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Matches 601 - 650 out of 3,135

Document Document Title
JP2015510262A
本発明は光学装置、特にマイクロリソグラフ ィのための投影レンズであって、光学表面( 31a)及び基板(32)を含む少なくとも 1つの光学素子(21)を備え、基板は...  
JP5694362B2  
JP2015057765A
To provide a luminaire capable of achieving uniform lighting without making an optical system configuration complicated.A luminaire 40 includes: a plurality of first element lenses 43 for condensing entered coherent light; and a field le...  
JP2015509285A
本発明は、マイクロリソグラフィ投影露光装 置のための光学系及びマイクロリソグラフィ 露光方法に関する。マイクロリソグラフィ投 影露光装置のための光学系は、偏光影響...  
JP5688672B2  
JP5689059B2  
JP5688410B2  
JPWO2013035661A1
基板処理装置は、基板の被処理面にパターン を形成する基板処理装置であって、パターン が形成されたマスクを保持し、回転軸を中心 に回転可能な中空状のマスク保持部と、...  
JP2015055832A
To provide an image forming apparatus using a spatial light modulator to form a more clear and bright image by reducing crosstalk.A plurality of image forming units 1 irradiates a surface of a workpiece W conveyed by a conveyance system ...  
JP2015053449A
To provide a light source device capable of achieving a desired illuminance distribution.A light source device includes: a first light emission unit having a plurality of LEDs arranged in a form capable of integrally controlling a power ...  
JP5686882B2  
JP2015046601A
To provide an illumination optical system which can realize illumination conditions rich in variety and can improve device productivity when it is applied to an exposure apparatus.The illumination optical system is designed to illuminate...  
JP2015046604A
To provide an illumination optical device capable of reducing light quantity loss when lighting up a mask with illumination light in a predetermined polarized state, and a projection exposure device.An illumination optical device compris...  
JP2015046619A
To provide an illumination optical device capable of reducing light quantity loss when lighting up a mask with illumination light in a predetermined polarized state, and a projection exposure device.An illumination optical device include...  
JP5684413B2  
JP5682799B2  
JPWO2013018799A1
光量ロスを低減させ、一様な照度分布を持つ 照明を得る照明装置の提供を目的とする。被 照明面を照明する照明装置において、光路を 横切る所定の面上の所定方向に沿って周...  
JP2015038975A
To provide an illumination optical technique that targets on illumination intensity over an illumination field and can exert influence in an illuminating angle-dependent mode.An illuminating optical unit comprises raster arrangements 12 ...  
JPWO2012169090A1
光源から供給される照明光を用いてレチクル 面を照明する照明方法は、空間光変調器の複 数のミラー要素に対して入射光の反射角を制 御するための駆動信号を設定することと...  
JPWO2012172672A1
蛍光体カラーホイル1が、ガラス基板2と、 ガラス基板2を回転させる回転モーター3と 、ガラス基板2の表面に環状に塗布されてい る蛍光体(第1の蛍光体)5と、を有し...  
JP5670602B2  
JP5673119B2  
JP2015505169A
本発明は、特にマイクロリソグラフィ投影露 光装置における偏光影響光学配置に関する。 本発明の開示の態様により、偏光影響光学配 置は、光学的ポジティブ単軸結晶材料か...  
JP2015031955A
To provide a method for optimizing effective light intensity.An effective light intensity distribution is optimized by the steps of: (a) providing a light source discharging a light beam 1 of a first intensity distribution 2a in a Z-axis...  
JP5668780B2  
JP2015029128A
To provide an illumination optical device capable of achieving the lighting conditions that are rich in diversity for the shape, size and polarization state of illumination pupil luminance distribution.The illumination optical device com...  
JP2015029092A
To provide a reflective optical element for grazing incidence at an extreme ultraviolet wavelength, which has a reflectance as high as possible.A reflective optical element 100 to be used for a collector mirror in an optical system for E...  
JP5668779B2  
JP2015026644A
To provide a proximity exposure device and a proximity exposure method capable of obtaining a good light exposure accuracy even in a case where deviation occurs between a position of a chip and a position of a pattern of a mask at light ...  
JP2015503231A
投影露光装置(1)のための照明及び変位デ バイスは、照明視野(18)を照明するため の照明光学ユニット(25)を含む。物体ホ ルダ(17a)は、物体(17)を物体...  
JP5660074B2  
JP5659497B2  
JP2015015281A
To provide a light emitting device capable of suppressing luminance reduction and obtaining high light extraction efficiency.In a light emitting device 10 including a lens 2 and a light emitter 1, the lens is a spherical segment body hav...  
JP5656731B2  
JP2015008304A
To provide an illumination optical device which can form an annular pupil distribution in circumferential polarization state, while suppressing light quantity loss well.The illumination optical device includes a light flux conversion ele...  
JP2015007774A
To provide a compact lighting device in which light utilization efficiency is improved, to provide a projection type display device provided with the lighting device, and to provide a direct-view display device provided with the lighting...  
JP2015005764A
To provide a spatial light modulation unit that is used in an illuminating optical system and is able to improve the degree of freedom in the intensity level of a pupil intensity distribution.A spatial light modulation unit used in an il...  
JP2015005676A
To provide an illuminating optical system by which a pupil intensity distribution at each point on a target illumination face can be adjusted to its required distribution.An illuminating optical system that illuminates a target illuminat...  
JP5650272B2  
JP2014241411A
To provide a mount that has improved accuracy and reproducibility and decreased sensitivity to irregularities from the nominal geometry of an optical element that the mount supports.A mount is configured to mount an optical element in a ...  
JP5646632B2  
JP5644921B2  
JP5646580B2  
JP2014239088A
To reduce the effect of a speckle pattern on the surface to be irradiated when light having high coherence is used.Disclosed is an illuminating optical system ILS which irradiates a reticle surface Ra with illumination light IL from a li...  
JP2014534643A
EUV放射線(14)のためのミラー(20 )は、第1のEUV放射線反射領域と少なく とも1つの第2のEUV放射線反射領域とを 有する全体反射面(24)を含み、EU...  
JP5642385B2  
JP2014236211A
To provide an illuminating device which allows for efficient adjustment of illumination of the illumination light, and to provide an exposure device, an illuminating method and a method of manufacturing a device.An illuminating device in...  
JP2014533441A
マイクロリソグラフィ投影露光装置の照明系 は光変調器(38)を含み、その光変調器(38 は、変調器基板(70)と、変調器基板(70) 支持されたミラー(42a,42b,42c)のア...  
JP2014225641A
To provide an illumination optical system capable of suppressing deterioration in light utilization efficiency when a substrate is exposed using light through a prism changing a cross-sectional shape of a light flux.A prism optical syste...  
JP5630455B2  

Matches 601 - 650 out of 3,135