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JP2015029128A |
To provide an illumination optical device capable of achieving the lighting conditions that are rich in diversity for the shape, size and polarization state of illumination pupil luminance distribution.The illumination optical device com...
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JP2015029092A |
To provide a reflective optical element for grazing incidence at an extreme ultraviolet wavelength, which has a reflectance as high as possible.A reflective optical element 100 to be used for a collector mirror in an optical system for E...
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JP5668779B2 |
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JP2015026644A |
To provide a proximity exposure device and a proximity exposure method capable of obtaining a good light exposure accuracy even in a case where deviation occurs between a position of a chip and a position of a pattern of a mask at light ...
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JP2015503231A |
Lighting and a displacement device for a projection aligner (1) contain an illumination-light study unit (25) for illuminating an illuminated viewing field (18). An object holder (17a) can be used to equip with an object (17) so that at ...
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JP5660074B2 |
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JP5659497B2 |
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JP2015015281A |
To provide a light emitting device capable of suppressing luminance reduction and obtaining high light extraction efficiency.In a light emitting device 10 including a lens 2 and a light emitter 1, the lens is a spherical segment body hav...
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JP5656731B2 |
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JP2015008304A |
To provide an illumination optical device which can form an annular pupil distribution in circumferential polarization state, while suppressing light quantity loss well.The illumination optical device includes a light flux conversion ele...
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JP2015007774A |
To provide a compact lighting device in which light utilization efficiency is improved, to provide a projection type display device provided with the lighting device, and to provide a direct-view display device provided with the lighting...
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JP2015005764A |
To provide a spatial light modulation unit that is used in an illuminating optical system and is able to improve the degree of freedom in the intensity level of a pupil intensity distribution.A spatial light modulation unit used in an il...
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JP2015005676A |
To provide an illuminating optical system by which a pupil intensity distribution at each point on a target illumination face can be adjusted to its required distribution.An illuminating optical system that illuminates a target illuminat...
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JP5650272B2 |
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JP2014241411A |
To provide a mount that has improved accuracy and reproducibility and decreased sensitivity to irregularities from the nominal geometry of an optical element that the mount supports.A mount is configured to mount an optical element in a ...
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JP5646632B2 |
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JP5644921B2 |
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JP5646580B2 |
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JP2014239088A |
To reduce the effect of a speckle pattern on the surface to be irradiated when light having high coherence is used.Disclosed is an illuminating optical system ILS which irradiates a reticle surface Ra with illumination light IL from a li...
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JP2014534643A |
ＥＵＶ放射線（１４）のためのミラー（２０
）は、第１のＥＵＶ放射線反射領域と少なく
とも１つの第２のＥＵＶ放射線反射領域とを
有する全体反射面（２４）を含み、ＥＵ...
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JP5642385B2 |
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JP2014236211A |
To provide an illuminating device which allows for efficient adjustment of illumination of the illumination light, and to provide an exposure device, an illuminating method and a method of manufacturing a device.An illuminating device in...
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JP2014533441A |
An illumination system of a micro lithography projection aligner has an array of a mirror (42a, 42b, 42c) by which the optical modulator (38) was supported by an abnormal-conditions machine board (70) and abnormal-conditions machine boar...
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JP2014225641A |
To provide an illumination optical system capable of suppressing deterioration in light utilization efficiency when a substrate is exposed using light through a prism changing a cross-sectional shape of a light flux.A prism optical syste...
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JP5630455B2 |
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JP2014219681A |
To provide a high performance projection type picture display device that uses a plurality of light sources, and does not cause a light source device to be enlarged upon using the light source device irradiating an illumination optical s...
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JP2014530509A |
The collector (15) for the projection aligner (1) for micro lithography, A plurality of reflective divisions (24) embodied and arranged so that a reflective division can receive incidence by the incidence angle (f) in a predetermined ang...
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JP5623937B2 |
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JP2014206571A |
To provide an image display light generation part assembly for an image display device, which realizes the image display device that obtains high contrast high image quality at low cost.A 1/4 wavelength plate 239 mutually exchanges a lin...
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JP2014529194A |
The projection object lens of a micro lithography projection aligner, It has a wave face amendment device (42), and a wave face amendment device (42) is provided with the refraction optical element (44;44a, 44b) which has a circumference...
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JP2014203905A |
To make it possible to obtain a distribution close to a target light intensity distribution in an irradiated surface even when the shape or properties of the reflecting face of the reflecting element of a spatial light modulator is chang...
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JP2014202805A |
To provide a light irradiation device which offers increased irradiation light intensity.A light irradiation device comprises a liquid actuator 100, a compact light source 200, and a lens 300. Light from the small light source 200 enters...
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JP2014202679A |
To provide a luminaire capable of reducing speckle noise further than the conventional art, and to provide an inspection apparatus that allows for short-time and efficient detection of fine defects required in association with the microf...
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JP5611443B2 |
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JP5604813B2 |
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JP5606634B2 |
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JP2014195048A |
To provide an illumination optical system advantageous for efficiently illuminating a surface to be illuminated using light from a plurality of light sources.This illumination optical system for illuminating the surface to be illuminated...
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JP2014195094A |
To provide an illumination optical device which can form an annular pupil distribution in circumferential polarization state, while suppressing light quantity loss well.The illumination optical device includes a light flux conversion ele...
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JP2014195086A |
To provide an illumination optical device and a projection exposure device capable of reducing light quantity loss when illuminating a mask with illumination light in a prescribed polarization state.An illumination optical device compris...
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JP2014191158A |
To provide a projector capable of improving use efficiency of illumination light.A projector includes: a light source 2; a diffraction optical element 5 to which light L1 emitted from the light source 2 is made incident; a light modulati...
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JP2014186086A |
To provide a projector capable of correcting focus deviation and achieving high luminance with a simple configuration.A projector 1 including a display device 2 modulating illumination light and a projection lens 35 projecting the light ...
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JP5598239B2 |
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JP5598733B2 |
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JP2014182207A |
To provide a luminaire capable of reducing speckle noise.A luminaire includes: a light source 41; a light condensing optical system 43A on which light emitted from the light source 41 is incident; a first light diffusion layer 49a on whi...
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JP2014179619A |
To provide an optical system for a microlithographic projection exposure device.An optical system for a microlithographic projection exposure device includes an optical system axis (OA) and polarization influent optical arrays. The polar...
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JP2014179631A |
To provide an illumination optical device capable of reducing light quantity loss when lighting up a mask with illumination light in a predetermined polarized state, and a projection exposure device.An illumination optical device compris...
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JP2014179645A |
To provide an illumination optics for microlithography.The illumination optics can divide an illumination light radiation bundle 3 into a plurality of radiation sub-bundles (28 to 30) which are assigned to different illumination angles o...
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JP2014178525A |
To provide a laser light source device which is capable of effectively cutting off the stray light component of laser light, while miniaturizing an optical system.A first collimator lens 20 turns the laser light emitted from an LD chip 1...
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JP2014525148A |
An indication of the present invention is related with an optical system and a micro lithography exposure method of a micro lithography projection aligner. By a mode of the present invention, an optical system is a light source, Light wh...
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JP2014178599A |
To provide a luminaire capable of emitting illumination light having more homogeneous illumination distribution.A luminaire includes: a light source 2; a diffraction optical element 5 on which light emitted from the light source 2 is inc...
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