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Patent Searching and Data


Matches 401 - 450 out of 29,222

Document Document Title
WO/2021/246187A1
Provided are: a frame-shaped pellicle frame 1 having a pellicle frame main body 1a and an insulation layer 1b covering the pellicle frame main body; a pellicle comprising a pellicle film that is provided on the pellicle frame 1 and a top...  
WO/2021/247296A1
Apparatus, methods and are disclosed for measuring refractive index of an absorber material used in EUV phase shift masks. The method and apparatus utilize a reference measurement and as series of reflectance measurements at a range of E...  
WO/2021/244820A1
Described herein is a method for improving a design of a patterning device. The method includes (i) obtaining mask points of a design of a mask feature, wherein the mask feature corresponds to a target feature in a target pattern to be p...  
WO/2021/246450A1
Provided are a method for producing a laminate and its application, the method comprising, in the stated order, step 1 of preparing a laminate precursor having, in the stated order, a base material, a first transparent conductive part, a...  
WO/2021/244830A1
A method for verifying a feature of a mask design is described. The method comprises determining localized shapes of the feature; and determining whether there is a breach by the feature of verification criteria based on the localized sh...  
WO/2021/241877A1
The present invention relates to an exposure pattern, an exposure mask, and a method for forming an exposure pattern by same, wherein the exposure pattern is formed by division exposure, and in an area where a first exposure area formed ...  
WO/2021/239337A1
There is described an optical element for a lithographic apparatus, said optical element comprising an anchor layer selected to support a top layer having self-terminating growth in an operating lithographic apparatus or plasma containin...  
WO/2021/237552A1
A mask, an exposure method, and a touch panel. The mask comprises a light-transmitting pattern (520) and a light-shielding pattern (510), the mask further comprises a first exposure region (A) and a second exposure region (B), and the fi...  
WO/2021/238342A1
A mask (13), an exposure method and a touch panel (170). The mask (13) comprises a first area (130') and a second area (130); the first area (130') is located on at least one side of the second area (130), wherein the first area (130') c...  
WO/2021/233121A1
A wafer edge exposure apparatus and method, and a lithographic device. The apparatus comprises a wafer bearing module (20), a mask (30), a mask driving module (40), an alignment module (50), an exposure module (60), and a control module ...  
WO/2021/230297A1
Provided are: a reflective mask in which a fine absorption film pattern is formed even when a high-absorption material is used as an absorption film of an EUV mask, whereby a projection effect can be lessened and electron beam modificati...  
WO/2021/229968A1
This processing method for glass substrates comprises: irradiating a first main surface of a glass substrate with a gas cluster in the form of a beam; moving the glass substrate so as to move the irradiation point of the gas cluster on t...  
WO/2021/230262A1
The present invention provides: a pellicle frame for EUV exposure characterized in that the pellicle frame is provided with at least one ventilation part, and a filter having a porous membrane coated with a resin is attached inside the v...  
WO/2021/229967A1
This processing method for glass substrates comprises: preparing a protective layer-equipped glass substrate that has a glass substrate and a protective layer containing a resin layer which is in contact with the glass substrate; holding...  
WO/2021/229269A1
A method and apparatus for inscribing a Bragg grating in an optical waveguide, comprising: providing electromagnetic radiation from an ultrashort pulse duration laser, wherein the electromagnetic radiation has a pulse duration of less th...  
WO/2021/227910A1
A photomask and a manufacturing method therefor. The photomask comprises: a substrate (11), and a light-shielding layer (12) and a barrier layer (13) which are located on the substrate (11), wherein the light-shielding layer (12) is inte...  
WO/2021/224353A1
In particular for producing reflective optical elements for the EUV wavelength range, which have grating structures or which can serve for a phase shift, methods with the following steps are proposed: - applying a structurable layer to a...  
WO/2021/223569A1
A mask plate relating to the technical field of display, comprising a first splicing exposure region (120) and a second splicing exposure region (220) which are arranged along a first direction (A). After being translated along a first v...  
WO/2021/224009A1
Disclosed is a substrate and associated patterning device. The substrate comprises at least one target arrangement suitable for metrology of a lithographic process, the target arrangement comprising at least one pair of similar target re...  
WO/2021/225999A1
Systems and methods for detecting defects on a reticle are provided. One system includes computer subsystem(s) configured for performing at least one repeater defect detection step in front-end processing during an inspection process per...  
WO/2021/218413A1
A mask (M), a display substrate and a manufacturing method, and a display device. The present invention can improve the yield of the display device. The mask (M) is used for manufacturing a pixel defining layer (6) of the display substra...  
WO/2021/221124A1
The objective of the present invention is to provide a reflective photomask blank and a reflective photomask that suppresses or reduces a projection effect in a reflective photomask for patterning transfer using light having a wavelength...  
WO/2021/221123A1
The purpose of the present invention is to provide a reflective photomask blank and a reflective photomask which have high resistance to hydrogen radicals and which have improved transfer properties by minimally suppressing projection ef...  
WO/2021/222179A1
Extreme ultraviolet (EUV) mask blanks, methods for their manufacture and production systems therefor are disclosed. The EUV mask blanks comprise a substrate,; a multilayer stack of reflective layers on the substrate, a capping layer on t...  
WO/2021/222688A1
Methods and systems for building a photomask from obtained pattern information relating to a photomask that exhibits defects on wafer. Spatial domain analysis is conducted on the pattern information so that corrective photomask structure...  
