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JP2012247811A |
To provide an ultra-broadband ultraviolet (UV) catadioptric imaging microscope system with wide-range zoom capability.The microscope system, which comprises a catadioptric lens group and a zooming tube lens group, has high optical resolu...
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JP5094361B2 |
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JP5065465B2 |
A silver salt-containing layer containing a silver salt and provided on a support is exposed and developed to form a metal silver portion and a light-transmitting portion, and then the metal silver portion is further subjected to physica...
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JP2012522263A |
Radiographic silver halide materials coated onto a support contain a portion of the developer chemistry incorporated within the radiographic film. The remainder of the developer chemistry is contained in a developer solution. Use of a re...
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JP4974307B2 |
A silver salt-containing layer containing a silver salt and provided on a support is exposed and developed to form a metal silver portion and a light-transmitting portion, and then the metal silver portion is further subjected to physica...
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JP4943673B2 |
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JP4931799B2 |
Methods and systems for measuring a characteristic of a substrate or preparing a substrate for analysis are provided. One method for measuring a characteristic of a substrate includes removing a portion of a feature on the substrate usin...
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JP4920705B2 |
In a photomask blank serving as a base member for producing a halftone-type phase shift mask in which a light-transmissive substrate is formed thereon with a light-semitransmissive phase shift pattern having a desired opening, a light-se...
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JP4909495B2 |
A method for producing a computer readable definition of photolithographic mask used to define a target pattern is provided. The phase shift mask patterns include phase shift windows, and the trim mask patterns include trim shapes, which...
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JP4887201B2 |
A silver halide photographic material, includes a transparent support having provided thereon a blue-sensitive silver halide emulsion layer, a green-sensitive silver halide emulsion layer and a red-sensitive silver halide emulsion layer,...
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JP4871535B2 |
Method for reducing the fogging effect in an electron beam lithography system wherein the exposure is controlled in order to obtain resulting pattern after processing which are conform to design data. A model for the fogging effect is fi...
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JP4871536B2 |
A process for controlling the proximity effect correction in an electron beam lithography system. The exposure is controlled in order to obtain resulting pattern after processing which is conform to design data. In a first step an arbitr...
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JP4864932B2 |
The present invention provides systems and methods for improved lithographic printing with polarized light. In embodiments of the present invention, polarized light (radially or tangentially polarized) is used to illuminate a phase-shift...
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JP4857166B2 |
A silver halide photosensitive material comprising at least one blue-sensitive layer, at least one green-sensitive layer and at least one red-sensitive layer on a transparent support, wherein a peak wavelength of spectral sensitivity of ...
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JP4848273B2 |
A method of direct curing a digitally imageable relief printing element having an increased direct-cure imaging speed upon exposure to lasers and other digital sources of actinic radiation, the printing element comprising a reflective la...
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JP4846558B2 |
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JP4819141B2 |
A silver salt-containing layer containing a silver salt and provided on a support is exposed and developed to form a metal silver portion and a light-transmitting portion, and then the metal silver portion is further subjected to physica...
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JP4817607B2 |
A photosensitive element for use as a flexographic printing plate comprises a support, an elastomeric photopolymerizable layer having a surface opposite the support that defines a plane, and a matted layer disposed above the surface of t...
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JP4813739B2 |
An out-of-plane micro-structure which can be used for on-chip integration of high-Q inductors and transformers places the magnetic field direction parallel to the substrate (14) plane without requiring high aspect ratio processing. The p...
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JP2011215297A |
To provide a silver halide photographic sensitive material with which digital information is recorded at high resolution with almost no deterioration, and which has little variation of the performance caused by the difference of the pres...
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JP4799402B2 |
A method for determining one or more process parameter settings of a photolithographic system is disclosed.
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JP4789620B2 |
A pattern formation method includes the steps of forming a flowable film made of a material with flowability; transferring at least one of a concave portion and a convex portion provided on a pressing face of a pressing member onto the f...
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JP4791433B2 |
Polymers are provided having the following formulas I and II:Polymers of the present invention can be used to provide an anti-reflective coating (ARC) material useful for submicrolithography processes using 248 nm KrF, 193 nm ArF and 157...
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JP4778958B2 |
Films for optical use, articles containing such films, methods for making such films, and systems that utilize such films, are disclosed.
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JP4778969B2 |
Films for optical use, articles containing such films, methods for making such films, and systems that utilize such films, are disclosed.
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JP2011180486A |
To solve the problem that the undeteriorated portion of a photographic recording medium may also be removed.A restoration method for restoring an original image from a photographic recording medium includes: a transmitted light-imaging s...
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JP4756720B2 |
The present invention is proposed to solve the problem of conspicuous increases in the drawing time of a circuit pattern when oblique lines are present which leads to high costs and low accuracy for resulting photomasks. For this reason,...
