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Matches 151 - 200 out of 2,534

Document Document Title
WO/2006/130701A2
Heating element assemblies, heating furnaces incorporating heating element assemblies, methods to form heating element assemblies, methods to form heating furnaces and methods to reduce a magnetic field in a bifilar coil are disclosed. T...  
WO2006009787A3
A device and method of cooling and humidifying a reformate stream comprising a reforming reactor (1) for producing a reformate stream (5) having a first temperature; a shift reactor (9, I0) for receiving the reformate stream; and a heat ...  
WO/2006/111252A1
The invention relates to a method for heat-treating metal work pieces, whereby a cooling gas flow is produced in a vacuum furnace by means of a fan, driven by a three-phase AC motor, in order to quench the work pieces. The aim of the inv...  
WO/2006/103697A1
A system for heat-treatment of large metallic samples (14), comprising a microwave heating apparatus with wave guide (8), means for monitoring and measuring temperature holding means for holding the metallic sample (14), wherein said hol...  
WO/2006/086217A2
A vacuum furnace adapted to cool a load. The vacuum furnace has one or more means for cooling a fluid and a muffle substantially containing the load. The fluid flows in a substantially unidirectional flow substantially within the muffle.  
WO/2006/055772A1
Kilns for processing ceramics and methods for using such kilns are disclosed herein. In one embodiment, a kiln includes an inner body configured to hold one or more ceramic workpieces for processing. The kiln can also include an outer bo...  
WO2006000011A3
The invention relates to a method for thermally treating a metal strip prior to the application of a metallic coating, according to which said metal strip is annealed in a reductive, protective gas atmosphere containing hydrogen. To impr...  
WO/2006/016430A1
A firing kiln that is free from any substantial drop of heat insulating performance of heat insulating layer, being free from any splitting into two parts or exfoliation of heat insulating layer, and that excels in long-term durability a...  
WO/2006/013651A1
A firing kiln that is free from the occurrence of warpage and corrosion of heat insulating layer and that eliminates the need of replacing members of heat insulating layer for a prolonged period of time, excelling in durability and heat ...  
WO/2006/000011A2
The invention relates to a method for thermally treating a metal strip prior to the application of a metallic coating, according to which said metal strip is annealed in a reductive, protective gas atmosphere containing hydrogen. To impr...  
WO/2005/122231A1
A radiation heat blocking shutter (20) is provided at the middle between a high-temperature area (32) and a low-temperature area (30) so as to be advanced and retreated from the high-temperature area to the low-temperature area. A board ...  
WO2005068680A3
An apparatus and method for heating materials or substances in an oven at an oven temperature below their melting and/or vaporization points to either melt and/or vaporize the substance. Substances are inserted into a substantially spher...  
WO2005013325A9
A customizable chamber spectral response is described which can be used at least to tailor chamber performance for wafer heating, wafer cooling, temperature measurement, and stray light. In one aspect, a system is described for processin...  
WO2005046920A3
As part of a system for processing a workpiece (122) by applying a controlled heat to the workpiece, a heating arrangement includes an array of spaced apart heating elements (102) for use in a confronting relationship with the workpiece ...  
WO/2005/093353A1
A apparatus (60) and method of thermally treating a wafer (12) or other substrate, such as rapid thermal processing (RTP). An array (24) of radiant lamps (26) directs radiation to the back side of a wafer to heat the wafer. The front sid...  
WO/2005/093354A1
An improved transfer mechanism (21) is provided for vertical heat treatment equipment. The transfer mechanism transfers a treating object W between a treating object storing container (carrier) (16) and a treating object holder (boat) (9...  
WO/2005/090836A1
A sealing system for a container (2) containing a fluid at high pressure, comprising a head (10) moving between a closed position and an open position of the container (2), a piston (12) for the pressurisation of the container (2) mounte...  
WO/2005/086588A2
A thermal treatment system (100) with at least one apparatus (102) comprising: one platform (110)or two substantially opposite platforms, where at least one of the platforms has at least one thermal means (140) for heating or cooling of ...  
WO/2005/085485A1
The invention relates to non-ferrous metallurgy, in particular to devises for producing a titanium sponge by magnesium-thermal reduction of a titanium tetrachloride. The inventive device comprises a furnace, wherein a retort-reactor prov...  
WO/2005/083341A1
An apparatus and method for uniformizing the temperature distribution across a semiconductor wafer during radiation annealing of process regions formed in the wafer is disclosed. The method includes forming a silicon layer atop the upper...  
WO2005013325B1
A customizable chamber spectral response is described which can be used at least to tailor chamber performance for wafer heating, wafer cooling, temperature measurement, and stray light. In one aspect, a system is described for processin...  
WO/2005/068680A2
An apparatus and method for heating materials or substances in an oven at an oven temperature below their melting and/or vaporization points to either melt and/or vaporize the substance. Substances are inserted into a substantially spher...  
WO2005040705A3
Muffle furnace consisting of a furnace, a perforated plate at the base of the interior, a structure which divides the interior of the furnace into chambers; a further perforated plate beneath the cover of the furnace. It is used for the ...  
WO/2005/064254A1
A vertical heat treatment device includes a treatment container (5) having a treatment region (A1). The treatment region (A1) is set so as to receive to-be-treated substrates (W) held at vertical intervals. The device also has a heating ...  
WO2005013325A3
A customizable chamber spectral response is described which can be used at least to tailor chamber performance for wafer heating, wafer cooling, temperature measurement, and stray light. In one aspect, a system is described for processin...  
