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JP2009192789 |
To provide a lighting optical system that is easily manufactured and emit an illuminating light suitable for image display by improving speckle noise or spatial light intensity distribution, and to provide a projection image display appa...
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JP2009194159 |
To provide an optical unit capable of contributing to the equalization of illumination distribution of light to be emitted, and to provide an illumination optical system, an exposure apparatus and a device manufacturing method.A first op...
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JP2009194107 |
To improve calculation accuracy of a lithography simulator.A database generation method has a step S1002, in which an effective light-source shape is calculated, while changing a plurality of conditions settable in an illumination optica...
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JP2009186942 |
To achieve the performance improvement and cost reduction of a solar lens capable of condensing the sunlight in a prescribed range with the lens staying still irrespective of the position of the sun, as there is a need for constantly all...
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JP2009181109 |
To provide a condenser lens system having compact structure, which is incorporated in a narrow space and selectively emits inspection light of a specified wavelength region, and an illuminator.The condenser lens system condenses waveleng...
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JP2009175741 |
To provide an illumination apparatus and a projection display for suppressing the increase in cost of the entire device even when using light beams of four or more colors.The illumination apparatus includes: a light source 10 emitting wh...
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JP2009162984 |
To provide an illumination device capable of easily forming an irradiation area and uniforming light quantity distribution, and to provide an image display device and a projector using the illumination device.The illumination device comp...
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JP2009162467 |
To provide a light-heat convertor effectively collecting light energy of the sun.In the light-heat convertor 1 including at least one outer sleeve 12, and at least one condensing lens 14, at least one through-hole 22 is opened in a pipe ...
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JP2009157379 |
To provide an uncomplicated decohered laser light production system with high energy efficiency.The decohered laser light production system is provided. The decohered laser light system includes a laser source. The system further include...
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JP2009145843 |
To provide a microscope illumination optical system that can change the height of an eyepiece unit, by extending/shortening the optical system of a microscope with a method that will not affect the optical performance.The microscope illu...
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JP2009130091 |
To provide an illumination optical device capable of adjusting a ratio of internal diameter to external diameter continuously in a wide range.The illumination optical device for applying luminous flux from a light source to a surface to ...
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JP2009130065 |
To provide an exposure apparatus for highly accurate exposure control.The photolithography machine includes a lighting optic system for lighting a reticle by means of a light flux from a light source and a projection optic system for pro...
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JP2009128695 |
To provide an optical system in which efficiency of bringing out fluorescent light, emission light, illumination light or the like emitted from a light-emitting body can be significantly improved while reducing as much as possible a loss...
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JP2009130071 |
To provide an illumination optical system achieving high-grade resolution with a simple configuration, and to provide an exposure apparatus.In the illumination optical system that is used for the exposure apparatus for exposing a pattern...
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JP2009128444 |
To provide an optical device which can be made compact in the whole device, in which accuracy of disposing each optical surface can be fixed to a high level without adjusting the position upon assembling, and fluorescent light, emission ...
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JP2009130367 |
To provide a reflective lighting technology that reduces an adhesion amount of particulates such as debris to the reflective surface.A lighting optical device for illuminating a surface being irradiated with exposure light EL includes a ...
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JP2009123888 |
To provide a lighting optical device capable of dimming illuminance of the light output from a light source, across such wide range as up to the illuminance requested for various measurements on a substrate side, while suppressing change...
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JP2009124143 |
To provide a lithographic apparatus which is simpler and lower in cost than those of prior art, using a conventional filter having sub-micron sized dots.In this system and method for use of a lithographic apparatus having a substrate and...
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JP2009117561 |
To improve controllability of a pupil luminance distribution formed on a lighting pupil surface.A illuminator which forms a predetermined light intensity distribution on the lighting pupil surface (5b) based upon light from a light sourc...
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JP2009116331 |
To provide a mixed light apparatus for application to liquid-crystal displays and lighting systems.The mixed light apparatus includes at least two light collectors and at least two light sources. Each of the light collectors has a first ...
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JP2009117671 |
To provide an illumination optical device forming a pupil intensity distribution of a desired shape and desired illumination and obtaining illumination conditions of great variety.The illumination optical device has: a spatial light modu...
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JP2009117812 |
To provide an illumination optical system capable of easily forming a desired light intensity distribution in which illumination non-uniformity is not distinctive at the pupil position of the illumination optical system or at a position ...
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JP2009117801 |
To provide illumination optical system which materializes a variety of illumination conditions and improves productivity of a device when the illumination optical system is applied to an exposure apparatus.The illumination optical system...
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JP2009117672 |
To provide an illumination optical system that saves space in an optical path between a spatial light modulator and an optical integrator and obtains illumination conditions of great variety.The illumination optical system irradiates a s...
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JP2009107922 |
To provide a manufacturing method of a mass-producible lens array allowing cost reduction with fewer production steps, to provide a lens array, to provide an illumination optical device, and to provide a projector.Molten glass G is set a...
