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Patent Searching and Data


Matches 1,151 - 1,200 out of 9,642

Document Document Title
WO/2005/015283A1
According to one exemplary embodiment, a projection objective (100, 200) is provided and includes at least two non-planar (curved) mirrors (M1-M4), wherein an axial distance between a next to last non-planar mirror (M3) and a last non-pl...  
WO2003076978A3
A birefringence correction is incorporated into an optical imaging system for imaging with deep ultraviolet light. Optical elements which exhibit an intrinsic birefringence with deep ultraviolet light are arranged in a fashion that rende...  
WO2004061487A3
An optical system for projection photolithography is disclosed. The optical system is a modified Dyson system capable of imaging a large field over both a narrow and a broad spectral range. The optical system includes a positive lens gro...  
WO/2005/001527A1
Disclosed is a corrective device for compensating disturbances of polarization distribution across the cross-section of a light beam (10). Said corrective device comprises a corrective member (18; 118) encompassing two double-refractive ...  
WO/2005/001557A2
A projection system for making an object appear and disappear to an observer on cue is disclosed. The system remotely activates a reflective axis and a transmissive axis within a polarized window for making an object on cue appear and di...  
WO/2005/001556A2
A real image projection system for making a real image of an object appear or disappear. The real image projection system (8) includes first and second polarizers (10, 20) to control the appearance and the disappearance of the real image...  
WO2004090466A3
An interferometry system for making interferometric measurements of an object (60) , the system including a source assembly (18) that generates an input beam; a detector assembly (70) that includes a detector element; and an interferomet...  
WO/2004/111690A1
The invention relates to a projection lens (10) for a microlithographic projection illumination unit, comprising several groups of serial optical elements, at least one first optical element made from a pure earth alkali metal fluoride c...  
WO/2004/111699A1
The invention relates to a projection objective comprising at least one lens (L1) and intended to transmit a divergent light beam onto a flat screen (SC). A hyperbolically shaped mirror (M1) is oriented so as to receive, on its convex fa...  
WO/2004/111697A1
The invention relates to a small-size and light-weight optical system with an adjustable focal length. The invention relates to a method and system comprising an image plane (203, 303) on which there is formed an image of the target obse...  
WO/2004/107011A1
A projection optical system of reflection/refraction type having an image forming ability thanks to favorable correction of the aberrations such as color aberration and field curvature, having a favorably reduced reflection loss at the r...  
WO2004092801A3
The invention relates to a catadioptric projection lens for reproducing a pattern that is located on the object plane of the projection lens on the imaging plane of said projection lens. The latter comprises an optical axis, a catadioptr...  
WO/2004/107746A1
A power-down determining circuit uses a clock signal applied from a multiplying circuit and horizontal and vertical sync signals applied from a TMDS decoder circuit to calculate horizontal and vertical frequencies, then compares the calc...  
WO/2004/107037A1
A 1X projection optical system for deep ultra-violet (DUV) photolithography is disclosed. The optical system is a modified Dyson system capable of imaging a relatively large field at high numerical apertures at DUV wavelengths. The optic...  
WO/2004/104925A2
The present embodiments provide methods, systems and apparatuses for use in generating a mixed output light beam. In some embodiments, apparatus comprises a mixing cavity (10) and a plurality of injection sources (2,22,32). The mixing ca...  
WO/2004/099842A1
Image display apparatus (50) comprising a curved rear projection screen (54), at least one projector (52), and a curved collimating mirror (66), the curved rear projection screen (54) having a convex side, a concave side, a transparent s...  
WO/2004/097499A1
The invention relates to an imaging system in which a diffractive optical element is used by both the illumination beam path and the imaging beam path. Said diffractive element operates in the reflection mode or transmission mode accordi...  
WO/2004/095137A1
A projection exposure apparatus for transferring an image of a patterned reticle onto a substrate comprises an illu­mination optical system for generating and directing an ex­posure beam onto the reticle, and a projection optical sys­...  
WO2003098350A3
The invention relates to a method for the targeted deformation of an optical element, in particular a mirror (2a, 2b, 2c, 2d, 2e, 2f) that is positioned in an optical system (1). The optical element (2a, 2b, 2c, 2d, 2e, 2f) or a support ...  
WO/2004/092842A1
An optical system, for example a lens for a photolithography tool, includes a group of optical elements (L1, L2) that each comprise a birefringent cubic crystal such as CaF2. The crystal lattices of the crystals have different orientatio...  
WO/2004/092801A2
The invention relates to a catadioptric projection lens for reproducing a pattern that is located on the object plane of the projection lens on the imaging plane of said projection lens. The latter comprises an optical axis, a catadioptr...  
WO2004019128A3
Optical Projection System and Method for Photolithography. A lithographic immersion projection system and method for projecting an image at high resolution over a wide field of view. The projection system and method include a final lens ...  
WO/2004/090466A2
An interferometry system for making interferometric measurements of an object (60) , the system including a source assembly (18) that generates an input beam; a detector assembly (70) that includes a detector element; and an interferomet...  
WO/2004/090582A2
A method of fabricating a catadioptric lens system (600), the method involving: fabricating a single catadioptric lens element having a bottom surface and an upper surface, the upper surface having a convex portion and a concave portion,...  
WO2004003601A3
Techniques for increasing the percentage of light that is transmitted through optical inspection systems (100) that operate in or near the ultraviolet and deep ultraviolet electromagnetic spectrums are described. Along with increasing th...  
