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Patent Searching and Data


Matches 901 - 950 out of 4,506

Document Document Title
JP4239335B2  
JP2009041800A
To provide a thermal decomposition furnace capable of rapidly rising a temperature in a furnace main body to a low-temperature heat decomposition temperature of about 50C to 300C.A powder and granular material layer 20 composed of a powd...  
JP2009030969A
To provide a pottery kiln capable of lengthening a retention time of combustion gas in an article burning chamber and improving the burning efficiency of the article by directly bringing the combustion gas into contact with the article.T...  
JPWO2009019756A
While being able to prevent metallic contamination of materials silicon, a silicon heating furnace which can prevent decline in heating efficiency by thermal expansion modification is provided. Silicon heating furnace 10 is constituted b...  
JP3148001U
[Subject] An electric furnace which stored a coil heater in a protection pipe is provided so that a heater may not blow out, even if it performs reduction firing. [Means for Solution] Inside of a furnace of electric furnace 1 is surround...  
JP4213991B2  
JP4216037B2  
JP2009008306A
To provide a heat treatment device capable of suppressing the increase of power consumption and reducing the amount of sublimate included in the air circulated in a heat insulating furnace.This heat treatment device 10 has a heat treatme...  
JP2009001893A
To provide a valuable metal recovery apparatus and a valuable metal recovery method by which valuable metal can be recovered inexpensively from a compound material containing polymer material and the valuable metal.The compound material ...  
JP2009002594A
To provide a portable small combustion furnace for manufacturing rice husk ash capable of manufacturing amorphous silica easily usable as a concrete additive or a silica fertilizer at site without transporting the rice husk discharged fr...  
JP4204253B2  
JP2008309354A
To provide a heat treatment device capable of oxidatively decomposing a sublimate generated at performing heat treatment on a treated object without depending on a temperature of air circulated in a heat treatment portion.This heat treat...  
JP2008304182A
To provide an intake/exhaust system of a substrate baking furnace high in energy efficiency.A large amount of organic matter is generated from a glass substrate W heated in a furnace body 10. Hot exhaust containing organic matter is disc...  
JP2008292465A
To provide a crucible loading/unloading assembly to efficiently move a crucible to and from the stand in an analysis furnace.The crucible handling shuttle 16 is equipped with a pair of opposed dual crucible clamping arms 24 and 26 mounte...  
JP2008285746A
To provide an annealing furnace with which the annealing of an iron core can be performed by equalizing the temperature in the annealing furnace and especially, the annealing of an amorphous material iron core needing a severe heat-treat...  
JP4181805B2  
JP4178310B2  
JP2008266097A
To carry out the heating of refractory formed of a binder containing carbon by the irradiation of microwave more efficiently than heretofore.The carbon-containing refractory 21 is housed in an insulation box 2 having ventilation characte...  
JP2008264638A
To provide an automatic spread combustion cyclone type reactor.The automatic spread combustion cyclone type reactor is characterized by providing at least one reducing agent inlet and some oxides inlets to some cut edges at the cut surfa...  
JP4176215B2  
JP4175831B2  
JP2008261619A
To provide a shuttle kiln for baking ceramics, superior in energy-saving performance, reducing furnace construction cost with a simple furnace body structure, and without causing nonuniformity of baking by ceramic packing position.This s...  
JP4171748B2  
JP4169586B2  
JP4167626B2  
JP4167660B2  
JP4165739B2  
JP2008240127A
To provide a pig iron storing furnace in which the service life of a lining refractory is extended in comparison with the conventional furnace, even in the case of storing not only the molten pig iron for producing an ordinary molten ste...  
JP2008537992A
The present invention is coated, デコーティング/or the polluted materials thermally, and relates to/or the equipment to dry. This equipment is attached to at least one support medium and each support medium, and the materials whic...  
JP2008232516A
To provide a heat treatment device capable of being utilized in drying and baking a coated surface of a workpiece, after drying and coating a surface to be coated, of the workpiece on which pretreatment such as washing is performed in a ...  
JP2008224056A
To provide a heat treatment device having good response to temperature control, and capable of shortening a start-up time and a termination time of a heat treatment device and reducing a weight of the device.This heat treatment device A ...  
JP4154606B2  
JP2008215728A
To provide a baking furnace capable of preventing devitrification of a member composed of transparent quartz glass.This baking furnace 1 comprises an infrared ray lamp 5 for radiation-heating a baked object, a base 9 for loading the bake...  
JP4150891B2  
JP4149865B2  
JP2008202961A
To suppress thinning of a heater and occurrence of spark, also prevent occurrence of cyanogen, and efficiently raise temperature.Body space that is surrounded by a furnace material and has the heater is shut off into a sample space and a...  
JP2008535172A
The microwave heating device which is a system for heat-treating a large-sized metal sample (14), and was equipped with the wave guide tube (8), It has a means for monitoring and measuring temperature, and the holding mechanism for holdi...  
JP2008534898A
The present invention relates to the equipment which the materials which were coated and/or were polluted are デコーティング (ed) and/or is dried. This equipment includes the furnace (10) which is attached to a support medium and ...  
JPWO2005100893A1
帯電させた試料を電極間で発生する電場によ り浮遊状態にして加熱処理を行う落下型の静 電浮遊炉であって、炉本体の下側に、真空に 掃気可能な落下チューブを鉛直にして接...  
JP4137750B2  
JP4136862B2  
JP4127779B2  
JP4123378B2  
JP4124838B2
The present invention provides a system for supplying a high-pressure medium gas suitable for processing a semiconductor to be processed by heating under isostatic pressure in a short cycle. The system includes a gas holder containing a ...  
JP4119687B2  
JP2008157590A
To provide a heat treatment device easily changeable and adjustable to the optimum length according to the length of a body to be treated when the length of the body is changed and a heat treatment method.This heat treatment device 1 in ...  
JP2008145004A
To provide a vertical baking furnace capable of continuing baking without temporarily cooling a baked material during dropping even after the termination of baking, and elongating a heat treatment time of the baked object to efficiently ...  
JP3142755U
[Subject] A recovery rate of wax is raised and a wax recovery subsystem which can also prevent failure of a vacuum pump is provided. [Means for Solution] The 1st wax recovery tank which is installed in a vacuum atmosphere degreasing sint...  
JP2008144196A
To provide a furnace core tube configuration capable of reducing the temperature variation in the furnace core tube in a heat-treatment apparatus, is reduced and facilitating the maintenance to the furnace core tube, branching tubes and ...  
JP4098210B2  

Matches 901 - 950 out of 4,506