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WO/2020/147059A1 |
A photomask is provided, the photomask includes a substrate (102), a circuit pattern (104) on the substrate (102), an electrostatic discharge (ESD) structure (106) on the substrate (102) and an ESD line (108a) on the substrate (102). The...
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WO/2020/149466A1 |
The present invention relates to a photomask storage box, and specifically, to a photomask storage box having a photomask case structure comprising: a lower case provided with a support unit such that a photomask rests therein; an upper ...
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WO/2020/144513A1 |
A system for training and verification of an integrated circuit layout is disclosed. The system includes a layout retrieval subsystem configured to retrieve one or more design layouts of an integrated circuit from one or more sources. Th...
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WO/2020/143201A1 |
A manufacturing method of a mask, and a mask. The manufacturing method of a mask comprises: forming a first patterned photoresist layer; forming photoresist patterns (20, 30); forming an electroformed layer (40); and forming a mask. The ...
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WO/2020/140718A1 |
A mask manufacturing method, comprising: establishing an OPC procedure; providing a design pattern, and pretreating a corner pattern in the design pattern; performing OPC operation on the design pattern comprising the pretreated corner p...
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WO/2020/137928A1 |
The present invention provides: a reflective mask blank which is capable of accurately transferring a pattern to a transfer-receiving body; a reflective mask; and a method for producing a semiconductor device. A reflective mask blank (10...
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WO/2020/137518A1 |
The present invention provides a mask blank that is equipped with a phase shift film that allows ArF exposure light to pass therethrough with a prescribed transmittance while creating a prescribed phase difference, and that minimizes the...
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WO/2020/138855A1 |
A blank mask includes a light-shielding film and a hard film which are formed on a transparent substrate. The hard film is formed of a silicon compound containing at least one of oxygen, nitrogen, and carbon in silicon. Provided are a bl...
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WO/2020/135946A1 |
Described herein is a method for generating a mask pattern to be employed in a patterning process. The method including (P301) obtaining (i) a first feature patch (301) comprising a first polygon portion of an initial mask pattern, and (...
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WO/2020/132391A1 |
Extreme ultraviolet (EUV) mask blanks, methods for their manufacture and production systems therefor are disclosed. The EUV mask blanks comprise a substrate; a multilayer stack of reflective layers on the substrate; a capping layer on th...
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WO/2020/132061A1 |
In a printing method, at least one image of a substrate supported in a printing system is acquired. An actual position of a first alignment feature on the substrate in a frame of reference of the printing system is determined based on th...
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WO/2020/126950A1 |
There is provided a method of manufacturing a membrane assembly for EUV lithography, wherein a layer which forms at least part of a pellicle membrane is provided after one or more etching steps which define a pellicle border holding the ...
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WO/2020/128869A1 |
A method for exposing a pattern in an area on a surface using a charged particle beam lithography is disclosed and includes inputting an original set of exposure information for the area. A backscatter is calculated for the area of the p...
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WO/2020/123038A1 |
Embodiments of the present disclosure generally provide apparatus and methods for removing an attachment feature utilized to hold a pellicle from a photomask. In one embodiment, an attachment feature removal apparatus for processing a ph...
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WO/2020/114729A1 |
A method for adjusting a target feature in a model of a patterning process based on local electric fields estimated for the patterning process is described. The method comprises obtaining a mask stack region of interest. The mask stack r...
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WO/2020/113667A1 |
A mask and a mask producing method. The mask comprises: a semi-transmitting film layer; and a light shielding layer, disposed on the semi-transmitting film layer. A part of the semi-transmitting film layer is exposed to serve as a channe...
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WO/2020/109152A1 |
A membrane cleaning apparatus for removing particles from a membrane comprises: a membrane support; and an electric field generating mechanism. The membrane support is for supporting the membrane. The electric field generating mechanism ...
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WO/2020/108902A1 |
Described herein is a method for determining a patterning device pattern. The method includes obtaining (i) an initial patterning device pattern having at least one feature, and (ii) a desired feature size of the at least one feature, ob...
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WO/2020/109074A1 |
Described herein is a method for quantifying uncertainty in parameterized (e.g., machine learning) model predictions. The method comprises causing a parameterized model to predict multiple posterior distributions from the parameterized m...
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WO/2020/104114A1 |
Disclosed is a method of measuring focus performance of a lithographic apparatus. The method comprises using the lithographic apparatus to print at least one focus metrology pattern on a substrate, the printed focus metrology pattern com...
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WO/2020/105319A1 |
The purpose of this invention is to make it possible to efficiently and accurately detect a reticle defect at an earlier stage in a manufacturing process. The inspection device according to this invention uses the results of comparing di...
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WO/2020/103317A1 |
A fast imputation method for use in mosaic stitching. By designing a special mosaic pattern on the smallest unit of a pattern of a first mosaic area or a second mosaic area formed, fast adjustment and imputation are implemented in a case...
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WO/2020/103187A1 |
Disclosed are a photomask for use in manufacturing an active switch and a manufacturing method of a display panel. The photomask comprises a light-blocking region, a translucent region, a transparent region and an exposed region. The lig...
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WO/2020/100632A1 |
Provided are a reflective photomask blank and a reflective photomask which have good irradiation resistance and which can obtain good transfer performance. In the reflective photomask blank (10), a reflective layer (2) for reflecting inc...
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WO/2020/101822A1 |
A method of aligning a plate containing a substrate is disclosed wherein multiple cameras with distinct fields of view are aligned with mark cells that are within the field of view of each of the multiple cameras. Tn one example embodime...
