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Patent Searching and Data


Matches 451 - 500 out of 1,750

Document Document Title
JP2011142150
To provide an illumination optical system which ensures high illumination efficiency while using a discharge tube of a normal ultra-high-voltage mercury vapor lamp or a laser light source, without using a special light source.This invent...  
JP2011137970
To provide a lens array that reduces an influence of light to propagates to a necessary area on a focal plane, and to pass through an unnecessary region, forms consequently in the necessary area on the focal plane, uniform illumination i...  
JP2011133514
To improve the contrast of an image display apparatus while suppressing reduction in the brightness thereof.The image display apparatus includes: an image display element configured to display an image by controlling a polarization state...  
JP2011135099
To provide an optical integrator having characteristics decreasing the influence of an relative positioning error of a pair of optical members on an illuminance distribution and the shape of an illumination field.This wavefront splitting...  
JP2011128569
To provide an image projection device which obtains high contrast by a simple constitution using a reflecting liquid crystal panel.The image projection device includes: a color separation element; a wavelength selecting phase plate; firs...  
JP2011128634
To obtain a lighting optical system that is easily manufactured; and to emit illuminating light suitable for image display by improving speckle noise or spatial light intensity distribution; and also to provide an image display apparatus...  
JP2011124584
To provide an illumination optical unit and a projection exposure apparatus including the same.The illumination optical unit includes a first optical element having a plurality of first reflective facet elements and a second optical elem...  
JP2011118268
To provide an objective optical system which has the number of apertures, for example, larger than 1.1, while satisfactorily correcting aberration and keeping sensitivity in optical adjustment small.The objective optical system includes,...  
JP2011113002
To provide a lighting apparatus which can easily manufacture a lens array while increasing lighting efficiency and to provide a projector using the lighting apparatus.In a luminous flux adjusting device 80, a first partial luminous flux ...  
JP2011114041
To provide a luminous flux splitting apparatus capable of guiding luminous flux having a desired intensity distribution to a plurality of spatial optical modulators without depending upon an intensity distribution of incident luminous fl...  
JP2011112997
To provide a mirror attachment and detachment device for changing the mirror of an illumination optical system, without directly touching the mirror.The mirror attachment and detachment device 1 is configured such that a plurality of sup...  
JP2011109128
To provide a lithographic apparatus which applies a desired angular intensity distribution to a radiation beam by using an array of mirrors, this radiation beam overcoming or alleviating one or more shortcomings of a lithographic apparat...  
JP2011107710
To provide a uniformizing optical element and an illumination device, for supplying polarized light in a predetermined oscillation direction with high efficiency at a high illumination ratio.The illumination device includes: a rod integr...  
JP2011107264
To improve the yield of manufacturing liquid crystal panels with high performance by uniform irradiation with UV rays.A pair of electrodes 13a, 13b for discharge is disposed opposing to each other in an axial direction of a light emittin...  
JP2011109097
To provide a homogenizer in which any risk of being damaged is obviated or mitigated.A two-stage homogenizer includes a first homogenizer stage and a second homogenizer stage. The first homogenizer stage includes a pair of microlens arra...  
JP2011103465
To prevent the condensation of light from optical elements in a narrow region on a surface of a following optical member when the light from a plurality of optical elements is used.A lighting device 2 for lighting a surface of a reticle ...  
JP2011097076
To simultaneously transfer various pitch patterns, each with high a resolution.An exposure apparatus includes an illuminating optical system 12 for illuminating a reticle R with illumination light IL, and a projecting optical system PL t...  
JP2011091177
To perform uniform exposure by making uniform interference fringes of laser light formed through a fly-eye lens and reducing illuminance unevenness of the laser light.A laser exposure device includes: a laser light source 1; a first fly-...  
JP2011077142
To provide an illumination optical apparatus for suppressing a loss of a quantity of illumination light caused by a change in an illumination condition, and to provide an aligner and a device manufacturing method.The illumination optical...  
JP2011075651
To decrease speckle noise related to a projection type image display device using a coherent light source, and to decrease light loss caused by an increase of a divergence angle of light.An optical unit (for example, a speckle noise decr...  
JP2011059174
To fix a length of a scanning range and a scanning speed in a lighting device.The lighting device, which illuminates an object area by causing light to scan the object area, includes: a light source (1) generating light; an optical syste...  
JP2011060869
To provide an element changeover device that positions one of a plurality of reflection optical elements into an optical path and can of easily exchange the respective reflection optical elements.The element changeover device (30) for po...  
JP2011053323
To provide a light source device improving the luminance, and to provide a projector including the same.The projector includes: the light source device; a display element; a projector control means and the like. The light source device i...  
JP2011048070
To prevent quantity of light from being reduced and to switch between a non-polarizing state and a polarizing state by a simple configuration.Each of a first polarizing separation element 71 and a second polarizing separation element 73 ...  
JP2011049284
To efficiently and accurately measure dynamic optical characteristics of a projection optical system without enlargement of an optical system for measurement.A measuring device for measuring optical characteristics of the projection opti...  
