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Patent Searching and Data


Matches 151 - 200 out of 17,004

Document Document Title
WO2006028858A3
Methods of etching a carbon-rich layer on organic photoresist overlying an inorganic layer can utilize a process gas including a fluorine-containing gas, an oxygen-containing gas, and a hydrocarbon gas, and one or more optional component...  
WO/2006/075985A1
Device and method for exposing photoresists on semiconductor wafers without using physical masks while improving significantly the time-and cost-efficiencies for the manufacturing of integrated-circuit chips. Two electromagnetic sources ...  
WO/2006/073926A1
Containment structures for an organic composition, comprising a first zone having a first surface energy, and a second zone having a second surface energy different than the first surface energy, and methods for making the same.  
WO/2006/071586A1
Thermally developable materials such as photothermographic and thermographic materials contain one or more boron compounds in an amount of at least 0.001 g/m2 as stabilizers. These boron compounds have an X B(OL) Z moiety.  
WO2005065109A3
A method of transferring a representation of an image to a surface (12) of a building (14). The method comprising receiving the image as an image file, converting the image file to a raster file comprising a series of dots, scaling the r...  
WO/2006/069255A2
Methods and systems for controlling variation in dimensions of patterned features across a wafer are provided. One method includes measuring a characteristic of a latent image formed in a resist at more than one location across a wafer d...  
WO2005038524A3
A positive-working photosensitive composition comprising one or more polybenzoxazole precursor polymers, a diazonaphthoquinone photoactive compound which is the condensation product of a compound containing from 2 to about 9 aromatic hyd...  
WO/2006/060504A2
A photolithography trim mask (20) includes a transparent region (30), an attenuated phase-shift region (32), and an opaque region (34). The transparent region substantially transmits received light. The attenuated phase-shift region atte...  
WO/2006/054791A1
A insulating resin cured film provided after the formation of tin plating, substantially containing no copper, on a flexible printed wiring board for electronic component, wherein the glass transition temperature of the film after being ...  
WO/2006/053174A1
A holder for an x-ray sensing device having a first retention member and a handle. The first retention member includes a back plate, a first retention guide, and a second retention guide. The first retention guide is connected with an en...  
WO/2006/050614A1
The present invention relates to a composition comprising a crosslinkable resin comprising lactam groups; a DMAPMA / HEMA copolymer copolymer; and a cellulose based water absorbent polymer. The invention also relates to a photographic pa...  
WO2006004693A3
A method for etching a bilayer resist defined over a substrate in a plasma etch chamber is provided. The method initiates with introducing the substrate having a pattern defined on a first layer of the bilayer resist into the etch chambe...  
WO2005065303A3
Magnetic nanoparticle masks for lithographic applications of a substrate and methods for producing such masks via defining regions of localized magnetic field maxima and minima on a substrate are provided. Also provided are methods for p...  
WO2005115743A3
A light scattering EUVL mask and a method of forming the same comprises depositing (300) a crystalline silicon layer (110) over an ultra low expansion substrate (100), depositing a hardmask over the crystalline silicon layer (310), patte...  
WO2005123277A3
Films for optical use, articles containing such films, methods for making such films, and systems that utilize such films, are disclosed.  
WO/2006/037027A1
A photomask may include a patterned layer, a phase-shift layer adjacent the patterned layer, a first aperture, a second aperture, and a light-absorbing layer. The first aperture may allow light to pass through the patterned layer and the...  
WO/2006/036028A1
A silver halide color photographic light-sensitive material, having, on a support, at least one silver halide emulsion layer containing a cyan dye forming coupler, at least one silver halide emulsion layer containing a magenta dye formin...  
WO/2006/028649A2
A concentrate suitable for forming a stable aqueous composition upon dilution with water includes a water-insoluble active organic compound and a water-insoluble oil-modified alpha-beta unsaturated carboxylic acid.  
WO/2006/028951A2
In semiconductor processing, the critical dimensions of structures formed on a wafer are controlled by first developing photoresist on top of a film layer on a wafer using a developer tool, the photoresist development being a function of...  
WO/2006/026278A2
An acrylamide reducing agent is added to a starch-based food product having a disrupted cellular structure prior to dehydration of the food product. Thus, a dehydrated potato flake can be produced that, can be later made into a dough. Th...  
WO/2006/026280A2
A combination of two or more agents is added to a fabricated food prior to cooking in order to reduce the formation of acrylamide. The fabricated food product can be a corn chip or a potato chip. The agents can include any of a divalent ...  
WO/2006/022405A1
A silver halide color photographic photosensitive material comprising a support and, superimposed thereon, at least one of each of photosensitive silver halide emulsion layers respectively containing yellow, magenta and cyan dye forming ...  
WO/2006/020194A2
An improved lithographic alignment method, system, and template. The method includes creating, within a lithographic subfield, subsequent-layer features which are intentionally offset from their respective previous-layer features, where ...  
WO/2006/013383A1
A target (10, 20) is disclosed suitable for setting the exposure and white balance of a photographic digital camera. The target (10, 20) comprises a target surface (12) that has a reflectance of 18 % for all wavelengths of visible light....  
WO/2006/011977A2
