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JP6041304B2 |
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JP2016537683A |
Including a transparent lens in which the present invention defines optic volume, the transparent lens is related with an optical system containing the 1st reflective lens which orients light so that light which carried out demand may re...
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JP6034845B2 |
An illumination system of a microlithographic projection exposure apparatus (10) comprises an optical integrator (60) having a plurality of light entrance facets (75) each being associated with a secondary light source (106). A spatial l...
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JP6025835B2 |
A projection arrangement for imaging lithographic structure information comprises: an optical element, which has at least partly a coating composed of an electrically conductive layer material. The coating comprises a continuous region, ...
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JP6028633B2 |
To provide a laser light source device which is capable of effectively cutting off the stray light component of laser light, while miniaturizing an optical system.A first collimator lens 20 turns the laser light emitted from an LD chip 1...
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JP2016191844A |
To provide a fluorescent light source device capable of highly efficiently radiating fluorescence and configuring a compact device in a simple structure.The fluorescent light source device comprises: an excitation light emission section ...
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JP6022759B2 |
A magnification projection optical system combining a catoptric system and a dioptric system is equipped with: a first optical system for forming an image using patterned light from an object surface; a return prism for polarizing and se...
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JP6023777B2 |
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JP2016188923A |
To provide an exposure apparatus and an exposure method, capable of achieving a high efficiency and longer life of a spatial light modulator.An exposure apparatus 100 comprises: a micro lens array 142 having micro lenses condensing light...
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JP6016169B2 |
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JP6010032B2 |
A mirror for EUV radiation includes a mirror body, which has at least one EUV radiation-reflecting region and at least two EUV radiation-permeable regions. A spatial separation of the illumination and imaging beam paths is possible with ...
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JP2016177194A |
To provide an image projection device which has an excellent portability and can display an enlarged image easily and in good quality.An image projection device comprises: a light source; an image display element which is illuminated by ...
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JP5994970B2 |
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JP5991256B2 |
To provide an image display light generation part assembly for an image display device, which realizes the image display device that obtains high contrast high image quality at low cost.A 1/4 wavelength plate 239 mutually exchanges a lin...
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JP5984013B2 |
A coherent light source apparatus includes a coherent light source, a first optical system, a light deflection unit, a second optical system and a light mixing unit disposed in that order. The coherent light source forms a first light em...
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JP5983689B2 |
A light optical device capable of forming a bracelet-form lighting pupil distribution in a peripherally-polarized state with a light quantity loss satisfactorily controlled, the device comprising a light flux conversion element (50) for ...
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JP5983966B2 |
Provided is an optical element for a supplementary light source unit having appropriate lighting as supplementary light for imaging, the optical element keeping compactness, providing a sufficient amount of light, being easy to manufactu...
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JP2016162731A |
To provide a planar lighting device capable of improving luminance by suppressing absorption of light on an end surface on an incident side of a light shielding body which constitutes a louver.A planar lighting device 10 includes: a ligh...
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JP2016157096A |
To provide an illumination device that allows illumination light to be more efficiently obtained.An illumination device 1 to be used in a projection display device and the like is configured to include: a light source 10; and a light tun...
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JP5979793B2 |
An illumination optical system for projection lithography has an optical assembly for guiding illumination light to an object field to be illuminated in an object plane. The illumination optical system divides a bundle of the illuminatio...
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JP2016153878A |
To provide a small size light source device with high brightness capable of largely improving the output of blue light.The light source device includes: a solid light source; a dichroic mirror that reflects a blue excitation ray output f...
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JP5979693B2 |
An illumination optical unit for EUV projection lithography serves for obliquely illuminating an illumination field, in which an object field of a downstream imaging catoptric optical unit and a reflective object to be imaged can be arra...
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JP5967132B2 |
A light optical device capable of forming a bracelet-form lighting pupil distribution in a peripherally-polarized state with a light quantity loss satisfactorily controlled, the device comprising a light flux conversion element (50) for ...
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JP5959342B2 |
The invention provides a light source apparatus including first and second light sources that output light in mutually opposing directions along a single optical axis; a wavelength conversion element that is disposed between these light ...
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JP2016130859A |
To provide a spatial light modulation unit used for an illumination optical system capable of improving a degree of freedom concerning an intensity level of a pupil intensity distribution.The spatial modulation unit used for an illuminat...
