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JP4518370B2 |
A support structure for supporting a ceramic susceptor in a chamber is provided. The support structure includes a supporting portion joined with a back face of the ceramic susceptor. The supporting portion includes an inner space that is...
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JP4497798B2 |
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JP4476180B2 |
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JP4455564B2 |
To make a reaction to produce uranium dioxide from uranium hexafluoride efficient by a simpler constitution. A rotary kiln for manufacturing uranium dioxide provided with a kiln main body 2 equipped with an inlet hood 3 at one end and an...
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JP4451259B2 |
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JP3157522U |
To provide a ceramic assembly capable of supporting a product to be fired or heat-treated in a kiln. It is composed of a plate-shaped ceramic base member 1 and at least one ceramic support functional member connected to the base member 1...
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JP4421238B2 |
After the maintenance of a heat treatment apparatus, a susceptor and a heating plate are moved upwardly and a nitrogen gas flow from an inlet toward an outlet passage is produced prior to heat treating a semiconductor wafer. In this stat...
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JP4421910B2 |
A tray for heat treatment includes a plate-shaped ceramic substrate which includes at least one pocket for placing a workpiece and a notch formed therein. The tray for heat treatment does not crack or undergo deformation such as warping ...
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JP4415110B2 |
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JP4416323B2 |
The present invention provides an apparatus and method for substrate transport. In systems according to the invention, at least a first and second chamber are provided. The first chamber may be a load lock and the second chamber a proces...
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JP4401652B2 |
Apparatus for heat treating a cutting tool comprises a furnace and a tool holder within the furnace adapted to receive therein a first portion of the tool, a second portion of the tool projecting from the tool holder, the second portion ...
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JP4377601B2 |
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JP4371260B2 |
In a thermal processing apparatus ( 1 ), an upper opening ( 60 ) is closed by a transparent plate ( 61 ) and a light emitting part ( 5 ) emits light through the upper opening ( 60 ). Also provided are a susceptor ( 72 ) for supporting a ...
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JP4351374B2 |
The disclosure relates to a system for supporting a substrate having a support frame (54) that minimizes deflection encountered during thermal expansion in a processing chamber. In one embodiment, the support frame comprises one or more ...
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JP2009210169A |
To provide a plate material holding device and a method of uniformly heating a plate material capable of uniformly heating a plate material by a forced circulation type heating furnace.This plate material holding device for holding the p...
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JP4310457B2 |
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JP4260944B2 |
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JP4213991B2 |
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JP4205434B2 |
A sample processing device comprising: a rectangular body; and a plurality of process arrays located within the body, each of the process arrays comprising an input chamber, an output chamber, and a primary process chamber located betwee...
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JP4170392B2 |
The present invention discloses a method of sintering of cemented carbide or cermet bodies lying on graphite trays. By using graphite trays coated with a covering layer of Y2O3 containing
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JP2008249215A |
To provide a vertical type heating furnace capable of creating a temperature profile of high accuracy.In this vertical type heating furnace in which a heated object 6 is vertically passed to be heated, partitioning plates 5 are disposed ...
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JP2008241214A |
To provide a baking device capable of quickly supplying a baked object into a baking space and discharging it from the baking space.The baking device includes a baking furnace 2 forming the baking space 6 where the baked object can be ar...
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JP4137750B2 |
In a thermal processing unit, a substrate is held by a local transport hand to be transported between a transfer section and a heating unit, and subjected to a heat processing by the heating unit. Also, the local transport hand is cooled...
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JP4137699B2 |
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JP4085307B2 |
A sealed enclosure comprises a sleeve (1) formed from an electrical insulating material and sealed with respect to gas or vacuum. The internal faces are protected by a thermal screen (2) comprising a matrix of heat insulating tiles (5) a...
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JP4062845B2 |
Adjusting element is made of a porous body with a three-dimensional network structure having pores with an average diameter of 5-1000 mu m, a porosity of 70-25% and a planar surface. An independent claim is also included for a process fo...
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JP2007333272A |
To provide a heat treatment device capable of highly densely mounting articles to be heated and heating the articles, and a heat treatment system with the heat treatment device. The heat treatment system 1 comprises a transfer device 2 a...
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JP4008606B2 |
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JP3979764B2 |
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JP3977595B2 |
The loader device is made of a thermostructural composite material and comprises a base (20), a loading pole (30) secured to the base and extending at least over the full height of the loader device, and a plurality of loading trays (40)...
