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JP7427352B2 |
To provide an exposure device capable of enhancing uniformity on an irradiation surface of exposed illumination light even when in the vicinity of the center of an irradiation area is the light strong and surrounding thereof weak by alig...
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JP2024504506A |
A device for measuring the optical properties of an optical system (12, 112, 212) includes an imaged object (16) having a plurality of structures (18) arranged in a plane and separated from each other, and a two-dimensional image. It has...
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JP7418128B2 |
To prevent an optical output from lowering in a light source device having an LED as a light source.A light source device 1 includes: an LED array having a circuit including a substrate 2 and a chip array in which a plurality of LED chip...
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JP7390804B2 |
Exposure apparatus includes illumination optical system and projection optical system for forming projected image with light from the illumination optical system. The illumination optical system forms, on pupil plane of the illumination ...
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JP7378265B2 |
The present invention provides an exposure apparatus that exposes a substrate via an original, including an illumination optical system configured to illuminate the original, and a projection optical system configured to project a patter...
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JP7357515B2 |
Provided is an image projection device (1) capable of projecting a projection image only on either the left or right side with respect to the image projection device, comprising: an illumination optical system (4) for generating illumina...
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JP7340520B2 |
An optical system includes an illumination optical unit configured to guide illumination radiation along a path to an object plane. The illumination optical unit includes comprising a first facet mirror; a second facet mirror disposed do...
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JP7316300B2 |
In an optical system for a projection exposure apparatus, the angle space of the illumination radiation of the projection optical unit at the reticle is twice as large in a first direction as the angle space of the illuminating radiation...
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JP2023102480A |
To provide a light guide unit which is high in light withdrawal efficiency, a manufacturing method of the light guide unit, a light source device and a projector.A light guide unit 60 comprises a light guide member 50, an angle conversio...
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JP2023099536A |
To provide a light source optical system, a light source device, and an image projection device that are excellent in utilization efficiency of light and can be reduced in size.A first optical system is arranged between an excitation lig...
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JP7282721B2 |
What is shown is a projection device having at least one light source and an array of optical channels. Each channel includes a first refractive optical free-form surface and a second refractive optical free-form surface and projection o...
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JP2023069258A |
To suppress unevenness of illumination caused by light distribution characteristics of a light source at a wide observation magnification from low to high.An illumination optical system 10 includes an illumination optical element 5 and a...
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JP2023064096A |
To provide a method for allowing, while an optical production system is reproducing a target wavefront using an optical measuring system, appropriate approximation of wavefront deviations of the optical measuring system to corresponding ...
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JP7268421B2 |
A light source optical system includes a wavelength conversion unit (27) configured to receive the first color light emitted by the excitation light source (21) and emit second color light with a wavelength different from a wavelength of...
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JP2023514637A |
The optical system includes a first optical system, a second optical system, and a third optical system. A first optical system splits the incident beam into a first light and a second light. The second optical system includes a concave ...
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JP7242642B2 |
When producing a mirror as an optical component for an optical system of a projection exposure apparatus for projection lithography, first, an average value of a global gravitational acceleration is determined. Next, a gravitational acce...
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JP7234861B2 |
A light source device includes a blue laser light module that emits a blue laser light, and a dichroic mirror including an incident surface, and that reflects the incident blue laser light in a second direction different from a first dir...
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JP7227775B2 |
An illumination optical system illuminates a surface to be illuminated using incoherent light emitted from a light source. The illumination optical system includes: an integrator arranged between the light source and the surface to be il...
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JP2023024892A |
To provide a light source device and an optical component adjustment device with which it is possible to easily adjust the installed angle of an optical component.The present invention comprises: a light source for emitting light; an opt...
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JP7210000B2 |
To improve performance of a photodetector module.A photodetector module 300 receives a light beam L1 from a light source module 200. The photodetector module 300 includes: a solar cell 310 which is a photoelectric conversion element; and...
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JP2023009810A |
To use lights from a plurality of light-emitting elements with high efficiency.An embodiment of illumination optical systems includes: a light source in which a plurality of light-emitting elements that individually emits light from a li...
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JP7208953B2 |
A projection lens is disclosed for imaging a pattern arranged in an object plane of the projection lens into an image plane of the projection lens via electromagnetic radiation having an operating wavelength λ from the extreme ultraviol...
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JP2023003153A |
To provide a technique suitable for forming a pattern on a substrate with high accuracy.An exposure apparatus exposes a substrate to light by using an original in which a pattern is formed and includes an illumination optical system to g...
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JP2022190890A |
To provide a technique advantageous for controlling a temperature distribution in an optical element with good responsiveness.An exposure device conducts an exposure operation for exposing a substrate via a projection optical system. The...
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JP2022553545A |
Kind Code: A1 An optical component and method of manufacturing the same are disclosed. The first optical component is a hollow-core photonic crystal fiber including an inner capillary for guiding radiation, an outer capillary covering th...
