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Patent Searching and Data


Matches 451 - 500 out of 5,862

Document Document Title
WO/2011/090899A1
Implementing a portable articulated arm coordinate measuring machine includes receiving a first request to perform a function. The portable AACMM includes a manually positionable articulated arm portion having opposed first and second en...  
WO/2011/089658A1
A holding unit fixes a body which is to be inspected and is integrally constituted with a jig. An inspecting unit detects radiation which has passed through the body to be inspected or the jig and generates a transfer image. A shift quan...  
WO/2011/077644A1
Disclosed is a pattern measuring apparatus which can identify the kind of a gap formed in a manufacture process having a plurality of exposure steps, such as SADP, with high accuracy and high throughput. Specifically disclosed is a patte...  
WO/2011/072040A2
A high speed miniature tera- and gigahertz electromagnetic radiation on-chip spectrometer that comprises a tunable solid state 2D charge carrier layer or a quasi 2D charge carrier layer with incorporated single or multiple defects, at le...  
WO/2011/068887A2
In one aspect, the present invention provides an imager, preferably portable, that includes a source of electromagnetic radiation capable of generating radiation with one or more frequencies in a range of about 1 GHz to about 2000 GHz. A...  
WO/2011/068056A1
Provided is a technique for a wafer inspection conducted by simple operation, which is useful even when the inspection covers a variety of items and the inspection items are changed frequently with time like in a start-up period of a sem...  
WO/2011/062494A1
The invention relates to a method for making a numerical three-dimensional model of a structure from relatively soft and relatively hard parts, comprising of: making by means of penetrating radiation a plurality of numerical sections of ...  
WO/2011/052130A1
Disclosed is a protrusion detection device that that detects a protrusion (305) on the surface (300) of a traveling metal object. Said protrusion detection device is provided with: a transmission antenna (23) that radiates electromagneti...  
WO/2011/052339A1
Disclosed is a pattern dimension measurement method with minimal measurement error and excellent repeatability even if a shift in focus occurs. Also disclosed is a charged particle beam microscope used in the same. The method measures pa...  
WO/2011/052070A1
Provided are pattern measuring apparatus and a pattern measuring method by which influences of SEM image noise and edge roughness are reduced and the corner shape of a pattern can be highly accurately measured. The pattern measuring appa...  
WO/2011/048758A1
Provided is a pattern matching method and a pattern matching apparatus, wherein the degree of matching between a template and the actual image upon template matching is maintained at a high level, without depending on a partial projectio...  
WO/2011/021346A1
Provided are a pattern shape estimation method and a pattern measuring device which are capable of more appropriately estimating pattern shapes. Under different conditions, multiple pattern cross-sectional shapes are obtained by exposure...  
WO/2011/013317A1
Disclosed is a method wherein a template for template matching is created with high accuracy and high efficiency. With respect to each individual pattern constituting a basic circuit, pattern information regarding a plurality of layers i...  
WO/2011/013650A1
A charged-particle-beam device is characterized in that a template image to be used in template matching is automatically rotated, when conducting an automatic measurement, according to a predetermined procedure, of a pattern that is arr...  
WO/2011/013316A1
Proposed are a pattern shape selection method and a pattern measuring device whereby it is possible to appropriately estimate the shape on the basis of comparison between actual waveforms and library data. As an illustrative embodiment o...  
WO/2011/013342A1
Disclosed is a pattern evaluation device which determines the irregularities of the surface of a sample and measures the dimension thereof using the parallax induced by a beam tilt, wherein the amount of an astigmatic difference or the a...  
WO/2011/007516A1
A panorama image synthesis technique is a technique in which an evaluation point (EP) covering a wide-range area of a semiconductor pattern is divided into a plurality of segmental evaluation points (SEPs) and a group of images of the SE...  
WO/2011/004533A1
Provided is a charged particle beam device which achieves a great increase in throughput by eliminating the positional displacement of an object to be observed by suppressing the change of expansion/contraction of a specimen that is the ...  
WO/2011/001967A1
An image of the joint portion of a circuit pattern manufactured using a design pattern for double patterning is read out, and a target boundary line and an evaluation region are set (701, 711, 721) on the image. In the evaluation region,...  
WO/2011/001635A1
Provided are a semiconductor inspection device and a semiconductor inspection method such that in a specimen image in a single field of view obtained by an electron microscope, it is possible to suppress variations in the edge position m...  
WO/2010/144936A1
The invention relates to a method and a device (1) for calculating a surface (3') of a filling material (4) of a container (7), comprising an antenna unit (27), which comprises a plurality of antennas (9) arranged in a housing (7), in pa...  
WO/2010/140649A1
A charged particle beam device has a problem that charged particle beams deflect due to a disturbance in the symmetry of equipotential distribution in the vicinity of the outer peripheral edge of a sample to be evaluated. Electrode plate...  
WO/2010/137586A1
Disclosed is a scanning electron microscope device enabling the FOV (Field Of View) to be efficiently set. Using device shape information (including circuit design data and layout design data) that CAD data includes, a plurality of FOVs ...  
WO/2010/135769A1
An instrument is described for measuring the thickness of a paint coating on a rotating roll of a roll coating applicator roll for determination of the thickness of a paint coating to be applied to a moving substrate comprising: sensor m...  
WO/2010/135768A1
An instrument for measuring volume solids of a paint sample is described, the instrument comprising: sensor means arranged to emit and detect signals reflected from the surface of the paint sample on a substrate, for generating data sets...  
