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WO/2012/060047 |
In a rotating drum (4) of a rotating drum type work washing apparatus (1), a first cylindrical body section (21), in which a liquid impassable part (21a) that follows the circumferential orientation and does not allow a washing solution ...
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WO/2012/053173 |
[PROBLEM] To provide a method for steam cleaning an object to be steam cleaned and an apparatus for said method which make it possible to perform safe steam cleaning with a reduced outward flow of a solvent gas and little environmental i...
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WO/2012/039944 |
A method of selecting a mercury-contaminated solid surface followed by heating a cleaning solution to a temperature less than 100C. The cleaning solution can contain hydrocarbon oil and one or more organic sulfur compounds. Afterwards, t...
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WO/2012/039476 |
Provided is a rubber-metal composite manufacturing method having a step for bringing a metal raw material into contact with a buffer solution having a pH of 5 to 7.2 inclusive, and a step following said contact for causing the metal mate...
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WO/2012/031913 |
The invention relates to a fluid circuit (1) for a power plant, comprising a permanent part (2) to be cleaned and comprising a temporary part (3) for the chemical cleaning of the permanent part (2), wherein a drain device (6, 7), which i...
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WO/2012/028203 |
The present invention relates to a cleaning composition with enhanced cleaning activity and to the use for cleaning of hard and soft surfaces. In particular, the invention relates to a liquid alkaline cleaning composition useful in the c...
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WO/2012/029632 |
Provided is a method for producing a cold-rolled steel sheet exhibiting excellent chemical conversion processability and corrosion resistance after coating in harsh corrosive environments such as in a warm salt water immersion test or a ...
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WO/2012/029631 |
Provided is a method for producing a cold-rolled steel sheet exhibiting excellent chemical conversion processability and corrosion resistance after coating in harsh corrosive environments such as in a warm salt water immersion test or a ...
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WO/2012/026490 |
Provided is a method for preventing elution of Bi from a copper alloy in which elution of Bi is prevented in a leadless copper alloy piping material and the like containing a trace of lead and a specified amount of Bi. The present invent...
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WO/2012/024680 |
A rust removing composition is described. The composition, based on the total mass of the composition, comprises: 10 to 20% by mass of an inorganic acid; 1 to 10% by mass of an organic acid; 1 to 8% by mass of a penetrant selected from t...
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WO/2012/022233 |
Disclosed in the present invention is a device for continuously cleaning the surface of a molybdenum wire at high temperature, comprising in succession a wire pay-off mechanism, a first wire guiding wheel, a cleaning mechanism, a second ...
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WO/2012/016425 |
A low etching photo-resist washing fluid suitable for washing a relatively thick photo-resist. The washing fluid comprises: (a) potassium hydroxide, (b) a pyrrolidone solvent, (c) a sulfone solvent, (d) pentaerythritol, (e) amine, (f) re...
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WO/2012/016094 |
The present disclosure provides azeotropic and azeotrope-like compositions comprised of methylperfluoroheptene ethers and 2-propanol. The present disclosure also provides for methods of use for the azeotropic and azeotrope-like compositi...
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WO/2012/016093 |
The present disclosure provides azeotropic and azeotrope-like compositions comprised of methylperfluoroheptene ethers and methanol. The present disclosure also provides for methods of use for the azeotropic and azeotrope-like compositions.
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WO/2012/009968 |
A low etch cleaning solution suitable for the cleaning of thick photoresist comprises (a) potassium hydroxide, (b) pyrrolidones solvent, (c) pentaerythritol, (d) alkylol amine and (e) resorcinol. The low etch photoresist cleaning solutio...
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WO/2012/008269 |
An anti-corrosive agent for use in the washing of a metal with an acid, which comprises an amphoteric polymeric compound (P) having at least one cationic constituent unit (A) having a specific structure, at least one anionic constituent ...
