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Matches 1 - 50 out of 38,219

Document Document Title
WO/2019/115218A1
An apparatus for determining a condition associated with a pellicle (19) for use in a lithographic apparatus (LA), the apparatus comprising a sensor (26, 32, 52, 60), wherein the sensor (26, 32, 52, 60) is configured to measure a propert...  
WO/2019/116755A1
Provided are: a pellicle frame body for a flat panel display (FPD) having high dimensional accuracy and flatness, the pellicle frame body being capable of maintaining the rigidity required for a pellicle for a large flat panel display (F...  
WO/2019/112896A1
A purge system (100) includes a purge gas distribution manifold (110) that includes at least one port (124) through which light beam (132) from an optical metrology or inspection head (130) is transmitted. The purge gas distribution mani...  
WO/2019/108164A1
A mask process development having consistent mask targeting is described. A method includes receiving an integrated (IC) design. A test mask is generated that converts the IC design into one or more physical layouts. A set of one or more...  
WO/2019/105098A1
An alignment mark, substrate and fabrication method therefor, and exposure alignment method. The alignment mark comprises an alignment area (1), a peripheral area (2) and a shielding area (3). The alignment area (1) is provided with an o...  
WO/2019/104825A1
Provided are a color filter film substrate and method for fabrication thereof, said color filter film substrate comprising: a substrate (1) and a plurality of color-resist thin films (2) and a black matrix (3) formed on the substrate (1)...  
WO/2019/108379A1
Embodiments described herein relate to methods for fabricating waveguide structures utilizing substrates. The waveguide structures are formed having input coupling regions, waveguide regions, and output coupling regions formed from subst...  
WO/2019/103024A1
Provided is a reflective mask blank (100) which is able to produce a reflective mask (200) that is capable of forming a fine and highly accurate transfer pattern by further reducing the shadowing effects of the reflective mask. A reflect...  
WO/2019/103533A1
The present application relates to a method for manufacturing a substrate. The method for manufacturing a substrate, of the present application, can uniformly form a spacer having a height according to a desired cell gap and can also fre...  
WO/2019/101646A1
In order to qualify a mask (1) for microlithography, the effect of an aerial image (9) of the mask (1) on the wafer (8) is determined by means of a simulation for predicting the wafer structures (14) which can be produced by means of the...  
WO/2019/102990A1
The present invention provides a mask blank equipped with a phase shift film that has both the function for transmitting ArF exposure light at a prescribed transmittance and the function for creating a prescribed phase difference, and th...  
WO/2019/096094A1
A mask container apparatus for storing and unlocking mask boxes, comprising a support base (1), a positioning support mask (2), an unlocking module (3), and a rise/fall drive module (4). The positioning support mask (2) is fixed on the s...  
WO/2019/096574A1
The invention relates to a method and a device for mask inspection, for inspecting a mask for use in lithography, the method comprising the following steps: identifying at least one region at which the line width of structures present on...  
WO/2019/091932A1
A pellicle comprising a metal oxysilicide layer. Also disclosed in a pellicle comprising a molybdenum layer, a ruthenium layer and a silicon oxynitride layer, wherein the molybdenum layer is disposed between the ruthenium layer and the s...  
WO/2019/089196A1
Methods of and apparatuses for processing a metal oxide film are provided. Methods involve (a) exposing the metal oxide film to a boron halide reactant and igniting a first plasma with a first bias power to modify a surface of the metal ...  
WO/2019/090053A1
A digital masking system includes a supporting structure for supporting a material, and a pattern imaging apparatus. The pattern imaging apparatus includes a light source device, multiple imaging devices that convert light from the light...  
WO/2019/086643A1
A pellicle for a lithographic apparatus, wherein the pellicle comprises nitridated metal silicide or nitridated silicon as well as a method of manufacturing the same. Also disclosed is the use of a nitridated metal silicide or nitridated...  
WO/2019/081095A1
A pellicle frame (17) for supporting a pellicle, the frame (17) comprising a first surface (17B) and a second surface (17A) opposite the first surface (17A), and structure (18) provided between the first and the second surfaces (17A, 17B...  
WO/2019/081211A1
The disclosure relates to methods of determining a value of a parameter of interest of a patterning process, and of cleaning a signal containing information about the parameter of interest. In one arrangement, first and second detected r...  
WO/2019/082380A1
A photomask (1) has a light-shielding part (5), a semitransmissive part (2), and a transmissive part (4), wherein the semitransmissive part (2) is provided with a plurality of slits (3a) and band-like light-shielding sections (3b), and t...  
WO/2019/084237A1
A method of focusing includes irradiating an object by directing radiation output by a radiating source through an objective lens, measuring a first intensity of reflected radiation that is reflected from the object, adjusting a distance...  
WO/2019/078206A1
Provided are a substrate with a multilayer reflective film, a reflective mask blank, a reflective mask, and a semiconductor device manufacturing method which make it possible to prevent a surface of a multilayer reflective film from bein...  
WO/2019/079010A1
A set of the pulses of light in a light beam is passed through a mask toward a wafer during a single exposure pass; at least a first aerial image and a second aerial image on the wafer based on pulses of light in the set of pulses that p...  
WO/2019/078598A1
A stencil mask for a solar cell according to the present invention includes a busbar electrode opening which may comprise a plurality of sub openings, and in particular, each of the sub openings and a finger electrode opening may be in t...  
WO/2019/078205A1
Provided are: a multi-layer reflection film-equipped substrate that is capable of preventing contamination of the surface of the multi-layer reflection film even when a reference mark is formed on the multi-layer reflection film; a refle...  
