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Patent Searching and Data


Matches 201 - 250 out of 16,996

Document Document Title
WO/2005/081059A1
Disclosed is a mask for photolithographic processes, comprising opaque and transparent zones and a surface structure. At least some opaque zones are embodied as positively resting zones while at least some transparent zones are spaced ap...  
WO/2005/081058A1
A method is provided for applying a watermark pattern along a length of photosensitive medium, the photosensitive medium having a frame pitch in the length direction that is the sum of an image frame height plus an interframe distance. T...  
WO/2005/079233A2
A multilayer film defining an optical axis, wherein the optical filter transmits 50% of light having a wavelength λ1 propagating along the optical axis, and the optical filter transmits 50% of light having a wavelength λ2 incident on t...  
WO/2005/076940A2
A single-part photographic bleach-fixing composition is provided which is formed by mixing at least a bleaching agent which includes an iron-ligand complex, a fixing agent including a thiosulfate, and at least one of a formula (A) compou...  
WO2004027822A3
This invention provides compositions and devices having structurally ordered nanostructures (Figures 1A-1D), as well as methods for producing structurally ordered nanostructures.  
WO/2005/073804A1
A color-image forming method in a silver halide color photographic light-sensitive material, having the steps of: performing exposure of the light-sensitive material cut into sheets; and subjecting the exposed light-sensitive material sh...  
WO/2005/069805A2
Radiation from a spectrally broad radiation source is reduced to radiation of limited spectral range with high efficiency by an emitter (11) that includes a radiation source (12) and a multilayer optical coating (15) that reflects radiat...  
WO2005001432A3
The present invention is directed towards a fluid composition comprising a perfluoroehter compound; the fluid composition has an absorbance of less than about 2 cm<-1> at a wavelength of about 157 nm. The present invention also comprises...  
WO2005060565A3
A system converts graphic images, such as those created by graphics applications, to a format that can be efficiently printed on a material by a laser printing system. An image can be converted to a set of locations by defining progressi...  
WO2005001898A3
A method of designing and forming a reticle (404), as well as the manufacture of a semiconductor substrate (410) using the reticle, includes defining a first edge of a reticle layout file. The first edge corresponds to a reference featur...  
WO/2005/065109A2
A method of transferring a representation of an image to a surface (12) of a building (14). The method comprising receiving the image as an image file, converting the image file to a raster file comprising a series of dots, scaling the r...  
WO/2005/066712A1
The invention relates to a color motion picture print silver halide photographic film, and more particularly to such a film which has reduced silver levels designed for processing in a redox amplification development process. The inventi...  
WO/2005/065303A2
Magnetic nanoparticle masks for lithographic applications of a substrate and methods for producing such masks via defining regions of localized magnetic field maxima and minima on a substrate are provided. Also provided are methods for p...  
WO2005031458A3
A photomask (1900) for producing partial-depth features (712 and 912) in a photo-imageable polymer layer (412) on a wafer of a chip scale package (200) using exposure tools capable of resolving sizes of a critical dimension or larger, ha...  
WO2004107407A3
A photolithographic method of making an information storage device having different storage characteristics at a plurality of discrete memory locations thereon, comprises the steps of: (a) providing a substrate having a surface portion, ...  
WO/2005/062125A1
A method of processing photographic color papers is carried out using an aqueous single-part photographic bleach-fixing composition in a bleach-fixing step for less than 60 seconds. The single-part bleach-fixing composition has a pH of f...  
WO/2005/062126A1
A process is disclosed for the solvent-less development and production of flexographic printing plates. Relatively thin metal backed printing plate elements with a layer of photopolymer are selectively exposed to actinic radiation heated...  
WO/2005/060565A2
A system converts graphic images, such as those created by graphics applications, to a format that can be efficiently printed on a material by a laser printing system. An image can be converted to a set of locations by defining progressi...  
WO2005024325A3
A method and system is described for drying a thin film on a substrate following liquid immersion lithography. Drying the thin film to remove immersion fluid from the thin film is performed prior to baking the thin film, thereby reducing...  
WO2005026839A3
Compositions and methods for production of color images using phthalocyanine precursor-containing color forming compositions are described. The color forming composition can include a phthalocyanine precursor, an infrared absorber, and a...  
WO/2005/050314A1
A radiographic imaging assembly comprises a symmetric radiographic silver halide film has an overall system speed of at least 1100 to provide images with improved contrast and sharpness and reduced fog. The imaging assembly includes a sy...  
WO/2005/050313A1
An ultra-high-speed radiographic imaging assembly (at least 900 system speed) is useful especially for pediatric radiography to provide images with improved contrast and sharpness and reduced fog. The imaging assembly includes a symmetri...  
WO2004094967A3
In accordance with this invention, there is provided a method of imaging, measuring and displaying a 3-dimensional dose distribution of an energy field in a translucent 3-dimensional object comprises: applying an energy field to the obje...  
WO/2005/050311A1
Thermally developable compositions, such as photothermographic emulsions, include certain stabilizing polycarboxylic acid compounds and ascorbic acid or reductone reducing agents. These compositions can be used in thermally developable m...  
WO/2005/050312A2
A radiographic imaging assembly comprises a symmetric radiographic silver halide film has an overall system speed of at least 200 but less than 800 to provide images with improved contrast and sharpness and reduced fog. The imaging assem...  