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WO/2012/005068 |
Disclosed are a liquid concentrate for a cleaning composition, a cleaning composition using the same, and a cleaning method for the cleaning of flux residue, solder paste, etc., which are highly safe for the environment since a predeterm...
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WO/2012/000848 |
In order to provide an improved method for the industrial cleaning of metal parts, molded plastic parts, or electronic components, in which the part to be cleaned is brought into contact with a cleaning agent, the invention provides a me...
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WO/2012/002977 |
A three-part solvent composition that contains A) a C1 to C4 lactate ester, B) ethyl 3-ethoxy propionate and C) a C7-C12 hydrocarbon mixture is disclosed that is a homogeneous liquid at zero degrees C. A contemplated solvent blend provid...
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WO/2011/155548 |
Disclosed are an ultrasonic cleaning apparatus and an ultrasonic cleaning method, whereby cleaning nonuniformity generated after ultrasonically cleaning a subject to be cleaned is suppressed. The ultrasonic cleaning apparatus is provided...
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WO/2011/147426 |
A process of production of concentrated ferric chloride solution which used in the waste water treatment processes as a flocculation agent and making use of hydrochloric acid waste pickle liquor which resultant from steel surface treatme...
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WO/2011/147037 |
A process is disclosed in which hot rolled or cold rolled steel articles, such as tube, pipe, plate and sheet are cleaned of mill scale, surface rust and oils. The cleaning compositions compromise a solution mixture of diluted hydrochlor...
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WO/2011/138230 |
In order to provide an installation (100) for cleaning and/or deburring workpieces (102), comprising a treatment region (104) in which a cleaning treatment and/or a deburring treatment can be carried out on a workpiece, a loading device ...
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WO/2011/130760 |
The invention relates to a method for obtaining or recovering acids, in particular nitric acid and hydrofluoric acid, from solutions and/or from solutions containing metal salts of said acids, comprising the following steps: a) spray dry...
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WO/2011/130058 |
Processes for preparing and treating a substrate are disclosed. A process includes: a) applying a cleaning solution comprising at least an organic acid to at least a portion of the substrate; (b) rinsing at least a portion of the cleanin...
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WO/2011/120093 |
A process for recovering zinc from pickle liquor is disclosed. The process comprises: (i) passing the liquor to an iron recovery stage in which iron present in the liquor is separated from the liquor; (ii) passing the iron-depleted liquo...
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WO/2011/113221 |
A natural plant detergent, is prepared by mixing limonene 70-80 parts, tea saponin 2-10 parts, lecithin1-10 parts, citral 2-10 parts and citric acid 0.5-1 parts by weight at 15-25℃. The detergent of the invention does not damage automo...
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WO/2011/112968 |
A method for performing preventative maintenance in a substrate processing system is described. The method includes diagnosing a level of contamination in a substrate processing system, scheduling a wet clean process when necessary, and ...
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WO/2011/109540 |
A processing chamber (20) successfully removes hardened photoresist via direct infrared radiation onto the wafer, in the presence of an acid such as sulfuric acid, optionally along with an oxidizer such as hydrogen peroxide. The processi...
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WO/2011/105449 |
Disclosed is a metal cleaner comprising a specific nonionic surfactant, a specific nitrogenated organic compound, a specific carboxylic acid or a salt thereof, and a specific alkanolamine compound and having a pH value of 9 or more as me...
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WO/2011/104421 |
A degreasing composition comprises - ethyl lactate functioning as a solvent, to which has been mixed - turnip rapeseed oil or rapeseed oil functioning as a protective lubricating component, and - isopropanol functioning as a dispersion a...
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WO/2011/105181 |
Disclosed is a method for surface treatment of a magnesium alloy plate, said method being able to cause blemishes and discoloration to not be prominent on the plate surface in the case where wet polishing has been performed to smooth the...
