Login| Sign Up| Help| Contact|

Patent Searching and Data


Matches 201 - 250 out of 4,583

Document Document Title
WO/2004/106829A1
The invention relates to a stove for producing denture and or the parts thereof comprising a combustion chamber and heating device which is arranged therein and provided with a heating spiral consisting of an appropriate resistance wire ...  
WO2004072323A3
A furnace incorporating a novel thermal design is disclosed. Heating element temperature is reduced compared to conventional designs while providing a precisely controlled process temperature in the range1000 - 1400 degrees centigrade. T...  
WO/2004/105435A2
A heating assembly for use in an electric furnace includes a helical heating element encircled by thermal insulation, and rows of spacers for keeping turns of the heating element spaced apart by predetermined distances. Each spacer inclu...  
WO/2004/102073A2
The present invention provides a heat treating process chamber (200) having a housing (203) with a flow passage (201) in communication with a vestibule assembly (222a, 222b). The vestibule assembly includes an outer ring (218) with a fir...  
WO2004082867A3
A continuous casting installation includes a furnace (2) for heating metal to a first liquid metal temperature, a degassing unit (4), a filter (6), a heating unit (8) and a casting machine (10). The casting machine (10) includes a pair o...  
WO/2004/089562A1
The invention relates to a holding furnace comprising a metering device for molten metal, especially for precisely metering molten light metal during die casting, wherefore the holding furnace (1) is provided with a dosing chamber (8) en...  
WO2004025697B1
Methods and apparatuses to improve the temperature uniformity of a workpiece (33) being processed on a heated platen (38) of a thermal processing station (10). A heated platen (38) is enclosed in a housing (31) incorporating an additiona...  
WO/2004/085943A1
The aim of the invention is to provide a reliable and efficient operation of a dental furnace (1) for producing compacted ceramics, comprising a hood-shaped firing chamber (3), into which a muffle (5) can be inserted and which is closed ...  
WO/2004/082867A2
A continuous casting installation includes a furnace (2) for heating metal to a first liquid metal temperature, a degassing unit (4), a filter (6), a heating unit (8) and a casting machine (10). The casting machine (10) includes a pair o...  
WO/2004/083757A1
An electrostatic suspension furnace comprising a vacuum chamber, main electrodes facing each other in this vacuum chamber, auxiliary electrodes for moving a sample suspended by electric fields produced between main electrodes, and laser ...  
WO/2004/081477A2
An analytical furnace (12) includes a predictive temperature control which is trained to model crucible (24) temperature during analysis by employing a pair of temperature sensors, with one sensor (130) being mounted in the furnace in fi...  
WO/2004/077505A2
An etching system for etching a wafer of a material has a measuring device, an etching chamber, and a controller. The measuring device measures the critical dimension test feature (CD) along the profile of the wafer at a plurality of pre...  
WO/2004/074768A1
An imaging device comprising a CMOS camera provided with a telecentric lens to image a sample suspending at the center of the interior of an electrostatic suspension furnace, a metal halide light source located opposite to the CMOS camer...  
WO/2004/074523A2
A metal melting closed furnace which includes a main chamber (22), a circulation well (28) connected to the main chamber (22) by a communications passageway (32) and a vortex well (84) having an exit outlet for molten metal into the main...  
WO/2004/072323A2
A furnace incorporating a novel thermal design is disclosed. Heating element temperature is reduced compared to conventional designs while providing a precisely controlled process temperature in the range1000 - 1400 degrees centigrade. T...  
WO/2004/073051A1
A heater assembly for an ALD or CVD reactor provides protection for an electrical conductor associated with a heating element by using a purge gas to isolate the conductor from the corrosive environment of the reactor chamber. The purge ...  
WO/2004/073037A2
A combination of microwave (16) and convection/radiation heating (18) is employed in a fornace (10) and method for binder removal and sintering of materiale such as ceramic materiale and products, LTCC intervals, solid oxide fuel celle a...  
WO2004025697A3
Methods and apparatuses to improve the temperature uniformity of a workpiece (33) being processed on a heated platen (38) of a thermal processing station (10). A heated platen (38) is enclosed in a housing (31) incorporating an additiona...  
WO/2004/060593A1
A centrifugal sintering system imparting a centrifugal force field and a temperature field to a molding of ceramics or metal powder or a ceramic precursor film, characterized in that a rotor for turning a sample holder, a shaft or the sa...  
WO2003096383A3
Methods and apparatus for selectively processing objects with a plasma formed in a cavity (12) with electromagnetic radiation. In one embodiment, a method can be provided that includes placing the object in the cavity (12) such that a fi...  
WO2003096382A3
Apparatus and methods for plasma-process control are provided. One method relates to determining a physical condition of at least one object in a cavity (12) containing gas, where sufficient electromagnetic radiation is directed into the...  
WO2003096381A3
Methods and apparatus are provided for plasma-assisted processing multiple work pieces in a manufacturing line. In one embodiment, the method can include placing the work pieces (320) in movable carriers, moving the carriers on a conveyo...  
WO2003096380A3
Methods and systems (10) for plasma-assisted nitrogen surface-treatments are provided. The method can include subjecting a gas (24) to electromagnetic radiation (26) in the presence of a plasma catalyst (100, 120, 140) to initiate a plas...  
WO/2004/053187A1
The present invention relates to a susceptor system for an apparatus for the treatment of substrates and/or wafers, provided with a treatment chamber (1) delimited by at least two walls and with at least one heating solenoid (9); the sus...  
WO2004027838A3
A method for thermally processing a semiconductor substrate (12) comprises: heating the substrate to a target peak temperature while controlling the gas pressure in the processing chamber (14) at a pressure level that is significantly lo...  
