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Patent Searching and Data


Matches 701 - 750 out of 3,324

Document Document Title
JP2015095337A
To provide a lighting device capable of occurrence of irregular luminance.A lighting device 10 includes: a light source 21; and a condenser 23. The light source 21 includes a flat light-emitting surface 28. The condenser 23 is formed int...  
JP2015092604A
To provide an exposure device and method that enables patterns of various pitches to be simultaneously transferred at high resolution respectively.An exposure device comprises: an illumination optical system 12 for illuminating a reticle...  
JPWO2013118615A1
例えばEUV光を用いる露光装置に適用され たときに、装置のフットプリントを小さく抑 えることのできる反射結像光学系。照明光学 系からの光で照明された第1面に配置さ...  
JPWO2013118615A
For example, reflective imaging optics which can stop the footprint of a device small when applied to the exposure device using EUV light. The reflective imaging optics which images the image of the pattern arranged at the 1st page illum...  
JP2013218235A5  
JP2015088410A
To provide an LED lighting device that enables respective light-emitting points of a plurality of LED elements to be condensed in a lump and that can extremely decrease loss of light emitted from the plurality of LED elements.An LED ligh...  
JP2015513223A
A plurality of channels in which (a) of each shows the present invention to a partial beam, and at least one includes at least one defect, (b) It is arranged at at least one channel which has at least one defect, and is related with an i...  
JP2015513227A
The present invention relates to an optical system of a micro lithography projection aligner, and is it, In order to change angular distribution of light reflected by mirror device, it becomes independent mutually. At least one mirror de...  
JP2015512560A
The illumination-light study unit for EUV projection lithography functions as guiding the illumination light (16) towards the illuminated viewing field which can arrange a lithography mask. An illumination-light study unit has the 1st fa...  
JP2015082594A
To provide a fluid supply system capable of suppressing generation of an exposure failure.A fluid supply system comprises: a first temperature adjustment device capable of adjusting temperature of first fluid; a second temperature adjust...  
JP2015079815A
To provide an illumination optical system suitable for an exposure apparatus by controlling telecentricity for each light transmission part constituting light transmission means, and correcting the telecentricity in an exposure region of...  
JP2015079811A
To compensate either one of local focus or distortion variations according to an exposure history at exposure equipment.Two places of a thin optical component are simultaneously deformed by the same amount in the same direction or the op...  
JP5706519B2  
JP5704519B2  
JP2015511770A
An illumination-light study unit (25) for a projection aligner functions as guiding illumination light (16) towards an illuminated viewing field (5) which can arrange a lithography mask (7). The 1st facet mirror (19) is an illumination-l...  
JP2015073129A
To provide an illumination optical device, an exposure device, and a device manufacturing method that are capable of contributing to an improvement of device manufacturing efficiency through an increase of output of a light source even w...  
JP5700272B2  
JP2015511064A
An illumination-light study unit (26) for EUV projection lithography functions as showing illumination light (16) to an illuminated viewing field (5) which can arrange a lithography mask (7). A facet mirror (19) which has a plurality of ...  
JP2013182207A5  
JP2015065482A
To reduce influence of a localized heat load when using immersion fluid in a lithographic apparatus.A support table configured to support a substrate comprises a support section to support a substrate, and a regulation system to supply h...  
JP2015065441A
To provide an illumination optical device capable of reducing light quantity loss when lighting up a mask with illumination light in a predetermined polarized state, and a projection exposure device.An illumination optical device include...  
JP2015510654A
This indication generates a plurality of virtual light sources, and provides a system, a method, and a device which collimate light at least partially. In one mode, the manifold which collimates light can generate a plurality of virtual ...  
JP5696746B2  
JP2015510262A
Zero crossing temperature deltaT related to [the present invention is a projection lens for an optical apparatus, especially micro lithography, have at least one optical element (21) containing the optical surface (31a) and a substrate (...  
JP5694362B2  
JP2015057765A
To provide a luminaire capable of achieving uniform lighting without making an optical system configuration complicated.A luminaire 40 includes: a plurality of first element lenses 43 for condensing entered coherent light; and a field le...  
JP2015509285A
The present invention relates to an optical system and a micro lithography exposure method for a micro lithography projection aligner. An optical system for a micro lithography projection aligner, Polarization influence optical arrangeme...  
JP5688672B2  
JP5689059B2  
JP5688410B2  
JPWO2013035661A
A substrate processing device is provided with the following. It is a substrate processing device which forms a pattern in a processed side of a substrate, a mask in which a pattern was formed is held, and it is a mask attaching part of ...  
JPWO2013035661A1
基板処理装置は、基板の被処理面にパターン を形成する基板処理装置であって、パターン が形成されたマスクを保持し、回転軸を中心 に回転可能な中空状のマスク保持部と、...  
JP2015055832A
To provide an image forming apparatus using a spatial light modulator to form a more clear and bright image by reducing crosstalk.A plurality of image forming units 1 irradiates a surface of a workpiece W conveyed by a conveyance system ...  
JP2015053449A
To provide a light source device capable of achieving a desired illuminance distribution.A light source device includes: a first light emission unit having a plurality of LEDs arranged in a form capable of integrally controlling a power ...  
JP5686882B2  
JP2015046601A
To provide an illumination optical system which can realize illumination conditions rich in variety and can improve device productivity when it is applied to an exposure apparatus.The illumination optical system is designed to illuminate...  
JP2015046604A
To provide an illumination optical device capable of reducing light quantity loss when lighting up a mask with illumination light in a predetermined polarized state, and a projection exposure device.An illumination optical device compris...  
JP2015046619A
To provide an illumination optical device capable of reducing light quantity loss when lighting up a mask with illumination light in a predetermined polarized state, and a projection exposure device.An illumination optical device include...  
JP5684413B2  
JP5682799B2  
JP2013251222A5  
JPWO2013018799A
A light volume loss is reduced and it aims at offer of a lighting installation which obtains lighting with uniform illumination distribution. A deviation member which forms illumination distribution which has a periodic pattern along a d...  
JPWO2013018799A1
光量ロスを低減させ、一様な照度分布を持つ 照明を得る照明装置の提供を目的とする。被 照明面を照明する照明装置において、光路を 横切る所定の面上の所定方向に沿って周...  
JP2015038975A
To provide an illumination optical technique that targets on illumination intensity over an illumination field and can exert influence in an illuminating angle-dependent mode.An illuminating optical unit comprises raster arrangements 12 ...  
JPWO2012169090A1
光源から供給される照明光を用いてレチクル 面を照明する照明方法は、空間光変調器の複 数のミラー要素に対して入射光の反射角を制 御するための駆動信号を設定することと...  
JPWO2012172672A
Fluorescent substance color wheel 1 has glass substrate 2, rotary motor 3 made to rotate glass substrate 2, and fluorescent substance (the 1st fluorescent substance) 5 annularly applied to the surface of glass substrate 2, and the center...  
JPWO2012169090A
It is characterized by a lighting method which illuminates a レチクル side using illumination light supplied from a light source comprising the following. A drive signal for controlling an angle of reflection of incidence light to a ...  
JPWO2012172672A1
蛍光体カラーホイル1が、ガラス基板2と、 ガラス基板2を回転させる回転モーター3と 、ガラス基板2の表面に環状に塗布されてい る蛍光体(第1の蛍光体)5と、を有し...  
JP2014006372A5  
JP5670602B2  

Matches 701 - 750 out of 3,324