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Patent Searching and Data


Matches 601 - 650 out of 3,156

Document Document Title
JP2015095337A
To provide a lighting device capable of occurrence of irregular luminance.A lighting device 10 includes: a light source 21; and a condenser 23. The light source 21 includes a flat light-emitting surface 28. The condenser 23 is formed int...  
JP2015092604A
To provide an exposure device and method that enables patterns of various pitches to be simultaneously transferred at high resolution respectively.An exposure device comprises: an illumination optical system 12 for illuminating a reticle...  
JPWO2013118615A1
例えばEUV光を用いる露光装置に適用され たときに、装置のフットプリントを小さく抑 えることのできる反射結像光学系。照明光学 系からの光で照明された第1面に配置さ...  
JP2015088410A
To provide an LED lighting device that enables respective light-emitting points of a plurality of LED elements to be condensed in a lump and that can extremely decrease loss of light emitted from the plurality of LED elements.An LED ligh...  
JP2015513223A
本発明は、(a)各々が部分ビームを案内し 、少なくとも1つが少なくとも1つの欠陥を 含む複数のチャネルと、(b)少なくとも1 つの欠陥を有する少なくとも1つのチャ...  
JP2015513227A
本発明は、マイクロリソグラフィ投影露光装 置の光学系に関し、それは、ミラー装置によ って反射された光の角度分布を変更するため に互いに独立して調節可能である複数の...  
JP2015512560A
EUV投影リソグラフィのための照明光学ユ ニットは、リソグラフィマスクを配置するこ とができる照明視野に向けて照明光(16) を案内するように機能する。照明光学ユ...  
JP2015082594A
To provide a fluid supply system capable of suppressing generation of an exposure failure.A fluid supply system comprises: a first temperature adjustment device capable of adjusting temperature of first fluid; a second temperature adjust...  
JP2015079815A
To provide an illumination optical system suitable for an exposure apparatus by controlling telecentricity for each light transmission part constituting light transmission means, and correcting the telecentricity in an exposure region of...  
JP2015079811A
To compensate either one of local focus or distortion variations according to an exposure history at exposure equipment.Two places of a thin optical component are simultaneously deformed by the same amount in the same direction or the op...  
JP5706519B2  
JP5704519B2  
JP2015511770A
投影露光装置のための照明光学ユニット(2 5)は、リソグラフィマスク(7)を配置す ることができる照明視野(5)に向けて照明 光(16)を案内するように機能する。...  
JP2015073129A
To provide an illumination optical device, an exposure device, and a device manufacturing method that are capable of contributing to an improvement of device manufacturing efficiency through an increase of output of a light source even w...  
JP5700272B2  
JP2015511064A
EUV投影リソグラフィのための照明光学ユ ニット(26)は、リソグラフィマスク(7 )を配置することができる照明視野(5)に 照明光(16)を案内するように機能す...  
JP2015065482A
To reduce influence of a localized heat load when using immersion fluid in a lithographic apparatus.A support table configured to support a substrate comprises a support section to support a substrate, and a regulation system to supply h...  
JP2015065441A
To provide an illumination optical device capable of reducing light quantity loss when lighting up a mask with illumination light in a predetermined polarized state, and a projection exposure device.An illumination optical device include...  
JP2015510654A
本開示は、複数の仮想光源を生成し、少なく とも部分的には光をコリメートするシステム 、方法および装置を提供するものである。1 つの態様では、光をコリメートするマニ...  
JP5696746B2  
JP2015510262A
本発明は光学装置、特にマイクロリソグラフ ィのための投影レンズであって、光学表面( 31a)及び基板(32)を含む少なくとも 1つの光学素子(21)を備え、基板は...  
JP5694362B2  
JP2015057765A
To provide a luminaire capable of achieving uniform lighting without making an optical system configuration complicated.A luminaire 40 includes: a plurality of first element lenses 43 for condensing entered coherent light; and a field le...  
