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JP2016025316A |
To provide a technique for suppressing ununiformity of lighting due to a light source with a small number of optical elements.An illumination optical element 3 irradiates a predetermined area A1 of an illuminated surface, i.e., a sample ...
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JP2016021526A |
To provide an illumination optical device for forming the shape of the image of a secondary light source into a desired ring shape or a circular shape, while suppressing the loss of a light quantity.An illumination optical device 100 inc...
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JP5849727B2 |
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JP2016502684A |
The illumination-light study unit for EUV projection lithography has the 1st facet mirror and the 2nd facet mirror to which each has a plurality of reflective facets on a base material. The facet of the 1st facet mirror can be switched a...
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JPWO2013179977A1 |
照明装置（ＩＵ）は、第１の光源部（２１ａ
）と、第１の光源部と光の出射方向が異なる
第２の光源部（２１ｂ）と、第１の光源部か
らの光と第２の光源部からの光の進行方...
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JPWO2013179977A |
A lighting installation (IU) is provided with the 1st light source part (21a), the 1st light source part and the 2nd light source part (21b) that differs in the outgoing radiation direction of light, and a deflection part (22) that defle...
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JP2016502136A |
An EUV collector (15) functions as transmitting EUV radiation (14) from an EUV radiation source (3) in a lighting long-sight field (17a). A collector (15) has at least one Normal mirror collector subunit (23) containing at least one mirr...
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JP2016502233A |
Lighting installation 1 has housing 3 provided with luminescence window 5 and antenna reflector 7 of the side opposite to the above-mentioned luminescence window. Light transmittance state plane carrier 9 is allocated between the above-m...
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JP5845684B2 |
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JP2016009014A |
To provide an illumination device capable of projecting an image that is bright and high in chromatic purity.An illumination light source device according to the present invention comprises: a phosphor 5 which is irradiated by light from...
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JPWO2013179961A |
The section shape of the beam of a light emitting element is operated orthopedically, reducing an optical transfer loss. The light equipment for endoscopes (13) is provided with the light emitting element part (71) which has a laser diod...
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JPWO2013179961A1 |
光伝達損失を低減しつつ、発光素子のビーム
の断面形状を整形する。内視鏡用の光源装置
（１３）には、レーザダイオード（ＬＤ２）
を有する発光素子部（７１）と、ビーム...
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JP2016500838A |
An EUV optical apparatus is provided with Miller (22x) in whom many regulation is possible on the Miller main part (120). Each mirror main part is supported on an actuator (100x) provided with moving parts (132, 134, 136) and a fixed cas...
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JP5842615B2 |
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JP5843905B2 |
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JPWO2013164923A1 |
撮像用の補助光として適した配光を有する補
助光源ユニット用の光学素子であって、小型
を保ちつつ、十分な光量を確保し、製造が容
易で低コストである光学素子及びそれを...
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JPWO2013164923A |
It is an optical element for source units of a fill-in flash which has Light distribution which was suitable as a fill-in flash for an image pick-up, and maintaining small size, sufficient light volume is secured, and manufacture is easy...
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JP5835828B2 |
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JP2015230354A |
To provide a light source device that can improve the efficiency of use of light and reduce the size thereof, and efficiently cool a wavelength conversion element.A light source device includes: a light emitting element that emits excita...
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JPWO2013157249A1 |
【課題】６枚構成の投写用レンズにおいて、
小さなＦナンバー、広角、諸収差の良好な補
正、高性能を実現する。【解決手段】投写用
レンズは、拡大側から順に、縮小側に凹...
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JPWO2013157249A |
[Subject] In a lens for projection of six-sheet composition, good amendment of small F number, a wide angle, and Osamu differences and high performance are realized. [Means for Solution] The 1st negative lens in which a lens for projecti...
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JPWO2013150752A |
A graphic display device has a light source, a display element, a lighting prism, and an eyepiece optical system. A light source ejects illumination light. A display element modulates illumination light and ejects it as an image light. I...
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JPWO2013150752A1 |
映像表示装置は、光源と表示素子と照明プリ
ズムと接眼光学系とを有する。光源は照明光
を射出する。表示素子は照明光を変調して映
像光として射出する。照明プリズムは光...
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JP2015223462A |
To reduce speckle noises by a further simple method.The lighting system includes: at least one laser light source exiting laser beams; a coupling optical system for coupling the laser beams exited from the laser source, with optical fibe...
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JP2015534654A |
the present invention -- light source; condenser [of an optical beam] (5) ; -- it is an optical equalization system (4) containing at least one micro lens array (L3, L4), and an image focal point side of an optical equalization system is...
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JP2015534123A |
How to operate a micro lithography device, The stage of giving the illumination system (20) in which the optical irradiance distribution on an array contains the array (34) of the mirror (M) which can be inclined which changes only at le...
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JP2015534130A |
A lighting system of a micro lithography projection aligner is provided with an optical integration machine (70), and an optical integration machine (70) contains the 1st optical raster plate (74) and the 2nd optical raster plate (76). T...
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JP2015206817A |
To provide a lighting device capable of lighting under desired lighting conditions, and an inspection device.Provided is a lighting device 11 including: an EUV light source 21 of generating EUV light by discharge plasma; a filter 22 of s...
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JP5816152B2 |
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JP2015201433A |
To provide an illumination optical system and an image projection device that can realize the projection of an image with high luminance and high image quality.An illumination optical system comprises a first lens array that divides ligh...
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JP5810467B2 |
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JP5807761B2 |
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JP2015198110A |
To provide an imprint device which is advantageous when light from a light source is distributed to a plurality of processing parts.Disclosed is an imprint device for molding an imprint material on a substrate using a mold in which a pat...
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JP2015197963A |
To provide a linear light source unit structure having a hole between the light source side of a light guide member and a light-emitting surface, and diffusing incident light.In a linear light source unit structure, the shape of a hole i...
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JP2015195141A |
To provide an irradiation device enabling light irradiation with even illuminance and desired wavelength.An irradiation device 1 includes a light source 11, a recessed reflection mirror 12 reflecting light emitted from the light source 1...
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JP5803377B2 |
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JP5803222B2 |
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JP5803412B2 |
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JP2015191043A |
To provide a lighting device configured to effectively obscure speckle, while using light from a light source with a high utilization rate.A lighting device 40 includes: an irradiation device 70; a diffusion element 50; a first lens arra...
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JP5800340B2 |
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JP2015184303A |
To provide a light source optical device and a projector 10 where light efficiency of light source light is enhanced.A light source optical device includes: a light source; an illumination optical system 110 including a plurality of lens...
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JP5793222B2 |
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JP2015529855A |
Test structure for measuring a wavefront aberration of an extreme ultraviolet-rays (EUV) inspection system is indicated. a test -- structure -- EUV -- light -- substantial -- reflexibility -- not having -- a material -- from -- forming -...
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JP2015172749A |
To provide an illumination optical apparatus which can realize appropriate illumination conditions necessary for accurate transfer of mask patterns having varied characteristics, e.g. illumination conditions with wide variety in the ligh...
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JP5787382B2 |
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JP5787133B2 |
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JP2015166863A |
To provide a lens which allows for measuring light intensity of an effective luminous flux propagating therethrough without requiring additional components for coupling light out.A lens includes at least one object-side refractive surfac...
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JP5780337B2 |
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JP5781165B2 |
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JP2015163994A |
To provide a lighting optical unit and a projection exposure device including the same.A lighting optical unit comprises: a first optical element including plural first reflection facet elements; and a second optical element including pl...
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