WO/2019/074774A1
A beamsplitter includes a substrate formed from a material transparent to wavelengths of light at least above a selected cutoff wavelength and reflective structures distributed across a surface of the substrate. The reflective structures...  
WO/2019/071669A1
The present invention provides a pre-UV treating apparatus for evaporation, comprising: a housing having a curing chamber therein, wherein one end of the housing is provided with a feed inlet, and an opposite end of the housing is provid...  
WO/2019/072703A1
A method to improve a lithographic process for imaging a portion of a patterning device pattern onto a substrate using a lithographic projection having an illumination system and projection optics, the method including: (1) obtaining a s...  
WO/2019/074112A1
One embodiment of the present invention provides a method for producing a circuit wiring line and a method for producing a substrate having a pattern, each of which comprises: a step wherein a photosensitive transfer material, which has ...  
WO/2019/075113A1
Electron source designs are disclosed. The emitter structure, which may be silicon, has a layer on it. The layer may be graphene or a photoemissive material, such as an alkali halide. An additional layer between the emitter structure and...  
WO/2019/066861A1
Apparatuses, methods and storage medium associated with generating an association dataset for manipulating a photomask pattern are disclosed herein. In embodiments, an apparatus to generate an association dataset for correction of a mask...  
WO/2019/066891A1
Predicting a failure mode in a negative and positive focus including patterning a wafer using a test mask at each of a plurality of varied focus steps to expose a plurality of features of the test mask into the wafer at each of the plura...  
WO/2019/061779A1
Provided is an array substrate, comprising a substrate (1), a thin film transistor layer provided on the substrate (1), and a planarization layer (5) provided above the thin film transistor layer. Bumps (51) are formed on the surface of ...  
WO/2019/064573A1
This photomask (1) is provided with: transmissive sections that form the openings; semitransmissive sections that form the flat sections; and light-blocking sections that form the photo spacer sections. The light-blocking sections are fo...  
WO/2019/061556A1
A manufacturing method for a substrate of a display device, the method comprising: providing a substrate main body (S10); applying a photoresist layer on the substrate main body (S11); using multiple lenses of an exposure device to expos...  
WO/2019/061714A1
A manufacturing method of a TFT array substrate comprises: providing a substrate; sequentially depositing, on a surface of the substrate, a gate metal layer, an insulation layer and a metal oxidation layer; forming a first metal layer on...  
WO/2019/066827A1
Lithographic apparatuses suitable for, and methodologies involving, e-beam lithography such as complementary e-beam lithography (CEBL) are described. In an example, a method of performing e-beam lithography includes forming a background ...  
WO/2019/058984A1
Provided is a mask blank 10 formed by stacking a phase shift film 2 made of a material consisting of silicon and nitrogen, a light shielding film 3, and a hard mask film 4 on a light transmissive substrate 1, said mask blank being config...  
WO/2019/055522A1
An apparatus (e.g., a multi-spectral optical filter array, an optical wafer, an optical component) has an aperture mask printed directly thereon, the aperture mask including a positive or negative photoresist. The apparatus includes a su...  
WO/2019/054768A1
The present application relates to a method for preparing a patterned substrate. According to the method of the present application, in a process of transferring a self-assembled pattern of a block copolymer on a substrate to form a patt...  
WO/2019/050288A1
The present invention relates to a frame for a lithographic pellicle that is attached to a mask and used as an anti-dust membrane while manufacturing a semiconductor device, a liquid crystal display, etc. The present invention provides a...  
WO/2019/048147A1
Disclosed is a method of measuring focus performance of a lithographic apparatus, and corresponding patterning device and lithographic apparatus. The method comprises using the lithographic apparatus to print one or more first printed st...  
WO/2019/047358A1
A light cover (100), used for the production of a common electrode (300) of an array substrate (200), comprising a center part (10), a first part (1) and a second part (2); the first part (1) is connected to the center part (10) and exte...  
WO/2019/048506A1
A method including: obtaining an optical proximity correction for a spatially shifted version of a training design pattern (5000); and training a machine learning model (5200) configured to predict optical proximity corrections for desig...  
WO/2019/049919A1
This photomask blank comprises: a substrate; and at least a first layer and a second layer, which are sequentially arranged from the substrate side. The first layer contains chromium; the second layer contains chromium and oxygen; and th...  
WO/2018/140502A8
Antireflection coatings for metasurfaces are described herein. In some embodiments, the metasurface may include a substrate, a plurality of nanostructures thereon, and an antireflection coating disposed over the nanostructures. The antir...  
WO/2019/039290A1
Provided are: an actinic ray-sensitive or radiation-sensitive resin composition that has excellent resolution, exposure latitude, and pattern shape properties; and a resist film, a pattern-forming method, a method for producing an electr...  
WO/2019/035636A1
The present application provides a substrate and a manufacturing method therefor. The present application can provide a substrate having a structure comprising a base layer, a black layer and a spacer, which are sequentially formed, wher...  
WO/2019/036582A1
A method of patterning a substrate may include providing a blanket photoresist layer on the substrate; performing an ion implantation procedure of an implant species into the blanket photoresist layer, the implant species comprising an e...  
WO/2019/031361A1
Provided are: a pellicle (1) which is capable of improving the production yield; and a method for producing a pellicle. This method for producing a pellicle comprises: a step for preparing a supporting body (3) that contains Si; and a st...  

Matches 1 - 50 out of 38,219