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WO/2012/014356 |
Beforehand, the device characteristic parameters of each critical dimension SEM are measured, the cross-sectional shapes of an object to undergo dimension measurements are estimated by a model-based library (MBL) matching system, dimensi...
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WO/2012/014363 |
The present invention relates to a device (303) for setting image acquisition conditions for charged particle beam devices or the like. An image integration unit (402) forms a plurality of images with a number of different integrations (...
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WO/2012/014935 |
When the electrical characteristics of an inspection target are measured, higher magnification and higher resolution of an SEM image and real time performance are realized without affecting the electrical characteristics of the inspectio...
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WO/2012/008021 |
Disclosed is a measurement device that can accurately measure size, position, the presence of an object, and the like by means of a simple and low-cost method. Specifically, disclosed is a measurement device that is provided with: a tran...
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WO/2012/001867 |
Disclosed is a semiconductor inspecting apparatus which is provided with an inspecting unit, a detecting unit, and a processing unit, which processes an image on the basis of reflection light detected by the detecting unit, and which ins...
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WO/2011/158239 |
A system and method are presented for use in inspection of patterned structures. The system comprises: data input utility for receiving first type of data indicative of image data on at least a part of the patterned structure, and data p...
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WO/2011/159264 |
This invention is about a method for measuring the thickness with electron microscopes using energy dispersive X-ray spectrometer. A spectrum of X-rays resulting from the interaction of the coated substrate to be investigated with an ele...
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WO/2011/151530 |
Method and device for measuring the thickness of a coating layer of material on a running strip, whereby a quantity representative of the thickness of the coating layer is measured, using an eddy current sensor, on at least one region of...
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WO/2011/151585 |
Process and device for measuring the thickness of a layer of coating material of a running strip according to which a quantity representative of the thickness of the coating layer is measured, using an eddy-current sensor, for at least o...
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WO/2011/148975 |
Disclosed are an image processing device and a charged particle beam device that either measure or assess distortion within a field of view rapidly and precisely. To achieve the objective, an image processing device is provided that acqu...
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WO/2011/145338 |
Disclosed is a method for more precisely measuring the dimension of a pattern inclined with respect to the image of the pattern of an object to be inspected. The method comprises: a step (S1001) for detecting the auxiliary dot sequence i...
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WO/2011/142768 |
The present invention is directed to an inspection system that has a radiation source, a detector array, an inspection region, and a processing unit, where the processing unit a) obtains a radiographic image, b) segments the radiographic...
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WO/2011/138882 |
Disclosed is a template matching processing device which is capable of calculating a corresponding coincidence degree in template matching between a design image and a captured image, even in the case where a shape change is great. In th...
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WO/2011/138093 |
The invention relates to the determination of the sag or deformation of a rotor blade of a wind turbine and is based on the combination of active radio direction-finding and an inertial sensor system. A phased-array antenna is fastened t...
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WO/2011/139473 |
An area detector used in a two-dimensional system is used as a point detector in Bragg-Brentano and other geometries by providing the area detector with a mask the limits the area through which X-rays can enter the detector. Secondary X-...
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WO/2011/139473 |
An area detector used in a two-dimensional system is used as a point detector in Bragg-Brentano and other geometries by providing the area detector with a mask the limits the area through which X-rays can enter the detector. Secondary X-...
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WO/2011/118745 |
Disclosed is an image processing technology, whereby rotation of an observation image of a sample can be accurately detected. The image processing apparatus indirectly corrects a rotation shift between the measured image data and referen...
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WO/2011/114644 |
Disclosed are an image generating method and device such that a high-resolution SEM image is obtained while suppressing damage caused by SEM imaging to a sample as a result of irradiation of an electron beam in relation to image pick-up ...
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WO/2011/116274 |
A method of generating a density enhanced model of an object is described. The method includes generating a customized a model of ars object using a pre-defined set of models in combination with at least one projection image of the objec...
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WO/2011/108402 |
Disclosed is a charged particle beam microscope which can obtain information about pattern materials and stereostructure without lowering throughput of pattern dimension measurement. To achieve this, the charged particle beam microscope ...
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WO/2011/099377 |
An analyzing method for deriving phase information by analyzing a periodic pattern of moiré comprises steps of: subjecting at least a part of the periodic pattern of moiré to a windowed Fourier transform by a window function; calculati...
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WO/2011/093436 |
Disclosed is an apparatus for forming an image for pattern matching, which forms a template on the basis of design data, without performing exposure simulation and the like, and which can form the image that corresponds to the size of an...
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WO/2011/090899 |
Implementing a portable articulated arm coordinate measuring machine includes receiving a first request to perform a function. The portable AACMM includes a manually positionable articulated arm portion having opposed first and second en...
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WO/2011/089658 |
A holding unit fixes a body which is to be inspected and is integrally constituted with a jig. An inspecting unit detects radiation which has passed through the body to be inspected or the jig and generates a transfer image. A shift quan...
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WO/2011/090111 |
Disclosed is a contour extraction method aiming to suppress unnecessary contour processing, or, selectively creating contour lines of necessary parts; also disclosed is a contour extraction device. The contour device extracts contour lin...
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WO/2011/089913 |
Disclosed is a scanning electron microscope provided with a calculation device (403) for measuring the dimension of a pattern on a sample (413), characterized in that the amount of change of a pattern shape, caused by electron beam irrad...