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JP2011148802A |
To provide a method for producing glycine-N, N-derivatives I and their alkali metal, alkaline earth metal, ammonium and substituted ammonium salts.The method comprises (A) reacting a corresponding di-substituted glycine or di-substituted...
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JP4741622B2 |
Use of glycine-N,N-diacetic acid derivs. of formula (I) is claimed as complex formers for alkaline earth or heavy metals. R = 1-20C alkyl, 2-20C alkenyl or -A.CH(COOM).N(CH2COOM)2; A = 1-12C alkylene or a chemical bond; M = H, alkali met...
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JP4733661B2 |
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JP4733663B2 |
A silver halide photosensitive material having at least one blue-sensitive layer, at least one green-sensitive layer, and at least one red-sensitive layer, on a transparent support, wherein at least one of the green-sensitive layers cont...
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JP4711251B2 |
A system and method for repairing a photomask (52) for use in a photolithography process is disclosed, the photomask (52), consisting of a substrate layer (38) and a chrome layer (36) over the substrate layer (38), having a defect (42) i...
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JP4709322B2 |
The present invention is directed to micro- and nano-scale imprinting methods and the use of such methods to fabricate supported and/or free-standing 3-D micro- and/or nano-structures of polymeric, ceramic, and/or metallic materials. In ...
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JP4704332B2 |
Methods for the determination of center of focus and process control for a lithographic tool. Diffraction signatures are obtained from a plurality of diffraction structures located within multiple different focus setting fields. Variabil...
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JP4684584B2 |
A mask manufacturing method suitable for an exposure method wherein a mask on which a desired pattern and a supplementary pattern with formations smaller than those of the desired pattern are arrayed is illuminated, and the light which p...
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JP2011081984A |
To provide a method of manufacturing a conductive material by a simple method capable of obtaining a highly precise wiring pattern with superior conductivity without thickening of line width as seen at a plating process.The method of man...
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JP3167183U |
To provide eyeglasses which can relieve eye fatigue and delay eye aging, which are good for health and useful for physical health. An eyeglass is composed of two lenses 1, a bridge 2 connected between the two lenses 1, and two temples 3....
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JP2011070230A |
To provide an ultra-broadband ultraviolet (UV) catadioptric imaging microscope system with wide-range zoom capability.The microscope system, which comprises a catadioptric lens group and a zooming tube lens group, has high optical resolu...
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JP4650608B2 |
A photomask blank is prepared by forming a light-absorbing film on a transparent substrate, and irradiating the light-absorbing film with light from a flash lamp at an energy density of 3 to 40 J/cm2. A photomask is prepared by forming a...
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JP4643585B2 |
A high-speed (over 700) radiographic silver halide film is useful for radiography to provide images with improved contrast and sharpness and reduced fog. The film includes at least one tabular grain silver halide emulsion layer on each s...
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JP4630898B2 |
The present invention is directed to micro- and nano-scale imprinting methods and the use of such methods to fabricate supported and/or free-standing 3-D micro- and/or nano-structures of polymeric, ceramic, and/or metallic materials. In ...
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JP4622579B2 |
The present invention provides a chemically amplified positive resist composition comprising (A) a resin which comprises (i) a structural unit of the formula (I) and (ii) at least one structural unit selected from the group consisting of...
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JP4619043B2 |
A phase shift mask blank 10 having a very thin film (a chromium nitride film) 2 provided on a quartz substrate 1 for forming a phase shift pattern 1 P and a resist film 3 formed thereon is used as a material, a resist pattern 3 P is form...
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JP4590503B2 |
An image-forming method of recording a digital image data in resolution of 2,000 dpi or more, the method comprising: recording a digital image data on a silver halide photographic material with little deterioration.
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JP4589918B2 |
A patterned reflective semiconductor mask uses a multiple layer ARC overlying an absorber stack that overlies a reflective substrate. The absorber stack has more than one layer and an upper layer of the absorber stack has a predetermined...
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JP4588368B2 |
An exposure measurement apparatus is configured by including a size measurer measuring respective sizes of at least a pair of transferred patterns having mutually different optimal focus positions out of a plurality of transferred patter...
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JP4584926B2 |
A method and system is described for drying a thin film on a substrate following liquid immersion lithography. Drying the thin film to remove immersion liquid from the thin film is performed prior to baking the thin film, thereby reducin...
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JP4570400B2 |
An exposure data generation method for generating exposure data that can enhance exposure throughput by making the number of shots in each of unit areas where a plurality of charged particle beams are simultaneously applied equal. Layout...
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JP4563323B2 |
The present invention is characterized to provide a hologram silver halide photographic material having high sensitivity and diffraction efficiency, providing an excellent image and having less color residue and noise in a transparent pa...
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JP4563203B2 |
To provide a method for withdrawing a silver-containing liquid when necessary or periodically from a photographic processing solution to be used in a photographic processing plant, separating silver-based waste from the silver-containing...
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