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Matches 601 - 650 out of 1,772

Document Document Title
JP2009130065A
To provide an exposure apparatus for highly accurate exposure control.The photolithography machine includes a lighting optic system for lighting a reticle by means of a light flux from a light source and a projection optic system for pro...  
JP2009128695A
To provide an optical system in which efficiency of bringing out fluorescent light, emission light, illumination light or the like emitted from a light-emitting body can be significantly improved while reducing as much as possible a loss...  
JP2009130071A
To provide an illumination optical system achieving high-grade resolution with a simple configuration, and to provide an exposure apparatus.In the illumination optical system that is used for the exposure apparatus for exposing a pattern...  
JP2009128444A
To provide an optical device which can be made compact in the whole device, in which accuracy of disposing each optical surface can be fixed to a high level without adjusting the position upon assembling, and fluorescent light, emission ...  
JP2009130367A
To provide a reflective lighting technology that reduces an adhesion amount of particulates such as debris to the reflective surface.A lighting optical device for illuminating a surface being irradiated with exposure light EL includes a ...  
JP2009123888A
To provide a lighting optical device capable of dimming illuminance of the light output from a light source, across such wide range as up to the illuminance requested for various measurements on a substrate side, while suppressing change...  
JP2009124143A
To provide a lithographic apparatus which is simpler and lower in cost than those of prior art, using a conventional filter having sub-micron sized dots.In this system and method for use of a lithographic apparatus having a substrate and...  
JP2009117561A
To improve controllability of a pupil luminance distribution formed on a lighting pupil surface.A illuminator which forms a predetermined light intensity distribution on the lighting pupil surface (5b) based upon light from a light sourc...  
JP2009116331A
To provide a mixed light apparatus for application to liquid-crystal displays and lighting systems.The mixed light apparatus includes at least two light collectors and at least two light sources. Each of the light collectors has a first ...  
JP2009117671A
To provide an illumination optical device forming a pupil intensity distribution of a desired shape and desired illumination and obtaining illumination conditions of great variety.The illumination optical device has: a spatial light modu...  
JP2009117812A
To provide an illumination optical system capable of easily forming a desired light intensity distribution in which illumination non-uniformity is not distinctive at the pupil position of the illumination optical system or at a position ...  
JP2009117801A
To provide illumination optical system which materializes a variety of illumination conditions and improves productivity of a device when the illumination optical system is applied to an exposure apparatus.The illumination optical system...  
JP2009117672A
To provide an illumination optical system that saves space in an optical path between a spatial light modulator and an optical integrator and obtains illumination conditions of great variety.The illumination optical system irradiates a s...  
JP2009107922A
To provide a manufacturing method of a mass-producible lens array allowing cost reduction with fewer production steps, to provide a lens array, to provide an illumination optical device, and to provide a projector.Molten glass G is set a...  
JP2009111175A
To provide an illumination optical apparatus capable of correcting an illuminance distribution in an irradiated area irradiated with exposure light on an irradiated surface of an irradiated body, to provide an exposure apparatus, and to ...  
JP2009111369A
To provide an illumination optical apparatus, an exposure apparatus, and a device manufacturing method, that can contribute to higher output of a light source and improvement in manufacturing efficiency of a device even when spatial ligh...  
JP2009098493A
To provide a projector in which an adverse effect on an optical performance aspect, generated due to compactness, is reduced.A reflective liquid crystal display element 224 has a rectangular display region 240 which is oppositely arrange...  
JP2009099879A
To provide: an illumination optical system accurately forming an effective light source shape; an exposure device; and a device manufacturing method.The illumination optical system illuminating an illumination object surface by using lum...  
JP2009099696A
To provide an illumination optical system capable of stably keeping an optical characteristic of an optical member like, such as a diffractive optical element.The illumination optical system includes a light-transmitting optical system 1...  
JP2009080468A
To obtain a laser beam synthesizer which can efficiently synthesize laser beams with a simple structure and at low cost.The laser beam synthesizer comprises a plurality of laser light sources 11 having anisotropy in the angle of laser be...  
JP2009071011A
To provide an optical integrator, capable of uniforming an illumination distribution on an irradiated surface by suppressing the influence due to the difference in surface shape of each refractive surface, when it is applied to, for exam...  
JP2009071010A
To provide an illumination optical system capable of adjusting the pupil intensity distribution, while suppressing the loss in optical quantity to a low level.The illumination optical system for illuminating surfaces (M, W) to be illumin...  
JP2009063619A
To provide an illumination device and a projection image display device in each of which illuminance non-uniformity of illumination light on an optical modulation element can be smoothly and effectively suppressed.The illumination device...  
JP2009060139A
To provide a light source unit capable of collecting DPP divergent light while reducing the adherence of debris to a reflecting surface.The light source unit is provided with a light source main body for bringing a target material into a...  
JP2009055060A
To provide a lithographic apparatus and method for projecting a patterned beam onto a substrate.An illumination system supplies a projection beam of radiation. A pattern is imparted to the projection beam, for example by an array of indi...  
