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WO/2006/096793 |
Provided herein is methods of treating a medical implant and methods of using the same.
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WO/2006/091712 |
A novel image capture device (80), system and method are disclosed for use in capturing dental images. One or more devices are integrated within one or more components of the system. Examples of such devices include a wireless transmitte...
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WO/2006/091881 |
Merging sub-resolution assist features includes receiving a mask pattern (10) that includes the sub-resolution assist features. A first sub-resolution assist feature is selected to merge with a second sub-resolution assist feature. A mer...
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WO/2006/081534 |
Methods for carrying out lithography with a carbon dioxide development system are described. This invention involves methods for preferential removal of the darkfield region of conventional chemically amplified positive tone resists. The...
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WO/2006/078918 |
Durable seamless replication tools are disclosed for replication of seamless relief patterns in desired media, for example in optical recording or data storage media. Methods of making such durable replication tools are disclosed, includ...
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WO/2006/078791 |
Contact hole patterns are disclosed having a plurality of peripheral regions formed around a target area in which a contact hole is to be formed. The peripheral regions visually resemble 'lobes' or 'leaves' extending outwards towards the...
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WO/2006/075985 |
Device and method for exposing photoresists on semiconductor wafers without using physical masks while improving significantly the time-and cost-efficiencies for the manufacturing of integrated-circuit chips. Two electromagnetic sources ...
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WO/2006/073926 |
Containment structures for an organic composition, comprising a first zone having a first surface energy, and a second zone having a second surface energy different than the first surface energy, and methods for making the same.
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WO/2006/071586 |
Thermally developable materials such as photothermographic and thermographic materials contain one or more boron compounds in an amount of at least 0.001 g/m2 as stabilizers. These boron compounds have an X B(OL) Z moiety.
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WO/2006/071419 |
This invention relates generally to uses of novel nanomaterial composition and the systems in which they are used, and more particularly to nanomaterial compositions generally comprising carbon and a metal, which composition can be expos...
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WO/2006/069255 |
Methods and systems for controlling variation in dimensions of patterned features across a wafer are provided. One method includes measuring a characteristic of a latent image formed in a resist at more than one location across a wafer d...
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WO/2006/069255 |
Methods and systems for controlling variation in dimensions of patterned features across a wafer are provided. One method includes measuring a characteristic of a latent image formed in a resist at more than one location across a wafer d...
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WO/2006/065557 |
An embodiment of the invention is described with reference to the figures using reference designations as shown in the figures. Referring to Figure 1, a pulse-modulated laser writing system includes a computer (10) for generating a laser...
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WO/2006/060504 |
A photolithography trim mask (20) includes a transparent region (30), an attenuated phase-shift region (32), and an opaque region (34). The transparent region substantially transmits received light. The attenuated phase-shift region atte...
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WO/2006/060504 |
A photolithography trim mask (20) includes a transparent region (30), an attenuated phase-shift region (32), and an opaque region (34). The transparent region substantially transmits received light. The attenuated phase-shift region atte...
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WO/2006/054791 |
A insulating resin cured film provided after the formation of tin plating, substantially containing no copper, on a flexible printed wiring board for electronic component, wherein the glass transition temperature of the film after being ...
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WO/2006/050614 |
The present invention relates to a composition comprising a crosslinkable resin comprising lactam groups; a DMAPMA / HEMA copolymer copolymer; and a cellulose based water absorbent polymer. The invention also relates to a photographic pa...
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WO/2006/053174 |
A holder for an x-ray sensing device having a first retention member and a handle. The first retention member includes a back plate, a first retention guide, and a second retention guide. The first retention guide is connected with an en...
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WO/2006/045002 |
A manufacturing method for producing ceramic item from a photocurable ceramic filled material by stereolithography. The method compensates for the anisotropic shrinkage of the item during firing to produce a dimensionally accurate item.
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WO/2006/036028 |
A silver halide color photographic light-sensitive material, having, on a support, at least one silver halide emulsion layer containing a cyan dye forming coupler, at least one silver halide emulsion layer containing a magenta dye formin...
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WO/2006/037027 |
A photomask may include a patterned layer, a phase-shift layer adjacent the patterned layer, a first aperture, a second aperture, and a light-absorbing layer. The first aperture may allow light to pass through the patterned layer and the...
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WO/2006/028951 |
In semiconductor processing, the critical dimensions of structures formed on a wafer are controlled by first developing photoresist on top of a film layer on a wafer using a developer tool, the photoresist development being a function of...
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WO/2006/028649 |
A concentrate suitable for forming a stable aqueous composition upon dilution with water includes a water-insoluble active organic compound and a water-insoluble oil-modified alpha-beta unsaturated carboxylic acid.
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WO/2006/026280 |
A combination of two or more agents is added to a fabricated food prior to cooking in order to reduce the formation of acrylamide. The fabricated food product can be a corn chip or a potato chip. The agents can include any of a divalent ...
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WO/2006/026278 |
An acrylamide reducing agent is added to a starch-based food product having a disrupted cellular structure prior to dehydration of the food product. Thus, a dehydrated potato flake can be produced that, can be later made into a dough. Th...