WO/2010/135770A1
There are provided instruments for measuring and/or controlling the thickness of a coating applied to a substrate. An instrument embodied by the invention comprises coating removal means for removing a quantity of the coating to partiall...  
WO/2010/137267A1
Provided is a method of manufacturing a template matching template, as well as a device for manufacturing a template, by both of which high matching accuracy can be stably ensured without being affected by factors such as process variati...  
WO/2010/135212A1
A novel method of characterizing laser drilled boreholes is disclosed. The method uses x-ray microscopy for dimensional characterization. The x- ray output may be processed to control manufacturing equipment in automated production syste...  
WO/2010/131763A1
An electromagnetic wave measuring apparatus comprises: an electromagnetic wave detector (4) that outputs electromagnetic waves and detects electromagnetic waves having passed through a measured object (1); a scanning stage (6) that chang...  
WO/2010/131665A1
Disclosed is a method and device for accurately analyzing the layer structure of a multilayer body using an X-ray reflectance method. The method for analyzing the layer structure of a multilayer body using an X-ray reflectance method is ...  
WO/2010/128992A1
The present invention relates to a dual energy X-ray apparatus and method for osteoporosis assessment and monitoring. The present invention takes a bone densitometry reading of a patient's wrist to assess osteoporosis and monitor bone lo...  
WO/2010/119641A1
Provided are a pattern measuring apparatus and a computer program which determine whether a gap formed in a sample (201) is a core gap (211) or a spacer gap (212). The secondary electron profile of the sample (201) is acquired, the featu...  
WO/2010/119844A1
Disclosed are a surface microstructure measuring method enabling accurate measurement of the microstructure of a surface and evaluation of the three-dimensional structural features, a surface microstructure measuring program, and an X-ra...  
WO/2010/112277A1
The invention relates to a network analyser with an n-port network having at least two ports (T1, T2) for measuring the wave parameters of a measurement object (M), wherein each port (T1, T2) has a feed for a radio-frequency signal from ...  
WO/2010/095392A1
Provided is a sample observing method wherein the effect on throughput is minimized, and a pattern profile can be obtained at high accuracy even in a complicated LSI pattern, regardless of the scanning direction of an electron beam. In t...  
WO/2010/094139A1
In a first aspect, some embodiments of the invention provide a system for measuring the level of a plurality of phases of a conductive or semi-conductive mixture in a vessel, the system comprising: a vessel configured to hold a conductiv...  
WO/2010/091015A1
One embodiment of the invention includes a system for measuring at least one thermal property of a material. The system includes a thermal source configured to generate an incident thermal wave that propagates through a medium and is pro...  
WO/2010/087149A1
A charged particle beam device enabling prevention of degradation of reproducibility of measurement caused by an increase of the beam diameter attributed to an image shift and having a function of dealing with device-to-device variation....  
WO/2010/082477A1
Provided is a charged beam device wherein the accuracy of an automatic focus/astigmatism correction is improved, and an accurate image of a sample surface pattern can be obtained.The charged beam device is comprised of an electron gun ...  
WO/2010/076874A1
In an examining apparatus or method, values of thickness and characteristic of an object, or distributions thereof can be simultaneously acquired. The examining apparatus includes a portion 9 for irradiating an object 2 with radiation, a...  
WO/2010/077407A2
A thin film measurement technique is disclosed. The thin film measurement technique comprises radioisotopes, radiation detectors, mechanical hardware, electronics and/or circuitry, wires, cables, connectors, measurement software, and a c...  
WO/2010/073360A1
Provided is a pattern measuring apparatus and a pattern measuring method which can correctly measure the length of a pattern even if the width of an edge portion of the pattern is narrower than a beam diameter. The pattern measuring appa...  
WO/2010/073478A1
A charged particle radiation device wherein the position or the size of a FOV can be easily determined even if a number of measuring points are provided on a sample, and an image capturing condition determining method using the charged p...  
WO/2010/070815A1
Provided is a scanning electron microscope including: an image storage unit (112) which stores a plurality of acquired frame images; a correction calculation processing unit (113) which calculates a drift amount between frame images and ...  
WO/2010/067491A1
Disclosed is a semiconductor wafer testing apparatus that resolves the following problems which arise when semiconductor wafers become larger: (1) complexity of stage acceleration/deceleration control; (2) throughput reduction; and (3) i...  
WO/2010/061516A1
Provided are an image formation method and a charged particle beam device which can accurately measure a plurality of objects to be measured and contained in an image by executing a small number of scans. For this, a scan line is set in ...  
WO/2010/056434A1
A system and method for measuring a thickness of a refractory wall of a gasifϊer using electromagnetic energy is disclosed. The system includes a waveguide with a bistatic or monostatic phased array antenna at one end. The waveguide is ...  
WO/2010/052855A1
Provided is a technology of performing more highly accurate semiconductor inspection by detecting a pattern edge which does not contribute as a mask in an etching step and measuring a pattern without including such edge at the time of ca...  
WO/2010/052840A1
Provided is a standard member for performing highly precisely a magnification calibration to be used in an electronic microscope. A plane direction (110) or (100) silicon substrate containing a magnification calibration pattern composed...  
WO/2010/048914A1
The invention relates to a positioning device for analyzing a double seam cross-section and the double seam pleat formation using X-rays, comprising an X-ray source, having a first stop associated therewith for a can to be analyzed in th...  

Matches 451 - 500 out of 5,862