WO/2004/090600A2
A catadioptric projection objective for imaging a pattern arranged in the object plane (102) of the projection objective into the image plane (104) of the projection objective has a catadioptric first objective part (105) having at least...  
WO/2004/090601A1
A concentrator having a first surface, a second surface, and a concentrating surface disposed between the first surface and the second surface, the concentrating surface having a first profile which effects concentration of incident radi...  
WO2004051223A3
The present embodiments provide methods, apparatus and assemblies for use in a producing a desired output beam that meets a desired intensity prescription. An apparatus can include an input surface (155), and an optically active output s...  
WO/2004/081628A1
The invention relates to an optical assembly comprising a first optical system (12), a second optical system (16) and an optical imaging assembly (10, 18', 20) comprising at least one toric mirror (10), said assembly being positioned bet...  
WO/2004/079427A1
An optical device for the representation of a central image (10) of an object (1) and at least one lateral image (11, 12, 13, 14) of the same object (1), whereby the length of the real optical path (11, 12, 13, 14) is equal to the length...  
WO2004059990A3
A photon concentrator includes an imaging photon concentrator (13) concentrating photons from a source (70) to an image point (14) and a non-imaging photon concentrator (30). The non-imaging photon concentrator (NIPC) has an entry apertu...  
WO/2004/077104A2
A reduced size catadioptric objective and system is disclosed. The objective may be employed with light energy having a wavelength in the range of approximately 190 nanometers through the infrared light range. Elements are less than 100 ...  
WO2003098349A3
There is provided an illumination system for scannertype microlithography along a scanning direction with a light source emitting a wavelength <= 193 nm. The illumination system includes a plurality of raster elements (5). The plurality ...  
WO/2004/074881A2
A differential interferometric confocal microscope including: a source-side pinhole array; a detector-side pinhole array; and an interferometer that images the array of pinholes of the source-side pinhole array onto a first array of spot...  
WO/2004/074880A2
A differential interferometric confocal microscope for measuring an object, the microscope including a source-side pinhole array; a detector-side pinhole array; and an interferometer that images the array of pinholes of the source-side p...  
WO/2004/070434A2
An interferometric microscope (110) for making interferometric measurements of locations within an object (60) that is in a medium, there being a mismatch between indices of refraction of said object and said medium, the microscope (110)...  
WO/2004/068187A2
An interferometery system (110) for making interferometric measurements of an object, the system including: a beam generation module (124) which during operation delivers an output beam that includes a first beam at a first frequency and...  
WO/2004/068182A2
A compact and efficient optical illumination system featuring planar multi-layered LED light source arrays concentrating their polarized or un-polarized output within a limited angular range. The optical system manipulates light emitted ...  
WO/2004/068065A2
A method of using an interferometric confocal microscope to measure features of a trench or via in a substrate, wherein the interferometric confocal microscope produces a measurement beam (240), the method involving: focusing the measure...  
WO/2004/068186A2
A confocal interferometry system (110) for making measurements of an object (60), the system including an array of pinholes (12) to receive a source beam (24) and act as an array of beamsplitters to separate the source beam into a refere...  
WO/2004/066013A1
Disclosed is a catadioptric camera comprising an image plane, an optical axis (1), a main optical system which is provided with at least one mirror (7) that is placed on the optical axis and blocks the view from the image plane to a dead...  
WO/2004/064370A2
An image projection system (10) and method is presented for optically projecting an image onto a display surface (20) with visually correct geometry and optimum image quality. The projection system (10) includes an image processing unit ...  
WO2004010224A3
The invention concerns a projection objective for a projection exposure apparatus, said projection exposure apparatus having a primary light source for emitting electromagnetic radiation with a wavelength <=193 nm. The projection objecti...  
WO/2004/061487A2
An optical system for projection photolithography is disclosed. The optical system is a modified Dyson system capable of imaging a large field over both a narrow and a broad spectral range. The optical system includes a positive lens gro...  
WO2003098321A9
Apparatus (204) for optical manipulation of a pair of landscape stereoscopic images, such that the side-by-side orientation needed by a pair of human eyes is reoriented to an orientation which is required for recording with a single came...  
WO2003098314A3
The invention relates to a short-pulse laser device (11) with a preferably passive mode coupling. Said device comprises a resonator (12), which contains a laser crystal (14) in addition to several mirrors (M1-M7, OC) that define a long r...  
WO/2004/059990A2
A photon concentrator includes an imaging photon concentrator (13) concentrating photons from a source (70) to an image point (14) and a non-imaging photon concentrator (30). The non-imaging photon concentrator (NIPC) has an entry apertu...  
WO2003078941A8
The inventive sensor (30) device includes a support structure, a sensing element (15) mounted on the support substrate (60) for sensing optical radiation and generating an electrical output signal in response thereto, and an encapsulant ...  
WO/2004/057400A1
The aim of the invention is to obtain aspheric components of the projection characteristics of a mirror optical system and/or to eliminate chromatic errors of an optical system of this type. To achieve this, at least one (M6) of the mirr...  
WO2003093903A3
The invention relates to a catadioptric projection lens comprising a plurality of optical elements, which are arranged along an optical axis and comprise at least one concave mirror located in the vicinity of a pupillar surface of the pr...  

Matches 1,151 - 1,200 out of 9,642