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Patent Searching and Data


Matches 1 - 50 out of 37,604

Document Document Title
WO/2018/110511A1
A fine optical image generation element (100) is provided with a fine structure (120) in which a plurality of openings (140) are arranged on the basis of an arrangement pattern formed by combining at least two paracrystal patterns on the...  
WO/2018/104573A1
The present invention relates to compositions for photolithographic masks comprising a substrate and a covering having at least one electroconducting layer containing a nitride, a boride or a carbide, and to methods for preparing the same.  
WO/2018/104039A1
An overlay measurement (OV) is based on asymmetry in a diffraction spectrum of target structures formed by a lithographic process. Stack difference between target structures can be perceived as grating imbalance (GI), and the accuracy of...  
WO/2018/101729A1
The present application can provide a block copolymer and a use thereof. The block copolymer of the present application has excellent self-assembly properties or phase separation properties, has excellent etching selectivity, and can als...  
WO/2018/101732A1
The present application may provide a block copolymer and a use thereof. The block copolymer of the present application has excellent self-assembly properties or phase separation characteristics, and can be freely assigned various requir...  
WO/2018/099159A1
A display panel having a display area tessellated by repetition of a first subpixel group (10). The display panel includes an array of a plurality of first subpixel groups(10). Each of the plurality of first subpixel groups includes a fi...  
WO/2018/101731A1
The present application relates to a polymer composition and the use thereof. The present application can provide a polymer composition which has excellent self-assembly properties, enables a vertical orientation structure even for a sur...  
WO/2018/101730A1
The present application can provide a block copolymer and a use thereof. The block copolymer of the present application has excellent self-assembly properties or phase separation properties and can also freely provide a variety of requir...  
WO/2018/101743A2
The present application relates to a block copolymer and use thereof. The present application can provide a laminate which can form a highly aligned block copolymer on a substrate and thus can be effectively applied to manufacture of var...  
WO/2018/099716A1
A method including: obtaining a device design pattern layout having a plurality of design pattern polygons; automatically identifying, by a computer, a unit cell of polygons in the device design pattern layout; identifying a plurality of...  
WO/2018/100958A1
Provided is a mask blank of which the correction rate of EB defect correction is sufficiently fast even when a thin film for forming a transfer pattern is formed with an SiN material, and the ratio of correction rate for EB defect correc...  
WO/2018/101713A1
The present application relates to a method for manufacturing a polymer film. The present application relates to a manufacturing method for effectively forming a polymer film comprising, on a substrate, highly-aligned block copolymers ha...  
WO/2018/101742A1
The present application relates to a polymer composition and the use thereof. The present application can provide a polymer composition which has excellent self-assembly properties, enables a vertical orientation structure even for a sur...  
WO/2018/095249A1
A mask box comprises a bottom plate (1), a middle frame (2) disposed above the bottom plate (1), and a top cover (3) disposed above the middle frame (2). The bottom plate (1), the middle frame (2) and the top cover (3) form, in a surroun...  
WO/2018/091604A1
An apparatus and a method for cleaning a partial area of a substrate, in particular a photomask, are described. The apparatus has a cleaning head having a lower surface configured to be arranged above and in close proximity to the substr...  
WO/2018/091601A1
The invention relates to a holder for holding and for protecting a side of a photomask or a photomask having pellicle from a cleaning medium, to a method for cleaning such a photomask, and to a device for opening and closing a holder. Th...  
WO/2018/092050A1
Controlling an etch process applied to a multi-layered structure, by calculating a spectral derivative of reflectance of an illuminated region of interest of a multi-layered structure during an etch process applied to the multi-layered s...  
WO/2018/090630A1
Provided is a pixel arrangement structure comprising a plurality of pixel groups arranged repeatedly, each pixel group comprising four pixels. A first pixel (310) and a second pixel (320) are arranged in the same row, and a third pixel (...  
WO/2018/082396A1
A mask plate, comprising: a completely light-transmitting region (100), a completely opaque region (200), and a partially light-transmitting region located at a junction between the completely light-transmitting region (100) and the comp...  
WO/2018/085110A1
An apparatus may include a platen to hold a substrate. A substrate plane structure may be disposed in front of the platen. The substrate plane structure has an opening therein. The apparatus may further include a removable structure disp...  
WO/2018/084133A1
The purpose of the present invention is to provide an ultraviolet treatment device capable of treating, with high reliability, portions of a surface to be treated of an object to be treated. An ultraviolet treatment device comprising an ...  
WO/2018/076591A1
Disclosed is a method for a device. The device is used for manufacturing or using a mask or a display substrate. The method comprises the following steps: providing a master mask; a step of setting measurement points: setting a plurality...  
WO/2018/077787A1
A method for optimizing a patterning device pattern, the method including: obtaining an initial design pattern having a plurality of polygons; causing at least some of the polygons to be effectively connected with each other; placing eva...  
WO/2018/080489A1
A system for fabricating micro-truss structures. A reservoir holds a volume of a liquid photomonomer configured to polymerize to form a photopolymer when exposed to suitable light such as ultraviolet light. A mask at the bottom of the re...  
WO/2018/073427A9
In one embodiment of the disclosure, it is proposed a photolithography device for generating structure on a photoresist substrate, the photolithography device comprising a light illumination unit and a photomask. The photomask is remarka...  
