Login| Sign Up| Help| Contact|

Patent Searching and Data


Matches 701 - 750 out of 3,408

Document Document Title
JP5843905B2  
JPWO2013164923A1
撮像用の補助光として適した配光を有する補 助光源ユニット用の光学素子であって、小型 を保ちつつ、十分な光量を確保し、製造が容 易で低コストである光学素子及びそれを...  
JPWO2013164923A
It is an optical element for source units of a fill-in flash which has Light distribution which was suitable as a fill-in flash for an image pick-up, and maintaining small size, sufficient light volume is secured, and manufacture is easy...  
JP5835828B2  
JP2015230354A
To provide a light source device that can improve the efficiency of use of light and reduce the size thereof, and efficiently cool a wavelength conversion element.A light source device includes: a light emitting element that emits excita...  
JPWO2013157249A1
【課題】6枚構成の投写用レンズにおいて、 小さなFナンバー、広角、諸収差の良好な補 正、高性能を実現する。【解決手段】投写用 レンズは、拡大側から順に、縮小側に凹...  
JPWO2013157249A
[Subject] In a lens for projection of six-sheet composition, good amendment of small F number, a wide angle, and Osamu differences and high performance are realized. [Means for Solution] The 1st negative lens in which a lens for projecti...  
JPWO2013150752A
A graphic display device has a light source, a display element, a lighting prism, and an eyepiece optical system. A light source ejects illumination light. A display element modulates illumination light and ejects it as an image light. I...  
JPWO2013150752A1
映像表示装置は、光源と表示素子と照明プリ ズムと接眼光学系とを有する。光源は照明光 を射出する。表示素子は照明光を変調して映 像光として射出する。照明プリズムは光...  
JP2015223462A
To reduce speckle noises by a further simple method.The lighting system includes: at least one laser light source exiting laser beams; a coupling optical system for coupling the laser beams exited from the laser source, with optical fibe...  
JP2015534654A
the present invention -- light source; condenser [of an optical beam] (5) ; -- it is an optical equalization system (4) containing at least one micro lens array (L3, L4), and an image focal point side of an optical equalization system is...  
JP2015534123A
How to operate a micro lithography device, The stage of giving the illumination system (20) in which the optical irradiance distribution on an array contains the array (34) of the mirror (M) which can be inclined which changes only at le...  
JP2015534130A
A lighting system of a micro lithography projection aligner is provided with an optical integration machine (70), and an optical integration machine (70) contains the 1st optical raster plate (74) and the 2nd optical raster plate (76). T...  
JP2015206817A
To provide a lighting device capable of lighting under desired lighting conditions, and an inspection device.Provided is a lighting device 11 including: an EUV light source 21 of generating EUV light by discharge plasma; a filter 22 of s...  
JP5816152B2  
JP2015201433A
To provide an illumination optical system and an image projection device that can realize the projection of an image with high luminance and high image quality.An illumination optical system comprises a first lens array that divides ligh...  
JP5810467B2  
JP5807761B2  
JP2015198110A
To provide an imprint device which is advantageous when light from a light source is distributed to a plurality of processing parts.Disclosed is an imprint device for molding an imprint material on a substrate using a mold in which a pat...  
JP2015197963A
To provide a linear light source unit structure having a hole between the light source side of a light guide member and a light-emitting surface, and diffusing incident light.In a linear light source unit structure, the shape of a hole i...  
JP2015195141A
To provide an irradiation device enabling light irradiation with even illuminance and desired wavelength.An irradiation device 1 includes a light source 11, a recessed reflection mirror 12 reflecting light emitted from the light source 1...  
JP5803377B2  
JP5803222B2  
JP5803412B2  
JP2015191043A
To provide a lighting device configured to effectively obscure speckle, while using light from a light source with a high utilization rate.A lighting device 40 includes: an irradiation device 70; a diffusion element 50; a first lens arra...  
JP5800340B2  
JP2015184303A
To provide a light source optical device and a projector 10 where light efficiency of light source light is enhanced.A light source optical device includes: a light source; an illumination optical system 110 including a plurality of lens...  
JP5793222B2  
JP2015529855A
Test structure for measuring a wavefront aberration of an extreme ultraviolet-rays (EUV) inspection system is indicated. a test -- structure -- EUV -- light -- substantial -- reflexibility -- not having -- a material -- from -- forming -...  
JP2015172749A
To provide an illumination optical apparatus which can realize appropriate illumination conditions necessary for accurate transfer of mask patterns having varied characteristics, e.g. illumination conditions with wide variety in the ligh...  
JP5787382B2  
JP5787133B2  
JP2015166863A
To provide a lens which allows for measuring light intensity of an effective luminous flux propagating therethrough without requiring additional components for coupling light out.A lens includes at least one object-side refractive surfac...  
JP5780337B2  
JP5781165B2  
JP2015163994A
To provide a lighting optical unit and a projection exposure device including the same.A lighting optical unit comprises: a first optical element including plural first reflection facet elements; and a second optical element including pl...  
JP2015163947A
To provide: a light source optical system capable of projecting a brighter image by reducing the volume of unconverted light returning to a light source from a wavelength conversion element; a light source device having the same; and an ...  
JP2015162446A
To provide an optical lens, a light source unit, and a lighting device capable of reducing glare with low light loss.A lighting device 1 comprises: a device body 6; and a light source unit 10 attached to this device body 6. The light sou...  
JP2015161737A
To provide a display device having a high optical performance, with small size, being thin.A display device includes a space phase modulation element 30 for forming a display optical flux 2, a transparent substrate 40 in which the displa...  
JP5772935B2  
JP5772090B2  
JP2015524942A
In the method of operating a micro lithography projection aligner, a facet mirror (72) is illuminated with the projection light (PL) which has a main wavelength between 5 nm and 30 nm. The group of the mirror facet (86) which a facet mir...  
JP2015155950A
[Subject] Composition of an optical system can be simplified and incidence of coherent light is ideally enabled in the near state to an equalization optical system. [Means for Solution] A coherent light source to which a lighting install...  
JP5768428B2  
JP2015524576A
An illumination-light study unit (4) contains the 1st facet element (17) and the 2nd facet element (18) that has a micro mirror (33) of a large number which can carry out a group division flexibly so that a facet (24) may be formed which...  
JP5765608B2  
JP2015146275A
To solve the problem of the possibility that the light intensity of a spot on a fluorescent body largely varies due to a positioning error (attaching error) between a light emission point of a semiconductor laser and a collimator lens, w...  
JP2015146417A
To provide: an exposure device and an exposure method, with which a mask pattern can be accurately exposed and transferred in relation to a shape of an exposed region of a workpiece even if the workpiece is distorted, and exposure accura...  
JP5761329B2  
JP5757930B2  

Matches 701 - 750 out of 3,408