WO/2004/046416A1
So as to simplify and improve flexibility of multiple step substrate vacuum processing a loadlock- and processing tower LLPTl comprises a loadlock arrangement LLA as well as a processing arrangement PMA. The loadlock arrangement LLA comm...  
WO/2004/040632A1
A heat treating system comprising a holding unit for holding a plurality of substrates, a reaction container into which the holding unit is carried, a treating gas supply mechanism for supplying a treating gas into the reaction container...  
WO2003095058A3
Methods and apparatus for plasma-assisted processing of multiple parts are provided. Multi-part processing may include, for example, placing a plurality of parts (11) to be processed in or near a plurality of sub-regions of a cavity (12)...  
WO2004020908A3
An oven rack assembly (15) including full extension slides (21). Full extension slides (21) are mounted to an oven rack and oven rack frames (17) or wire racks providing full extension of an oven rack from an oven enclosure. The rack fra...  
WO/2004/036120A1
A method of suppressing the occurrence of dioxin in an inclined grate furnace (1), comprising the steps of inputting combustibles from the feeder (2) of the inclined grate furnace (1) onto a grate (3), and operating a burned ash removal ...  
WO/2004/027838A2
A method for thermally processing a semiconductor substrate (12) comprises: heating the substrate to a target peak temperature while controlling the gas pressure in the processing chamber (14) at a pressure level that is significantly lo...  
WO/2004/025697A2
Methods and apparatuses to improve the temperature uniformity of a workpiece (33) being processed on a heated platen (38) of a thermal processing station (10). A heated platen (38) is enclosed in a housing (31) incorporating an additiona...  
WO/2004/020908A2
An oven rack assembly (15) including full extension slides (21). Full extension slides (21) are mounted to an oven rack and oven rack frames (17) or wire racks providing full extension of an oven rack from an oven enclosure. The rack fra...  
WO2004005820A3
An oven rack assembly (15) including full extension slides (21). Full extension slides (21) are mounted to an oven rack and oven rack frames (17) or wires racks providing full extension of an oven rack from an oven enclosure. The rack fr...  
WO/2004/016190A1
The aim of the invention is to simplify a method for the production of dentures made of pressed ceramics in the field of dental technology, comprising the following steps; producing a muffle, introducing the muffle into the dental cerami...  
WO/2004/015348A1
A reactor chamber (130) is positioned between a top array of LED heat lamps (146) and a bottom array of LED heat lamps (148). The LED heat lamps (180) forming the top and bottom arrays (146, 148) are individually or controllable in group...  
WO2003096747A3
Apparatus and methods for plasma-assisted heating are provided. In one embodiment, a heating apparatus can include a cavity (14) for containing a gas. The cavity can have a thermally conductive wall and a radiation-transmissive wall. At ...  
WO/2004/005820A2
An oven rack assembly (15) including full extension slides (21). Full extension slides (21) are mounted to an oven rack and oven rack frames (17) or wires racks providing full extension of an oven rack from an oven enclosure. The rack fr...  
WO/2004/001311A1
A heating muffle for a muffle kiln for the production of a dental ceramic product containing titanium, which comprises a hollow unit, which is provided with at least one opening for the uptake of the ceramic product and has completely he...  
WO/2003/096747A2
Apparatus and methods for plasma-assisted heating are provided. In one embodiment, a heating apparatus can include a cavity (14) for containing a gas. The cavity can have a thermally conductive wall and a radiation-transmissive wall. At ...  
WO/2003/095807A1
Methods and apparatus are provided for plasma-assisted engine exhaust treatment. In one embodiment, an engine exhaust treatment system includes at least one conduit with an inlet portion (215), an outlet portion (216), an intermediate po...  
WO/2003/096768A1
Methods and apparatus for plasma-assisted dry processing are provided. Dry processing may include, for example, treating the at least one part (11) by subjecting it to a plasma formed by subjecting it to a plasma formed by subjecting a f...  
WO/2003/096380A2
Methods and systems (10) for plasma-assisted nitrogen surface-treatments are provided. The method can include subjecting a gas (24) to electromagnetic radiation (26) in the presence of a plasma catalyst (100, 120, 140) to initiate a plas...  
WO/2003/096774A1
Methods and apparatus are provided for igniting, modulating, and sustaining a plasma for various plasma processes and treatments. In one embodiment, a plasma is ignited by subjecting a gas in a multi-mode processing cavity to electromagn...  
WO/2003/096383A2
Methods and apparatus for selectively processing objects with a plasma formed in a cavity (12) with electromagnetic radiation. In one embodiment, a method can be provided that includes placing the object in the cavity (12) such that a fi...  
WO/2003/095699A1
Methods and apparatus are provided for igniting, modulating, and sustaining a plasma (615) for coating objects (250). In one embodiment, a method of coating a surface of an object (250) includes forming a plasma (615) in a cavity (230) b...  
WO/2003/096770A1
Methods and apparatus are provided for igniting, modulating, and sustaining plasma (615) for various coating processes. In one embodiment, the surface of an object can be coated (247) by forming plasma in a cavity (230) with walls (232) ...  
WO/2003/095090A1
A system and method of carburizing a surface region of an object includes subjecting a gas to electromagnetic radiation, generated from a radiation source (52), in the presence of a plasma catalyst (70) to initiate a plasma containing ca...  
WO/2003/095089A1
Methods and apparatus are provided for igniting, modulating, and sustaining a plasma for synthesizing carbon structures. In one embodiment, a method is provided for synthesizing a carbon structure including forming a plasma by subjecting...  
WO/2003/095058A2
Methods and apparatus for plasma-assisted processing of multiple parts are provided. Multi-part processing may include, for example, placing a plurality of parts (11) to be processed in or near a plurality of sub-regions of a cavity (12)...  

Matches 201 - 250 out of 4,583