WO/2005/050315A1
A high-speed (over 700) radiographic silver halide film is useful for radiography to provide images with improved contrast and sharpness and reduced fog. The film includes at least one tabular grain silver halide emulsion layer on each s...  
WO2005008850A3
A method and apparatus (Figure 1) for laser-assisted fault mapping synchronizes laser control (11) whith tester unit (6). The inventive method provides for laser-assisted pseudo-static fault mapping to localize defects in a device (2) wh...  
WO/2005/048287A2
A phosphor screen comprises an inorganic phosphor capable of absorbing X-rays and emitting electromagnetic radiation having a wavelength greater than 300 nm. The phosphor is disposed on a support that has a reflective substrate (11) comp...  
WO2004066028A3
A method for determining one or more process parameter settings of a photolithographic system is disclosed. The method is performed using a scatterometry tool (258) to measure a latent image of a pattern, a partially developed pattern, o...  
WO2004079780A3
A patterned reflective semiconductor mask (10) uses a multiple layer ARC (24, 26, 28) overlying an absorber stack (22) that overlies a reflective substrate (12, 14). The absorber stack has more than one layer and an upper layer of the ab...  
WO/2005/043241A2
A method of fabricating a pattern on a surface of a substrate includes applying at least one non-molecular lithographic technique with at least one molecular lithographic technique to simultaneously define a size and shape of at least on...  
WO/2005/040924A2
A photoresist spray coating process for deep trenched substrates. According to one implementation of the invention, the substrate surface is primed with a primer having a water contact angle between forty and fifty degrees. A spray nozzl...  
WO/2005/038524A2
A positive-working photosensitive composition comprising one or more polybenzoxazole precursor polymers, a diazonaphthoquinone photoactive compound which is the condensation product of a compound containing from 2 to about 9 aromatic hyd...  
WO/2005/036261A1
A negative resist composition is disclosed, wherein the resist composition includes a polymer having at least one fluorosulfonamide monomer unit having one of the following two formulae: wherein: M is a polymerizable backbone moiety; Z i...  
WO2004086143A3
Method and apparatus for etching a metal layer disposed on a substrate, such as a photolithographic reticle, are provided. In one aspect, a method is provided for processing a photolithographic reticle including positioning the reticle o...  
WO/2005/031458A2
A photomask (1900) for producing partial-depth features (712 and 912) in a photo-imageable polymer layer (412) on a wafer of a chip scale package (200) using exposure tools capable of resolving sizes of a critical dimension or larger, ha...  
WO/2005/026839A2
Compositions and methods for production of color images using phthalocyanine precursor-containing color forming compositions are described. The color forming composition can include a phthalocyanine precursor, an infrared absorber, and a...  
WO/2005/024325A2
A method and system is described for drying a thin film on a substrate following liquid immersion lithography. Drying the thin film to remove immersion fluid from the thin film is performed prior to baking the thin film, thereby reducing...  
WO/2005/022600A2
Disclose are methods, systems, and processor program products for filtering overlay measurements, including generating a residual between a measured overlay displacement (212) and an overlay displacement based on a model of reticle erros...  
WO/2005/013006A1
The present invention relates to alignment of a writing system and a workpiece. In particular, it relates to alignment to write a second layer pattern on a workpiece that has a first layer pattern, using an SLM. It extends to producing a...  
WO2004079779A3
An attenuated phase shift mask (10 or 20) includes a substrate (12 or 22) and an attenuation stack (11 or 21) overlying the substrate. The attenuation stack includes a chromium layer or ruthenium layer (14 or 24) overlying the substrate,...  
WO/2005/013007A1
The present invention relates to methods for patterning substrates, such as reticles, masks or wafers, which reduce critical dimension variations, improving CD uniformity. In particular, it relates to tuning doses applied in passes of a ...  
WO/2005/011992A1
A process for providing a security paper, in particular a banknote, with a coloured marking, comprising providing a photosensitive preparation on a portion of said document and submitting at least selected areas of said portion to a ligh...  
WO2004083960A3
The present invention generally relates to optical lithography and more particularly relates to the fabrication of transparent or semitransparent phase shifting masks used in the manufacture of semiconductor devices. In particular, the p...  
WO/2005/008850A2
A method and apparatus (Figure 1) for laser-assisted fault mapping synchronizes laser control (11) whith tester unit (6). The inventive method provides for laser-assisted pseudo-static fault mapping to localize defects in a device (2) wh...  
WO2004065287A3
A photoresist layer (417) on a semiconductor wafer (419) is patterned using a mask (401) with an absorbing layer (107) that has been repaired by using an additional light-absorbing carbon layer (105) that collects ions that are used in t...  
WO2004092832A3
Methods for the determination of center of focus and process control for a lithographic tool. Diffraction signatures are obtained from a plurality of diffraction structures located within multiple different focus setting fields. Variabil...  
WO/2005/001898A2
A method of designing and forming a reticle (404), as well as the manufacture of a semiconductor substrate (410) using the reticle, includes defining a first edge of a reticle layout file. The first edge corresponds to a reference featur...  
WO/2005/001567A1
An improved digitally imageable relief printing element having an increased direct-cure imaging speed upon exposure to lasers and other digital sources of actinic radiation. The printing elements of the invention comprise a reflective la...  
WO/2005/001565A1
A black and white photothermographic material is imaged and heat developed to provide an image that has an image tone that is characterized such that the value for b* at an optical density of 1.0 is greater than the value for b* at Dmin....  

Matches 201 - 250 out of 16,996