Login| Sign Up| Help| Contact|

Patent Searching and Data


Matches 601 - 650 out of 3,408

Document Document Title
JP2016152270A
[Subject] A plurality of lamps provide an exposure device arranged the optimal. [Means for Solution] In exposure device 10 provided with lamp group 11 which comprised a plurality of lamps 12, and integrator 14 which improves the homogene...  
JP2016151687A
[Subject] Provide the optical system for projecting which covers a wide variable power range and can respond also to the image display element of high resolution in application to an approached type projector. [Means for Solution] In the...  
JP2016525232A
the present invention -- especially -- lithography -- it is an optical assembly (100) of a lithography system which is detailed or images nano structureAt least two optical elements (101, 103) arranged succeeding a beam course of an opti...  
JP2016151688A
[Subject] Provide the optical system for projecting which covers a wide variable power range and can respond also to the image display element of high resolution in application to an approached type projector. [Means for Solution] In the...  
JP2016071353A5  
JP2016524182A
The present invention relates to a system for producing structure in a wafer using a projection exposure system and a lithography mask. contribution of the number [as opposed to a CD error by performing mask adjustment based on a rule us...  
JP2016524184A
An optical component is provided with at least one means to reduce influence of radiation to displacement of an optical element (27). [Chosen drawing] Drawing 5  
JP5967132B2  
JP2016142900A
To provide an illumination device that offers reduced illumination irregularity, and a projector having the same.An illumination device includes a light source unit that emits excitation light and a wavelength conversion element. In a cr...  
JP2016139143A
To provide an appropriate illumination condition necessary for transferring a mask pattern having a variety of characteristics with fidelity such as an illumination condition of great variety with regard to a light intensity distribution...  
JP2016138961A
To provide a projection optical device that efficiently suppresses a fluctuation in aberration due to a variation in installation position in lens groups constituting a projection optical system, and a projector including the projection ...  
JP5959342B2  
JP2016133756A
To provide a projection optical system that is adaptable to high luminance and high resolution and can achieve a large angle of view.A projection optical system 40 comprises, successively from an enlargement side, a first lens group to a...  
JP2016130859A
To provide a spatial light modulation unit used for an illumination optical system capable of improving a degree of freedom concerning an intensity level of a pupil intensity distribution.The spatial modulation unit used for an illuminat...  
JP2016127226A
[Subject] In the case of exposure, desired temperature distribution is produced inside a pattern field of Reticle . [Means for Solution] Exposure device 100 holds Reticle R which has the pattern field in which a pattern was formed, and i...  
JP2016063185A5  
JP5944400B2  
JP2016518619A
A micro lithography device (10) contains an object system (20) containing a penetration filter (42) constituted so that light irradiation distribution in projection Optical path might be corrected variably. A penetration filter (42) cont...  
JP5938335B2  
JP5938707B2  
JP2016109731A
[Subject] In a microscope, irradiation light to a sample is adjusted swiftness and appropriately. [Means for Solution] It has a reflective means including a reflective surface which has a part of shape of an elliptical pipe side, and a d...  
JPWO2014010274A1
The projection optical system (PL) which turn a substrate processing device (EX) to a substrate, it makes the catoptric light bunch (L2) which occurs from a lighting field (IR) project, and images the image of a mask pattern to a substra...  
JPWO2014010274A
The projection optical system (PL) which turn a substrate processing device (EX) to a substrate, it makes the catoptric light bunch (L2) which occurs from a lighting field (IR) project, and images the image of a mask pattern to a substra...  
JP5934082B2  
JP5935852B2  
JP5935920B2  
JP2016105190A
To provide a ring light illuminator capable of creating a well-defined and homogeneous illumination field in an area to be illuminated.A ring light illuminator with annularly arranged light sources is disclosed. To each light source ther...  
JP2016517026A
An illumination-light study unit (4) for projection lithography functions as illuminating an object recognition field (5) which can arrange an object (7) imaged by illumination light (16). An illumination-light study unit (4) has a view ...  
JP2016103025A
[Subject] An exposure method and a device for enabling transfer of a pattern of various pitches to high resolution simultaneous respectively are provided. [Means for Solution] It is an exposure device which has illumination-light study s...  
JP5928653B2  
JP5928632B2  
JP5927555B2  
JP2016099390A
[Subject] An illumination-light study system and an image display device which can raise a contrast ratio of picture light by reducing diffraction light are provided. [Means for Solution] An optical equalization element (14) which equali...  
JP2016100461A
[Subject] Large-sized-izing of an illumination optical device accompanying an increase in the number of optical components and complication of imaging optics and big-ticket-ization are avoided, and an illumination optical device in which...  
JPWO2013191255A1
The optical integrator which a lighting installation has the 1st page of a rectangle, an inside, and the 2nd page of a rectangle, and the light which entered into the 1st above-mentioned page emits from the 2nd above-mentioned page via t...  
JP2016095523A
To provide catadioptric projection objectives that have tilted deflecting mirrors which allows imaging of patterns including sub-patterns oriented in various directions.A first deflecting mirror has a first reflective coating with reflec...  
JPWO2013191255A
The optical integrator which a lighting installation has the 1st page of a rectangle, an inside, and the 2nd page of a rectangle, and the light which entered into the 1st above-mentioned page emits from the 2nd above-mentioned page via t...  
JP2016086060A
[Subject] Without consuming a memory of a computer excessively, also when a part of shape of a mask pattern is changed, an image formation pattern simulation system and an image formation pattern simulation method which can carry out a s...  
JP2015111672A5  
JP2016085472A
[Subject] An illumination-light study system which has high flexibility about change of shape of pupil intensity distribution, and a polarization state without being accompanied by exchange of an optical member. [Means for Solution] An i...  
JP5918858B2  
JP2016513817A
[Subject] As there are novelty and unobviousness to a prior art, the temperature of a reflector (for example, mirror) is controlled. [Means for Solution] An array of thermoelectrical heat pump which has respectively the 1st end that is i...  
JP2016075936A
To provide a device for making laser radiation uniform in the visual field of illumination, and to provide a method for manufacturing the device.A device for making laser radiation uniform in the visual field of illumination includes a f...  
JP5914254B2  
JP2016071353A
[Subject] The object of the present invention is to provide an optical apparatus which can realize smaller light equipment, light equipment using this, and a projection type display, controlling decline in utilization efficiency of light...  
JP2016072543A
[Subject] Although generating of a failure by a pattern is suppressed, provide a light irradiation device for peripheral exposure devices which can irradiate with light which has the irradiation intensity distribution which rises steeply...  
JP2016065923A
[Subject] Even when a point of a light source emitting light is large, control a fall of condensing nature in a condensing point. [Means for Solution] It extends to near the euphotic point at least from LED package 24A containing a plura...  
JP5911898B2  
JP5910324B2  
JP5909369B2  

Matches 601 - 650 out of 3,408