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WO/2011/077644 |
Disclosed is a pattern measuring apparatus which can identify the kind of a gap formed in a manufacture process having a plurality of exposure steps, such as SADP, with high accuracy and high throughput. Specifically disclosed is a patte...
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WO/2011/072040 |
A high speed miniature tera- and gigahertz electromagnetic radiation on-chip spectrometer that comprises a tunable solid state 2D charge carrier layer or a quasi 2D charge carrier layer with incorporated single or multiple defects, at le...
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WO/2011/072040 |
A high speed miniature tera- and gigahertz electromagnetic radiation on-chip spectrometer that comprises a tunable solid state 2D charge carrier layer or a quasi 2D charge carrier layer with incorporated single or multiple defects, at le...
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WO/2011/068887 |
In one aspect, the present invention provides an imager, preferably portable, that includes a source of electromagnetic radiation capable of generating radiation with one or more frequencies in a range of about 1 GHz to about 2000 GHz. A...
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WO/2011/068887 |
In one aspect, the present invention provides an imager, preferably portable, that includes a source of electromagnetic radiation capable of generating radiation with one or more frequencies in a range of about 1 GHz to about 2000 GHz. A...
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WO/2011/068056 |
Provided is a technique for a wafer inspection conducted by simple operation, which is useful even when the inspection covers a variety of items and the inspection items are changed frequently with time like in a start-up period of a sem...
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WO/2011/066028 |
Wireless strain and displacement sensors wirelessly monitor structural health and integrity, and are made by printing inductor-interdigital capacitor sensing circuits on a variety of substrates, including ceramic substrates, with thermal...
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WO/2011/062494 |
The invention relates to a method for making a numerical three-dimensional model of a structure from relatively soft and relatively hard parts, comprising of: making by means of penetrating radiation a plurality of numerical sections of ...
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WO/2011/052339 |
Disclosed is a pattern dimension measurement method with minimal measurement error and excellent repeatability even if a shift in focus occurs. Also disclosed is a charged particle beam microscope used in the same. The method measures pa...
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WO/2011/052130 |
Disclosed is a protrusion detection device that that detects a protrusion (305) on the surface (300) of a traveling metal object. Said protrusion detection device is provided with: a transmission antenna (23) that radiates electromagneti...
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WO/2011/052070 |
Provided are pattern measuring apparatus and a pattern measuring method by which influences of SEM image noise and edge roughness are reduced and the corner shape of a pattern can be highly accurately measured. The pattern measuring appa...
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WO/2011/048758 |
Provided is a pattern matching method and a pattern matching apparatus, wherein the degree of matching between a template and the actual image upon template matching is maintained at a high level, without depending on a partial projectio...
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WO/2011/021346 |
Provided are a pattern shape estimation method and a pattern measuring device which are capable of more appropriately estimating pattern shapes. Under different conditions, multiple pattern cross-sectional shapes are obtained by exposure...
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WO/2011/013317 |
Disclosed is a method wherein a template for template matching is created with high accuracy and high efficiency. With respect to each individual pattern constituting a basic circuit, pattern information regarding a plurality of layers i...
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WO/2011/013342 |
Disclosed is a pattern evaluation device which determines the irregularities of the surface of a sample and measures the dimension thereof using the parallax induced by a beam tilt, wherein the amount of an astigmatic difference or the a...
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WO/2011/013650 |
A charged-particle-beam device is characterized in that a template image to be used in template matching is automatically rotated, when conducting an automatic measurement, according to a predetermined procedure, of a pattern that is arr...
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WO/2011/013316 |
Proposed are a pattern shape selection method and a pattern measuring device whereby it is possible to appropriately estimate the shape on the basis of comparison between actual waveforms and library data. As an illustrative embodiment o...
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WO/2011/007516 |
A panorama image synthesis technique is a technique in which an evaluation point (EP) covering a wide-range area of a semiconductor pattern is divided into a plurality of segmental evaluation points (SEPs) and a group of images of the SE...
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WO/2011/004533 |
Provided is a charged particle beam device which achieves a great increase in throughput by eliminating the positional displacement of an object to be observed by suppressing the change of expansion/contraction of a specimen that is the ...
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WO/2011/001635 |
Provided are a semiconductor inspection device and a semiconductor inspection method such that in a specimen image in a single field of view obtained by an electron microscope, it is possible to suppress variations in the edge position m...
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WO/2011/001967 |
An image of the joint portion of a circuit pattern manufactured using a design pattern for double patterning is read out, and a target boundary line and an evaluation region are set (701, 711, 721) on the image. In the evaluation region,...
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WO/2010/144936 |
The invention relates to a method and a device (1) for calculating a surface (3') of a filling material (4) of a container (7), comprising an antenna unit (27), which comprises a plurality of antennas (9) arranged in a housing (7), in pa...
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WO/2010/140649 |
A charged particle beam device has a problem that charged particle beams deflect due to a disturbance in the symmetry of equipotential distribution in the vicinity of the outer peripheral edge of a sample to be evaluated. Electrode plate...
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WO/2010/135769 |
An instrument is described for measuring the thickness of a paint coating on a rotating roll of a roll coating applicator roll for determination of the thickness of a paint coating to be applied to a moving substrate comprising: sensor m...
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