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WO/2006/026278 |
An acrylamide reducing agent is added to a starch-based food product having a disrupted cellular structure prior to dehydration of the food product. Thus, a dehydrated potato flake can be produced that, can be later made into a dough. Th...
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WO/2006/026280 |
A combination of two or more agents is added to a fabricated food prior to cooking in order to reduce the formation of acrylamide. The fabricated food product can be a corn chip or a potato chip. The agents can include any of a divalent ...
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WO/2006/022405 |
A silver halide color photographic photosensitive material comprising a support and, superimposed thereon, at least one of each of photosensitive silver halide emulsion layers respectively containing yellow, magenta and cyan dye forming ...
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WO/2006/020194 |
An improved lithographic alignment method, system, and template. The method includes creating, within a lithographic subfield, subsequent-layer features which are intentionally offset from their respective previous-layer features, where ...
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WO/2006/013383 |
A target (10, 20) is disclosed suitable for setting the exposure and white balance of a photographic digital camera. The target (10, 20) comprises a target surface (12) that has a reflectance of 18 % for all wavelengths of visible light....
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WO/2006/011977 |
The present invention relates to manufacturing grayscale masks that are used for mass-producing grayscale DOEs. More specifically, the present invention provides a method whereby a grayscale mask is fabricated by using an absorber layer ...
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WO/2006/011977 |
The present invention relates to manufacturing grayscale masks that are used for mass-producing grayscale DOEs. More specifically, the present invention provides a method whereby a grayscale mask is fabricated by using an absorber layer ...
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WO/2006/004693 |
A method for etching a bilayer resist defined over a substrate in a plasma etch chamber is provided. The method initiates with introducing the substrate having a pattern defined on a first layer of the bilayer resist into the etch chambe...
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WO/2005/124465 |
The present invention relates to an edge bead remover composition for a photoresist composition disposed as a film on a surface comprising from about 0.5 to about 8 Normal solution of a basic compound.
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WO/2005/124293 |
A method of forming a semiconductor layer of a semiconductor device including interposing a reticle between an energy source and a semiconductor wafer, the reticle including at least two duplicate mask patterns each having a different bi...
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WO/2005/123277 |
Films for optical use, articles containing such films, methods for making such films, and systems that utilize such films, are disclosed.
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WO/2005/119371 |
The present invention is drawn to the use of alkanes that are highly transparent to UV wavelengths ranging from about 170 nm to 260 nm in optical couplants, optical cements, optical elements, optical inspection media for semiconductor wa...
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WO/2005/119372 |
This invention relates to a composition used as a developer that contains a surfactant to improve the developing of photoresist, which may contain at least 50 mol% of monomers containing carboxylic acid. The present invention is also a p...
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WO/2005/115743 |
A light scattering EUVL mask and a method of forming the same comprises depositing (300) a crystalline silicon layer (110) over an ultra low expansion substrate (100), depositing a hardmask over the crystalline silicon layer (310), patte...
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WO/2005/116757 |
A coating on a transparency is provided. In an exemplary embodiment the coating is conductive and transparent. Furthermore, a method for forming a transparency with such a coating is provided.
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WO/2005/114324 |
A conductive coating is provided. Methods of forming and applying the same are also provided. Substrates incorporating such coatings are also provided.
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WO/2005/114324 |
A conductive coating is provided. Methods of forming and applying the same are also provided. Substrates incorporating such coatings are also provided.
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WO/2005/113422 |
The present invention is directed to micro- and nano-scale imprinting methods and the use of such methods to fabricate supported and/or free-standing 3-D micro- and/or nano-structures of polymeric, ceramic, and/or metallic materials. In ...
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WO/2005/109109 |
A composition comprising a mixture of at least one triphenylmethane compound and at least one tetraphenylmethane compound. One method of using the composition is as a charge control agent in a toner composition in an electrophotographic ...
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WO/2005/106583 |
A single-solution type bleach concentrate composition for silver halide color-photographic photosensitive materials which contains ethylenediaminetetraacetato iron(III) as the bleaching agent in a concentration of 0.10 to 0.42 mol/L, fre...
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WO/2005/106508 |
An apparatus for characterization of a micro beam comprising a micro modified Faraday cup assembly (102) including a first layer (201) of material, a second layer (202) of material operatively connected to the first layer of material, a ...
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WO/2005/101112 |
Films for optical use, articles containing such films, methods for making such films, and systems that utilize such films, are disclosed.
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WO/2005/101112 |
Films for optical use, articles containing such films, methods for making such films, and systems that utilize such films, are disclosed.
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WO/2005/101118 |
The addition of certain aliphatic and non aromatic carbocyclic polycarboxylic acids provides an improvement in natural age keeping properties of organic-solvent based photothermographic materials. This improvement is particularly useful ...
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WO/2005/091784 |
Systems and methods are provided for a lens or microlens array or non-spherical lens with or without an integrated sensor unit. A dielectric between a substrate and a lens material has curved recesses, which are filled in by the lens mat...
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