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WO/2020/099072A1 |
A pellicle for EUV lithography comprising: a frame; and a membrane supported by the frame, wherein the membrane comprises: a metallic or semimetallic layer, wherein the membrane comprises pores at a density of at least 5 per µm2. The me...
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WO/2020/096731A1 |
Embodiments of the present disclosure are related to systems and methods for autofocusing an imaging apparatus in real-time during substrate scanning to pattern a substrate that includes a photoresist formed over one or more patterned ma...
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WO/2020/096759A1 |
A container for supporting a workpiece, the workpiece including a chamfer around upper and lower edges of the workpiece is disclosed. The container includes a door and a shell capable of coupling with the door to define an isolated envir...
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WO/2020/095959A1 |
The present invention allows improvement in the accuracy of conversion from a coordinate system of a defect inspection device for detecting defects on a multilayer reflection film into a coordinate system of a device other than the defec...
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WO/2020/092963A1 |
Materials and methods to immobilize photoacid generators on semiconducting substrates are provided. PAG-containing monomers are copolymerized with monomers to allow the polymer to bind to a surface, and optionally copolymerized with mono...
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WO/2020/082630A1 |
A method for manufacturing a base plate and a display panel, comprising: providing a first substrate (210); sequentially forming a plurality of photoresist layers (211, 212, 213) arranged in parallel on the first substrate (210) so as to...
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WO/2020/083731A1 |
Inspection apparatus for inspecting an object such as a pellicle for use in an EUV lithographic apparatus, the inspection apparatus comprising: - a vacuum chamber; - a load lock forming an interface between the vacuum chamber and an ambi...
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WO/2020/086933A1 |
Extreme ultraviolet (EUV) mask blanks, methods for their manufacture and production systems therefor are disclosed. The EUV mask blanks comprise a substrate; a multilayer stack of reflective layers on the substrate; a capping layer on th...
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WO/2020/086932A1 |
Extreme ultraviolet (EUV) mask blanks, methods for their manufacture and production systems therefor are disclosed. The EUV mask blanks comprise a substrate having a first side and a second side; a backside coating layer comprising an al...
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WO/2020/078180A1 |
A mask, a display substrate and a manufacturing method therefor, and a display device, relating to the technical field of display. The mask comprises a transparent region (52), a first opaque region, and a first partially transparent reg...
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WO/2020/081842A1 |
The present disclosure provides masks suitable for Extreme Ultraviolet (EUV) and X-ray lithography by including a non-reflective region within the reflective multilayer. This non-reflective region replaces a typical absorber layer used t...
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WO/2020/078985A1 |
The invention describes a method for moving a structure (220) on a semiconductor article (180, 410) comprising providing a focused charged particle beam device (250), providing a semiconductor article (180, 410) comprising a substrate (2...
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WO/2020/078721A1 |
A method for manufacturing a membrane assembly for EUV lithography, the method comprising: providing a stack comprising: at least one membrane layer supported by a planar substrate, wherein the planar substrate comprises an inner region ...
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WO/2020/073391A1 |
Provided in the present application is a photomask and display panel manufacturing method. The manufacturing method comprises: simulating the exposure conditions of a part of a photomask corresponding to production; manufacturing the par...
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WO/2020/074356A1 |
Described herein is a method for source mask optimization with a lithographic projection apparatus. The lithographic projection apparatus comprises an illumination source and projection optics configured to image a mask design layout ont...
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WO/2020/076431A1 |
Generally, examples described herein relate to methods and apparatus for photomask processing. In an example, a photomask is obtained that is protected by a pellicle during a photolithography process. The photomask is cleaned by performi...
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WO/2020/071817A1 |
The present invention relates to a pellicle etching jig and a pellicle etching system. A pellicle etching jig according to one embodiment of the present invention comprises: a first support plate having a set thickness and a set area; a ...
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WO/2020/064217A1 |
A system for securing a particle to a pellicle membrane for subsequent use in a lithographic apparatus, the system comprising a particle securement device configured to secure the particle to the pellicle membrane. The particle securemen...
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WO/2020/062374A1 |
Disclosed are a photomask (1) and a manufacturing method therefor. The photomask (1) comprises: a fully shielded area (2) made of a light shielding material; and a semitransparent region (3), the number of which being set to at least one...
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WO/2020/062515A1 |
A photomask (50) for making a liner-type BPS and a liquid crystal display panel. The photomask (50) for making a liner-type BPS is provided with a liner pattern (52) for forming a main photo spacer color resist liner (51). The liner patt...
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WO/2020/062421A1 |
A photomask (100) and an exposure system, wherein the photomask (100) comprises a complete light-transmission area (10) and a complete light-shielding area (30) arranged in a manner of surrounding the outer periphery of the complete ligh...
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WO/2020/066591A1 |
Provided is a mask blank (100) provided with an etching stopper film (1): that exhibits a high resistance to dry etching that uses a fluorine-based gas and that is employed when patterning a phase shift film (3); and that additionally po...
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WO/2020/066590A1 |
Provided is a mask blank including an etching stopper film: that exhibits a high resistance to dry etching that uses a fluorine-based gas and that is employed when patterning a pattern-forming thin film; and that additionally possesses a...
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WO/2020/056863A1 |
Provided in the present disclosure is a light valve mask, which comprises a first substrate, a second substrate, a first electrode, a second electrode, and a light valve medium. The first electrode is provided on the lower surface of the...
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WO/2020/055894A1 |
An improved ANAB system or process substantially or fully eliminating contaminant particles from reaching a beam target by adding to the usual primary (first) ionizer of the ANAB system or process an additional (second) ionizer to ionize...
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