50 out of 101,477