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JP2016127226A |
To cause desired temperature distribution inside a pattern region of a reticle during exposure.An exposure device 100 comprises: a reticle stage RST which can hold and move a reticle R including a pattern region where a pattern is formed...
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JP5944400B2 |
An optical concentrator having a concentrating element for collecting input light, a redirecting element for receiving the light and also for redirecting the light, and a waveguide including a plurality of incremental portions enabling c...
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JP5938335B2 |
The objective of the present invention is to provide a projection-type video-image-displaying device capable of efficiently displaying an image by reducing the loss of light in the device, the device also being suitable for reducing cost...
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JP5938707B2 |
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JP2016109731A |
To provide a microscope capable of quickly and appropriately adjusting light irradiated on a specimen.An illumination optical system includes reflection means including a reflective surface having a shape of a part of an elliptic cylinde...
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JP5934082B2 |
Projection objectives, such as projection objectives of lithography projection exposure apparatuses, as well as related systems, components and methods, such as methods of revising and/or repairing such objectives, are disclosed.
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JP5935852B2 |
The present invention pertains to an optical unit which can be arranged in optical system of an illumination apparatus for illuminating a first surface with light from a light source, the optical unit comprising a light splitter to split...
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JP5935920B2 |
An illumination optical system which illuminates an illumination objective surface with a light from a light source. The illumination optical system includes a spatial light modulator which includes a plurality of optical elements arrang...
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JP5928653B2 |
An optical system of a microlithographic projection exposure apparatus comprises at least one mirror arrangement, having a plurality of mirror elements which are adjustable independently of one another for varying an angular distribution...
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JP5928632B2 |
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JP5927555B2 |
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JP2016099390A |
To provide an illumination optical system and a picture display unit capable of enhancing a contrast ratio of image light by reducing diffraction light.An illumination optical system (1) includes: a light source (11); and a light uniform...
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JPWO2013191255A1 |
The lighting device has a first surface, an inner surface, and a second surface of the rectangle, and the light incident on the first surface is emitted from the second surface through multiple reflections on the inner surface. The light...
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JP2016095523A |
To provide catadioptric projection objectives that have tilted deflecting mirrors which allows imaging of patterns including sub-patterns oriented in various directions.A first deflecting mirror has a first reflective coating with reflec...
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JP5918858B2 |
An illumination system of a microlithographic projection exposure apparatus comprises a light modulator which includes a modulator substrate and an array of mirrors that are supported by the modulator substrate. At least some adjacent mi...
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JP2016075936A |
To provide a device for making laser radiation uniform in the visual field of illumination, and to provide a method for manufacturing the device.A device for making laser radiation uniform in the visual field of illumination includes a f...
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JP5914254B2 |
An optical module including a plurality of laser diodes and outputting optical beams emitted from the laser diodes includes a radiator unit for radiating heat and a case enclosing the optical module. The case has a first attachment surfa...
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JP5911898B2 |
Exposure apparatus (EX) exposes a substrate (P) by irradiating the substrate (P) with exposure light (EL) via a projection optical system (PL) and a liquid (LQ). The exposure apparatus (EX) is provided with a liquid immersion mechanism (...
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JP5910324B2 |
An illumination unit includes: light sources each including a solid-state light-emitting device, the solid-state light-emitting device emitting light from a light emission region thereof, the light emission region including a plurality o...
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JP5909369B2 |
A method for designing an optical component for shaping laser light according to one embodiment of this invention measures the intensity distribution of an incident laser light, obtains the shapes in the short and long axial directions o...
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JP2016061851A |
To provide an illumination device capable of efficiently generating fluorescent light and a projector.The illumination device includes: a light source which emits a beam of excitation light; a base plate which transmits the excitation li...
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JP2016057644A |
To provide an illumination optical system and an image display apparatus which allow compact configuration of the illumination optical system even when the number of elements serving as light sources is increased.An illumination optical ...
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JP2016510425A |
The present invention relates to at least one mirror device (200) having a plurality of mirror elements that can be adjusted independently of each other for the purpose of changing the angular distribution of light reflected by the mirro...
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JP2016042124A |
To provide a lighting device capable of changing the beam angle distribution of illumination light while restraining loss in the quantity of light.A lighting device comprises: a light source 2 that emits light; a multiple reflection elem...
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JP2016042125A |
To provide a diffusion lens that suppresses sensitivity to changes in illuminance as well as suppresses degradation in optical performance caused by unnecessary light and decrease in releasability in the process of molding the lens.An em...
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