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JP2004263206A |
To provide a heat treatment device in which the configuration of a magnetic field generation means is made simple by using a compact solenoid magnet (an air-core coil), and as a result, the weight and the height of the device are reduced...
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JP2004257613A |
To provide a preheater of a preform for a composite material capable of manufacturing the composite material having excellent wear resistance and vibration damping performance.In this preheater, a shielded casing 16 in which a sealingly ...
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JP2004257600A |
To provide a continuous furnace capable of saving power consumption by suppressing heat radiation amount from a heating chamber in the furnace.In this continuous furnace having a muffle 2 passed through the heating chamber 1 in the furna...
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JP2004253665A |
To provide a wafer holder for a semiconductor manufacturing apparatus wherein the thermal uniformity of the wafer holding surface of a wafer holder having a wafer mounting surface is improved, and to provide a semiconductor manufacturing...
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JP3560190B2 |
To improve production efficiency by detecting temperatures of a plurality of heating bodies to control the temperatures of residual heating bodies so that the temperatures of the residual heating bodies converge onto the temperatures of ...
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JP2004231424A |
To solve problems that thermal efficiency is low and refractory such as fine ceramic used as a heat conducting plate is expensive and difficult to form large sized one in the conventional indirect heating type lime kiln, though there are...
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JP2004231463A |
To provide a firing furnace which requires only a small maintenance work and in which a dewaxing process and a sintering process can be performed for producing a sintered compact having a constant quality, and to provide a production met...
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JP3554847B2 |
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JP2004228564A |
To narrow the temperature distribution of a susceptor even if the set temperature of the susceptor is made high in heating a semiconductor on the susceptor in a chamber.In the chamber for semiconductor manufacturing equipment, semiconduc...
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JP2004212021A |
To prevent leakage of harmful matter such as dioxins to the outside by preventing simultaneous opening of an outer input opening and an inner input opening by mechanical control and not by electrical control in an incinerator adopting an...
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JP2004211948A |
To provide a system to perform sequence processing to introduce preliminary heated articles into an annealing chamber in turn when the article is annealed in the vacuum annealing chamber.In this system, a plurality of article storage she...
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JP3548809B2 |
PURPOSE: To contrive to miniaturize a furnace or to decrease setting space, to decrease consumption of electric power, and to raise work efficiency of sending in or taking out work of baked material or maintenance work. CONSTITUTION: A p...
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JP3543949B2 |
To enable stable control, without the need for atmospheric air introduction and inert gas introduction, simplify the structure of an exhaust system and reduce cost. An apparatus, where a treatment object matter (w) is contained in the in...
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JP3543963B2 |
To improve maintenance operability by simplifying the piping of an exhaustion system. The heat-treating equipment is provided with a main valve 18, a 1st auxiliary valve 30, and a 2nd auxiliary valve 31 for a pipe 13 of the exhaustion sy...
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JP2004188198A |
To provide a muffle system of an oven for dentistry in which it is possible to improve the operability and the cost side.The muffle system (10) of the oven for dentistry is equipped with a muffle base (12), and a muffle cylinder (14) is ...
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JP3534955B2 |
To provide a gaseous far infrared ray heater capable of performing a uniform heating of the entire heating object and further provide a far infrared ray heating furnace. A gaseous far infrared ray heater 10 is constituted by a tubular ra...
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JP3533572B2 |
To provide a heat treating device in a magnetic field capable of improving characteristic of a disclike member to be treated such as a magnetic disc uniformly in the circumferential direction, saving energy, and controlling temperature w...
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JP3528944B2 |
PURPOSE: To provide the subject system enabling necessary mechanical power to be significantly reduced by utilizing, as a heat source, hot effluent changing in a time series fashion within the temperature range between 40 and 70°C, alon...
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JP3526779B2 |
To provide the preventing method of bending of a muffle in a continuous sintering furnace, sintering the products of powder metallurgy or the like. In a muffle type continuous sintering furnace 10, a muffle 21 is disposed on a sintering ...
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JP3524838B2 |
To provide a method for controlling a combustion furnace for manufacturing dental prosthesis material, the method being better adapted to various dental prosthesis materials, particularly for at least reducing or completely excluding the...
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JP2004132679A |
To prevent contamination from a syringe needle or a contaminated medical apparatus used in a hospital or the like.In the radiation down-draft melting furnace, heat resistant bricks 3 are laid on a furnace bottom, and an exhaust groove 2 ...
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JP2004132587A |
To provide a heating furnace repeatedly usable in a high-temperature range of 2500°C or higher.This heating furnace 1 comprises a furnace body 2, a furnace core pipe 46, a graphite-made crucible 52, a heating matter to be housed in the ...
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JP2004132565A |
To provide a heat treatment furnace for easily supplying an atmospheric gas into a furnace body at a low cost without generating dew condensation and capable of saving energy.This heat treatment furnace, wherein the atmospheric gas is su...
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JP2004108725A |
To provide a pressurization induction melting device capable of preventing a water cooled cable connecting an induction coil in a melting furnace incorporated in a pressure vessel with external power supply from being deformed even when ...
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JP3511376B2 |
To perform multiple processes by a single set. A plurality of contact zones A-C required for processing of a work W are formed in a muffle body 11 by a first feed and discharge mechanism 17 - a third feed and discharge mechanism 19. The ...
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JP2004093123A |
To provide a non-oxidation furnace with high energy efficiency capable of stably carrying out incomplete combustion of a fuel in a furnace body, a non-oxidation furnace with high energy efficiency provided with a control mechanism capabl...
