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Patent Searching and Data


Matches 401 - 450 out of 1,168

Document Document Title
JP2005069668A
To provide a baking container for silicon nitride-based ceramic in which a silicon nitride-based molded article, especially, a honeycomb molded article containing metal silicon particles and/or silicon nitride particles can be subjected ...  
JP3622932B2  
JP2005041777A
To provide an electronic component firing tool whose durability for a long term is improved by solving the problems that the durability for a long term lacks such that a surface layer is peeled from an intermediate layer and the like as ...  
JP2005032898A
To provide a practical and low-cost method of reducing the temperature distribution on the heated surface of a ceramic susceptor by suppressing the cold spots on the heated surface when bonding a support section to the rear surface of th...  
JP2005029462A
To provide a method for manufacturing a ceramic plate capable of easily and economically providing in a high yield the ceramic plate having sufficient strength and a favorable smooth surface capable of performing homogeneous firing treat...  
JP2005026517A
To provide a piezoelectric layer forming method capable of surely degreasing a ferroelectric precursor film and obtaining fine crystallization and a heater to be used for the method.The method for forming a piezoelectric layer 70 repeats...  
JP3610369B2  
JP3602604B2  
JP2004340552A
To provide a container that prevents fused magnesium from being contaminated by nickel while retained in a transporting vessel or a holding vessel in view of a problem of impurities such as nickel and chromium contained in conventional s...  
JP2004340514A
To provide a microwave heating furnace preventing a bottom furnace shell from becoming too hot, particularly, preventing temperature rise of the furnace shell due to rise of a strut temperature of a mounting block for mounting an object ...  
JP2004536291A
The equipment for processing sample material, a method, and a system are indicated. A standard microtiter plate system, a method, a protocol, etc. In which the present invention contains ウェル arranged by the rectangle array, A bridg...  
JP2004535512A
It is the support equipment for parts and the heat treatment method of metal parts which should be heat-treated in a furnace. It is an object for heat treatment of parts (3), especially a support peg for the carburizations of steel parts...  
JP2004325006A
To provide a heat treatment furnace capable of lowering the temperature of the radiation heat from a hearth to a driving means to a desired temperature only by supplying the small amount of air, and inhibiting the heat radiation from the...  
JP2004534929A
The present invention relates to the heating furnace (1) which can carry out the heat reaction carried out at a rapid transient temperature, and such a reaction. This method and heating furnace may be appropriately applied, in order to c...  
JP2004306140A
To provide a solder reflow oven capable of extending the distance that a workpiece is heated to solder reflow temperatures without interference of the workpiece with the oven in an upstream side and a downstream side.The solder reflow ov...  
JP2004532179A
Although a commercial combustion auxiliary component generally consists of Kyn Aoishi, 溶融 silica, or Si/SiC, these instruments can satisfy a demand only by the state where could not satisfy the demand on high temperature and mechanic...  
JP2004262751A
To provide a method of manufacturing a setter for firing a ceramic core used for the casting of molten metal to scarcely deform.A green ceramic setter is formed by molding a mixture containing ceramic particles and a binder, Next, the gr...  
JP2004263888A
To provide an inexpensive setter having superior durability.This setter is used when baking an electronic part. A leg 2 projecting to the upper surface side and the under surface side of a flat plate 1 composed of a flat refractory is ar...  
JP2004253665A
To provide a wafer holder for a semiconductor manufacturing apparatus wherein the thermal uniformity of the wafer holding surface of a wafer holder having a wafer mounting surface is improved, and to provide a semiconductor manufacturing...  
JP3545475B2
PURPOSE: To provide a shutter device which has better sealability and simply meets a material to be treated. CONSTITUTION: A shutter strip 1 has a projection line 11 on one end side thereof, a groove part 12 on the other end side thereof...  
JP2004197959A
To provide a shelf board for a kiln for pottery capable of eliminating unevenness of reduction gas to achieve favorable result of baking in a case of reduction baking in an electric kiln, and favorably eliminating deviation of inner temp...  
JP2004163095A
To provide a serial-type kiln formed by connecting single kilns (units) to correspond to the amount of burned products and burning time, wherein the burning temperature of the burned products in the kiln are adjusted by a shielding plate...  
JP2004516127A
The method and equipment for heat-treating two or more samples simultaneously are indicated. When an assembly distributes sample material to a career and a set of process chambers by which fluid 連通 sushi て配置 was carried out wit...  
JP2004505175A
The equipment for heat-treating the cutting tool (12) by the present invention, The tool holder (14) in the inside of a furnace (2) and the furnace (2) which accepts the 1st portion of a cutting tool (12) in inside is included, The 2nd p...  
JP2004051469A
To provide a method for operating a microwave heating furnace which does not deform nor crack a workpiece in heating and calcining the workpiece by using microwaves, and a placing table for the workpiece.The operating method for the micr...  
JP3494757B2
PURPOSE: To prevent the oxidization of copper, printed as a wiring, upon heating a print substrate made of ceramic. CONSTITUTION: A hot plate 4 is constituted of a plurality of divided bodies 4a, 4b, 4c and a plurality of passages 8 are ...  
