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JP5972831B2 |
The present invention improves the strength of the bottom (net) of the jig and makes it more difficult and unlikely for deviation of the mesh to occur. A workpiece is loaded on the net (2) of the heat treat furnace jig (hereinafter, heat...
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JP5957613B2 |
An object of the present invention is to stably support steel sheets for hot stamping accommodated in a far-infrared radiation multi-stage type heating furnace over a long period of time using steel sheet support members having a small p...
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JP5938710B2 |
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JP2016109424A |
To suppress increase of an electric power supply amount from a power supply, and make the temperature in a device into ultrahigh temperature of 2500°C or more in a short time.In a heat treatment furnace 2, arranged are a heater 4, and a...
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JP5927355B2 |
The present invention provides a far-infrared radiation heating furnace for steel sheets for hot stamping configured to inhibit thermal deformation of the furnace body and furnace body parts. A far-infrared radiation heating furnace (10)...
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JP2015210072A |
To provide a rapid temperature rise area having a high temperature rise rate, in a calcination furnace where a processed object is moved to constant temperature areas by roller transportation, and while passing through each area having e...
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JP5813229B2 |
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JP2015200444A |
To provide a vertical furnace capable of burning not only coarse raw core but also fine raw ore.A vertical furnace comprises a coarse grain raw ore supply pipe 2A and a fine grain raw ore supply pipe 2B. An inner cylindrical wall 4A with...
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JP2015169396A |
To provide supporting members for heat treatment, a supporting device for heat treatment, a heat treatment apparatus and a treated object-arranging method, capable of making a more uniform distribution of atmosphere in a space where a pl...
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JP2015158291A |
To provide a retort for magnesium heat reduction, which facilitates the taking-out of an inner cylinder and can shield hot air.A terminale plate 10 with a handle 15 is detachably provided on a terminal of an inner cylinder 9 by a bayonet...
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JP2015155568A |
To provide a retort for magnesium heat reduction capable of discarding only the main body when the main body is deteriorated by heating. Since the main body 2 and the head 4 are detachably fastened, if the main body 2 deteriorates, only ...
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JP5732655B2 |
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JP5731808B2 |
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JP2015064139A |
To provide a vertical furnace capable of firing not only coarse ore but also fine ore.In a vertical furnace, a preheating space is formed by a furnace floor 6 in which a falling opening 12 is formed, a cylindrical wall 4 extending upward...
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JP2014228237A |
To provide a heat treatment vessel prevented from damage caused by change of configuration due to thermal shock.A heat treatment vessel 1 is a tank type heat treatment vessel includes a planar bottom part 2, and an upright planar wall pa...
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JP5491222B2 |
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JP5490606B2 |
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JP5449645B2 |
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JP5393166B2 |
A substrate firing device having an increased contact area between the substrate and substrate support portions, thereby preventing the substrate support portions from generating scratches on the substrate when the substrate expands and ...
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JP5256655B2 |
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JP5159768B2 |
The present invention relates to a method and device (10) for the temperature treatment of workpieces (19) or components, in particular for producing a solder connection between a solder material and at least one component or workpiece u...
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JP5108543B2 |
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JP5108545B2 |
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JP5108544B2 |
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JP5063845B2 |
A jig for heat treatment of a workpiece capable of use over a long period of time by minimizing or eliminating deformation thereof caused by thermal distortion and which is capable of performing heat treatment of the workpiece by reducin...
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JP2012163231A |
To provide a rotary heat treatment furnace achieving miniaturization of a furnace body and improvement of heat efficiency.The rotary heat treatment furnace includes: the furnace body 1 having a closed cylindrical shape; a rotational shaf...
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JP4986964B2 |
A crystal-growing furnace with a convectional cooling structure includes a furnace body, a heating room, and at least one heater. The heating room is accommodated in the furnace body, and includes an upper partition, a plurality of side ...
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JP2012096980A |
To provide an apparatus for firing a ceramic substrate, and to provide a method for firing a ceramic substrate using the same.The apparatus for firing a ceramic substrate includes: a firing setter for mounting a ceramic substrate thereon...
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JP4936216B2 |
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JP4938198B2 |
Methods and devices for thermal processing of multiple samples at the same time are disclosed. The assemblies include carriers and sample processing devices with process arrays that include conduits useful in distributing sample material...
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JP4927296B2 |
Methods and devices for thermal processing of multiple samples at the same time are disclosed. The assemblies include carriers and sample processing devices with process arrays that include conduits useful in distributing sample material...
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JP2012084637A |
To improve a heat treatment apparatus used in a calcination process when providing an electrode on the front and back of a silicon wafer, and to realize an ideal temperature profile in calcination.The heat treatment apparatus includes a ...
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JP4924991B2 |
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JP4896954B2 |
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JP2012046793A |
To provide a withstand load bearing member for use in a furnace for supporting large load, which is interposed under a heated material for use such as a skid in a heating furnace where a high temperature environment, for example 1,200°C...
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JP4884208B2 |
Disclosed is an annealing frame, especially for conveying molded aluminum parts during a heat treatment process. The invention is characterized in that said annealing frame comprises at least one annealing frame element (1) that is provi...
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JP2011242108A |
To provide a baking furnace capable of uniformly baking a ceramic molding in a sheath.In this baking furnace 1, a recessed face K recessed downward is extended along the longitudinal direction of a hearth plate 3 at a top face 3a of the ...
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JP2011226690A |
To provide an integral multilayer type firing and mounting device for heat treating facilities, which has high air permeability, which can be customized, and which is firmly integrated.The firing and mounting device includes a plurality ...
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JP2011145058A |
To provide a kiln for ceramic products and a baking method utilizing the kiln including a kiln body with a heat insulating material placed inside, one or more setters arranged inside the kiln body and loaded with ceramic moldings at the ...
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JP4703966B2 |
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JP2011094882A |
To provide a support tool usable within a high-temperature firing furnace and enabling adjustment of support height of a shelf board and accurate horizontal adjustment of the shelf board by a simple work.The support tool 10 includes: a b...
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JP4610089B2 |
The rack is made essentially out of thermostructural composite material and comprises a baseplate (12), a partition (14) extending above the baseplate, and a plurality of support arms (20) fixed to the partition and extending substantial...
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JP4568089B2 |
A floating substrate reactor allows heat treatment of a series of semiconductor substrates, one by one. The heat treatment occurs while flowing gas suspends a substrate between two heated surfaces of the reactor. The two heated surfaces ...
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JP2010230137A |
To provide connecting structure preventing loosening of a fitting state of connecting structure caused by difference in thermal expansion coefficient of material constituting structure and thereby to prevent thermal stress breakage of co...
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JP4553637B2 |
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JP4553132B2 |
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JP4549091B2 |
[Problem] The long-term use of a conventional jig for calcining an electronic component arises a problem such as peel-off of a zirconia surface layer. Even if the performance is not deteriorated in the short-term use, the zirconia surfac...
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JP4542378B2 |
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JP4534619B2 |
A heat treatment jig for supporting silicon semiconductor substrates by contacting, being loaded onto a heat treatment boat in a vertical heat treatment furnace, comprises; the configuration of a ring or a disc structure with the thickne...
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JP4526683B2 |
An object of the present invention is to provide a novel wafer support jig and a process for producing the same, said wafer support jig capable of considerably suppressing the generation of particles in the wafer heat treatment process, ...
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