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WO/2011/089344 |
The invention relates to the use of a liquid composition including 1-chloro-3,3,3-trifluoropropene and 1,2-transdichloroethylene for cleaning solid surfaces, the 1-chloro-3,3,3-trifluoropropene and the 1,2-transdichloroethylene being at ...
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WO/2011/083742 |
A thin plate member cleaning device is configured so that tap water poured down from water flow holes (520a) of a water flow plate (520) impinges on outer rotating blades (543) and inner rotating blades (544), which are provided to a rot...
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WO/2011/085172 |
Methods and systems are provided for treating oxide scale on the surface of a metal object. In one embodiment, a system (100) temperature control apparatus (105) controls the temperature of metal object's (106) surface (112) to an applic...
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WO/2011/083744 |
A thin plate member cleaning device (1000) comprises: a cleaning container (1100) provided with a lid member (1101) and with an elongated cylindrical container (1102) which has an opening on one end side thereof, the opening being closed...
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WO/2011/067955 |
Provided are a method for pickling steel plates, whereby an oxide scale formed in a process for producing Si-containing steel plates can be efficiently and uniformly removed, and a pickling device. The method for pickling steel plates co...
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WO/2011/060617 |
A low etched rinse solution for removing thick film resist and the removing method of using the same. The rinse solution includes dimethyl sulfoxide, potassium hydroxide, aromatic alcohol, alcohol amine and metal K. The rinse solution ma...
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WO/2011/057829 |
The invention relates to the improvement of the previous FIC cleaning process of oxidized cracks (5) by means of previous introduction of fluoride-containing material (16) into the crack (5).
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WO/2011/055502 |
Multiple spray units spray a cleaning liquid at multiple spray regions sandwiching a cleaning site of an electronic component. The multiple spraying regions extend linearly, and the spray units have a spray pattern wherein the spray dire...
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WO/2011/051410 |
A method for removing a silicon hydride from the surface of a solid body which comprises treating the silicon hydride with a gas comprising molecular fluorine or reactive species generated from molecular fluorine.
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WO/2011/051409 |
For the plasma assisted manufacture of semiconductors, photovoltaic cells, thin film transistor liquid crystal displays and micro-electromechanical systems, and for chamber cleaning, F2 or COF2 is applied as etchant. It was found that a ...
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WO/2011/030917 |
Provided is a method for cleaning and sterilizing powerfully a surface of an article by use of an ultrasonic wave to remove oil and dirt adhering to the surface of the article. The method enables reduction of the cost of the installation...
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WO/2011/027673 |
Disclosed is a cleaning agent for the removal of a water-soluble, lead-free solder flux that is capable of cleaning water-soluble flux residue, which is produced when soldering a lead-free solder with a water-soluble flux, in a short per...
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WO/2011/023319 |
The invention relates to a process for the surface treatment of high-grade steel alloys and microstructures, said process comprising two process steps wherein the first process step has a pre-treatment or activation step, and the second ...
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WO/2011/017010 |
A pickle line assembly is provided having a roll tank, a pickle tank, and an expansion seal. The roll tank includes a front and rear face that are angled towards one another at the upper end. The pickle tank includes front and rear openi...
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WO/2011/013766 |
Disclosed is a method for removing a hard coating film in a superhard material, which can selectively remove a hard coating film provided on the surface of a superhard material such as a superhard tool and a mold, and can minimize the de...
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WO/2011/005147 |
The invention relates to the field of producing finishing materials used for cladding the facades of buildings and structures and for finishing home and office interiors, window and door openings, enclosed spaces and passenger compartmen...
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WO/2010/151641 |
In one embodiment, a metal loss inhibitor concentrate is provided which contains water, (A) an amount of a component of dissolved organic compounds and polymers that contain at least two hydroxy moieties per molecule and an average of at...
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WO/2010/151513 |
A system, method and an apparatus to remove contaminants from a semiconductor substrate surface includes application of a cleaning material. The cleaning material includes a cleaning solution and a plurality of micron-sized dry polyvinyl...
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