WO/2018/073427A1
In one embodiment of the disclosure, it is proposed a photolithography device for generating structure on a photoresist substrate, the photolithography device comprising a light illumination unit and a photomask. The photomask is remarka...  
WO/2018/074512A1
Provided are reflective mask blank and a reflective mask with which it is possible to reduce the shadowing effect of EUV lithography and form fine patterns. As a result, it is possible to produce a semiconductor device with a stable, hig...  
WO/2018/068441A1
A mask plate (30), a stitching exposure method, a display panel, and a manufacturing method. The mask plate (30) is used for manufacturing scan lines (21) or data lines (22) of a display panel by means of exposure; the mask plate (30) is...  
WO/2018/071063A1
Diffraction-based focus target cells, targets and design and measurement methods are provided, which enable sensitive focus measurements to be carried out by overlay measurement tools. Cells comprise a periodic structure having a coarse ...  
WO/2018/061544A1
Disclosed is a proximity exposure method wherein: a mask (M), in which mask patterns (31) larger than the resolution limit of a resist (R) are formed, is prepared with respect to a resist pattern (43) having the smallest pitch (P) that i...  
WO/2018/063325A1
Lithographic apparatuses suitable for complementary e-beam lithography (CEBL) are described. In an example, method of forming a pattern for a semiconductor structure including forming a pattern of parallel lines above a substrate. The me...  
WO/2018/063331A1
Lithographic apparatuses suitable for complementary e-beam lithography (CEBL) are described. In an example, a method of forming a pattern for a semiconductor structure includes forming a pattern of parallel lines above a substrate. The m...  
WO/2018/057327A1
A method of patterning a substrate. The method may include: providing a first surface feature and a second surface feature in a staggered configuration within a layer, the layer being disposed on the substrate, and directing first ions i...  
WO/2018/057345A1
Asymmetric structures formed on a substrate and microlithographic methods for forming such structures. Each of the structures has a first side surface and a second side surface, opposite the first side surface. A profile of the first sid...  
WO/2018/055995A1
Provided are: a support frame (1) for pellicles, which has both low dust generation properties and high light resistance, while being ultimately reduced in the ion release amount to the extent such that haze is not produced even in cases...  
WO/2018/056033A1
Provided is a mask blank for a phase shift mask that transmits ArF excimer laser light at a transmittance of 10% or greater, has a high correction rate ratio for translucent substrates when EB defect correction is performed, and for whic...  
WO/2018/055994A1
The present invention provides a support frame for pellicles that has both low dusting characteristics and high light fastness and the ion elution amount of which is reduced to the utmost limit to an extent that noise is not generated ev...  
WO/2018/046377A1
A source grating structure (G0) for interferometric X-ray imaging cable of generating a non-uniform intensity profile behind a surface (S) of the grating structure when exposed to X-ray radiation.  
WO/2018/048005A1
A mask protecting module is provided. The mask protecting module comprise a frame and a membrane supported by the frame, and the membrane may comprise areas that are different from each other in terms of at least one selected from optica...  
WO/2018/044678A1
A reticle pod includes an outer pod, an inner pod cover and an inner base plate. A reticle is supported on the base and is contained within the environment created by the inner pod cover and the inner pod base. The inner pod cover can in...  
WO/2018/043347A1
Provided is a pellicle production method which allows for the simplification of production steps. The pellicle production method comprises: a step for forming an SiC film (11) on a lower surface (21a) of an Si substrate (21); a step for ...  
WO/2018/037864A1
It tends to be difficult to create a phase shift film having a transmittance of 20% or more from a single layer phase shift film made of silicon nitride material; as such, provided is a mask blank including a phase shift film having a tr...  
WO/2018/037863A1
The purpose of the present invention is to provide a mask blank (100) of which a light-shielding film pattern (2a) has high ArF light resistance, and which solves the problem of detection sensitivity being insufficient when mask detectio...  
WO/2018/034460A1
The present invention relates to a photosensitive resin composition and a cured film prepared therefrom. The photosensitive resin composition additionally includes a thermal acid generator in addition to a conventional siloxane polymer, ...  
WO/2018/030703A1
The present invention relates to a nano protrusion forming method and a base material having a nano protrusion surface formed by the method, which forms, through a wet etching process by an acid solution without using a nano mask, an ant...  
WO/2018/029184A1
The invention concerns an optical system comprising a scanning unit, a first lens- element group comprising at least a first lens element, a focusing unit which is designed to focus beams onto a focus, wherein the focusing unit comprises...  
WO/2018/023838A1
A novel protection film for preventing from growing a haze on a photomask, comprising a frame (2) connected to a photomask (1) and a protection film (3) connected to ends of the frame (2). A gas channel is provided on the frame (2). Acco...  
WO/2018/022371A1
Extreme ultraviolet (EUV) mask blanks, methods for their manufacture and production systems therefor are disclosed. The EUV mask blanks comprise a multilayer stack of absorber layers on the capping layer, the multilayer stack of absorber...  
WO/2018/020913A1
This mask blank is provided with a light blocking film on a light transmitting substrate. The light blocking film has an optical density of 2.5 or more with respect to ArF excimer laser exposure light, and has a structure that comprises ...  
WO/2018/020994A1
The present invention provides a mask blank substrate, a mask blank, and a transfer mask that enable deterrence of focus error even when a transfer mask having relatively sparse transfer patterns is manufactured without using a high-spec...  

Matches 1 - 50 out of 37,604