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Matches 1 - 50 out of 38,119

Document Document Title
WO/2019/074774A1
A beamsplitter includes a substrate formed from a material transparent to wavelengths of light at least above a selected cutoff wavelength and reflective structures distributed across a surface of the substrate. The reflective structures...  
WO/2019/071669A1
The present invention provides a pre-UV treating apparatus for evaporation, comprising: a housing having a curing chamber therein, wherein one end of the housing is provided with a feed inlet, and an opposite end of the housing is provid...  
WO/2019/072703A1
A method to improve a lithographic process for imaging a portion of a patterning device pattern onto a substrate using a lithographic projection having an illumination system and projection optics, the method including: (1) obtaining a s...  
WO/2019/074112A1
One embodiment of the present invention provides a method for producing a circuit wiring line and a method for producing a substrate having a pattern, each of which comprises: a step wherein a photosensitive transfer material, which has ...  
WO/2019/075113A1
Electron source designs are disclosed. The emitter structure, which may be silicon, has a layer on it. The layer may be graphene or a photoemissive material, such as an alkali halide. An additional layer between the emitter structure and...  
WO/2019/066861A1
Apparatuses, methods and storage medium associated with generating an association dataset for manipulating a photomask pattern are disclosed herein. In embodiments, an apparatus to generate an association dataset for correction of a mask...  
WO/2019/066891A1
Predicting a failure mode in a negative and positive focus including patterning a wafer using a test mask at each of a plurality of varied focus steps to expose a plurality of features of the test mask into the wafer at each of the plura...  
WO/2019/061779A1
Provided is an array substrate, comprising a substrate (1), a thin film transistor layer provided on the substrate (1), and a planarization layer (5) provided above the thin film transistor layer. Bumps (51) are formed on the surface of ...  
WO/2019/064573A1
This photomask (1) is provided with: transmissive sections that form the openings; semitransmissive sections that form the flat sections; and light-blocking sections that form the photo spacer sections. The light-blocking sections are fo...  
WO/2019/061556A1
A manufacturing method for a substrate of a display device, the method comprising: providing a substrate main body (S10); applying a photoresist layer on the substrate main body (S11); using multiple lenses of an exposure device to expos...  
WO/2019/061714A1
A manufacturing method of a TFT array substrate comprises: providing a substrate; sequentially depositing, on a surface of the substrate, a gate metal layer, an insulation layer and a metal oxidation layer; forming a first metal layer on...  
WO/2019/066827A1
Lithographic apparatuses suitable for, and methodologies involving, e-beam lithography such as complementary e-beam lithography (CEBL) are described. In an example, a method of performing e-beam lithography includes forming a background ...  
WO/2019/058984A1
Provided is a mask blank 10 formed by stacking a phase shift film 2 made of a material consisting of silicon and nitrogen, a light shielding film 3, and a hard mask film 4 on a light transmissive substrate 1, said mask blank being config...  
WO/2019/055522A1
An apparatus (e.g., a multi-spectral optical filter array, an optical wafer, an optical component) has an aperture mask printed directly thereon, the aperture mask including a positive or negative photoresist. The apparatus includes a su...  
WO/2019/054768A1
The present application relates to a method for preparing a patterned substrate. According to the method of the present application, in a process of transferring a self-assembled pattern of a block copolymer on a substrate to form a patt...  
WO/2019/050288A1
The present invention relates to a frame for a lithographic pellicle that is attached to a mask and used as an anti-dust membrane while manufacturing a semiconductor device, a liquid crystal display, etc. The present invention provides a...  
WO/2019/048147A1
Disclosed is a method of measuring focus performance of a lithographic apparatus, and corresponding patterning device and lithographic apparatus. The method comprises using the lithographic apparatus to print one or more first printed st...  
WO/2019/047358A1
A light cover (100), used for the production of a common electrode (300) of an array substrate (200), comprising a center part (10), a first part (1) and a second part (2); the first part (1) is connected to the center part (10) and exte...  
WO/2019/048506A1
A method including: obtaining an optical proximity correction for a spatially shifted version of a training design pattern (5000); and training a machine learning model (5200) configured to predict optical proximity corrections for desig...  
WO/2019/049919A1
This photomask blank comprises: a substrate; and at least a first layer and a second layer, which are sequentially arranged from the substrate side. The first layer contains chromium; the second layer contains chromium and oxygen; and th...  
WO/2018/140502A8
Antireflection coatings for metasurfaces are described herein. In some embodiments, the metasurface may include a substrate, a plurality of nanostructures thereon, and an antireflection coating disposed over the nanostructures. The antir...  
WO/2019/039290A1
Provided are: an actinic ray-sensitive or radiation-sensitive resin composition that has excellent resolution, exposure latitude, and pattern shape properties; and a resist film, a pattern-forming method, a method for producing an electr...  
WO/2019/035636A1
The present application provides a substrate and a manufacturing method therefor. The present application can provide a substrate having a structure comprising a base layer, a black layer and a spacer, which are sequentially formed, wher...  
WO/2019/036582A1
A method of patterning a substrate may include providing a blanket photoresist layer on the substrate; performing an ion implantation procedure of an implant species into the blanket photoresist layer, the implant species comprising an e...  
WO/2019/031361A1
Provided are: a pellicle (1) which is capable of improving the production yield; and a method for producing a pellicle. This method for producing a pellicle comprises: a step for preparing a supporting body (3) that contains Si; and a st...  