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JP7167844B2 |
An optical system (300) includes a light source (101); an illumination optical system (301); and an optical modulator (103). The illumination optical system (301) emits the light to the optical modulator (103) and includes a lens array (...
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JP2022163632A |
To provide a technique that renders irradiation intensity distribution of waves in a medium three-dimensionally uniform.A wave irradiator 10 has a holder 16 filled with a medium 17 to be irradiated with waves 12. The holder 16 has a poly...
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JP7160163B2 |
Extreme ultra-violet (EUV) lithography ruling engine specifically configured to print one-dimensional lines on a target workpiece includes source of EUV radiation; a pattern-source defining 1D pattern; an illumination unit (IU) configure...
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JP7133754B2 |
An optical system includes a plurality of lenses and a lens holding member. Each of the plurality of lenses has a cut-off face to have a shape of a partial circle formed by cutting off part of a periphery of a first circle. Cut-off faces...
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JP2022122134A |
To provide an illumination optical system which is advantageous for illuminating a target surface.An illumination optical system for illuminating a target surface comprises: an optical integrator for forming a secondary light source with...
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JP2022112196A |
To provide a condenser capable of efficiently transmitting light for cauterizing a biological tissue.In a condenser having a light source element and an optical system for applying light to light absorption/scattering characteristics tha...
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JP2022533555A |
When imaging the object (7), the imaging characteristics of the optical manufacturing system that images the object (7) are determined by at least one element (M) of the optical measurement system (15, 4).iThe following procedure is perf...
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JP2022091478A |
To provide an illumination optical system in which an illumination optical system that can realize uniform light intensity distribution with a simple configuration is realized.Provided is an illumination optical system that illuminates t...
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JP2022089104A |
To provide a lighting device capable of illuminating a wide field with high uniformity, which can, for example, emit light with a wide wavelength range from a visible light range to a near infrared light range with a single device under ...
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JP2022075311A |
To provide a light source device capable of achieving high light collection efficiency and being downsized, and an image projection device including the same.A light source device 200 comprises: a light source 1 generating first light; a...
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JP7071436B2 |
An illumination optical unit for EUV projection lithography serves for illuminating an illumination field in which an object field of a downstream imaging optical unit is arranged. An object displaceable in an object displacement directi...
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JP2022072582A |
To provide a small and still efficient light source device, and an image projector with the light source device.A light source device 100 includes: a light source unit 10 having a plurality of light sources 1b and a collimator lens 2 for...
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JP7065608B2 |
An optical arrangement, comprises first and second optical elements. The first optical plate is for collimating light from a light source to generate collimated light, which is provided to the second optical element. The second optical e...
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JP2022060113A |
To provide a reliable and effective fluid sterilization method.By roughly aligning the light path of collimated light generated by sterilization light beam and the flow path of a fluid to be sterilized, and forming a long large straight ...
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JP7052242B2 |
To enable reduction of exposure unevenness due to a joint of an exposure area when a plurality of projection optics system arranged in zigzag is used in an exposure device.An exposure device 100 has an illumination light source 2, a visu...
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JP7051204B2 |
The utility model provides a light source device with a plurality of lamps and an exposure device. The light source device and the exposure device can condense light while inhibiting the loss of lightquantity. The light source device wit...
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JP2022055379A |
To provide a lighting device with which it is possible to successively change illuminance or colors while maintaining the uniformity of light.The present invention is constituted from a lighting device 10, comprising: a light source unit...
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JP7049357B2 |
A method for correcting a reflective optical element for the wavelength range between 5 nm and 20 nm, which includes a multilayer system on a substrate. The multilayer system has layers consisting of at least two alternately arranged dif...
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JP2022022911A |
To provide a technology that is advantageous for improving the accuracy of aberration correction.There is provided an imaging optical system including a plurality of mirrors and forming an image of a luminous flux emitted from an object ...
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JP2022020087A |
To provide a technique related to a transmissive optical element, which has an advantage in equalizing illuminance distribution on an illuminated surface.A manufacturing method of a light transmissive optical element includes: a first st...
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JP7006598B2 |
[Solving Means] A composite-optical-system unit includes a polarization beam splitter and a thermal conduction member. The polarization beam splitter includes a first prism including a first surface, a second prism including a second sur...
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JP7007283B2 |
A display system comprising a light emitter; a reflector optically coupled to the light emitter and configured to receive light from the light emitter, the reflector configured to output light with increased angular uniformity relative t...
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JP6987817B2 |
An illumination optical unit for EUV projection lithography guides illumination light toward an object field. A field facet mirror of the illumination optical unit has a multiplicity of individual mirrors which are switchable between at ...
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JP2021193429A |
To provide a light source device for exposure which is capable of highly accurately adjusting alignment even in the case where LEDs are used as a light source, and an illumination device, an exposure apparatus, and an exposure method usi...
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JP2021193407A |
To inhibit deterioration of an optical output when LED chips having different luminous performance are used in a mixed manner.A light source device includes: a first chip array with only a plurality of LED chips of a first rank ranked ac...
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