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Matches 601 - 650 out of 3,177

Document Document Title
JP2015118362A
To provide a projector enhancing admissibility of positional accuracy, improving contrast of an image, further controlling a boundary between a bright portion and a dark portion in an image plane of an image projected to not be conspicuo...  
JP2015119192A
To provide a beam delivery system providing a beam of light having a reduced coherence as compared to laser light directly emitted from a laser of the beam delivery system.A beam delivery system of a projection exposure system comprises ...  
JP2015115423A
To provide a designing method of an exposure light source which is capable of generating a mask image as sharp as a light source of pixelated light intensity distribution and can be easily manufactured.The designing method includes: a fi...  
JP2015114633A
To provide a light irradiation apparatus capable of radiating a substantially parallel light beam with uniform and high luminance.A light irradiation apparatus for radiating a light beam to a rectangular irradiation area on an irradiatio...  
JP2015517733A
An illumination-light study unit for EUV projection lithography functions as showing illumination light to an object recognition field which can arrange a lithography mask. An illumination-light study unit has the 1st facet mirror (36) c...  
JP2015114620A
To enable improvement of speckle reduction effect without complicating a structure.A luminaire 40 includes: a diffusion member 67 having an anisotropic diffusion surface; a rotary shaft member 68 that rotates the anisotropic diffusion su...  
JP2015517729A
An illumination-light study unit for EUV projection lithography functions as carrying out slanting lighting of the illuminated viewing field which can arrange an object recognition field of a downstream image formation catoptric light st...  
JP2015111672A
To provide an illumination system of a micro lithography projection exposure device that can adjust both a space radiation illuminance distribution and an angular radiation illuminance distribution in a field dependent method.An illumina...  
JP5736746B2  
JP5737175B2  
JP2015108804A
To provide a liquid crystal modulator having a structure optimized for inspecting defects in a substrate, and a substrate inspection apparatus including the liquid crystal modulator.A substrate inspection apparatus includes a liquid crys...  
JP2015108768A
To provide a patterned light projecting device allowing further miniaturization.A patterned light projecting device comprises: a light source 2 emitting light ML; a condenser lens 3 condensing the light ML emitted from the light source 2...  
JP5731630B2  
JP5731591B2  
JP2015103810A
To provide extreme ultraviolet lithography process and a mask with reduced shadow effect and enhanced intensity.A mask is an extreme ultraviolet lithography (EUVL) mask. The mask includes: a first state and a second state different from ...  
JP5729047B2  
JP2015515637A
They are a method for uniforming bundle of rays 110 with long and slender optical element 100 constituted so that light might be uniformed, an optical system, and a lighting installation. Incidence cross section 101 of an optical element...  
JP5724561B2  
JP2015515117A
Each has the flexibility of at least one displacement, and was connected to at least one actuator (131) for each displacement, An optical component (40;40a) provided with the mirror array (22) which has a plurality of mirror elements (23...  
JP2015515140A
Present invention, it has the 1st reflective surface (110, 210, ...) and 2nd reflective surface (120, 220, ...) that received mutually and are arranged at an angle of an angle of ±10 degrees of 0 degree, or 90 degrees ±10 degrees -- at...  
JP5721858B2  
JP2015095337A
To provide a lighting device capable of occurrence of irregular luminance.A lighting device 10 includes: a light source 21; and a condenser 23. The light source 21 includes a flat light-emitting surface 28. The condenser 23 is formed int...  
JP2015092604A
To provide an exposure device and method that enables patterns of various pitches to be simultaneously transferred at high resolution respectively.An exposure device comprises: an illumination optical system 12 for illuminating a reticle...  
JPWO2013118615A1
例えばEUV光を用いる露光装置に適用され たときに、装置のフットプリントを小さく抑 えることのできる反射結像光学系。照明光学 系からの光で照明された第1面に配置さ...  
JP2015088410A
To provide an LED lighting device that enables respective light-emitting points of a plurality of LED elements to be condensed in a lump and that can extremely decrease loss of light emitted from the plurality of LED elements.An LED ligh...  
JP2015513223A
A plurality of channels in which (a) of each shows the present invention to a partial beam, and at least one includes at least one defect, (b) It is arranged at at least one channel which has at least one defect, and is related with an i...  
JP2015513227A
The present invention relates to an optical system of a micro lithography projection aligner, and is it, In order to change angular distribution of light reflected by mirror device, it becomes independent mutually. At least one mirror de...  
JP2015512560A
The illumination-light study unit for EUV projection lithography functions as guiding the illumination light (16) towards the illuminated viewing field which can arrange a lithography mask. An illumination-light study unit has the 1st fa...  
JP2015082594A
To provide a fluid supply system capable of suppressing generation of an exposure failure.A fluid supply system comprises: a first temperature adjustment device capable of adjusting temperature of first fluid; a second temperature adjust...  
JP2015079815A
To provide an illumination optical system suitable for an exposure apparatus by controlling telecentricity for each light transmission part constituting light transmission means, and correcting the telecentricity in an exposure region of...  
JP2015079811A
To compensate either one of local focus or distortion variations according to an exposure history at exposure equipment.Two places of a thin optical component are simultaneously deformed by the same amount in the same direction or the op...  
JP5706519B2  
JP5704519B2  
JP2015511770A
An illumination-light study unit (25) for a projection aligner functions as guiding illumination light (16) towards an illuminated viewing field (5) which can arrange a lithography mask (7). The 1st facet mirror (19) is an illumination-l...  
JP2015073129A
To provide an illumination optical device, an exposure device, and a device manufacturing method that are capable of contributing to an improvement of device manufacturing efficiency through an increase of output of a light source even w...  
JP5700272B2  
JP2015511064A
An illumination-light study unit (26) for EUV projection lithography functions as showing illumination light (16) to an illuminated viewing field (5) which can arrange a lithography mask (7). A facet mirror (19) which has a plurality of ...  
JP2015065482A
To reduce influence of a localized heat load when using immersion fluid in a lithographic apparatus.A support table configured to support a substrate comprises a support section to support a substrate, and a regulation system to supply h...  
JP2015065441A
To provide an illumination optical device capable of reducing light quantity loss when lighting up a mask with illumination light in a predetermined polarized state, and a projection exposure device.An illumination optical device include...  
JP2015510654A
This indication generates a plurality of virtual light sources, and provides a system, a method, and a device which collimate light at least partially. In one mode, the manifold which collimates light can generate a plurality of virtual ...  
JP5696746B2  
JP2015510262A
Zero crossing temperature deltaT related to [the present invention is a projection lens for an optical apparatus, especially micro lithography, have at least one optical element (21) containing the optical surface (31a) and a substrate (...  
JP5694362B2  
JP2015057765A
To provide a luminaire capable of achieving uniform lighting without making an optical system configuration complicated.A luminaire 40 includes: a plurality of first element lenses 43 for condensing entered coherent light; and a field le...  
JP2015509285A
The present invention relates to an optical system and a micro lithography exposure method for a micro lithography projection aligner. An optical system for a micro lithography projection aligner, Polarization influence optical arrangeme...  
JP5688672B2  
JP5689059B2  
JP5688410B2  
JPWO2013035661A1
基板処理装置は、基板の被処理面にパターン を形成する基板処理装置であって、パターン が形成されたマスクを保持し、回転軸を中心 に回転可能な中空状のマスク保持部と、...  
JP2015055832A
To provide an image forming apparatus using a spatial light modulator to form a more clear and bright image by reducing crosstalk.A plurality of image forming units 1 irradiates a surface of a workpiece W conveyed by a conveyance system ...  

Matches 601 - 650 out of 3,177