Login| Sign Up| Help| Contact|

Patent Searching and Data


Matches 301 - 350 out of 2,747

Document Document Title
JP2014146660A  
JP2014146718A  
JP5571170B2  
JP5570225B2  
JP5571546B2  
JP5569556B2  
JP2014142369A  
JP2014519196A  
JP5567973B2  
JP5566501B2  
JP5561508B2  
JP5554245B2  
JP5552140B2  
JP5548127B2  
JP5552699B2  
JP2014131031A  
JP5541604B2  
JP2014127485A  
JP2014516209A  
JP2014126836A  
JP2014123749A  
JP2014123600A  
JP2014123063A  
JP5537455B2  
JP5534540B2  
JP5537950B2  
JP2014119666A
To prevent damage to a light tunnel.An image irradiation device includes: a cylindrical light tunnel for uniforming light emitted from a light source device and guiding it to an image forming element; a position adjustment unit which mov...  
JP2014119702A
To provide a microlens array that has less optical loss and hardly causes degradation.A microlens array 110 is formed by bonding a first microlens array 122 formed of resin and a second microlens array 126 formed of glass. The first micr...  
JP2014119655A
To provide an image display device which, although being reduced in size, can suppress one-sided blur due to temperature rise in the device.The image display device includes: a light source; a mirror for turning-back a light beam from th...  
JP2014116611A
To provide an exposure device using an illumination system that enables patterns of various pitches to be simultaneously transferred at high resolution.An exposure device has: an illumination optical system 12 configured to illuminate a ...  
JP2014115496A
To excellently maintain telecentricity over an entire variable power area, make illuminance unevenness less over an entire photographing screen and secure a relatively long operational distance (a working distance), and to reduce the siz...  
JP2014116612A
To provide an exposure device and an exposure method which can achieve appropriate illumination conditions required for faithfully transferring mask patterns with various characteristics, for example illumination conditions rich in diver...  
JP5529922B2  
JP5534080B2  
JP5531955B2  
JP5533917B2  
JP5529698B2  
JP5534276B2  
JP2014514772A  
JP2014112706A
To provide an optical mechanism for EUV lithography and a method for configuring the optical mechanism in which deformation due to an influence of temperature is reduced.A reflective coating 31 is applied to a substrate 32, the reflectiv...  
JP5525608B2  
JP2014109741A
To provide a convergent optical system capable of outputting light from a surface illuminant to have high convergence or divergence.A convergent optical system converges light emitted from a surface illuminant 104. The convergent optical...  
JP2014109693A
To provide a liquid crystal device and a projector that improve utilization efficiency of light and can suppress degradation of liquid crystal.The liquid crystal device modulates light whose spectrum has a maximum peak at a first wavelen...  
JP2014106463A
To provide an image display device capable of achieving size reduction and image quality improvement.An image display device includes a light source, a reflection type image display element 8 which reflects light from the light source, a...  
JP2014102364A
To provide a projection type video display device which can efficiently display an image by reducing optical loss in the device and is suitable for the reduction in cost of the device as well.The projection type video display device incl...  
JP2014102468A
To provide a processor capable of efficiently exposing.A processor contains a mask holding member (DM) having a holding area (A1) holding a mask pattern (M) curving along a first cylindrical surface (DM2) at a part in a circumferential d...  
JP5511360B2  
JP5514178B2  
JP5511818B2  
JP2014099649A
To provide an exposure apparatus which maintains a liquid immersion region in a desired state, and can excellently carry out exposure processing.An exposure apparatus EX exposes a substrate P by irradiating the substrate P with exposure ...  

Matches 301 - 350 out of 2,747