| Document |
Document Title |
|
WO/2019/194305A1 |
A scanning electron microscope system comprising: a primary electron beam radiation means that radiates a primary electron beam at a first pattern on a substrate that has a second pattern formed at a peripheral region of the first patter...
|
|
WO/2019/194304A1 |
An electron microscope device having: a detection part that detects reflected electrons which have reflected from a sample that has been irradiated with primary electrons emitted from a primary electron generation part (an electron gun);...
|
|
WO/2019/191335A1 |
Multilayer targets enabling fast and accurate, absolute calibration and alignment of X-ray based measurement systems are described herein. The multilayer calibration targets have very high diffraction efficiency and are manufactured usin...
|
|
WO/2019/188258A1 |
This method is for generating a correction line indicating the relationship between the amount of separation between a wafer pattern edge and reference pattern edge and the width of a space adjacent to the reference pattern edge. The met...
|
|
WO/2019/180760A1 |
The present invention proposes a pattern measurement tool characterized by being provided with: a charged-particle beam sub-system having a tilt deflector; and a computer sub-system which is connected to the charged-particle beam sub-sys...
|
|
WO/2019/173944A1 |
Disclosed is a clinometer, comprising a displacement sensor, a flexible string or an elastic rod (32), and a weight (31). The weight (31) is fixed at the bottom of the flexible string or the elastic rod (32) and is located in a body of t...
|
|
WO/2019/175143A1 |
The invention relates to a method for correcting measurement errors in the imaging of an analysis object by means of computed tomography (CT) in the form of a reconstructed volume of the analysis object, comprising the steps: a) measurin...
|
|
WO/2019/173170A1 |
A semiconductor metrology tool inspects an area of a semiconductor wafer. The inspected area includes a plurality of instances of a 3D semiconductor structure arranged periodically in at least one dimension. A computer system generates a...
|
|
WO/2019/166085A1 |
The general field of the invention is that of computer-implemented methods for identifying mechanical parameters of an object subject to mechanical stress. The method according to the invention comprises a step of acquiring, by an imagin...
|
|
WO/2019/168139A1 |
Provided is a device for measuring a surface profile of a charged material in a blast furnace, the device including an outer member inserted into an insertion hole formed in a sidewall of the blast furnace such that a transmission openin...
|
|
WO/2019/136189A1 |
Methods and systems for measuring structural and material characteristics of semiconductor structures based on combined x-ray reflectometry (XRR) and x-ray photoelectron spectroscopy (XPS) are presented herein. A combined XRR and XPS sys...
|
|
WO/2019/113997A1 |
Disclosed is a Micro-CT-based method for measuring the flow velocity of assimilation products of a Rosaceae crop, comprising the following steps: step 1) establishing a Micro-CT-based calculation formula for fibrovascular bundle cross-se...
|
|
WO/2019/108763A1 |
A system and method is disclosed for measuring the dimensions of physical objects. The systems and methods include a measuring instrument of significant length comprising an array of patch antennas arranged along the length of an elongat...
|
|
WO/2019/100119A1 |
A device for testing the structural integrity of a helmet including: an x-ray generator; a space shaped to receive the helmet; and an x-ray detector; wherein the x-ray generator is arranged to eject x-rays through the space; and wherein ...
|
|
WO/2019/103348A1 |
Disclosed are a method for visualizing and measuring the thickness distribution of a paint film layer, and a device therefor. A heating unit applies light beams to heat a measurement target region of a measurement target structure while ...
|
|
WO/2019/094225A1 |
A method and system for estimating a thickness of at least one casing string in a cased hole may comprise obtaining a plurality of induction measurements from a plurality of channels using a casing inspection tool, computing a quality ve...
|
|
WO/2019/094754A1 |
Material loss may be estimated from 2D digital radiographs using double wall single imaging (DWSI) technique using a system for estimation of material loss from 2D digital radiographs comprising one or more calibration samples (10), each...
|
|
WO/2019/094209A1 |
A method and system for determining properties of a pipe string using multi-channel induction measurements. The method may comprise disposing a multi-channel induction tool in a cased hole, obtaining a multi-channel measurement, forming ...
|
|
WO/2019/089686A1 |
An apparatus having a layer of fats, oils and grease (F.O.G) on water includes a tank having an inlet and an outlet. The inlet connects to a source of F.O.G.-laden effluent and the outlet connects to a sewer pipe so that the outlet defin...
|
|
WO/2019/081876A1 |
The invention concerns a method for measuring dimensions of empty glass containers (2) consisting of: - choosing at least one region to be inspected of the container, - transporting the containers, - positioning, to either side of the re...
|
|
WO/2019/081875A1 |
The invention concerns a measurement method consisting in; - acquiring, by means of image sensors (Cji), for each object during the movement of same, at least three radiographic images of the region to be inspected, obtained from at leas...
|
|
WO/2019/079630A1 |
Methods and systems for realizing a high brightness, liquid based x-ray source suitable for high throughput x-ray metrology are presented herein. A high brightness x-ray source is produced by bombarding a rotating liquid metal anode mate...
|
|
WO/2019/073592A1 |
The present invention comprises a computation device for measuring the dimensions of patterns formed on a sample on the basis of a signal obtained from a charged particle beam device. The computation device comprises a positional deviati...
|
|
WO/2019/064293A1 |
A control system for use in measuring one or more parameters of a patterned structure. The control system is configured as a computer system and comprises: an input utility configured to receive input data comprising raw measured TEM ima...
|
|
WO/2019/063185A1 |
The present invention relates to a measuring device for determining the thickness of a dielectric coat on a conductive substrate. The device comprises a resonance cavity for electromagnetic fields, which has a rotationally symmetrical wa...