WO/2021/222603A1
A pod includes a cover with a cover body, a baseplate with a baseplate body, and one or more seal surfaces. The one or more seal surfaces are formed on one or more of the baseplate body and the cover body to provide sealing. A method of ...  
WO/2021/212557A1
A mask plate, and a display panel and a manufacturing method therefor. The mask plate comprises a transverse shading strip (10) and a longitudinal shading strip (20) crossed with the transverse shading strip (10); and the mask plate is p...  
WO/2021/216658A1
Extreme ultraviolet (EUV) mask blanks and methods for their manufacture, and production systems therefor are disclosed. The method for forming an EUV mask blank comprises smoothing out surface defects on a surface of a substrate.  
WO/2021/213777A1
A pellicle frame (17) comprises: a first portion (40); and a plurality of second portions (42). The first portion is for connection to a border (19a) of a pellicle (19). The first portion comprises a hollow and generally rectangular body...  
WO/2021/217061A1
Embodiments of the present disclosure are directed to an array substrate which can be used in nucleic acid sequencing, which includes a plurality of fiducial domains (FDs). The disclosure also includes array substrate manufacturing metho...  
WO/2021/213813A1
An inspection system (1600), a lithography apparatus, and an inspection method are provided. The inspection system (1600) includes an illumination system (1602), a detection system (1606), and processing circuitry (1622). The illuminatio...  
WO/2021/208692A1
A mask layout method and apparatus, and a mask. The mask layout method comprises: forming, on a mask (1), chip patterns (11) arranged in an array, a cutting channel (12) being formed between every two adjacent chip patterns (11), the cut...  
WO/2021/211676A1
Extreme ultraviolet (EUV) mask blanks, methods for their manufacture and production systems therefor are disclosed. The EUV mask blanks comprise a substrate; a multilayer stack of reflective layers on the substrate; a capping layer on th...  
WO/2021/209273A1
An inspection system, a lithography apparatus, and an inspection method are provided. The inspection system includes an illumination system, a detection system, and processing circuitry. The illumination system generates a broadband beam...  
WO/2021/211955A1
Sensor zones are created on an inner pod of a reticle container using a dry coating method. The sensor zones are discrete zones having a specific spectral reflectivity. The sensor zones are positioned such that they can be read by a tool...  
WO/2021/210432A1
An exposure pellicle film includes a carbon nanotube film, the carbon nanotube film containing carbon nanotubes, the carbon nanotube film having an EUV light transmittance of 80% or above at a wavelength of 13.5 nm, and the carbon nanotu...  
WO/2021/205906A1
[Problem] With conventional mask-information adjusting devices, there has been a problem in that the data size of mask information with which it is possible to obtain a high-precision exposure pattern is large. [Solution] A mask-informat...  
WO/2021/203966A1
An optical proximity effect correction method and apparatus. The optical proximity effect correction method comprises: acquiring an original target pattern, and pre-processing the original target pattern to form a secondary target patter...  
WO/2021/204024A1
Disclosed are a mask plate and a method for testing the quality of the mask plate. The mask plate comprises a mask exposure area (12) and a non-mask exposure area (11), wherein the mask exposure area (12) is provided with a mask pattern ...  
WO/2021/203550A1
Disclosed is an optical proximity correction method for a curve pattern. After the optical proximity correction is performed on an imported original design pattern and before design rule checking, the curve pattern is subjected to orthog...  
WO/2021/204541A1
A pre-classification of potential mask defects on the basis of machine learning is provided during the inspection of a mask for EUV lithography.  
WO/2021/197266A1
An optical proximity correction method and apparatus. The optical proximity correction method comprises: manufacturing a test mask plate; using the test mask plate to acquire wafer data under the current photoetching condition; using the...  
WO/2021/199528A1
An inspection device comprising: a bombardment source that bombards a pattern of an inspection specimen with an electron beam, said inspection specimen having a first surface, and a second surface on which the pattern is formed; a first ...  
WO/2021/200325A1
The present invention provides a multilayer reflective film-equipped substrate, a reflective mask blank, a reflective mask, and a method for producing a semiconductor device, the multilayer reflective film-equipped substrate having high ...  
WO/2021/195194A1
Extreme ultraviolet (EUV) mask blanks, methods for their manufacture and production systems therefor are disclosed, The EUV mask blanks comprise a substrate,; a multilayer stack of reflective layers on the substrate, a capping layer on t...  
WO/2021/190396A1
Provided is a mask (1000), comprising a first boundary area (21) and a plurality of exposure pattern areas (10), wherein the first boundary area (21) comprises a region surrounding the plurality of exposure pattern areas (10); and the fi...  
WO/2021/193681A1
The purpose of the present disclosure is to provide a pellicle that has an adhesive layer having good flatness, and a method for producing the pellicle with good reproducibility. Said purpose is achieved by a pellicle having: a pellicle ...  
WO/2021/189776A1
The present application provides a mask, a display panel, and an electronic device. The mask moves an opening graphic pattern to sides of repeat regions. On the basis of the structure, masks having the same size can be used in display pa...  
WO/2021/192734A1
The present invention provides a mask blank which is capable of suppressing decrease in the etching rate of a hard mask film as a whole, while enhancing the pattern resolution, CD in-plane uniformity and CD linearity. A mask blank whic...  
WO/2021/190123A1
Provided are a mask (20), a display panel, and a method for preparing the mask (20). The mask (20) comprises a fully light-transmitting area (210), a semi-light-transmitting area (220) and a non-light-transmitting area (230), wherein the...  

Matches 401 - 450 out of 29,222