JP2011048314
To provide a reflection type liquid crystal projector which has a projection auto-focus function using a reflection type liquid crystal and a liquid crystal lens and can be incorporated in a cellular phone, etc.The reflection type liquid...  
JP2011043128
To provide a sunlight collecting system suppressing production cost low, facilitating recovery work when a failure occurs, and achieving suppression of power generation cost by a receiver 2 immediately recovering a heat medium circulatin...  
JP2011040505
To provide an optical system and aligner, capable of minimizing astigmatism, and to provide a device manufacturing method.One end 53a of an irradiation mechanism 51 for irradiating irradiation beam SL to an objective lens 35 housed in a ...  
JP2011039435
To provide a lighting system where the disturbance of the polarization direction is small in a rod integrator and the light utilization efficiency is high, when a polarized light of an aligned polarization direction is made to be inciden...  
JP2011039172
To suppress the decline of image forming characteristics due to nonuniform temperature distribution which can occur in the lens of a projection optical system.In the exposure apparatus having the projection optical system for projecting ...  
JP2011040716
To form a lighting region having a trapezoidal light intensity distribution along a predetermined direction on a photosensitive substrate, and to vary a blur width of the lighting region within a necessary range.An exposure apparatus whi...  
JP2011040619
To provide a light shielding apparatus, a lighting optical system, and an exposure apparatus that can precisely project a predetermined pattern on a surface to be irradiated for exposure, and a method of manufacturing a device.The light ...  
JP2011040618
To provide a diffraction optical element capable of uniformly adjusting light intensities by positions on a surface to be irradiated, an illumination optical system, an exposure apparatus, a method of manufacturing a device, and a method...  
JP2011039210
To obtain an image projector capable of obtaining a projection image, in which variation in optical performance of a projection lens is small and which has a good image quality, by reducing absorption of luminous flux of the projection l...  
JP2011029596
To switch over a diffraction optical element and a spacial light modulator based on a simple configuration and eventually to achieve illumination conditions of great variety for the shape and the size of pupil's intensity distribution.A ...  
JP2011022553
To provide an illumination optical system which achieves uniform illuminance distribution on an object surface to be illuminated by combining a light beam from an integrating sphere and a light beam generated by a critical illumination m...  
JP2011013589
To provide a compact, low-cost illumination optical system which secures uniformity of illumination light, and to provide an illuminating apparatus.The illumination optical system 30 used for the illuminating apparatus 10 includes: a col...  
JP2011009611
To provide an integrator structured so that a lens and a lens can be readily integrated without gaps, and to provide a light irradiation device that uses the integrator.Rectangular lens 41 are arranged bidirectionally so that the side fa...  
JP2011009780
To provide a microlithographic system in which partial coherence and a field size are variable.The microlithographic system includes: a lighting source; a lighting optical system including, in the order from an objective lens side, (a) a...  
JP2011009317
To correct illuminance unevenness of an illumination region formed on a surface to be irradiated while saving space and suppressing light quantity loss and generation of a flare small.The optical integrator (7) having a plurality of wave...  
JP2011003908
To provide an illumination optical apparatus for illuminating a surface to be illuminated using light in a desired polarized state without substantial influence from manufacturing errors in an optical member functioning as a wave plate.A...  
JP2010287806
To provide an illumination optical system capable of forming an illumination region having a light intensity distribution having a trapezoidal shape along a predetermined direction and nearly uniform in the shape of a pupil intensity dis...  
JP2010287759
To make uniform an illumination distribution on a surface to be irradiated by suppressing the projection of an integrated quantity of light with respect to a light irradiation device using LEDs.The light irradiation device is constituted...  
JP2010286510
To provide an observing apparatus, preventing the occurrence of unevenness regardless of a curve of a liquid level to equally observe the whole of an observation object.In an observing apparatus, a liquid and the observation object are s...  
JP2010282032
To appropriately configure a solar system that has a large light receiving area, by providing a Fresnel lens for a solar system with a structure that is less likely to bend by its weight.Many prism portions 11 and 12 are arranged along a...  
JP2010281976
To provide a lower-cost mechanism for adjusting the position of an optical element.The mechanism 1 for adjusting the position of the optical element B is provided in a microscope having the optical element B for observing a sample, and a...  
JP2010278443
To provide a lithographic apparatus with a uniformity collection system.A system finger is movably configured so that it can be moved to the inside or outside of the intersection with a radiation beam to correct the intensity of respecti...  
JP2010272631
To provide a lighting apparatus capable of lighting a body in an expected state.The lighting apparatus lights a first surface based upon irradiation light supplied from a light source. The lighting apparatus includes: a spatial optical m...  
JP2010272640
To provide a lighting apparatus capable of illuminating a body in an expected state.The lighting apparatus illuminates a first surface based upon irradiation light supplied from a light source. The lighting apparatus includes: a polarize...  
JP2010272858
To provide a light source device forexposure machine capable of efficiently condensing light rays emitted from a plurality of ultraviolet LEDs, while having a simple consitution.The light source device for an exposure machine includes th...  

Matches 451 - 500 out of 1,750