WO2004078406B1
A one-piece or otherwise unitary annular shim member made from a perforated metallic material is used to maintain a space between stacked annular preforms during a manufacturing process, such as densification. The metallic material used ...  
WO2004094568A3
A Pulverized Coal Pressurized Gasifier (PCPG) including a gasifier chamber, a fuel (18) chamber and at least one flame retention burner (100). The flame retention burner (100) prolongs high temperature exposure of coal (18) to the hot fl...  
WO/2005/046920A2
As part of a system for processing a workpiece (122) by applying a controlled heat to the workpiece, a heating arrangement includes an array of spaced apart heating elements (102) for use in a confronting relationship with the workpiece ...  
WO/2005/040705A2
Muffle furnace consisting of a furnace, a perforated plate at the base of the interior, a structure which divides the interior of the furnace into chambers; a further perforated plate beneath the cover of the furnace. It is used for the ...  
WO/2005/038373A1
A high-pressure heat treatment furnace, comprising a pressure vessel having a furnace container and a furnace cover closing the furnace container and allowing an internal pressure to be controlled, heat-insulating walls installed in the ...  
WO2004008494A3
A method and system for controlling a servomotor network. The system has at least one local control node remotely located from a central processing area. The local control node actuates one or more servomotors, and is physically placed n...  
WO2004077505A3
An etching system for etching a wafer of a material has a measuring device, an etching chamber, and a controller. The measuring device measures the critical dimension test feature (CD) along the profile of the wafer at a plurality of pre...  
WO2004072323B1
A furnace incorporating a novel thermal design is disclosed. Heating element temperature is reduced compared to conventional designs while providing a precisely controlled process temperature in the range1000 - 1400 degrees centigrade. T...  
WO/2005/013325A2
A customizable chamber spectral response is described which can be used at least to tailor chamber performance for wafer heating, wafer cooling, temperature measurement, and stray light. In one aspect, a system is described for processin...  
WO2004007800A9
A thermal processing apparatus (100) is provided comprising a process chamber (102) and a vacuum system (104) for evacuating the process chamber. The vacuum system comprises a pump unit (124) in flow communication with the chamber and a ...  
WO2004008054A9
A method and apparatus for insulating and controlling temperature in a semiconductor manufacturing environment. The invention comprises at least one modular heater element designed to be mounted about a semiconductor furnace process cham...  
WO/2005/001360A1
A gas cooling type vacuum heat treating furnace, comprising a gas cooling furnace having a cooling chamber allowing the stationary placement of a treated article therein and forming a gas flow passage in the vertical direction, a gas coo...  
WO/2004/113813A1
The inventive device (1) for compressing a ceramic dental mixture for producing dental prosthesis such as crowns, bridges and inlays comprises a top part (2), a lower part (4) movable with respect to the top part (2) and a piston (7) whi...  
WO/2004/114377A1
A heating means is disclosed which comprises a reflector plate composed of an opaque quartz and a quartz tube welded to the surface of the reflector plate. A carbon wire which generates heat when a current is applied is inserted in the q...  
WO2004008008A3
A gaseous flow control method and system. The flow control system monitors and controls gaseous levels and gas flow into and out of an enclosed space by using a proportional/integral/derivative (PID) controller to manipulate gas flow int...  
WO2004072323A3
A furnace incorporating a novel thermal design is disclosed. Heating element temperature is reduced compared to conventional designs while providing a precisely controlled process temperature in the range1000 - 1400 degrees centigrade. T...  
WO2004078406A3
A one-piece or otherwise unitary annular shim member made from a perforated metallic material is used to maintain a space between stacked annular preforms during a manufacturing process, such as densification. The metallic material used ...  
WO2004077912A3
A one-piece or otherwise unitary annular shim member made from a carbon material is used to maintain a space between stacked annular preforms during a manufacturing process, such as densification. The one-piece structure advantageously s...  
WO/2004/094568A2
A Pulverized Coal Pressurized Gasifier (PCPG) including a gasifier chamber, a fuel (18) chamber and at least one flame retention burner (100). The flame retention burner (100) prolongs high temperature exposure of coal (18) to the hot fl...  
WO/2004/085943A1
The aim of the invention is to provide a reliable and efficient operation of a dental furnace (1) for producing compacted ceramics, comprising a hood-shaped firing chamber (3), into which a muffle (5) can be inserted and which is closed ...  
WO/2004/077912A2
A one-piece or otherwise unitary annular shim member made from a carbon material is used to maintain a space between stacked annular preforms during a manufacturing process, such as densification. The one-piece structure advantageously s...  
WO/2004/078406A2
A one-piece or otherwise unitary annular shim member made from a perforated metallic material is used to maintain a space between stacked annular preforms during a manufacturing process, such as densification. The metallic material used ...  
WO/2004/077505A2
An etching system for etching a wafer of a material has a measuring device, an etching chamber, and a controller. The measuring device measures the critical dimension test feature (CD) along the profile of the wafer at a plurality of pre...  
WO/2004/072323A2
A furnace incorporating a novel thermal design is disclosed. Heating element temperature is reduced compared to conventional designs while providing a precisely controlled process temperature in the range1000 - 1400 degrees centigrade. T...  
WO/2004/073051A1
A heater assembly for an ALD or CVD reactor provides protection for an electrical conductor associated with a heating element by using a purge gas to isolate the conductor from the corrosive environment of the reactor chamber. The purge ...  

Matches 151 - 200 out of 2,534