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JP2011064518 |
To noncontactly and simply calculate a calorie of an object to be heated, and simply manage a calorie value in a heating apparatus.The heating apparatus includes: an object to be heated calorie calculating means 12 for noncontactly detec...
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JP2011059000 |
To provide a radiation thickness meter improved in measurement accuracy by correcting an error caused by vertical movement of a measuring object without installing a new facility.This radiation thickness meter includes: a C-type frame 1d...
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JP2011053064 |
To measure a distribution including a density and a dielectric constant due to a moisture content in addition to a distribution of the irregularities on a surface of a wood to be measured, and measure the distribution of the dielectric c...
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JP2011053192 |
To provide a device and method for measuring an electrostatic latent image, capable of measuring charge distribution or potential distribution occurring on the surface of a photoreceptor at high resolution of micron order, and to provide...
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JP2011043343 |
To provide a method and apparatus which measures the thickness of slag only by a microwave level gauge.The method for measuring the thickness of slag floating on molten iron within a blast furnace performs microwave transmission/receptio...
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JP2011043458 |
To solve the problem in a conventional method, wherein size measurement on the same spot is not easy to be performed by a length-measuring SEM (scanning electron microscope) and an AFM (atomic force microscope) hitherto, though, in order...
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JP2011040217 |
To solve the following problem: it is hitherto impossible for an electron microscope to perform observation of a sample from a plurality of directions at a time, so that, in order to find a three-dimensional shape of a sample, several me...
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JP2011038811 |
To enter into consideration of an influence of pattern density/position near a pattern to be measured, in a process of estimating a cross-sectional shape of the pattern by matching a SEM signal waveform of the pattern, with a library cor...
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JP2011040772 |
To provide a system for aiding a user to set a profile and variation thereof.The system includes incorporation of an image 42 of a known object, and superposition of a presumed profile 20 on the image automatically or by hand. The presum...
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JP2011039014 |
To provide a battery inspection device capable of inspecting the positional deviation of an electrode plate, even for a high-capacity stacked-type battery.The battery inspection device for inspecting positional deviation of an electrode ...
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JP2011033619 |
To enable a surface profile of a charge which is inserted in a blast furnace to be measured in a plana shape, and to enable introductory operation during the profile measurement quickly capable of the introductory operation to be operate...
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JP2011033422 |
To provide an inspection device and an inspection method having high reliability by acquiring a position relation between mutual probes and between a sample and a probe for characteristic evaluation of a miniaturized device.This inspecti...
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JP2011032853 |
To provide a method for surveying an internal damaged part of pavement quantitatively and speedily in a non-destruction manner.In this non-destruction survey method for the internal damaged part of pavement, a survey by an electromagneti...
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JP2011033794 |
To provide an image evaluation device and an image evaluation device for evaluating an electrostatic latent image formed on a photoreceptor, by measuring time variation of an optical output from a laser source to evaluate the performance...
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JP2011033423 |
To provide a pattern shape selection method and device, estimating a proper shape, when estimating the shape based on comparison between actual waveforms and library data.As one embodiment, proposed is a method and device wherein a libra...
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JP2011027514 |
To provide a profile measuring device which can accurately estimate the profile of an object in a short period of time.The profile measuring device includes an oscillating circuit 122 for generating a plurality of carrier waves, a plural...
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JP2011027526 |
To provide a strain measuring means capable of measuring consistently each strain each having a scale level without changing a sample.Following means are used, wherein this pattern for strain measurement is formed on a sample surface for...
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JP2011029031 |
To solve a problem, wherein since a conventional charged particle beam device premises to observe or measure a plurality of elements repeatedly arrayed in a lattice shape, a template is required to be registered for every viewpoint or me...
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JP2011022024 |
To clearly observe a bottom surface of a concave pattern of an insulating film having the concave pattern and a convex pattern.The pattern observation method observes a pattern 1 having a line pattern 2 and a space pattern 3, formed on a...
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JP2011023273 |
To enable to decide a Segmental Evaluation Point (SEP) in which the entire image is connected even with less patterns as a clue for connection, or enable to decide the SEP satisfying as many items demanded by a user as possible even if s...
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JP2011021910 |
To provide a layer height level detector for inhibiting an effect due to heat within an industrial furnace, and an effect on the detection accuracy due to attached dust, and the industrial furnace.The layer height level detector for dete...
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JP2011017569 |
To provide a charged particle beam device with its throughput substantially improved through the elimination of displacement of an observing object by preventing a change in expansion/contraction of a sample which is the observing object...
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JP2011013194 |
To provide a charged particle beam device generating precisely and automatically a recipe for reinspection for executing reinspection, in the CD inspection of a photomask where a large number of measuring points exist.The charged particl...
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JP2011013022 |
To provide a pattern shape evaluation method and apparatus which can realize accurate and rapid pattern shape evaluation.An image of a joint of a circuit pattern manufactured using a design pattern for double patterning is read, and a ta...
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JP2011013196 |
To provide a charged particle beam device of a critical-dimension measuring scanning electron microscope (CD-SEM) or the like, measuring accurately a pattern dimension on a photomask for nanoimprint by a retarding voltage application sys...