WO/2019/032730A1
In some embodiments, a collection system of a semiconductor metrology tool includes a chuck to support a target from which an optical beam is reflected and an aperture mask to provide an adjustable aperture for the reflected optical beam...  
WO/2019/032753A1
New classes of materials and associated components for use in devices and systems operating at ultraviolet (UV), extreme ultraviolet (EUV), and/or soft X-ray wavelengths are described. This invention relates to increasing the bandwidth a...  
WO/2019/023890A1
A method for determining a metal mask plate (700) defect and a manufacturing device (100) used for determining a metal mask plate (700) defect. The metal mask plate (700) is adapted to be attached to a pixel substrate (800) so as to assi...  
WO/2019/024091A1
A laser repairing method and device, for use in removing impurities (30) on a substrate (20). The laser repairing method comprises the steps of: acquiring an initial position of an impurity (30) on a substrate (20) (S1); bombarding the i...  
WO/2019/024193A1
Provided is a mask. The mask comprises an alignment zone (101). The alignment zone (101) is used for obtaining a preset reflectivity under illumination with certain intensity for alignment. The alignment zone (101) is subjected to reflec...  
WO/2019/025082A1
A method of manufacturing a pellicle for a lithographic apparatus, said method comprising: locally heating the pellicle (4) using radiative heating (3), and depositing coating material simultaneously on both sides of the pellicle. Also d...  
WO/2019/027714A1
A magnetic gun lens and an electrostatic gun lens can be used in an electron beam apparatus and can help provide high resolutions for all usable electron beam currents in scanning electron microscope, review, and/or inspection uses. An e...  
WO/2019/025109A1
The disclosure also relates to a reflective optical element (1) for reflecting light having at least one wavelength in an EUV wavelength range. The optical element (1) comprises an optically effective region configured for reflecting the...  
WO/2019/021154A1
Method for compensating at least one defect (820, 920, 1020) of a mask blank (800, 900, 1000), wherein the method includes the following steps: (a) obtaining data in respect of a position of the at least one defect (820, 920, 1020) of th...  
WO/2019/016224A1
The present application relates to a method for disposing of excess material (590, 595) of a photolithographic mask (500), wherein the method comprises the following steps: (a) enlarging a surface of the excess material (590, 595); (b) d...  
WO/2019/015905A1
An optical membrane (16) for use in or with a lithographic apparatus, the membrane comprising a first layer (18) comprising a first material, and a second layer (20) comprising a second material, the first layer being arranged on the sec...  
WO/2019/014947A1
A method for manufacturing a mask (100). The method comprises the following steps: forming a reinforcing layer (20) on a substrate (10); forming a conductive magnetic layer (30) on the reinforcing layer (20); subjecting the conductive ma...  
WO/2019/014376A1
Embodiments described herein generally relate to a wave guide and a method of creating a wave guide. In one embodiment, a method of forming a wave guide is disclosed herein. An inverse master substrate having a plurality of projections e...  
WO/2019/012887A1
Lithography based on a unit figure (10) simulates the formation of a real pattern on a real substrate. First, the unit figure (10) is divided into polygons (Fig. (a)) to define vectors (Va1 through Vd4) on individual sides of the polygon...  
WO/2019/009211A1
A reflective photomask blank (10) according to one embodiment of the present invention comprises a substrate (1), a reflective layer (2) that is formed on the substrate (1), and a light absorption layer (4) that is formed on the reflecti...  
WO/2019/009212A1
A reflective photomask blank (10) according to one embodiment of the present invention comprises a substrate (1), a reflective layer (2) that is formed on the substrate (1), and a light absorption layer (4) that is formed on the reflecti...  
WO/2019/005170A1
Methods, systems, and apparatuses for implementing dynamic learning mask correction include: creating a mask via a lithography process; performing a learning phase to identify a set of mask shape variables that change simulated intensity...  
WO/2019/003486A1
This mask blank is provided with: a transparent substrate; a phase shift layer laminated on the surface of the transparent substrate, said phase shift layer having Cr as a major component; an etching stopper layer laminated on the phase ...  
WO/2018/233182A1
A photomask structure, comprising a plurality of photomask units (102) distributed in an array. The photomask unit (102) comprises a first photomask used for forming a first transparent electrode in a corresponding area of the surface of...  
WO/2018/234747A1
Various implementations described herein are directed to a method for manufacturing an integrated circuit. The method may include defining multiple lithographic regions for the integrated circuit, and the multiple lithographic regions ma...  
WO/2018/235721A1
Provided is a substrate (110) with a multilayer reflective film, which is used for the purpose of producing a reflective mask (200) having a multilayer reflective film (5) that has a high reflectance with respect to exposure light, while...  
WO/2018/233951A1
Disclosed is a method and associated inspection apparatus for detecting variations on a surface of a substrate. The method comprises providing patterned inspection radiation to a surface of a substrate. The inspection radiation is patter...  
WO/2018/230090A1
This simulation device (1) capable of running a simulation accurately at a high speed is provided with: a factor amount conversion information storage unit (111) for storing factor amount conversion information indicating the corresponde...  
WO/2018/230476A1
According to the present invention, the shape of a real figure pattern formed on a real substrate is estimated by simulating a lithography process. An evaluation point (E) is set on a contour of an original figure pattern (10) included i...  
WO/2018/228933A2
The invention relates to a pellicle assembly comprising a pellicle frame defining a surface onto which a pellicle is attached. The pellicle assembly comprises one or more three-dimensional expansion structures that allow the pellicle to ...  

Matches 1 - 50 out of 38,119