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JP2013093600A |
To provide a method for managing temperature distribution varying dependently on the patterning of wafer in rapid thermal processing, to greatly enhance the uniformity of rapid thermal processing (RTP).Provided are an apparatus 60 and a ...
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JP5198169B2 |
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JP2013082591A |
To provide a glass production apparatus capable of vitrifying a glass raw material uniformly in a short time.In this glass production apparatus 1, a glass raw material 4 formed in a particular shape is allowed to pass through a combustio...
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JP5195419B2 |
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JP2012013341A5 |
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JP2013076563A |
To selectively heat a lower layer portion of an agglomerate charged into a drying furnace using a microwave.A microwave dryer is provided at a hot-air type drying furnace that makes hot air blast an object to be dried when the object to ...
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JP2013076560A |
To selectively heat a lower layer portion of an agglomerate charged into a drying furnace using a microwave.A microwave dryer is provided at a hot-air type drying furnace that makes hot air blast an object to be dried when the object to ...
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JP2013076561A |
To selectively heat a lower layer portion of an agglomerate charged into a drying furnace using a microwave.A microwave dryer is provided at a hot-air type drying furnace that makes hot air blast an object to be dried when the object to ...
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JP2013076562A |
To selectively heat a lower layer portion of an agglomerate charged into a drying furnace using a microwave.A microwave dryer is provided at a hot-air type drying furnace that makes hot air blast an object to be dried when the object to ...
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JP2013513924A |
It is a bottom electrode or an anode for a continuation direct-current arc furnace, and a cooling device which makes it possible to improve efficiency of a cooling action of the bottom electrode is equipped, A bottom electrode or an anod...
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JP5186374B2 |
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JP5183638B2 |
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JP2013512413A |
The present invention relates to an apparatus for adjusting a position of a plasma arc torch. The apparatus includes an elevation apparatus configured to raise and lower the plasma arc torch with respect to molten silicon, a rotary appar...
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JP2013061081A |
To provide a heat treatment apparatus capable of effectively preventing the deformation of a chamber caused by heat even if treating a substrate at a high temperature.The heat treatment apparatus has a triple structure in which a chamber...
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JP5176222B2 |
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JP2013057414A |
To provide drying furnace for a ceramic that can efficiently dry an unbaked ceramic containing water or a resin binder by concentratedly radiating near-infrared rays that excel in performance for disconnecting a hydrogen bond between mol...
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JP5162949B2 |
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JP5162181B2 |
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JP2013506113A |
A combustion tube attachment system attaches a combustion tube to the opening of the bottom wall of a furnace housing so that release is possible. A combustion tube has a base assembly object which has a cam, and in order to drop a combu...
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JP5150260B2 |
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JP5148114B2 |
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JP5148216B2 |
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JP2011134597A5 |
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JP2013033680A |
To provide a heat treatment apparatus for a glass substrate.In a heat treatment apparatus which heats a workpiece with a heater disposed in a furnace body, the heater is formed by housing a heater body composed of a heating element in a ...
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JP2013033631A |
To provide a heater for a heating furnace which is used regardless of heating temperatures and ambient conditions of products to be heated or sintered.Each of a first heater pipe body 20, a second heater pipe body 22, a third heater pipe...
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JP2013504739A |
It is a furnace lid system of a high temperature industrial furnace which has the cable system which the 1st which a restoration sequence has been arranged [1st] and had an interval detached mutually, and the 2nd hung, and contained a pl...
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JP5135846B2 |
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JP5137990B2 |
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JP5139136B2 |
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JP5134595B2 |
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JP5134375B2 |
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JP5129492B2 |
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JP5128134B2 |
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JP5126973B2 |
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JP2013011384A |
To provide a microwave heating furnace which can produce molten pig iron at high energy efficiency in place of a blast furnace pig iron production method, can recover noble metal or the like from a so-called urban mine, and can manufactu...
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JP5119544B2 |
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JP5122840B2 |
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JP2013007525A |
To provide a baking method for a batch-type kiln for quickly heating treated objects to a high temperature of 1,000°C or higher and uniformly baking them.The batch-type kiln is constituted by arranging, in a furnace, a plurality of stag...
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JP5114933B2 |
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JPWO2011013594A |
In a device which fuses raw-materials-for-glass particles and a piece of a glass caret, and manufactures fusion glass, and a method for the same, the present invention provides a glass melting furnace etc. which can maintain the homogene...
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JPWO2011013594A1 |
In a device which fuses raw-materials-for-glass particles and the piece of a glass caret, and manufactures fusion glass, and a method for the same, the present invention provides the glass melting furnace etc. which can maintain the homo...
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JP2013002728A |
To provide a heat treatment furnace which allows, outside the furnace, a lead wire in the furnace to be connected and detached from an electrode bar exposed to the outside, and to provide a method for replacing a heater of the heat treat...
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JP2013002767A |
To provide a heating device that can produce carbon fiber, graphite fiber, etc., of good quality by utilizing microwave, and suitably saves electric energy by simplifying the constitution.The heating device includes microwave supply mean...
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JP2012256523A |
To provide a long-life halogen heater lamp unit which does not cause an arc tube to break over a long period of use and a thermal treatment apparatus.The thermal treatment apparatus comprises: a heat-insulating enclosure 11 which enclose...
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JP5109339B2 |
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JP5103007B2 |
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JP5100021B2 |
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JP5094733B2 |
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JP5096182B2 |
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JP2012243692A |
To provide a control device of an induction melting furnace which can detect the phase difference of the output voltage and output current from a power conversion unit with a simple configuration.A control circuit 10 includes an output v...
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