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Matches 601 - 650 out of 3,201

Document Document Title
JP2015163994A
To provide a lighting optical unit and a projection exposure device including the same.A lighting optical unit comprises: a first optical element including plural first reflection facet elements; and a second optical element including pl...  
JP2015163947A
To provide: a light source optical system capable of projecting a brighter image by reducing the volume of unconverted light returning to a light source from a wavelength conversion element; a light source device having the same; and an ...  
JP2015162446A
To provide an optical lens, a light source unit, and a lighting device capable of reducing glare with low light loss.A lighting device 1 comprises: a device body 6; and a light source unit 10 attached to this device body 6. The light sou...  
JP2015161737A
To provide a display device having a high optical performance, with small size, being thin.A display device includes a space phase modulation element 30 for forming a display optical flux 2, a transparent substrate 40 in which the displa...  
JP5772935B2  
JP5772090B2  
JP2015524942A
In the method of operating a micro lithography projection aligner, a facet mirror (72) is illuminated with the projection light (PL) which has a main wavelength between 5 nm and 30 nm. The group of the mirror facet (86) which a facet mir...  
JP2015155950A
[Subject] Composition of an optical system can be simplified and incidence of coherent light is ideally enabled in the near state to an equalization optical system. [Means for Solution] A coherent light source to which a lighting install...  
JP5768428B2  
JP2015524576A
An illumination-light study unit (4) contains the 1st facet element (17) and the 2nd facet element (18) that has a micro mirror (33) of a large number which can carry out a group division flexibly so that a facet (24) may be formed which...  
JP5765608B2  
JP2015146275A
To solve the problem of the possibility that the light intensity of a spot on a fluorescent body largely varies due to a positioning error (attaching error) between a light emission point of a semiconductor laser and a collimator lens, w...  
JP2015146417A
To provide: an exposure device and an exposure method, with which a mask pattern can be accurately exposed and transferred in relation to a shape of an exposed region of a workpiece even if the workpiece is distorted, and exposure accura...  
JP5761329B2  
JP5757930B2  
JP5759174B2  
JP2015141826A
To provide a luminous flux control member capable of facilitating correction of the shape of a reflection surface.A luminous flux control member of the present invention comprises an incident region and an emission region. The incident r...  
JPWO2013140589A1
本発明は、発光管(21)と、発光管(21 )からの光が入射する入射面(23a)と、 入射面(23a)から入射した光を内部で多 重反射させて出射する出射面(23b)...  
JP2015141393A
To provide an illumination device that can illuminate at sufficiently even luminance while making speckle unnoticeable.An illumination device 40 comprises: a first diffusion element 50; an irradiation device 70 that irradiates the first ...  
JP5756242B1
[Subject] A plurality of lamps provide an exposure device arranged the optimal. [Means for Solution] In exposure device 10 provided with lamp group 11 which comprised a plurality of lamps 12, and integrator 14 which improves the homogene...  
JP2015133304A
To provide an illumination lens capable of suppressing illuminance irregularity in illumination by emitted light.An illumination lens 4 illuminating a display unit by condensing rays from a light source 3 and emitting the condensed rays ...  
JP2015132848A
To provide an illumination optical system having high flexibility relating to a profile of pupil intensity distribution and changes in a polarization state without accompanying exchange of an optical member.The illumination optical syste...  
JP5753260B2  
JP5748589B2  
JP2015519736A
The present invention relates to an optical element (21) which has a substrate (30) and reflecting coating (31). Especially reflecting coating (31) is constituted so that EUV irradiation may be reflected, It is a plurality of layer pairs...  
JP2015127755A
To provide a projection type image display device and a projection optical systems, which are able to perform large-screen display with an easy, small and inexpensive configuration even when applied for super-wide angle.The projection ty...  
JP5746259B2  
JP2015125424A
To provide an optical device that enables reduction in a variation of a loss of light amount further than when guiding light from all of a plurality of light sources different in a wavelength by use of one fiber.The present invention rel...  
JP2015118362A
To provide a projector enhancing admissibility of positional accuracy, improving contrast of an image, further controlling a boundary between a bright portion and a dark portion in an image plane of an image projected to not be conspicuo...  
JP2015119192A
To provide a beam delivery system providing a beam of light having a reduced coherence as compared to laser light directly emitted from a laser of the beam delivery system.A beam delivery system of a projection exposure system comprises ...  
JP2015115423A
To provide a designing method of an exposure light source which is capable of generating a mask image as sharp as a light source of pixelated light intensity distribution and can be easily manufactured.The designing method includes: a fi...  
JP2015114633A
To provide a light irradiation apparatus capable of radiating a substantially parallel light beam with uniform and high luminance.A light irradiation apparatus for radiating a light beam to a rectangular irradiation area on an irradiatio...  
JP2015517733A
An illumination-light study unit for EUV projection lithography functions as showing illumination light to an object recognition field which can arrange a lithography mask. An illumination-light study unit has the 1st facet mirror (36) c...  
JP2015114620A
To enable improvement of speckle reduction effect without complicating a structure.A luminaire 40 includes: a diffusion member 67 having an anisotropic diffusion surface; a rotary shaft member 68 that rotates the anisotropic diffusion su...  
JP2015517729A
An illumination-light study unit for EUV projection lithography functions as carrying out slanting lighting of the illuminated viewing field which can arrange an object recognition field of a downstream image formation catoptric light st...  
JP2015111672A
To provide an illumination system of a micro lithography projection exposure device that can adjust both a space radiation illuminance distribution and an angular radiation illuminance distribution in a field dependent method.An illumina...  
JP5736746B2  
JP5737175B2  
JP2015108804A
To provide a liquid crystal modulator having a structure optimized for inspecting defects in a substrate, and a substrate inspection apparatus including the liquid crystal modulator.A substrate inspection apparatus includes a liquid crys...  
JP2015108768A
To provide a patterned light projecting device allowing further miniaturization.A patterned light projecting device comprises: a light source 2 emitting light ML; a condenser lens 3 condensing the light ML emitted from the light source 2...  
JP5731630B2  
JP5731591B2  
JP2015103810A
To provide extreme ultraviolet lithography process and a mask with reduced shadow effect and enhanced intensity.A mask is an extreme ultraviolet lithography (EUVL) mask. The mask includes: a first state and a second state different from ...  
JP5729047B2  
JP2015515637A
They are a method for uniforming bundle of rays 110 with long and slender optical element 100 constituted so that light might be uniformed, an optical system, and a lighting installation. Incidence cross section 101 of an optical element...  
JP5724561B2  
JP2015515117A
Each has the flexibility of at least one displacement, and was connected to at least one actuator (131) for each displacement, An optical component (40;40a) provided with the mirror array (22) which has a plurality of mirror elements (23...  
JP2015515140A
Present invention, it has the 1st reflective surface (110, 210, ...) and 2nd reflective surface (120, 220, ...) that received mutually and are arranged at an angle of an angle of ±10 degrees of 0 degree, or 90 degrees ±10 degrees -- at...  
JP5721858B2  
JP2015095337A
To provide a lighting device capable of occurrence of irregular luminance.A lighting device 10 includes: a light source 21; and a condenser 23. The light source 21 includes a flat light-emitting surface 28. The condenser 23 is formed int...  

Matches 601 - 650 out of 3,201