Login| Sign Up| Help| Contact|

Patent Searching and Data


Matches 251 - 300 out of 17,003

Document Document Title
WO/2005/001901A2
A novel process for using a hard mask or protective layer in conjunction with an extremely thin photoresist is provided. In this process, a thin film of the protective layer is coated on the surface of a substrate that is to be selective...  
WO/2005/001432A2
The present invention is directed towards a fluid composition comprising a perfluoroehter compound; the fluid composition has an absorbance of less than about 2 cm-1 at a wavelength of about 157 nm. The present invention also comprises a...  
WO/2004/114382A1
A method for forming a pattern is disclosed which comprises a step wherein a fluid film is made from a material with fluidity, a step wherein a pressing surface of a pressing member which has at least one of a projected portion and a rec...  
WO2004042344A3
The present invention relates to a method of manufacturing a detection device which involves providing a substrate having a layer of gold and a first layer of photosensitive material. Next, the substrate is subjected to a first level pho...  
WO/2004/109397A1
A method of processing photographic material in which a processing chamber is indirectly heated to an aim temperature, the chamber being replenished substantially simultaneously with the passage of the material through the chamber. Eithe...  
WO/2004/109396A1
A radiographic imaging assembly comprises a radiographic silver halide film and a single fluorescent intensifying screen that has protective overcoat that comprises a miscible blend of a first polymer that is poly(vinylidene fluoride-co-...  
WO/2004/107042A1
A method of evaluating process effects of multiple exposure photolithographic processes by first determining a set of expected images for each exposure step or process of the multiple exposure process individually (SET1, SET2) and then o...  
WO/2004/107043A1
A method for reproducing on a support a digital holographic matrix comprises the steps of obtaining said matrix by the application of simulation software to a high resolution image, exposing said support by reproducing the holographic ma...  
WO/2004/107407A2
A photolithographic method of making an information storage device having different storage characteristics at a plurality of discrete memory locations thereon, comprises the steps of: (a) providing a substrate having a surface portion, ...  
WO/2004/107379A1
The present invention provides an unbaked laminate for producing a front plate (1) of a plasma display device, and a method for producing such a front plate (1). The laminate includes a burnable intermediate layer (14), and may include a...  
WO2004077154A3
The present invention provides systems and methods for improved lithographic printing with polarized light. In embodiments of the present invention, polarized light (radially or tangentially polarized) is used to illuminate a phase-shift...  
WO2004066358A3
The present invention generally relates to improved binary half tone ("BHT") photomasks and microscopic three-dimensional structures (e.g., MEMS, micro-optics, photonics, micro-structures and other three-dimensional, microscopic devices)...  
WO/2004/094967A2
In accordance with this invention, there is provided a method of imaging, measuring and displaying a 3-dimensional dose distribution of an energy field in a translucent 3-dimensional object comprises: applying an energy field to the obje...  
WO/2004/095133A1
A method of forming images through exposure according to digital data and development so as to obtain a print; and a silver halide color photographic lightsensitive material for use therein. In particular, a method of forming images wher...  
WO/2004/092832A2
Methods for the determination of center of focus and process control for a lithographic tool. Diffraction signatures are obtained from a plurality of diffraction structures located within multiple different focus setting fields. Variabil...  
WO/2004/093148A2
The invention describes a methodology based on the interpolation (503) of the correction (501 and 502) between selected evaluation points (505 and 506) of the target layout (504). By connecting the correction points this technique provid...  
WO/2004/090635A1
A method of producing a photomask (10) that poses a problem with a CD accuracy lowered due to a loading effect; and technique for restricting a loading effect. A method of producing a photomask (10) in which a chromium pattern (21) havin...  
WO2004049063A3
A photomask and method for creating a protective layer on the photomask are disclosed. The method includes placing a photomask including a patterned layer formed on at least a portion of a substrate in a chamber. Oxygen is introduced int...  
WO2004021081A3
A first (20) and a second phase-shifting, semi-transparent layer (30) are formed on a substrate (10). First raised structure elements (80) on the substrate (10) with a first degree of transmission are formed therefrom by means of lithogr...  
WO/2004/086143A2
Method and apparatus for etching a metal layer disposed on a substrate, such as a photolithographic reticle, are provided. In one aspect, a method is provided for processing a photolithographic reticle including positioning the reticle o...  
WO/2004/086138A1
A method of processing uses a common delivery means to supply a starter solution and a replenisher solution to the processing apparatus. The volume of the delivery means is equal the volume of starter solution required to convert a fixed...  
WO2004047121A3
The invention relates to a protective layer for an image detector used for an x-ray image. Said image detector comprises a layer of luminescent material (3), which is to be protected against mechanical stress and moisture. A polymeric pr...  
WO/2004/086139A1
A method of photographic processing in which the cleaning solution used for washing the processor comprises at least a constituent part of the processing solution.  
WO/2004/083960A2
The present invention generally relates to optical lithography and more particularly relates to the fabrication of transparent or semitransparent phase shifting masks used in the manufacture of semiconductor devices. In particular, the p...  
WO2004072734A3
An apparatus, system and method to compensate for the proximity effects in the imaging of patterns in a photolithography process. A light exposure of a photoresist layer is effectuated in predetermined patterns through an exposure mask h...  