JP2009054325A
To provide an illumination light source employing a coherent light source, which suppresses the influence of speckle in a simplified arrangement.The illumination light source comprises: a surface emitting laser 2 in which a plurality of ...  
JP2009044147A
To provide a lighting optical device which can illuminate a mask as an irradiated surface when it is applied to exposure equipment, e.g. an EUVL, without arranging a plane mirror in the optical path between a lighting optical system and ...  
JP2009044146A
To obtain a lighting optical device which can avoid adverse effect of field stop on the image formation and aggravation of light exposure distribution when the lighting optical device is applied to exposure equipment employing a reflecti...  
JP2009027162A
To provide a microlithographic projection exposure device capable of minimizing undesirable changes in the intensity distribution produced on a wafer surface, based on the polarization distribution set in an illumination system.This micr...  
JP2009019882A
To provide an adaptor for lighting where the size of a diffusion plate is made appropriate.The adaptor for lighting is inserted between a light source and an object to be illuminated for use, has the diffusion plate 1 and an aperture dia...  
JP2009015218A
To speed up a specimen observation using a scanning confocal microscope.The scanning confocal microscope 100 includes: a galvano mirror 4 by which an illuminating light ray for illuminating a specimen 1 is caused to scan on the specimen ...  
JP2009008728A
To provide an illumination optical system which illuminates an image display element brightly with uniform brightness even with small angle distribution of an optical element in a section where the angle distribution is sensitive, and to...  
JP2009003104A
To provide an illuminating lens varying the degree of light diffusion around an optical axis, and to provide an illumination device that has the illuminating lens.The illuminating lens 100 having a first face 101 formed into a plane and ...  
JP2008299326A
To provide an element for homogenized lighting which can attain structured lighting of a pupil of an objective lens by a simple method.The element 1 for homogenization of lighting by simultaneous conditioning of polarization degree is co...  
JP2008292862A
To reduce size and weight in a projection optical device having a reflection type liquid crystal element and projector device using the same.The projection optical device is equipped with: a light source 100; a plurality of reflection ty...  
JP2008277815A
To enable, in a flexible mode, substantial or complete elimination of an unwanted preferential polarization orientation even upon a variation in the illumination setting.The polarization-influencing arrangement 10 includes: a first wedge...  
JP2008268243A
To provide an illumination optical system capable of yielding uniform intensity distribution, and also reducing the loss of light quantity so as to yield illumination improved in the efficiency of using light, and a projection type displ...  
JP2008270571A
To provide an illuminating optical device having a high degree of freedom with respect to a device layout.In the illuminating optical device for leading beams emitted from a light source to an illumination target, the illuminating optica...  
JP2008268601A
To provide an illumination optical system with a light source which emits luminous flux having a flat cross section, and obtaining illuminating luminous flux having isotropic NA distribution in spite of compact configuration.The illumina...  
JP2008256979A
To provide an illumination optical system for providing illuminating luminous flux having isotropic NA distribution with compact constitution equipped with a laser array light source.The illumination optical system IL1 for illuminating t...  
JP2008257013A
To provide an optical unit configured to efficiently use light emitted from a light source.The optical unit is constituted by arranging two reflection surfaces facing each other across a virtual surface. The reflection surface on one sid...  
JP2008258637A
To provide systems and methods for improved lithographic printing with a polarized light.Polarized light (polarized in radial or tangential direction) is used to illuminate a phase-shift mask (PSM) and produce an exposure beam. A negativ...  
JP2008250303A
To provide an optical device for generating sheet light so that the tomographic layer of each of specimens can be efficiently observed.The optical device has a sheet light for emitting a luminous flux, and a plurality of optical devices ...  
JP2008241768A
To provide a projection type display device capable of achieving simplification, miniaturization and reduction of cost of structure and making illuminance irregularity of a video image projected to a screen small.The projection type disp...  
JP2008235885A
To provide a novel apparatus and method capable of adjusting the polarized light of a radiation beam.In an illuminating device of a lithography apparatus, an illuminating mode regulation element 2 converts a radiation beam PB into a dipo...  
JP2008227497A
To provide an optical integrator system capable of forming a desired illuminance distribution on a surface to be illuminated without being substantially influenced by errors of surface shapes of optical surfaces of wavefront division ele...  
JP2008224889A
To reduce speckle on the emission face of an optical fiber by connecting light from a laser light source to the optical fiber without waste, and reducing coherence of the laser light source.The apparatus includes: the laser light source ...  
JP2008227496A
To provide an optical integrator system capable of forming a desired illuminance distribution on a surface to be illuminated by ensuring a predetermined large numerical aperture of an emission side without requiring excessively high accu...  
JP2008197652A
To provide a collimator for a backlight unit, and to provide a liquid crystal display (LCD) using the collimator.The collimator includes a plate including a plurality of light passing areas, passing light incident from the backlight unit...  
JP2008191653A
To provide a dual lamp coupling system in which separate integrator rods for each lamp are replaced with a single rod, to benefit from advantages such as simple mounting, simple alignment, less coupling loss, lower cost since there is no...  

Matches 601 - 650 out of 1,772