JP2015509285A
本発明は、マイクロリソグラフィ投影露光装 置のための光学系及びマイクロリソグラフィ 露光方法に関する。マイクロリソグラフィ投 影露光装置のための光学系は、偏光影響...  
JP5688672B2  
JP5689059B2  
JP5688410B2  
JPWO2013035661A1
基板処理装置は、基板の被処理面にパターン を形成する基板処理装置であって、パターン が形成されたマスクを保持し、回転軸を中心 に回転可能な中空状のマスク保持部と、...  
JP2015055832A
To provide an image forming apparatus using a spatial light modulator to form a more clear and bright image by reducing crosstalk.A plurality of image forming units 1 irradiates a surface of a workpiece W conveyed by a conveyance system ...  
JP2015053449A
To provide a light source device capable of achieving a desired illuminance distribution.A light source device includes: a first light emission unit having a plurality of LEDs arranged in a form capable of integrally controlling a power ...  
JP5686882B2  
JP2015046601A
To provide an illumination optical system which can realize illumination conditions rich in variety and can improve device productivity when it is applied to an exposure apparatus.The illumination optical system is designed to illuminate...  
JP2015046604A
To provide an illumination optical device capable of reducing light quantity loss when lighting up a mask with illumination light in a predetermined polarized state, and a projection exposure device.An illumination optical device compris...  
JP2015046619A
To provide an illumination optical device capable of reducing light quantity loss when lighting up a mask with illumination light in a predetermined polarized state, and a projection exposure device.An illumination optical device include...  
JP5684413B2  
JP5682799B2  
JPWO2013018799A1
光量ロスを低減させ、一様な照度分布を持つ 照明を得る照明装置の提供を目的とする。被 照明面を照明する照明装置において、光路を 横切る所定の面上の所定方向に沿って周...  
JP2015038975A
To provide an illumination optical technique that targets on illumination intensity over an illumination field and can exert influence in an illuminating angle-dependent mode.An illuminating optical unit comprises raster arrangements 12 ...  
JPWO2012169090A1
光源から供給される照明光を用いてレチクル 面を照明する照明方法は、空間光変調器の複 数のミラー要素に対して入射光の反射角を制 御するための駆動信号を設定することと...  
JPWO2012172672A1
蛍光体カラーホイル1が、ガラス基板2と、 ガラス基板2を回転させる回転モーター3と 、ガラス基板2の表面に環状に塗布されてい る蛍光体(第1の蛍光体)5と、を有し...  
JP5670602B2  
JP5673119B2  
JP2015505169A
本発明は、特にマイクロリソグラフィ投影露 光装置における偏光影響光学配置に関する。 本発明の開示の態様により、偏光影響光学配 置は、光学的ポジティブ単軸結晶材料か...  
JP2015031955A
To provide a method for optimizing effective light intensity.An effective light intensity distribution is optimized by the steps of: (a) providing a light source discharging a light beam 1 of a first intensity distribution 2a in a Z-axis...  
JP5668780B2  
JP2015029128A
To provide an illumination optical device capable of achieving the lighting conditions that are rich in diversity for the shape, size and polarization state of illumination pupil luminance distribution.The illumination optical device com...  
JP2015029092A
To provide a reflective optical element for grazing incidence at an extreme ultraviolet wavelength, which has a reflectance as high as possible.A reflective optical element 100 to be used for a collector mirror in an optical system for E...  
JP5668779B2  
JP2015026644A
To provide a proximity exposure device and a proximity exposure method capable of obtaining a good light exposure accuracy even in a case where deviation occurs between a position of a chip and a position of a pattern of a mask at light ...  
JP2015503231A
投影露光装置(1)のための照明及び変位デ バイスは、照明視野(18)を照明するため の照明光学ユニット(25)を含む。物体ホ ルダ(17a)は、物体(17)を物体...  

Matches 601 - 650 out of 3,156