WO/2004/079779A2
An attenuated phase shift mask (10 or 20) includes a substrate (12 or 22) and an attenuation stack (11 or 21) overlying the substrate. The attenuation stack includes a chromium layer or ruthenium layer (14 or 24) overlying the substrate,...  
WO/2004/079780A2
A patterned reflective semiconductor mask (10) uses a multiple layer ARC (24, 26, 28) overlying an absorber stack (22) that overlies a reflective substrate (12, 14). The absorber stack has more than one layer and an upper layer of the ab...  
WO/2004/077154A2
The present invention provides systems and methods for improved lithographic printing with polarized light. In embodiments of the present invention, polarized light (radially or tangentially polarized) is used to illuminate a phase-shift...  
WO/2004/072735A1
A method for correcting a photomask by the optical proximity effect, enabling decrease of the inter-mask difference in the pattern density-dependent error of the line width between a test mask and a corrected mask. The method comprises a...  
WO/2004/072734A2
An apparatus, system and method to compensate for the proximity effects in the imaging of patterns in a photolithography process. A light exposure of a photoresist layer is effectuated in predetermined patterns through an exposure mask h...  
WO/2004/068239A1
An image forming method for forming a stable image excellent in sharpness with no variation in density in the image part even after continuous printing by means of a high-speed digital printer. The method in which a silver halide color p...  
WO/2004/066358A2
The present invention generally relates to improved binary half tone ('BHT') photomasks and microscopic three-dimensional structures (e.g., MEMS, micro-optics, photonics, micro-structures and other three-dimensional, microscopic devices)...  
WO/2004/066028A2
A method for determining one or more process parameter settings of a photolithographic system is disclosed. The method is performed using a scatterometry tool (258) to measure a latent image of a pattern, a partially developed pattern, o...  
WO/2004/065287A2
A photoresist layer (417) on a semiconductor wafer (419) is patterned using a mask (401) with an absorbing layer (107) that has been repaired by using an additional light-absorbing carbon layer (105) that collects ions that are used in t...  
WO2004040371A3
Novel copolymers suitable for forming the top layer photoimageable coating in a deep UV, particularly a 193 nm and 248 nm, bilayer resist system providing high resolution photolithography. Chemically amplified photoresist composition an ...  
WO/2004/056377A1
The invention refers to an orthochromatic system of rare earh elements screen film for intra-oral odontological radiology, which is characterized by comprising: 1.a) a protective layer (1-PL) b) one phosphor emulsion layer (1-PEL), compr...  
WO/2004/049063A2
A photomask and method for creating a protective layer on the photomask are disclosed. The method includes placing a photomask including a patterned layer formed on at least a portion of a substrate in a chamber. Oxygen is introduced int...  
WO/2004/046812A1
A silver halide photosensitive material having a high photosensitivity, undergoing little fog, and having a favorable gradation, a long shelf life, a favorable pressure resistance, an excellent text image reproducibility, and an excellen...  
WO/2004/047121A2
The invention relates to a protective layer for an image detector used for an x-ray image. Said image detector comprises a layer of luminescent material (3), which is to be protected against mechanical stress and moisture. A polymeric pr...  
WO/2004/044967A1
Accuracy of position of a mask pattern is improved by reducing stress change in a thin film layer which occurs during a manufacturing process of a transfer mask. A method for manufacturing a transfer mask is characterized by comprising a...  
WO/2004/042344A2
The present invention relates to a method of manufacturing a detection device which involves providing a substrate having a layer of gold and a first layer of photosensitive material. Next, the substrate is subjected to a first level pho...  
WO/2004/039601A1
Vesicular images are formed by thermal imaging of imageable layers containing thermally imageable vesicular imaging compositions. The vesicular images can be used as masks for imaging printing plate precursors. In one aspect, the printin...  
WO/2004/040371A2
Novel copolymers suitable for forming the top layer photoimageable coating in a deep UV, particularly a 193 nm and 248 nm, bilayer resist system providing high resolution photolithography. Chemically amplified photoresist composition an ...  
WO/2004/027822A2
This invention provides compositions and devices having structurally ordered nanostructures (Figures 1A-1D), as well as methods for producing structurally ordered nanostructures.  
WO/2004/021081A2
A first (20) and a second phase-shifting, semi-transparent layer (30) are formed on a substrate (10). First raised structure elements (80) on the substrate (10) with a first degree of transmission are formed therefrom by means of lithogr...  
WO2004007745A3
The invention provides chemiluminescent assays that incorporate a film including at least one chemiluminescent precursor immobilized therewith which produces a triggerable chemiluminescent compound, the film being free of compounds which...  
WO2003003116A8
Photographic developer replenisher concentrates comprising more reactive developers, like 4(N-ethyl-N-2-hydroxyethyl)-2-methylphenylenediamine (CD-4) undergo rapid oxidation, and consequently, have shorten shelf-life stabilities. Hydroxy...  
WO2003015329A3
The invention refers to a photosensitive device with typical appearance similar to a post office stamp, provided with information and equipped with at least two internal layers, able to perform the information transfer, be it coded or no...  
WO/2004/010217A1
A silver halide color photographic sensitive material for creating a color print by exposure and development on the basis of digital information and it image forming method are disclosed. Even if exposure is made by any type of digital e...  
WO/2004/010216A1
A method of forming a digital image with excellent line brightness and visually excellent whiteness. The method of image formation comprises exposing a silver halide photosensitive material and developing it, and is characterized in that...  

Matches 251 - 300 out of 17,003