Login| Sign Up| Help| Contact|

Patent Searching and Data


Matches 801 - 850 out of 4,641

Document Document Title
JP4970949B2  
JP2012127593A
To provide a heating furnace which can be easily constructed when a plurality of blocks are used for constructing a portion where a supporting force from below is extremely weak in the heating furnace, and prevents the structure from cru...  
JP4966961B2  
JP4947783B2  
JP4949192B2  
JP2012097969A
To provide a heating furnace that can equally heat up an object to be heated without complicating the structure and depending on the position in a heat treatment chamber while suppressing a heat loss.A hot air generating circulation part...  
JP4927433B2  
JP2012084637A
To improve a heat treatment apparatus used in a calcination process when providing an electrode on the front and back of a silicon wafer, and to realize an ideal temperature profile in calcination.The heat treatment apparatus includes a ...  
JP2012509192A
The present invention is a method for heat treatment in isostatic press between heat, and the isostatic press between heat, isostatic press between heat comprises a pressure vessel (1), and it is a pressure vessel, It has an insulator (8...  
JP2012078048A
To provide a heat treatment device that utilizes a catalyst activation heater for heat treatment, and suppresses increase in size and costs of the device.This heat treatment device 1A includes a heat treatment furnace 20 for housing a wo...  
JP2012077982A
To provide a heat treatment furnace which forms a revolving gas flow flux by an atmospheric gas supplied to a furnace core pipe, induces atmospheric gas straightness to suppress the accumulation of the atmospheric gas in the vicinity of ...  
JP2012509191A
The present invention is a method for temperature control in isostatic press between heat, and the isostatic press between heat, isostatic press between heat comprises a pressure vessel (1), and it is a pressure vessel, It has an insulat...  
JP2012074647A
To prevent unevenness in thermal history of each substrate due to substrate supply failure without causing the increase of the cost and the device size.A substrate thermal treatment system 10 of this invention includes a thermal treatmen...  
JP4912463B2  
JP2012068002A
To provide a heating device which can heat at a higher temperature while securing the uniformity of distribution of heat radiated on a heated object.The heating device is configured arranging a plurality of rod-like infrared lamps 11 on ...  
JP2012064852A
To reduce processing time of a heat treatment process of a substrate such as a semiconductor wafer.The heat treatment method includes a step in which a heated upper radiation plate is moved to a position opposed to the upper surface side...  
JPWO2010050450A
The irradiation means which irradiates with laser on the conditions which apply the temperature more than the boiling point of the oxidization compound concerned to the oxidization compound placed on the stage and the above-mentioned sta...  
JPWO2010050450A1
酸化化合物が置かれる処理室内のステージと 、前記ステージに置かれている酸化化合物に 対して当該酸化化合物の沸点以上の温度を加 える条件でレーザを照射する照射手段と...  
JP4900776B2  
JP4897256B2  
JP4896954B2  
JP4896952B2  
JP4892270B2  
JP2012037218A
To provide a ceramic baking furnace capable of minimizing defect of a ceramic substrate to be baked by preparing uniform gas atmosphere inside of the baking furnace.This ceramic baking furnace includes a case having an internal space in ...  
JP3173519U
[Subject] Electric kiln for ceramic art which makes possible three kinds of reduction firing which uses a reducing flame of a burner, reduction material, and its both sides in addition to oxidization calcination is provided. [Means for S...  
JP2012021742A
To provide a heat treatment furnace which can perform heat treatment of high accuracy under an intended atmosphere even when debinding and burning thereafter are continuously performed, and minimizing generation of cracking and the like ...  
JP4868091B2  
JP4861092B2  
JP4859268B2  
JP2012013256A
To provide a batch furnace which allows the atmospheric gas to come in uniform contact with all objects to be baked, for baking the objects well.In the condition in which a hearth 3 is inserted into an opening part 2b to be set to a furn...  
JP2012013341A
To provide a multi-chamber heat treatment device capable of preventing any other treatment chambers than a cooling chamber from being contaminated by a cooling liquid.This invention relates to a multi-chamber heat treatment device S1, pr...  
JP4855785B2  
JP4858659B2
In a method for heat treating a metal tube or pipe for a nuclear power plant, the tube or pipe being accommodated in a batch-type vacuum heat treatment furnace, when the tube or pipe is laid down on and is subjected to heat treatment on ...  
JP2011246316A
To provide a method for firing ceramic for preventing inflow of impurities such as oxygen into a firing container.An atmospheric gas is directly supplied from a gas supply source 5 arranged outside a firing furnace 1 into the firing cont...  
JP2011241469A
To provide a heat treatment furnace capable of suppressing the oxidation and coloring of a workpiece.The vacuum heat treatment furnace 1, having a carry-in chamber 10 into which the workpiece W is carried, and a heat treatment chamber 20...  
JP4826083B2  
JP4828934B2  
JP4823532B2  
JP2011528501A
[Subject] In batch type thermal treatment equipment, two or more substrates are simultaneously heat-treated so that the temperature within a field may become uniform. [Means for Solution] Chamber 100 with which batch type thermal treatme...  
JP4808425B2  
JP2011208821A
To pursue compression of processing time in a conventional vacuum furnace, accurate quality control, optimization of a totalized control mainly intended for energy saving, and improvement of productivity.A partition plate 3 surrounding a...  
JP2011207684A
To provide a furnace core tube which controls heat stress, and the reaction with strong alkali components generated from the material to be heat-treated in the furnace core tube, has an extended service life, and is of a high industrial ...  
JP4799071B2  
JP2011202940A
To provide a baking furnace for ceramic product, and a baking method using the same.The baking furnace for ceramic product includes a furnace body containing a heat insulating material; a setter disposed inside the furnace body, and havi...  
JP2011202915A
To provide a heat treatment device capable of suppressing increase in size of a device even when a size of a treated work is increased, and shortening a time necessary for carrying in and out the work to a process tube.A vertical furnace...  
JP4791695B2  
JP4782068B2  
JP4777688B2  
JP2011179796A
To provide an electric ceramic art kiln for flexibly controlling supply of reducing gas into a kiln chamber in reduced firing, carrying out reduced firing without using fossil fuel, and reducing environmental load so as to be suitable fo...  
JP2011174703A
To provide a degreasing furnace capable of drastically reducing electric power consumption compared to a conventional small degreasing furnace including a combustion furnace and of suppressing emissions of high-temperature exhaust gas.Th...  

Matches 801 - 850 out of 4,641