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Matches 251 - 300 out of 1,192

Document Document Title
JP6482072B2  
JP6455595B2  
JP6378155B2  
JP6363909B2  
JP2018096656A
To prevent property change of fluidized medium, and move the fluidized medium at low cost.A fluidized bed system 100 includes: a first fluidized bed chamber 212 having a first input port 212b provided on a first side wall 212a, and a fir...  
JPWO2016208615A1
In a continuation type furnace for heat treating (HF1), a heat treatment field which heat-treats a work is provided along the conveyance direction (b). A work is heat-treated while a heat treatment field (H) is conveyed. A work conveyanc...  
JP2018048805A
To provide a heating device which has excellent uniformity of temperature distribution and stability of cleanliness, and which can easily correspond to the change at least in a width direction size of an object to be heated.A heating dev...  
JP6264942B2  
JP6186039B2  
JPWO2015186600A1
The present invention provides the far-infrared type heating furnace of the steel plate for the press between heat which controls heat modification of a furnace object and each part of a furnace object. The block which consists of therma...  
JPWO2015186601A1
The present invention makes it a subject to be stabilized over a long period of time by the steel plate support member by which the plane project area was small and heat modification was controlled, and to support the steel plate for the...  
JP2017075726A
To provide a technology for mounting a shelf board on a support without forming a through hole on the shelf board.A shelf 10 for heat treatment includes a shelf board 30 having the planar shape, supports 20 respectively having supporting...  
JPWO2015186599A1
About the far-infrared heater which has flexibility, it is Ac.3The far-infrared type multi stage type heating furnace of the steel plate for the press between heat which it has is provided without making it bend also at more than a trans...  
JP2017059659A
To provide a semiconductor device manufacturing method which can reduce adhesion of particles to a surface of a substrate.A semiconductor device manufacturing method of the present embodiment comprises: a process of carrying in a substra...  
JP6064199B2  
JP6068431B2  
JP2016223733A
To reduce a variation in quality of sintered articles by uniformly heating and defatting a treatment object.A vacuum defatting and sintering furnace 1 comprises a treatment container 20, a nonporous insulation material 3, a vacuum chambe...  
JP5995809B2  
JP5990338B2  
JP2016156612A
To enable rapid heat-up and down corresponding to various kinds of treated products.In a heat treating furnace 10, with a state that atmosphere of a first space 11a is heated with a first heater 21a and atmosphere of a second space 11b i...  
JP5972831B2  
JP5957613B2  
JP5938710B2  
JP2016109424A
To suppress increase of an electric power supply amount from a power supply, and make the temperature in a device into ultrahigh temperature of 2500°C or more in a short time.In a heat treatment furnace 2, arranged are a heater 4, and a...  
JP5927355B2  
JP2016051819A
To provide magnetic annealing device and method capable of shortening the convergence period from heating start to temperature stabilization, while having a simple temperature control configuration.A magnetic annealing device for anneali...  
JP2016038191A
To provide a muffle in which silicon carbide and silicon dioxide are hard to occur inside the muffle when a compact containing silicon is fired.A muffle is attached into a firing chamber of a firing furnace used for firing a compact cont...  
JP2015210072A
To provide a rapid temperature rise area having a high temperature rise rate, in a calcination furnace where a processed object is moved to constant temperature areas by roller transportation, and while passing through each area having e...  
JP5813229B2  
JP2015200444A
To provide a vertical furnace capable of burning not only coarse raw core but also fine raw ore.A vertical furnace comprises a coarse grain raw ore supply pipe 2A and a fine grain raw ore supply pipe 2B. An inner cylindrical wall 4A with...  
JP2015169396A
To provide supporting members for heat treatment, a supporting device for heat treatment, a heat treatment apparatus and a treated object-arranging method, capable of making a more uniform distribution of atmosphere in a space where a pl...  
JP2015161474A
To provide a defatting treatment furnace capable of restricting quality dispersion in defatting and damage of a ceramic molded product at the time of installing and recovery of the ceramic molded product by shortening a time required for...  
JP2015158291A
To provide a retort for magnesium heat reduction, which facilitates the taking-out of an inner cylinder and can shield hot air.A terminale plate 10 with a handle 15 is detachably provided on a terminal of an inner cylinder 9 by a bayonet...  
JP2015155568A
[Subject] When a main part deteriorates from heating, a retort for magnesium heat reduction which can discard only a main part is provided. [Means for Solution] Since main part 2 and head 4 are concluded enabling free attachment and deta...  
JP5732655B2  
JP5731808B2  
JP2015081764A
To provide a supporting device, a substrate processing device having the supporting device and a substrate processing method in which a thermal distribution at the substrate can be kept uniformly during a heating process.A supporting uni...  
JP2015075280A
To appropriately fire a long firing target.A firing apparatus includes: a muffle furnace main body 6 forming a firing atmosphere 11 where a firing target is arranged; and a burner supplying high temperature gas to a furnace internal spac...  
JP2015064139A
To provide a vertical furnace capable of firing not only coarse ore but also fine ore.In a vertical furnace, a preheating space is formed by a furnace floor 6 in which a falling opening 12 is formed, a cylindrical wall 4 extending upward...  
JP2015054812A
To provide a burning tool that can prevent adhesion of a burned object in burning by lowering wettability in a membrane part formed so as to cover a substrate part, and a method for producing the burning tool.The burning tool according t...  
JP2015504476A
Heat treatment which gave and carried out expected [of the equivalent heating history] is realized to two or more long things inserted in a radiated type box form heating furnace. In specifically heating at least a plurality of long thin...  
JP2014237863A
To improve the strength of the bottom part (gauze) of a jig and suppress deviation of the gauze.A workpiece is mounted on a gauze 2 of a jig for heat treatment furnace. In the gauze 2, a first strand 10, a second strand 20 and a third st...  
JP2014228237A
To provide a heat treatment vessel prevented from damage caused by change of configuration due to thermal shock.A heat treatment vessel 1 is a tank type heat treatment vessel includes a planar bottom part 2, and an upright planar wall pa...  
JP2014214999A
To provide a heat treatment apparatus capable of heat-treating a heating object uniformly irrespective of variation of furnace temperature due to environmental change or a type and the like of the heating object.A uniform heat plate unit...  
JP2014511988A
The present invention relates to a roller hearth furnace (101) for heating work piece (102). A roller hearth furnace (101) concerning the present invention has a purge system (110) for a roller bearing unit (111), A purge system (110) is...  
JP5491222B2  
JP5490606B2  
JP5449645B2  
JP5393166B2  
JP5256655B2  

Matches 251 - 300 out of 1,192