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JP6165366B1 |
A lens (10) has an outgoing radiation side (12) which makes convex shape to an entrance plane (11) and an optic axis (10a) which make concave shape in cylindrical shape. A light source (20) has a spread angle smaller than a perpendicular...
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JP6166257B2 |
In order to reduce the negative influence of reactive hydrogen on the lifetime of a reflective optical element, particularly inside an EUV lithography device, there is proposed for the extreme ultraviolet and soft X-ray wavelength region...
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JP2017122786A |
To provide a lens array substrate having a first concave curved face formed in a substrate and a second concave curved face overlapping the first concave curved face, in which the second concave curved face can be suitably used as a lens...
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JP6160666B2 |
A light optical device capable of forming a bracelet-form lighting pupil distribution in a peripherally-polarized state with a light quantity loss satisfactorily controlled, the device comprising a light flux conversion element (50) for ...
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JP6160144B2 |
A illumination device includes a light source, a diffractive optical element on which light emitted from the light source is made incident, and a superimposing optical system on which diffracted light emitted from the diffractive optical...
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JP2017120364A |
To provide an improved projector.The projector includes a laser module for generating a laser beam and a wafer-level optical system. The wafer-level optical system includes a first substrate, a first collimator lens, and a diffraction op...
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JP6146646B2 |
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JP6146745B2 |
In a method for converting a light beam to a line focus, wherein the line focus extends according to its length along a first direction (y) and is narrow in a second direction (x) perpendicular to the first direction (y), the light beam ...
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JP2017103025A |
To provide a light guide and a luminaire which can secure optical quality, which has excellent cost performance and mass productivity, and which can achieve surface lighting having uniform illuminance distribution in a wide irradiation r...
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JP2017097372A |
To provide an exposure apparatus capable of simultaneously transferring patterns of various pitches each with high resolution.There is provided an exposure apparatus having an illumination optical system 12 that illuminates a reticle R w...
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JP6137762B2 |
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JP6137159B2 |
An exposure method and apparatus for simultaneously transferring patterns with various pitches with high resolution. On the pupil surface of an illumination system, nine areas are set. The nine areas are a first area (28) including the o...
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JP6135514B2 |
An illumination optical system is used with a reflective imaging optical system configured to form an image of a pattern arranged on a first plane onto a second plane, and is configured to illuminate an illumination area on the first pla...
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JP6137179B2 |
The disclosure relates to optical systems of a microlithographic projection exposure apparatus, and to a microlithographic exposure method. According to an aspect of the disclosure, an optical system has a light source, a ray-splitting o...
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JP6137182B2 |
This substrate treatment device (EX) is equipped with: a projection light system (PL) that forms an image of a mask pattern on a substrate by projecting a reflected light beam (L2), which is generated from an illumination region (IR), to...
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JP2017090488A |
To provide a lighting device in which an illumination uniforming conversion optical member is prevented from being damaged during position adjustment of the illumination uniforming conversion optical member.A lighting device for condensi...
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JP6132119B2 |
An illumination optical system which illuminates an illumination objective surface with a light from a light source. The illumination optical system includes a spatial light modulator which includes a plurality of optical elements arrang...
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JP2017083636A |
To provide an illumination device being capable of improving utilization efficiency of light while simplifying a configuration, and a projector.An illumination device comprises a light source unit and a uniformizing unit. The uniformizin...
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JP6128348B2 |
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JP6127001B2 |
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JP6113872B2 |
A ring light illuminator with annularly arranged light sources is disclosed. To each light source there corresponds a beam shaper comprising a light collector, a homogenizing means for light from the light source, and an imaging means fo...
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JPWO2015133260A1 |
This projection device (10) is emitted from a high-intensity light source (10A), an illumination optical system (10B) that converts the light emitted from the high-intensity light source (10A) into illumination light, and an illumination...
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JP2017059396A |
To provide a fluorescent light source device which can radiate white light excellent in a color rendering property while securing necessary safety, and a lighting device.A fluorescent light source device comprises: an excitation light so...