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JP2011007727 |
To provide a method and apparatus for acquiring a corrosion image, capable of reducing the dose of radiation and performing corrosion investigation in a simple way and with equivalent accuracy to conventional accuracy.The corrosion image...
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JP2011007581 |
To provide a size analysis program accurately determining parameters such as a correlation distance and variance required to evaluate the roughness of a pattern of a semiconductor device by using a size measurement apparatus such as a sc...
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JP2011007757 |
To solve the problem wherein, when imaging ranges corresponding to an imaging point overlap, the quality of an image imaged on an evaluation point is deteriorated.Existence of overlapping between imaging ranges in a charged particle beam...
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JP2011002434 |
To provide a nozzle, through which a gas for inhibiting adhesion of suspended matter to a target surface is sprayed, with a reduction in installation space perpendicular to the target surface.The shape of a slit nozzle 41b is determined ...
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JP2011002241 |
To provide a small and inexpensive device and a method of measuring profile of burden in blast furnace, the device and method not affected by high-density powder dust in a blast furnace even in the large-scale blast furnace and allowing ...
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JP2010286409 |
To provide an X-ray inspection device for automatically resupplying articles to be reinspected, while keeping an increase in installation space to a minimum.The X-ray inspection device 1 includes: a belt conveyor 6 having a domain 6P for...
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JP2010286380 |
To provide a method and an apparatus for simply and quantitatively measuring a micropore of a porous body, especially of a gas diffusion layer or a catalyst layer of a solid polymer fuel cell.The micropore measuring method includes the s...
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JP2010286405 |
To provide an X-ray transmission inspection apparatus and an X-ray transmission inspection method capable of clearly discriminating only the contrast caused by foreign matter to prevent over-detection and false detection.The X-ray transm...
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JP2010282825 |
To solve the problem that a charged particle beam device is involved in such a trouble near the outer peripheral edge of a sample as an evaluated object that the symmetry of equipotential distribution is disturbed to deflect charged part...
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JP2010276587 |
To provide a detecting device which can obtain conditions near the apex of an linear conductor even if there is no observation space near the apex thereof.The detecting device 100 detecting discharge conditions of liquid at the apex of a...
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JP2010276382 |
To easily determine a position at which an FOV (that is, an evaluation point (EP)) including a device having electric characteristics should be arranged in order to verify finished accuracy required for circuit operation.From device shap...
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JP2010276487 |
To provide a template creating method for template matching, stably securing high matching accuracy without depending on process variations etc. and also to provide a template creating apparatus.In the method and apparatus for creating a...
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JP2010276504 |
To detect an edge of an inspection object pattern without using information on the inspection object pattern.Edge points of a pattern are detected from an image of the inspection object pattern, and a plurality of edge lines are generate...
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JP2010271228 |
To provide a reference member for calibrating a dimension of an electronic microscope device, the reference member suppressing deposition of contamination and having a microscopic reference dimension.The reference member for calibrating ...
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JP2010249587 |
To attain specifying the type of a gap formed in a manufacturing process, having a plurality of exposure processes, at a high throughput.A pattern measuring apparatus and a computer program are proposed for extracting the feature quantit...
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JP2010249691 |
To provide a creation method of a calibration curve, in which a calibration curve of an X-ray detector showing the relationship between the thickness of an object to be measured and an output value is inexpensively created with high accu...
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JP2010249785 |
To provide a nondestructive inspection method appropriately detecting the remaining wall thickness of an object to be inspected.An object to be inspected such as a pipe 10B having a prescribed thickness is irradiated with γ rays E 0 in ...
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JP2010243361 |
To provide a radiographic inspection device capable of highly accurate surface shape analysis, such as, detection of cracks in reactor structures, even if the surface is covered with a clad, or the like.The radiographic inspection device...
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JP2010243364 |
To provide an X-ray defect inspection device for determining normality/abnormality of inspection objects by determining the size or the volume from radiographic images of the inspection objects, capable of accurately inspecting each insp...
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JP2010230686 |
To provide a method useful for measuring topographical features of a substrate.A coating method of the substrate for activating gas using an electron beam is disclosed. The coated substrate is then sliced using an ion beam to clarify res...
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JP2010217182 |
To provide a measuring stand which holds a measuring probe and its electric control method, especially suitable for measuring thickness of thin layer.The system includes a displacement member (23) which holds a supporting part (24) holdi...
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JP2010217127 |
To measure warping without destructing a package, on a plurality of respective monocrystal substrates stored in the package by being mutually laminated.A method includes: a step of irradiating the package with an X-ray; a step of selecti...
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JP2010197262 |
To provide a film evaluation method and a method for manufacturing a ferroelectric memory for accurately measuring a thickness or the like of a thin film with considerable unevenness on a surface by means of the X-ray reflectivity method...
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JP2010175249 |
To provide a method and a device for measuring the height of a sample which enables measurement of the height (depth) of a pattern having a large aspect ratio.In the method and the device proposed herein as one mode for attaining the obj...
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JP2010175318 |
To provide a charged particle beam apparatus which has the function of preventing deterioration in measurement reproducibility caused by an increase in a beam diameter by an image shift to cope with the occurrence of a machine difference...
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