The present invention relates to manufacturing grayscale masks that are used for mass-producing grayscale DOEs. More specifically, the present invention provides a method whereby a grayscale mask is fabricated by using an absorber layer ...  
WO2005106508A3
An apparatus for characterization of a micro beam comprising a micro modified Faraday cup assembly (102) including a first layer (201) of material, a second layer (202) of material operatively connected to the first layer of material, a ...  
WO/2006/004693A2
A method for etching a bilayer resist defined over a substrate in a plasma etch chamber is provided. The method initiates with introducing the substrate having a pattern defined on a first layer of the bilayer resist into the etch chambe...  
WO/2005/124465A1
The present invention relates to an edge bead remover composition for a photoresist composition disposed as a film on a surface comprising from about 0.5 to about 8 Normal solution of a basic compound.  
WO2005076940A3
A single-part photographic bleach-fixing composition is provided which is formed by mixing at least a bleaching agent which includes an iron-ligand complex, a fixing agent including a thiosulfate, and at least one of a formula (A) compou...  
WO/2005/123277A2
Films for optical use, articles containing such films, methods for making such films, and systems that utilize such films, are disclosed.  
WO/2005/124293A1
A method of forming a semiconductor layer of a semiconductor device including interposing a reticle between an energy source and a semiconductor wafer, the reticle including at least two duplicate mask patterns each having a different bi...  
WO/2005/119371A1
The present invention is drawn to the use of alkanes that are highly transparent to UV wavelengths ranging from about 170 nm to 260 nm in optical couplants, optical cements, optical elements, optical inspection media for semiconductor wa...  
WO/2005/119372A1
This invention relates to a composition used as a developer that contains a surfactant to improve the developing of photoresist, which may contain at least 50 mol% of monomers containing carboxylic acid. The present invention is also a p...  
WO/2005/116757A2
A coating on a transparency is provided. In an exemplary embodiment the coating is conductive and transparent. Furthermore, a method for forming a transparency with such a coating is provided.  
WO/2005/115743A2
A light scattering EUVL mask and a method of forming the same comprises depositing (300) a crystalline silicon layer (110) over an ultra low expansion substrate (100), depositing a hardmask over the crystalline silicon layer (310), patte...  
WO/2005/113422A1
The present invention is directed to micro- and nano-scale imprinting methods and the use of such methods to fabricate supported and/or free-standing 3-D micro- and/or nano-structures of polymeric, ceramic, and/or metallic materials. In ...  
WO2005001901A3
A novel process for using a hard mask or protective layer in conjunction with an extremely thin photoresist is provided. In this process, a thin film of the protective layer is coated on the surface of a substrate that is to be selective...  
WO/2005/114324A2
A conductive coating is provided. Methods of forming and applying the same are also provided. Substrates incorporating such coatings are also provided.  
WO/2005/109109A1
A composition comprising a mixture of at least one triphenylmethane compound and at least one tetraphenylmethane compound. One method of using the composition is as a charge control agent in a toner composition in an electrophotographic ...  
WO/2005/106583A1
A single-solution type bleach concentrate composition for silver halide color-photographic photosensitive materials which contains ethylenediaminetetraacetato iron(III) as the bleaching agent in a concentration of 0.10 to 0.42 mol/L, fre...  
WO/2005/106508A2
An apparatus for characterization of a micro beam comprising a micro modified Faraday cup assembly (102) including a first layer (201) of material, a second layer (202) of material operatively connected to the first layer of material, a ...  
WO/2005/101112A2
Films for optical use, articles containing such films, methods for making such films, and systems that utilize such films, are disclosed.  
WO/2005/101118A1
The addition of certain aliphatic and non aromatic carbocyclic polycarboxylic acids provides an improvement in natural age keeping properties of organic-solvent based photothermographic materials. This improvement is particularly useful ...  
WO2005040924A3
A photoresist spray coating process for deep trenched substrates. According to one implementation of the invention, the substrate surface is primed with a primer having a water contact angle between forty and fifty degrees. A spray nozzl...  
WO/2005/092025A2
Methods and systems for measuring a characteristic of a substrate (90) or preparing a substrate (90) for analysis are provided. One method for measuring a characteristic of a substrate (90) includes removing a portion of a feature on the...  
WO/2005/090931A1
The attenuation and phase shift properties of an embedded attenuated phase shift mask (EAPSM) maybe independently selected. After or during plowing of regions of an embedded phase shift layer, exposed regions of a substrate are etched to...  
WO2005048287A3
A phosphor screen comprises an inorganic phosphor capable of absorbing X-rays and emitting electromagnetic radiation having a wavelength greater than 300 nm. The phosphor is disposed on a support that has a reflective substrate (11) comp...  
WO/2005/088394A1
A photosensitive material for a silver halide color photograph having a support and, formed thereon, at least one red-sensitive silver halide emulsion layer, at least one green-sensitive silver halide emulsion layer and at least one blue...  
WO2004093148A3
The invention describes a methodology based on the interpolation (503) of the correction (501 and 502) between selected evaluation points (505 and 506) of the target layout (504). By connecting the correction points this technique provid...  
WO2005050312A3
A radiographic imaging assembly comprises a symmetric radiographic silver halide film has an overall system speed of at least 200 but less than 800 to provide images with improved contrast and sharpness and reduced fog. The imaging assem...  

Matches 151 - 200 out of 17,004