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JP6098950B2 |
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JP2017054123A |
To provide an illumination unit and a device for lithographic exposure.An illumination unit (10) for lithographic exposure is described: the illumination unit includes a beam source (1), an electronically controllable beam deflection ele...
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JP2017054138A |
To provide an illumination optical device and a projection exposure device capable of reducing light loss amount when illuminating a mask with illumination light in a prescribed polarized state.Provided is a projection exposure device wh...
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JP6096987B2 |
A laser light source (300), a wavelength conversion light source, a light combining light source, and a projection system. The laser light source comprises a laser element array, a focusing optical element (33), a collimation optical ele...
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JP6089196B2 |
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JP6089375B2 |
The invention relates to an illumination optical unit for EUV microlithography comprising a first optical element (1) having a plurality of first reflective facet elements (3) and a second optical element (5) having a plurality of second...
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JPWO2015015749A1 |
The light source 10 according to the embodiment of the present invention includes a light emitting element 11 and a homogenizer 13 provided corresponding to the light emitting element 11. The light emitted from the light emitting element...
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JP2017045064A |
To provide an illumination optical apparatus and an exposure apparatus which can contribute to increase in manufacture efficiency of a device with increase in an output of a light source, even when a spatial light modulation member is di...
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JPWO2014181858A1 |
The optical element is a multilayer film in which a plurality of unit laminated structures having a base material and a first layer and a second layer arranged on the base material are laminated, and unit laminated structures are used. A...
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JP6082721B2 |
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JP6078976B2 |
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JP6080875B2 |
A support table (WT) configured to support a substrate (W), the support table having a support section (22) to support the substrate and a conditioning system (21) to supply heat energy to and/or remove heat energy from the support secti...
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JP2017032964A |
To provide an optical system capable of preventing a phenomenon that a barrel is heated by irradiating the barrel with regular reflection light in an OFF state, and suppressing degradation of resolution and stray light.An optical system ...
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JP2017027903A |
To provide an illumination device having high efficiency for light utilization, and further to provide a projector provided with a light source device.An illumination device comprises: a light source array having a mounting substrate hav...
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JP6072177B2 |
To provide an optical device that can achieve a smaller light source device while suppressing a reduction in efficiency of use of light, and a light source device and a projection display device using the same.A paraboloid mirror array 3...
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JP6069941B2 |
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JP2017022035A |
To provide a light projection unit which can improve utilization efficiency of light from a light source, and which can easily array a plurality of light projection elements at predetermined positions while performing positioning adjustm...
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JPWO2014084143A1 |
Provided is a light irradiation device capable of increasing the light intensity per unit area even if the device has a plurality of light emitting elements mounted on one substrate. A plurality of light irradiation devices 1 for irradia...
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JP2017004025A |
To provide an illumination optical system having high flexibility for changing a pattern of pupil intensity distribution and a polarization state without exchanging optical members.The illumination optical system illuminates an illuminat...
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JP2017004697A |
To provide a luminaire which easily attains illumination light having excellent visual quality despite having narrow orientation distribution.A luminaire 10 includes a light source 11, a first lens 12 disposed in front of the light sourc...
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JP2016541009A |
To provide an apparatus including a programmable patterning device including an array of self-luminous contrast devices. An exposure apparatus is a modulator comprising a substrate holder constructed to hold a substrate (17) and a plural...
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JP6053748B2 |
A mirror array having a total surface extending perpendicularly to a surface normal, comprises a multiplicity of mirror elements each having a reflection surface and at least one degree of freedom of displacement, wherein the totality of...
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JP6053737B2 |
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JP2016218381A |
To provide an illumination device for proximity exposure, which can correct size variation of an exposure pattern caused by variation in a gap between a work and a mask with a simple configuration, and a proximity exposure apparatus and ...
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JP6049043B2 |
The invention relates to an illumination system of a microlithographic projection exposure apparatus comprising (a) a plurality of channels, each channel guiding a partial beam and at least one channel comprising at least one defect, and...
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JP6050618B2 |
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JP6044611B2 |
The purpose of the present invention is to improve the focusing property of a light guide component. A light-focusing light guide device (8) comprises: a first reflecting surface (50) formed into a curved shape extending from an LED pack...
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