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Patent Searching and Data


Matches 601 - 650 out of 3,435

Document Document Title
JP5983689B2  
JP5983966B2  
JP2016162754A
[Subject] Even if it is irradiated with many light sources at a mutually different angle and superposition of a beam pattern is made, a luminescent device for vehicles with which matching of a beam pattern can be made to be made is provi...  
JP2016162731A
[Subject] Absorption of light in the end face by the side of incidence of a shading object which constitutes a louver is controlled, and a field-like lighting installation which can raise luminosity is provided. [Means for Solution] Ligh...  
JP2016162575A
[Subject] Though afocal magnification is low, a bundle of rays can be extracted thinly and small light equipment is provided. A projector provided with a lighting installation provided with the above-mentioned light equipment and the lig...  
JP2016157096A
[Subject] A lighting installation which can obtain illumination light more efficiently is provided. [Means for Solution] It has light source 10 and light tunnel 14, and constitutes lighting installation 1 used for a projection display et...  
JP2016526258A
The present invention relates to a laser light source (300), a wavelength conversion light source, a synthetic light source, and a projection system. The laser light source concerned is [a laser device array and] with a condensing optica...  
JP5979793B2  
JP2016154141A
[Subject] A lighting installation etc. which can reduce luminosity unevenness in illumination light are provided. [Means for Solution] A lighting installation is provided with the following. A light source part containing a laser light s...  
JP2016153878A
[Subject] An output of blue light can be improved sharply and light equipment small and high-intensity moreover is provided. [Means for Solution] A dichroic mirror made to reflect blue excitation light which emits light equipment of this...  
JP5979693B2  
JP2016525231A
In the case of an optical component (36), an optical element (45) is fixed to a frame (43) by transverse direction (44), and a frame (43) is, Even when linear expansion of an optical element (45) of a transverse direction (44) is a maxim...  
JP2016152270A
[Subject] A plurality of lamps provide an exposure device arranged the optimal. [Means for Solution] In exposure device 10 provided with lamp group 11 which comprised a plurality of lamps 12, and integrator 14 which improves the homogene...  
JP2016151687A
[Subject] Provide the optical system for projecting which covers a wide variable power range and can respond also to the image display element of high resolution in application to an approached type projector. [Means for Solution] In the...  
JP2016525232A
the present invention -- especially -- lithography -- it is an optical assembly (100) of a lithography system which is detailed or images nano structureAt least two optical elements (101, 103) arranged succeeding a beam course of an opti...  
JP2016151688A
[Subject] Provide the optical system for projecting which covers a wide variable power range and can respond also to the image display element of high resolution in application to an approached type projector. [Means for Solution] In the...  
JP2016071353A5  
JP2016524182A
The present invention relates to a system for producing structure in a wafer using a projection exposure system and a lithography mask. contribution of the number [as opposed to a CD error by performing mask adjustment based on a rule us...  
JP2016524184A
An optical component is provided with at least one means to reduce influence of radiation to displacement of an optical element (27). [Chosen drawing] Drawing 5  
JP5967132B2  
JP2016142900A
To provide an illumination device that offers reduced illumination irregularity, and a projector having the same.An illumination device includes a light source unit that emits excitation light and a wavelength conversion element. In a cr...  
JP2016139143A
To provide an appropriate illumination condition necessary for transferring a mask pattern having a variety of characteristics with fidelity such as an illumination condition of great variety with regard to a light intensity distribution...  
JP2016138961A
To provide a projection optical device that efficiently suppresses a fluctuation in aberration due to a variation in installation position in lens groups constituting a projection optical system, and a projector including the projection ...  
JP5959342B2  
JP2016133756A
To provide a projection optical system that is adaptable to high luminance and high resolution and can achieve a large angle of view.A projection optical system 40 comprises, successively from an enlargement side, a first lens group to a...  
JP2016130859A
To provide a spatial light modulation unit used for an illumination optical system capable of improving a degree of freedom concerning an intensity level of a pupil intensity distribution.The spatial modulation unit used for an illuminat...  
JP2016127226A
[Subject] In the case of exposure, desired temperature distribution is produced inside a pattern field of Reticle . [Means for Solution] Exposure device 100 holds Reticle R which has the pattern field in which a pattern was formed, and i...  
JP2016063185A5  
JP5944400B2  
JP2016518619A
A micro lithography device (10) contains an object system (20) containing a penetration filter (42) constituted so that light irradiation distribution in projection Optical path might be corrected variably. A penetration filter (42) cont...  
JP5938335B2  
JP5938707B2  
JP2016109731A
[Subject] In a microscope, irradiation light to a sample is adjusted swiftness and appropriately. [Means for Solution] It has a reflective means including a reflective surface which has a part of shape of an elliptical pipe side, and a d...  
JPWO2014010274A1
The projection optical system (PL) which turn a substrate processing device (EX) to a substrate, it makes the catoptric light bunch (L2) which occurs from a lighting field (IR) project, and images the image of a mask pattern to a substra...  
JPWO2014010274A
The projection optical system (PL) which turn a substrate processing device (EX) to a substrate, it makes the catoptric light bunch (L2) which occurs from a lighting field (IR) project, and images the image of a mask pattern to a substra...  
JP5934082B2  
JP5935852B2  
JP5935920B2  
JP2016105190A
To provide a ring light illuminator capable of creating a well-defined and homogeneous illumination field in an area to be illuminated.A ring light illuminator with annularly arranged light sources is disclosed. To each light source ther...  
JP2016517026A
An illumination-light study unit (4) for projection lithography functions as illuminating an object recognition field (5) which can arrange an object (7) imaged by illumination light (16). An illumination-light study unit (4) has a view ...  
JP2016103025A
[Subject] An exposure method and a device for enabling transfer of a pattern of various pitches to high resolution simultaneous respectively are provided. [Means for Solution] It is an exposure device which has illumination-light study s...  
JP5928653B2  
JP5928632B2  
JP5927555B2  
JP2016099390A
[Subject] An illumination-light study system and an image display device which can raise a contrast ratio of picture light by reducing diffraction light are provided. [Means for Solution] An optical equalization element (14) which equali...  
JP2016100461A
[Subject] Large-sized-izing of an illumination optical device accompanying an increase in the number of optical components and complication of imaging optics and big-ticket-ization are avoided, and an illumination optical device in which...  
JPWO2013191255A1
The optical integrator which a lighting installation has the 1st page of a rectangle, an inside, and the 2nd page of a rectangle, and the light which entered into the 1st above-mentioned page emits from the 2nd above-mentioned page via t...  
JP2016095523A
To provide catadioptric projection objectives that have tilted deflecting mirrors which allows imaging of patterns including sub-patterns oriented in various directions.A first deflecting mirror has a first reflective coating with reflec...  
JPWO2013191255A
The optical integrator which a lighting installation has the 1st page of a rectangle, an inside, and the 2nd page of a rectangle, and the light which entered into the 1st above-mentioned page emits from the 2nd above-mentioned page via t...  
JP2016086060A
[Subject] Without consuming a memory of a computer excessively, also when a part of shape of a mask pattern is changed, an image formation pattern simulation system and an image formation pattern simulation method which can carry out a s...  

Matches 601 - 650 out of 3,435