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JP2004085125A |
To provide a microwave high-temperature furnace of high heat efficiency with almost no possibility of a heat-resistant ceramic material absorbing microwave to reduce heat efficiency even if using the heat-resistant ceramic material as a ...
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JP2004085126A |
To sufficiently reduce the treatment unevenness of a treated object even when the flow velocity distribution of treatment gas in a furnace is uneven.This vacuum heat treatment furnace for leading the treatment gas into the evacuated furn...
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JP3506303B2 |
To make good use of a high temperature unburnt gas generated when a cutting oil deposited on metal chip or the like is vaporized or pyrolytically decomposed as a melting fuel and thereby contrive enhance energy saving. On the introductio...
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JP2004077011A |
To provide a radiation heating device capable of evenly and stably heating an object to be heated in a furnace by heat radiation.A tubular flame burner 2 and a radiation heating box 3 surrounding the flame of the tubular flame burner 2 f...
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JP2004069074A |
To provide a microwave burning furnace that solves a problem that a ceramic fiber board as a thermal insulation member deforms in a burning state, and prevents an accident where the thermal insulation member deforms to sink a burned mate...
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JP2004060991A |
To provide a muffle for a kiln usable for efficiently manufacturing a bulky ceramic product.This muffle 1 for a kiln houses a material to be fired in a firing chamber R comprising a floor part 2, side wall parts 3, 4, 5 and 6. The firing...
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JP3499718B2 |
To realize a large-sized rotary kiln having a furnace core duct with a large inlet diameter not found heretofore and with a long axis. This indirect heating type rotary kiln is constructed such that at least both ends of a metallic furna...
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JP3498004B2 |
To improve yield in manufacturing of a semiconductor device by improving uniformity in sheet resistance and distribution of a film thickness in the plane of a wafer. A heat treatment apparatus includes a furnace tube 1, a heater 2 provid...
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JP3498213B2 |
To provide a heat treatment furnace capable of improving productivity by improving the cooling efficiency of a heat treatment material. The heat treatment furnace comprises at least a furnace body 3, a heater 5 situated at the internal p...
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JP3497450B2 |
To provide batch type heat treatment equipment which can appropriately cope with multi-kind small-scale production. A reaction chamber 2 is provided with a plurality of heaters 31-35 and a plurality of temperature sensors, and accommodat...
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JP2004044824A |
To reduce difference of temperature increasing speed of a dry distilled object between a proximity of a furnace wall and a central part in the furnace in starting an operation.Inert gas in the furnace is forcibly circulated through the d...
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JP2004037077A |
To provide a heat treatment furnace for reducing equipment cost, having high utilization efficiency of a constitutive part, reducing the occupying floor area, flexibly coping with a load change of a treating object, and suitable for smal...
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JP2004037044A |
To provide a vacuum heating furnace for a FPD capable of heat treatment of a board as even as possible and having excellent productivity.A plurality of plate-like heaters 22 are provided between a plurality of boards 16, which are suppor...
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JP2004034138A |
To efficiently remove air bubbles in molten metal and to effectively utilize material.An exhaust valve 24a is closed and an exhaust valve 24b is opened. Inert gas is introduced from an inert gas introducing pipe 11a into a tank 2a. The p...
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JP2004036981A |
To prevent a surface of a linear material passed in a long pipe, from being scratched by sliding contact, and to improve the manufacturing capability by increasing a linear speed in heat treatment.In this heat-treating furnace wherein a ...
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JP2004028428A |
To provide a heat-treating furnace and a heat-treating method that can miniaturize an exhaust gas recovery apparatus, can improve the capacity of the heat-treating furnace as compared with before, and can also cope with environmental pro...
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JP3490791B2 |
PURPOSE: To increase an efficiency of utilization of composing substances of a heat processing furnace and further to enable multi-kinds and low amount of production to be carried out by a method wherein a plurality of processing chamber...
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JP2004501795A |
Use the heating device of the material like the quality of a compound which can be dissolved, and before the processing equipment of the following like casting equipment or extrusion equipment, It has a heating device arranged to the ext...
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JP2004011934A |
To avoid a foreign substance formed in a heat treatment space from being stuck to a work in a low-cost structure.The continuous heat treating furnace is provided with a heat treatment space A in its inside and disposed with a metal muffl...
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JP2004011938A |
To provide an infrared high-temperature observation furnace having the thickness of the whole body of the observation furnace thinner than that of the conventional one and having superior handling performance.This observation furnace is ...
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JP2004006848A |
To provide a high temperature diffusion furnace capable of achieving a high process performance while improving the of maintenance.The high temperature diffusion furnace employed for a low particle atmosphere is provided with a frame, ha...
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JP3479020B2 |
To form a treatment region having high soaking property by adjusting the heat generation pattern (heat shape or the calorific value of each part) of a heater, in a vertical type heat-treating device for hear-treating, for example, a semi...
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JP3474261B2 |
PURPOSE: To prevent a slip from being generated when a wafer as an object to be treated is heat-treated by a method wherein the wafer is heat-treated at a temperature- rise pattern whose temperature-rise speed grade is smaller than that ...
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JP2003343982A |
To exhaust sublimed gas or the like by a small amount of air with high heat efficiency. An IR heater H which is a heating device is composed of a heat generation part 1 in which a resistance body is arranged between an insulation glass l...
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