JP2004037044A
To provide a vacuum heating furnace for a FPD capable of heat treatment of a board as even as possible and having excellent productivity.A plurality of plate-like heaters 22 are provided between a plurality of boards 16, which are suppor...  
JP2004502164A
The method and equipment for simultaneous heat treatment of two or more samples are indicated. When a sample processing unit distributes sample material to the process chamber group arranged by 連通 (ing) with an initiative pipe, it of...  
JP3475499B2
PURPOSE: To provide a belt type continuous heat treatment furnace, capable of miniaturizing the constitution of the whole of furnace and capable of applying sudden temperature change, necessitated practically, on a work to be treated. CO...  
JP3469746B2
To obtain an alumina porous carrier capable of being rapidly sintered and having uniform physical properties by introducing an alumina molded product comprising alumina powder and an inorganic binder into a roller hearth kiln and subsequ...  
JP2003535214A
(57) Nickel base alloy for high temperature heat treatment metal goods which requires super-low crush and a metal loss rate under oxidization and a nitriding atmosphere for, such as an inside of a summary wire mesh belt, the thermo coupl...  
JP2003317912A
To protect any magnetic circuit of an inducing means and an electromagnetic induction heating apparatus by providing a gas sealing and vacuum sealing chamber with electrical insulation (in other words, transmissive against a magnetic flu...  
JP2003289048A
To provide a deformation preventing jig of a silica glass reactor core pipe for heat treatment capable of lengthening the life of the silica glass reactor core pipe even if being thin in thickness, and reducing heat treatment costs.This ...  
JP2003285312A
To provide a drying method for a honeycomb molded object reducing the bending of the honeycomb molded object or the deformation of the cross-sectional shape of the honeycomb molded object.The honeycomb molded object has outer peripheral ...  
JP2003528985A
According to a known method for producing a component by means of a powdery starting material, powder is mixed with auxiliaries comprising binding agents, whereby a free-flowing mass is produced. A green body is produced from the mass by...  
JP3451916B2
To provide a bright annealing furnace in which atmospheric gas surely penetrates into the inner surface of a material and decarburization can effectively be prevented and also, the uniform quality product can be obtd., by forming the sui...  
JP2003267548A
To solve problems that a flaw or dirt are generated on glass substrate if the glass substrate moves a little and that organic gas re-adheres on the glass substrate due to insufficient discharge of organic gas generated during burning in ...  
JP3447898B2
To obtain a reaction chamber which is capable of distributing radiant heat and a reactive gas flow uniformly over the surface of a wafer and ensuring the wafer of an irreducibly minimal space by a method wherein a reaction chamber main b...  
JP2003243145A
To provide a high-temperature microwave oven easily made large-scale with microwave as heat source and a support and a shelf board member for use in it.With the high-temperature microwave oven using microwave as a heating source, an obje...  
JP2003227686A
To provide a rotary heat treat furnace which simultaneously heat treats objects to be treated of different heat treatment conditions.The rotary heat treat furnace heat treats objects to be treated placed on a hearth as continuously rotat...  
JP2003194467A
To provide a heat equalizing treatment device for a heat treated body with high heat equalizing accuracy and high cleanness.A heat treatment device for applying heat equalizing treatment to a heat treated body 12 has a heat treatment fur...  
JP2003073728A
To enable a holder for heat treatment to be in service for a long term, by eliminating or extremely reducing deformation due to thermal strain, and to enable the work to be effectively heat treated by reducing thermal energy absorption o...  
JP2003073794A
To provide a heat-resistant coated member which has satisfactory heat resistance, corrosion resistance, and non-reactiveness, and is effectively used for sintering or heat-treating metal or ceramic under vacuum, an inert atmosphere or a ...  
JP3378241B2
To provide a vertical heat treatment apparatus that can prevent a substrate retention tool from falling down not only during standby and loading and unloading into a reaction pipe, but also during treatment in the reaction pipe, and to p...  
JP2003045866A
To provide a heat treating method and a small heat treatment system of a work in which increase in the number of samples is suppressed, hour by productivity is high in an analytic system, contamination on sample is suppressed and uniform...  
JP3373312B2
PURPOSE: To provide kiln furniture made of oxide-containing SiC, in which various characteristics such as anti-spalling, anti-oxidation and anti-creep are well balanced. CONSTITUTION: 0.01 to 0.7wt.% V2O5, 0.01 to 0.7wt.% CaO and 0.01 to...  
JP2003026482A
To provide porous refractories which are the porous refractories to be used as trays in firing the fired matter and have good air permeability, excellent thermal impact resistance and the strength capable of withstanding the weight of fi...  
JP2003021468A
To obtain a heat treatment furnace in which even a part of a planar article being supported by an article support can be heated or cooled similarly to other parts.A planar article 5 placed in a furnace is supported by an article receiver...  
JP3364223B2  
JP2003500329A
(57) Summary book invention relates to the manufacture of a silica glass type material based on glass 破細 used for outside finish of a building and a structure and inner side finish, and a floor, in order to manufacture an ornament pa...  

Matches 401 - 450 out of 1,168