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Patent Searching and Data


Matches 601 - 650 out of 3,602

Document Document Title
JP2017138559A
[Subject] Even if it is a case where parallel light with a luminance nonuniformity is used, a manufacturing method of an optical diffusion film using a possible parallel light adjusting device, a parallel light irradiation device, and th...  
JP2017135146A
[Subject] A laser head which can equalize intensity of a laser beam, and a laser device are provided. [Means for Solution] A light source which a laser head has a plurality of optical power parts arranged in two dimensions, and outputs l...  
JP2017037325A5  
JP2017129866A
[Subject] An illumination-light study system which can realize a polarization state of a request of pupil intensity distribution with sufficient accuracy. [Means for Solution] An illumination-light study system which illuminates an irrad...  
JP2017129748A
[Subject] Provide a positioning apparatus, a wavelength converter, a diffuse reflection device, light equipment, and a projector which can readjust a position of a rotating wheel. [Means for Solution] A positioning apparatus provided wit...  
JP6170564B2  
JP6165366B1
A lens (10) has an outgoing radiation side (12) which makes convex shape to an entrance plane (11) and an optic axis (10a) which make concave shape in cylindrical shape. A light source (20) has a spread angle smaller than a perpendicular...  
JP6166257B2  
JP2017122751A
[Subject] Even if it is a case where a high Coherence light source is used, an illumination-light study system which can equalize addition illumination distribution on an irradiated plane by comparatively little pulsed light is provided....  
JP2017122786A
[Subject] A lens array board and an electrooptics device suitable for using the 2nd concave curve as a lens surface with a big curvature radius among the 1st concave curve formed in a substrate and the 2nd concave curve that overlaps wit...  
JP2016524182A5  
JP6160666B2  
JP6160144B2  
JP2015511770A5  
JP2017518543A
The present invention relates to an optical system of a micro lithography projection aligner designed towards operating wavelength of at least 150 nm. An element (11, 21) which generates angular distribution to light with which an optica...  
JP2017120364A
[Subject] Provide an improved projector. [Means for Solution] A projector includes a laser module and a wafer level optical system for generating a laser beam. A wafer level optical system contains the first substrate, the first collimat...  
JP2015517733A5  
JP6146646B2  
JP6146745B2  
JP2017515166A
In order to control positioning of a plurality of Miller elements which can be displaced, external control equipment (64) connected to multi-mirror arrangement (22) through a data channel which has the bandwidth of at least 1 kHz per con...  
JP2017103025A
[Subject] Optical quality can be secured, and it excels in cost nature or mass production nature, and provides a light guide and a lighting installation which can realize field lighting which had uniform illumination distribution in a la...  
JP2017097372A
[Subject] An exposure device which can be transferred to high resolution simultaneous, respectively is provided for a pattern of various pitches. [Means for Solution] It is an exposure device which has illumination-light study system 12 ...  
JP6137762B2  
JP6137159B2  
JP6135514B2  
JP6137179B2  
JP6137182B2  
JP2017090488A
[Subject] In position adjustment of a lighting uniform conversion optical member, a lighting installation which prevents a lighting uniform conversion optical member from being damaged is provided. [Means for Solution] In a lighting inst...  
JP2017016854A5  
JP6132119B2  
JP2017083903A
[Subject] Pupil intensity distribution in each point on an irradiated plane is adjusted almost respectively uniformly. [Means for Solution] An illumination-light study system which illuminates an object by illumination light via an optic...  
JP2017083659A
[Subject] Good plastic surgery nature is given to incidence light which enters into an optical diffusion element of a lighting installation. [Means for Solution] Lighting installation 10 is provided with irradiation equipment 30 which ir...  
JP2017083636A
[Subject] Provide a lighting installation and a projector which can raise utilization efficiency of light, simplifying composition. [Means for Solution] It has light equipment and an equalization device, and is an equalization device, Th...  
JP6128348B2  
JP6127001B2  
JP2015162446A5  
JP2016517026A5  
JP2017510850A
It is an optical system for carrying out collimation of the incidence light, and is with body 102, Crevice 110 which is crevice 110 formed in the 1st side 104 of body 102, and has central light entrance plane 114 and side light entrance ...  
JP2017073245A
[Subject] When fluorescence can be emitted at high efficiency and it uses for fluorescence light equipment which can constitute a small device from an easy structure, and a projector device, it is in providing fluorescence light equipmen...  
JPWO2015151171A1
A fluorescent substance unit (1l.) which moves so that light equipment (1) may be provided with a light source (1a), and a fluorescent substance field and a reflective field and a fluorescent substance field and a reflective field may be...  
JP6113872B2  
JP2014534643A5  
JP2017509920A
Especially the present invention relates to a mirror of a micro lithography projection aligner. According to one mode of the present invention, a mirror has an optical significant surface, and it is a mirror, About an electromagnetic rad...  
JPWO2015133260A1
An illumination-light study system (10B) which makes illumination light light to which this projection device (10) was emitted from a high-intensity light source (10A) and a high-intensity light source (10A), having a projection optical ...  
JP2017509017A
Although a subset of the 1st facet (68) is provided in how to illuminate an object recognition field (5) of a projection aligner (1) so that it may be positioned in a park position, and each of a park position is estranged from a target ...  
JP2017059396A
[Subject] Offer of fluorescence light equipment and a lighting installation which can irradiate with white light excellent in color rendering properties securing required safety. [Means for Solution] A source of excitation light to which...  
JP2017058582A
[Subject] Light equipment which can reduce Vignetting and color nonuniformity of projection light is provided. [Means for Solution] Light tunnel 175 arranged by providing light equipment 60 with a rectangular incidence mouth in which lig...  
JP6098950B2  
JP2017507356A
An illumination-light study unit for projection lithography functions as illuminating an object recognition field. Here, the 1st transfer optical unit functions as guiding illumination light emitted from a light source. A lighting prior ...  
JP2017054123A
[Subject] A lighting unit and a device for lithography exposure are provided. [Means for Solution] A lighting unit (10) for lithography exposure is indicated, and it is this lighting unit, A source of a beam (1), and a beam deflection el...  

Matches 601 - 650 out of 3,602