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JP3965579B2 |
To provide a piezoelectric layer forming method capable of surely degreasing a ferroelectric precursor film and obtaining fine crystallization and a heater to be used for the method. The method for forming a piezoelectric layer 70 repeat...
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JP2007198626A |
To provide a baking furnace capable of managing a dew point, controlling cooling gradient, and inexpensively manufacturing a baked substance with high reliability. This baking furnace has a furnace chamber 1, a movable partitioning devic...
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JP3929263B2 |
To provide porous refractories which are the porous refractories to be used as trays in firing the fired matter and have good air permeability, excellent thermal impact resistance and the strength capable of withstanding the weight of fi...
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JP2007139234A |
To provide a heat treatment apparatus capable of stacking in a high density state and heat-treating the objects to be heated.The heat treatment apparatus 1 is provided with a rack 10 in the interior of a heating chamber 3a. Multiple shel...
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JP3904665B2 |
To provide a shelf assembling structure for a furnace in which damages to a column due to cracks are not caused easily, and a beam can be attached and detached easily, and which can correspond to various sized and sectional beams and all...
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JP3869057B2 |
To provide a low density molybdenum sintered compact capable of inexpensively forming a low density and high strength product with a high purity, its production, and a product using the sintered compact. The low density molybdenum sinter...
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JP3859754B2 |
To prevent occurrence of dispersion in pressure applied to each molding and heat transfer characteristics when a plurality of moldings are heat treated, and at the same time, shorten the time required. This heating apparatus is equipped ...
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JP3860404B2 |
To improve the temperature uniformity of a ring member 5 in heat treatment to avoid damaging the ring member. A ring heating controller 81 controls a straight pipe-like heating light source 10 located above a ring member 5 for mainly hea...
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JP2006527351A |
A support for structural components that are subjected to a thermal treatment process. The support includes a frame having limbs and extending therefrom a grid of intersecting strands. In order to prevent the support from warping even wh...
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JP3851784B2 |
To improve thermal performance by downsizing a heat treatment apparatus for glass substrates, etc. The heat treatment apparatus is composed of heating plates 1 spaced by intervals c and supported by spacer pins 2 and a support beam 11, w...
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JP3843475B2 |
To attain excellent heat resistance and to eliminate the possibility of a nozzle plate being inclined due to thermal de formation. A pair of upright walls made of refractory such as firebricks are provided in parallel, with a prescribed ...
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JP2006275340A |
To efficiently execute melting treatment of incinerated ash or the like.In the melting treatment of an object W to be treated, the object W is charged and stored in a treated object pit 18 defined by a partitioning plate 16 ordinarily ke...
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JP3814490B2 |
To provide a heat insulating board of an induction heating device which is hardly deformed or broken due to radiation heat from a heated material in induction heating. The heat insulating board of the induction heating device is disposed...
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JP3810596B2 |
To provide a jig for heat treatment, by which the deformation can be reduced by uniformly cooling an annular member. The annular member 12 is fitted into the inside of a restricting ring 40 and also, supported from the lower side by the ...
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JP3797715B2 |
To provide a lifetime-prolonged boat for vertical diffusion ovens. A boat comprises a top plate 71, bottom plate, pair of first bars 73 which couple the top and bottom plates and have many slots to house wafers, pair of second bars 74 wh...
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JP3785036B2 |
To facilitate a cleaning and exchange work for a work support part and to prevent damaging of a work during high temperature heat treatment. The work support constitutes a part of a cassette 1 on which works W are loaded in multistage an...
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JP3780825B2 |
To automate an air conditioner through automating the loading/ unloading containers into/from a reaction chamber in a closed state. The subject automatic air conditioner comprises a reaction chamber 3 for holding a container 13 therein, ...
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JP2006132922A |
To provide a continuous heat treatment furnace capable of making the transporting speed of objects to be thermally treated in a firing area higher than that of objects to be thermally treated in a drying area.The drying area 21 where dry...
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JP2006078019A |
To provide a heat treatment equipment capable of shortening the distance to make illumination distribution become broad by making illumination distribution in a surface of a panel-shape object to be heated such as a semi-conductor wafer ...
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JP3747383B2 |
PURPOSE: To enable a sufficient tensile strength to be attained irrespective of a simple configuration of a supporting structure by a method wherein a first supporting means made of non-organic long fiber cloth supports a non- organic fi...
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