|
|
WO/2019/051616A1 |
A system for producing a peening process model comprises a peening load modeling module for obtaining models of peening induced loads as a function of a plurality of peening treatments. A peening optimization module obtains models of a c...
|
|
WO/2019/049234A1 |
When calculating a distortion amount in a detection surface 31 of a plane surface detector 3 of X-ray equipment 1, a user first disposes a calibration phantom 10 between a light source 2 and the plane surface detector 3. Then, the attitu...
|
|
WO/2019/038917A1 |
In order to achieve a correction sample and an electron beam adjustment method and an electron beam device using the correction sample, with which a high-precision measurement of an incident angle can be performed, this correction sample...
|
|
WO/2019/038841A1 |
The present invention quantitatively evaluates a crystal growth amount by nondestructive inspection in a wide area from an undergrowth state to an overgrowth state. According the present invention, a plurality of image feature amounts ar...
|
|
WO/2019/035425A1 |
A coated plate material (10) comprising: a base material (11) having as a surface (11a) thereof an uneven area (11P) having uniformly spaced undulations that reflect terahertz waves (L); and a coating layer (12) formed on the surface (11...
|
|
WO/2019/014283A1 |
Methods and systems for performing measurements of semiconductor structures based on high-brightness, polychromatic, reflective small angle x-ray scatterometry (RSAXS) metrology are presented herein. RSAXS measurements are performed over...
|
|
WO/2018/235167A1 |
This position/orientation measurement method is for determining the position and/or orientation of an object of measurement consisting of a metal plate using the following antennas that have been placed on one side of the object of measu...
|
|
WO/2018/229848A1 |
This charged particle beam device is provided with: a storage unit that stores relationship information indicating a relationship between the intensity or the intensity ratio of a charged particle signal and the thickness of a layer disp...
|
|
WO/2018/222613A1 |
Methods and systems for estimating values of process parameters, structural parameters, or both, based on x-ray scatterometry measurements of high aspect ratio semiconductor structures are presented herein. X-ray scatterometry measuremen...
|
|
WO/2018/212037A1 |
A testing device (100) is provided with: an emission unit (110) that emits a terahertz wave (THz) to a sample (S) having a plurality of layers (L) which are layered; a detection unit (130) that detects the terahertz wave from the sample ...
|
|
WO/2018/210501A1 |
The invention relates to a method for determining the external and internal geometry of a component (1) with at least one cavity, wherein - a component (1) to be measured is provided (S1) with at least one cavity, - the external geometry...
|
|
WO/2018/206225A1 |
The invention relates to a computer-implemented method for measuring an object on the basis of a digital representation of the object, wherein the object representation comprises a plurality of image information items for the object. An ...
|
|
WO/2018/206226A1 |
The invention relates to a computer-implemented method for determining a local deviation of a geometry of an object from a target geometry of the object on the basis of a digital representation of the object, wherein the object represent...
|
|
WO/2018/193800A1 |
In order to capture without deficiency the unique spatial distortion of an X-ray CT device and evaluate the three-dimensional shape measuring accuracy of the X-ray CT device, supporting rods 36, 37, 38 having different lengths and each h...
|
|
WO/2018/147929A3 |
Examples of imaging systems are described herein which may implement microwave or millimeter wave imaging systems. Examples described may implement partitioned inverse techniques which may construct and invert a measurement matrix to be ...
|
|
WO/2018/182360A1 |
A thickness measurement apparatus is provided. The thickness measurement apparatus may comprise: a terahertz wave signal processing unit for receiving a terahertz wave according to at least one mode among a reflection mode and a transmis...
|
|
WO/2018/175995A1 |
An apparatus and associated methods for measuring thickness and velocity of flat moving materials utilizing high frequency radar technologies. Two identical radar-based systems for measuring absolute distances between the source of the r...
|
|
WO/2018/154587A1 |
A control system is presented for use in measuring one or more parameters of a three-dimensional patterned structure. The control system is configured as a computer system comprising a data processor configured to receive and process raw...
|
|
WO/2018/156084A1 |
Systems and methods for monitoring plastic deformation of a structural material are provided. An acoustic wave actuator is configured to generate acoustic wave signals to be propagated within the structural material and is in-situ fabric...
|
|
WO/2018/100404A3 |
The present invention relates to a method to determine geometrical parameters of an object under study by means radiography, the object can be described geometrically, wherein intercepts that go through the material of the object under s...
|
|
WO/2018/139413A1 |
In this method for measuring the thickness of water on ice, one surface of the ice is irradiated with a terahertz wave having a frequency of 10 THz or less, the terahertz waves which pass through or are reflected are measured, and the th...
|
|
WO/2018/131101A1 |
In a semiconductor manufacturing process, it is necessary to cut a die close to the edge of a wafer in order to obtain as many dies as possible from one wafer. Accordingly, with respect to a charged particle beam device and an optical ex...
|
|
WO/2018/128988A1 |
Methods and systems for controlling illumination beam spot size for Transmission, Small-Angle X-ray Scatterometry (T-SAXS) measurements of different sized metrology targets are described herein. An X-ray illumination optics subsystem inc...
|
|
WO/2018/119160A1 |
An inspection system can include a handheld inspection device having a meter portion comprising at least two different paint meters, at least one display, at least one processor configured to present paint measuring locations on an inspe...
|
|
WO/2018/108902A1 |
The subject matter of the invention is a method for determining the mother-of-pearl thickness of a pearl, in particular a cultured pearl, comprising a spherical nucleus, mother-of-pearl and possibly at least one cavity, by means of x-ray...
|
