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Matches 301 - 350 out of 1,747

Document Document Title
JP2013243386
To obtain an illumination optical system which can form a pupil intensity distribution of desired shape and illuminance, and can achieve illumination conditions rich in diversity.The illumination optical system used in an exposure device...  
JP2013239750
To provide an illumination optical system capable of illuminating a surface to be illuminated with light of a required polarization state by suppressing influence of retardation caused by a subsequent optical system of a polarization con...  
JP2013235739
To provide a lighting device capable of suppressing color irregularities, in one having white LED light sources arranged in which blue LED elements are eccentrically arranged.A lighting device 10 is provided with a plurality of white LED...  
JP2013225673
To provide a method and apparatus for determining apodization properties of a projection system in a lithographic apparatus.The method comprises allowing light from a given point in an illumination field to pass through the projection sy...  
JP2013218235
To provide a projector that can make brightness of a projecting image uniform and improve light utilization efficiency.The projector comprises: a light modulation device 400R that includes a light source device, a lens integrator optical...  
JP2013219381
To provide a device 1 for transferring a structure provided in a mask 2 onto a substrate 3.A device comprises: at least one illumination device 9 for uniformly irradiating a part of a mask 2; a mask holding device 7 for holding the mask ...  
JP2013214030
To provide a homogenizer for homogenizing light after primary concentration, which has a smaller moment of a homogenizer optical system and suppresses reduction in power generation efficiency due to displacement of an optical axis of the...  
JP2013211558
To provide an illumination optical device and a projection exposure device capable of reducing light quantity loss when illuminating a mask such as a reticle with illumination light in a prescribed polarization state.An illumination opti...  
JP2013198547
To prevent the unevenness of color arising from differences in radiation angles of a plurality of semiconductor light sources.An endoscope light source device includes first-third light source modules 31-33. The light source modules 31-3...  
JP2013195821
To provide a light source device that can miniaturize a light guide optical system of blue light for blue image projection, and to provide a projector device including the light source device.A wheel 34 is provided with a prism 342 forme...  
JP2013195501
To provide a laser emitting device and video display device capable of reducing speckle noise, having less vibration sound, and suitable for downsizing.A laser emitting device 1 includes a laser source 2 emitting a laser beam, a uniformi...  
JP2013195838
To provide a light source device able to switch the optical path of blue light in time division without forming a phosphor plate in the shape of a wheel and to provide a projector device equipped with the same.A wheel 35 is disposed in t...  
JP2013190760
To provide an illuminator for a microscope capable of easily switching critical illumination and Koehler illumination with improved uniformity of illumination than before in a simple composition.An illuminator for a microscope has: a fir...  
JP2013190674
To provide a projector that can suppress occurrence of thermal damage and thermal degradation and is excellent in reliability.A projector comprises a first light source section 50A and a first optical element 60A. The first optical eleme...  
JP2013191858
To provide an illumination optical device capable of reducing light quantity loss when lighting up a mask such as a reticle with illumination light in a predetermined polarized state, and a projection aligner.An illumination optical devi...  
JP2013186338
To provide a laser expand optical system capable of removing speckle, and simultaneously illuminating a wide area evenly without lowering a luminous intensity.A laser expand optical system 1 includes: an input lens 2 for condensing injec...  
JP2013182207
To provide a projector that can suppress occurrence of illuminance unevenness and is excellent in display quality.A projector comprises: a solid light source 52 for emitting linearly polarized light; a birefringent element 60 for convert...  
JP2013178290
To provide a light source device capable of being mounted on a three-plate type projection type display device which uses a phosphor as a light source.A semiconductor laser 1 emits excitation light. A reflection type phosphor assembly 42...  
JP2013179305
To provide an exposure device enabling the size reduction thereof and mask-less exposure with a stable operation and to provide an exposure device and exposure method enabling highly accurate exposure through mask-less exposure with resp...  
JP2013174844
To provide an equal-magnification reflection-type imaging optical system that enables reflection light from a measured thin film surface of a predetermined wavefront aberration and a broad frequency band to be imaged on a light receiving...  
JP2013174905
To provide an endoscope light source optical system capable of handling respective observation methods, preventing enlargement of a light source device and securing brightness.A light source optical system guiding light from a light sour...  
JP2013171125
To provide a projector optical system that completely shields against light reflected from a prism face.In a projector optical system that decomposes or composes light by a beam splitter and reflects the light by a DMD, thereby projectin...  
JP2013165134
To certainly and quickly optimize pupil luminance distribution so as to obtain an image formation performance sufficiently similar to a desired image formation performance.A method includes: a first step of deriving variation in an OPE v...  
JP2013157636
To provide optical systems having mirror elements with reflective coatings for use with short wavelength radiation in a photolithography apparatus.An optical system includes a plurality of elements arranged to image radiation at a wavele...  
JP2013152441
To provide a coherent light source device capable of avoiding such a problem that the uniformity of projected light is degraded due to speckle unavoidably generated when the coherent light of a semiconductor laser and other lasers is pro...  
