Login| Sign Up| Help| Contact|

Patent Searching and Data


Matches 451 - 500 out of 2,812

Document Document Title
JP2014505368A  
JP5428250B2  
JP2014036108A
To solve a problem such that a plasmonic lens is adhered on a substrate and so a degree of freedom of a pattern is small.The exposure device for exposing an exposed member comprises: a light output part for outputting light; a reticle on...  
JP2014035449A
To provide a projection exposure whose constitution can be made simple.Disclosed is a projection exposure in which a pattern formed on a reflection type mask M is projection-exposed onto a sensitive substrate P. The projection exposure c...  
JP2014032354A
To execute a favorable projection exposure of a pattern configured atop a cylindrical plane onto a sheet substrate skirting another cylindrical plane by using a projection optical system capable of securing a favorable telecentricity of ...  
JP2014504448A  
JP2014503937A  
JP2014504005A  
JP5406639B2  
JP2014021480A
To solve the problem that a conventional lens generates a difference between light intensity nearby a light source and light intensity distant from the light source and also to solve the problem that a light source using the primary colo...  
JP2014016438A
To provide a light source device that is suitably combined and used with a device for illuminating a small region such as a microscope and a liquid crystal projector and that increases brightness of illumination light.A light source devi...  
JP5398299B2  
JP2014013303A
To provide an exposure device that causes little decrease in illuminance and no decrease in productivity per unit time even when illumination light to a fly eye lens located in an optical path of the light is physically blocked so as to ...  
JP5393055B2  
JP5392468B2  
JP5392454B2  
JP5397562B2  
JP2014007259A
To provide an advantageous technique for design of an exposure device which can reduce variation of aberration of a projection optical system caused by temperature variation.A method of designing a projection optical system having a hold...  
JP2014006372A
To provide a depolarizer able to eliminate speckle at a low cost and in a saved space.A depolarization element 1 comprises: an optical polarizer 3 having a light transmission area 3a; an elastic body 5 connected to the optical polarizer ...  
JP5391641B2  
JP5390691B2  
JP5387893B2  
JP2014003305A
To provide an illumination optical device for illuminating a pattern on a mask with illumination light, in which an annular illumination pupil distribution in circumferential polarization state is formed while suppressing light quantity ...  
JP2014003086A
To provide a highly-efficient light irradiation device by providing an optical system capable of efficiently taking an outgoing beam into an integrator from a light source composed of a plurality of LEDs.A light irradiation device 1 comp...  
JP2014003306A
To provide an illumination optical device which can form an annular pupil distribution in circumferential polarization state, while suppressing light quantity loss well.The illumination optical device includes a light flux conversion ele...  
JP2014003290A
To provide an optical method for performing high accuracy measurement and setting of the angular position of a facet mirror for EUV use, and to provide an optical measurement device.In the optical method for measuring the angular positio...  
JP5384750B2  
JP5375122B2  
JP5377641B2  
JP2013254229A
To provide a projection optical system comprising reduced image face curvature.A projection optical system comprises: a first optical system for forming a second image conjugate with a first image; and a second optical system comprising ...  
JP5371531B2  
JP5369319B2  
JP5373373B2  
JP2013251222A
To provide a lighting device capable of improving light use efficiency by a simple structure while attempting the high luminance of illumination light.A lighting device includes one or a plurality of light sources 10A, 10B, and 10C havin...  
JP2013243357A
To provide the optical system of microlithography projection exposure apparatus which allows flexible setting of a different polarization distribution including a tangential/radial mixed polarization distribution.A polarization-influenci...  
JP2013243386A
To obtain an illumination optical system which can form a pupil intensity distribution of desired shape and illuminance, and can achieve illumination conditions rich in diversity.The illumination optical system used in an exposure device...  
JP2013543150A  
JP2013239750A
To provide an illumination optical system capable of illuminating a surface to be illuminated with light of a required polarization state by suppressing influence of retardation caused by a subsequent optical system of a polarization con...  
JP5352694B2  
JP5352989B2  
JP2013235739A
To provide a lighting device capable of suppressing color irregularities, in one having white LED light sources arranged in which blue LED elements are eccentrically arranged.A lighting device 10 is provided with a plurality of white LED...  
JP2013541808A  
JP5338863B2  
JP5333528B2  
JP5333429B2  
JP5333322B2  
JP5337304B2  
JP2013540350A  
JP2013225673A
To provide a method and apparatus for determining apodization properties of a projection system in a lithographic apparatus.The method comprises allowing light from a given point in an illumination field to pass through the projection sy...  
JP5326259B2  

Matches 451 - 500 out of 2,812