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JP2009111175 |
To provide an illumination optical apparatus capable of correcting an illuminance distribution in an irradiated area irradiated with exposure light on an irradiated surface of an irradiated body, to provide an exposure apparatus, and to ...
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JP2009111369 |
To provide an illumination optical apparatus, an exposure apparatus, and a device manufacturing method, that can contribute to higher output of a light source and improvement in manufacturing efficiency of a device even when spatial ligh...
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JP2009098493 |
To provide a projector in which an adverse effect on an optical performance aspect, generated due to compactness, is reduced.A reflective liquid crystal display element 224 has a rectangular display region 240 which is oppositely arrange...
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JP2009099879 |
To provide: an illumination optical system accurately forming an effective light source shape; an exposure device; and a device manufacturing method.The illumination optical system illuminating an illumination object surface by using lum...
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JP2009099696 |
To provide an illumination optical system capable of stably keeping an optical characteristic of an optical member like, such as a diffractive optical element.The illumination optical system includes a light-transmitting optical system 1...
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JP2009080468 |
To obtain a laser beam synthesizer which can efficiently synthesize laser beams with a simple structure and at low cost.The laser beam synthesizer comprises a plurality of laser light sources 11 having anisotropy in the angle of laser be...
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JP2009071011 |
To provide an optical integrator, capable of uniforming an illumination distribution on an irradiated surface by suppressing the influence due to the difference in surface shape of each refractive surface, when it is applied to, for exam...
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JP2009071010 |
To provide an illumination optical system capable of adjusting the pupil intensity distribution, while suppressing the loss in optical quantity to a low level.The illumination optical system for illuminating surfaces (M, W) to be illumin...
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JP2009063619 |
To provide an illumination device and a projection image display device in each of which illuminance non-uniformity of illumination light on an optical modulation element can be smoothly and effectively suppressed.The illumination device...
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JP2009060139 |
To provide a light source unit capable of collecting DPP divergent light while reducing the adherence of debris to a reflecting surface.The light source unit is provided with a light source main body for bringing a target material into a...
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JP2009055060 |
To provide a lithographic apparatus and method for projecting a patterned beam onto a substrate.An illumination system supplies a projection beam of radiation. A pattern is imparted to the projection beam, for example by an array of indi...
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JP2009054325 |
To provide an illumination light source employing a coherent light source, which suppresses the influence of speckle in a simplified arrangement.The illumination light source comprises: a surface emitting laser 2 in which a plurality of ...
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JP2009044147 |
To provide a lighting optical device which can illuminate a mask as an irradiated surface when it is applied to exposure equipment, e.g. an EUVL, without arranging a plane mirror in the optical path between a lighting optical system and ...
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JP2009044146 |
To obtain a lighting optical device which can avoid adverse effect of field stop on the image formation and aggravation of light exposure distribution when the lighting optical device is applied to exposure equipment employing a reflecti...
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JP2009027162 |
To provide a microlithographic projection exposure device capable of minimizing undesirable changes in the intensity distribution produced on a wafer surface, based on the polarization distribution set in an illumination system.This micr...
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JP2009019882 |
To provide an adaptor for lighting where the size of a diffusion plate is made appropriate.The adaptor for lighting is inserted between a light source and an object to be illuminated for use, has the diffusion plate 1 and an aperture dia...
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JP2009015218 |
To speed up a specimen observation using a scanning confocal microscope.The scanning confocal microscope 100 includes: a galvano mirror 4 by which an illuminating light ray for illuminating a specimen 1 is caused to scan on the specimen ...
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JP2009008728 |
To provide an illumination optical system which illuminates an image display element brightly with uniform brightness even with small angle distribution of an optical element in a section where the angle distribution is sensitive, and to...
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JP2009003104 |
To provide an illuminating lens varying the degree of light diffusion around an optical axis, and to provide an illumination device that has the illuminating lens.The illuminating lens 100 having a first face 101 formed into a plane and ...
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JP2008299326 |
To provide an element for homogenized lighting which can attain structured lighting of a pupil of an objective lens by a simple method.The element 1 for homogenization of lighting by simultaneous conditioning of polarization degree is co...
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JP2008292862 |
To reduce size and weight in a projection optical device having a reflection type liquid crystal element and projector device using the same.The projection optical device is equipped with: a light source 100; a plurality of reflection ty...
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JP2008277815 |
To enable, in a flexible mode, substantial or complete elimination of an unwanted preferential polarization orientation even upon a variation in the illumination setting.The polarization-influencing arrangement 10 includes: a first wedge...
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JP2008268243 |
To provide an illumination optical system capable of yielding uniform intensity distribution, and also reducing the loss of light quantity so as to yield illumination improved in the efficiency of using light, and a projection type displ...
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JP2008270571 |
To provide an illuminating optical device having a high degree of freedom with respect to a device layout.In the illuminating optical device for leading beams emitted from a light source to an illumination target, the illuminating optica...
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JP2008268601 |
To provide an illumination optical system with a light source which emits luminous flux having a flat cross section, and obtaining illuminating luminous flux having isotropic NA distribution in spite of compact configuration.The illumina...
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