JP2013152384
To provide a projection type display device which can further effectively reduce speckles.A beam expansion unit 20 expands laser beams emitted from laser sources 1R, 1G, and 1B into elliptical shapes. A beam radiation position displacing...  
JP2013148930
To provide a projection zoom lens which satisfies the conditions that it has a relatively wide angle of view, is a bright optical system with a small F number, has a simple lens configuration, and is inexpensive.The projection zoom lens ...  
JP2013145344
To provide a design method of an optical component for laser beam shaping, which has a pair of aspherical lenses, and is capable of highly accurately shaping an intensity distribution of a laser beam to an arbitrary intensity distributio...  
JP2013145378
To provide an illumination optical system for a projector with high illumination efficiency.In an illumination optical system for a projector having a liquid crystal panels 108a to 108c, integrators 101a, 101b, a polarization conversion ...  
JP2013142842
To provide a light source device in which a light source and an optical lens are integrated on the base, the device being designed to improve productivity in order to improve the use efficiency of light beams output from the light source...  
JP2013135215
To provide systems and methods for providing the use of a two- or three-plate Alvarez lens located in a focal plane of a projection lens of a lithographic apparatus.The Alvarez lens can be used to modify the shape of the focal plane to m...  
JP2013130767
To provide a projector which can project light of which directions of polarization are uniform at the whole of color light, can reduce cost of the projector since a wavelength-selective wavelength plate is not used, the projector having ...  
JP2013123048
To provide a method and a device that can be used to reduce a range in which an assist feature is exposed to light in a resist on a substrate.A method for projecting a pattern from a patterning device on a substrate by using a projection...  
JP2013120264
To provide projectors and a projection system which allow a projection image to be excellently and stereoscopically viewed.A projector 2A comprises: a polarization switching device 22 in which a retardation value is switched between a fi...  
JP2013114175
To form a highly accurate pattern while ensuring a wide exposure area in a projection exposure device.The projection optical system 30 of the projection exposure device comprises a first lens group 32, a second lens group 34, a third len...  
JP2013102225
To provide an illumination optical system for a microlithographic projection exposure apparatus.An illumination optical system for a microlithographic projection exposure apparatus (1) is used for illuminating an object surface (19) with...  
JP2013095659
To provide an optical mechanism for EUV lithography reducing deformation caused by an influence of a temperature, and to provide a method for constituting the optical mechanism having especially a projection lens and an optical element.T...  
JP2013092788
To provide a lighting system and an optical device that are capable of equally illuminating an illuminated area (image formation area) without making a speckle noise outstanding.A lighting system relating to the invention comprises: a li...  
JP2013076927
To achieve the reduction of the manufacturing costs and scale of a reading head.An optical element 15 includes: an optical block 20; a first reflection film 21 and a second reflection film 22 formed on the surfaces of first and second cu...  
JP2013074089
To provide an adhesion method for optical element on optical element holding device, capable of fixing an optical element on an optical element holding device by removing distortion and/or deformation of the optical elements as much as p...  
JP2013072888
To provide a projection type image displaying apparatus that enables the range of color reproduction to be expanded even when a luminous body having a broad spectrum is used.A projection type image displaying apparatus 100 comprises a li...  
JP2013068651
To provide an image display device having a narrow viewing angle capable of contributing to energy saving by eliminating waste of energy caused by having a wider viewing angle than required.An image display device includes: a convex lens...  
JP2013065857
To provide a microlithographic projection exposure apparatus for imaging a mask on a layer using a catoptric projection lens which is configured for wavelengths in the extreme ultraviolet spectral range (EUV).A microlithographic projecti...  
JP2013065051
To provide a projection objective which secures a space sufficient for mounting an optical element particularly in the front portion of an objective.A projection objective includes: object planes (20, 100, 300, 2103) by which object visu...  
JP2013058801
To provide a method of correcting/repairing a projection target instrument of a lithography projection exposure apparatus.The method of correcting/repairing a projection target instrument of a lithography projection exposure apparatus (1...  
JP2013051424
To provide an optical imaging arrangement which has good and long-term reliable imaging properties and is used in an EUV exposure process.Provided is an optical imaging arrangement comprising: a mask unit 3; a substrate unit 4; an optica...  
JP2013046060
To resolve problems such as increase in cost and complexity of a lithographic process, decrease in throughput, and increase in defects.A lithographic apparatus includes: an illumination system for providing a radiation beam; a patterning...  
JP2013041132
To provide an optical element capable of obtaining light in which intensity distribution is equalized with high efficiency.An optical element 30 includes: a first rod integrator 31A that has a first end surface 3a and a second end surfac...  
JP2013041018
To provide a dimmer capable of enhancing an extinction rate in a state that a light-shielding member is closed even when lenses constituting a lens array are arranged at odd-numbered rows in a direction in which the light-shielding membe...  
JP2013041017
To provide a dimmer capable of maintaining a separation distance between end portions of a light-shielding member and of enhancing an extinction rate, and further to provide a projector.A dimmer blocks a light beam made incident thereto ...  

Matches 301 - 350 out of 1,747