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Patent Searching and Data


Matches 1 - 50 out of 37,899

Document Document Title
WO/2018/219572A1
A patterning device for use with a lithographic apparatus, the device comprising an absorber portion configured to absorb incident radiation and to reflect a portion of incident radiation, the absorber portion comprising a first layer an...  
WO/2018/221201A1
Provided are a mask blank, a method for manufacturing a transfer mask, and a method for manufacturing a semiconductor device, with which it is possible to minimize the incidence of surface roughness in a translucent substrate when EB def...  
WO/2018/219032A1
A mask plate, a substrate and a display device. The mask plate is provided with a plurality of light-transmitting regions (2), each light-transmitting region (2) being provided with a plurality of corners (3), and the transition between ...  
WO/2018/215188A1
A method including: obtaining a portion (505) of a design layout; determining (520) characteristics (530) of assist features based on the portion or characteristics (510) of the portion; and training (550) a machine learning model using ...  
WO/2018/218092A1
In one embodiment, disclosed are apparatus, methods, and targets for determining a phase shift of a photomask having a phase-shift target. An inspection or metrology system is used to direct an incident beam towards the target and then d...  
WO/2018/212604A1
The present invention relates to a method for manufacturing a lithography pellicle used as an anti-dust film when manufacturing a semiconductor device, a liquid crystal display, etc. and, more specifically, to a method for manufacturing ...  
WO/2018/208791A1
A method for detecting defects in objects includes: controlling, by a processor, one or more depth cameras to capture a plurality of depth images of a target object; computing, by the processor, a three-dimensional (3-D) model of the tar...  
WO/2018/205345A1
A mask and a method for preparing an array substrate. The mask comprises: at least two first sub-regions (101) that are arranged at intervals and are semi-transparent regions; at least one second sub-region (201) arranged in the gap betw...  
WO/2018/205588A1
A mask and an assembly thereof, an exposure machine and a method for inspecting shielding effect of test windows, and a photoetching method. The mask (10) comprises a light-transmitting region, and a functional window (12/13) provided at...  
WO/2018/205752A1
A mask plate, a preparation method for a patterned film layer, and a preparation method for a thin film transistor. The mask plate (200) comprises: a first pattern (201) and a second pattern (202), wherein the first pattern (201) compris...  
WO/2018/204193A1
Disclosed are methods of generating a proximity-corrected design layout for photoresist to be used in an etch operation. The methods may include identifying a feature in an initial design layout, and estimating one or more quantities cha...  
WO/2018/201545A1
A photomask and a manufacturing method for an active switch array substrate using same. The photomask (201) comprises: a light-transmitting area (220), which has a light-transmitting base material; a half light-transmitting area (210) pr...  
WO/2018/200871A1
A notch detection system receives images of a sample from the imaging detector, in which the sample includes a notched surface and an un-notched surface bounded by a sidewall and further includes at least one notch known notch specificat...  
WO/2018/186325A1
The purpose of the present invention is to provide a photomask blank and a photomask having favorable wafer transfer characteristics and irradiation resistance. A photomask blank (200) is for fabricating a photomask for an exposure wavel...  
WO/2018/186320A1
In the present invention, an etching stopper film (2), a light-blocking film (3) comprising a material containing one or more elements selected from among silicon and tantalum, and a hard mask film (4) are laminated in that order on a tr...  
WO/2018/176783A1
Provided are a mask plate and a manufacturing method thereof, and a display device. The mask plate comprises an optically transmissive substrate and a mask pattern formed at the optically transmissive substrate. The optically transmissiv...  
WO/2018/180592A1
The present invention provides a photosensitive resin composition that exhibits a light blocking effect, is of high sensitivity, and provides excellent halftone characteristics. This photosensitive resin composition comprises (A) an alka...  
WO/2018/181891A1
The purpose of the present invention is to obtain a phase shift mask with an improved size, wherein an undercut does not occur in a lower layer light-blocking film when the phase shift mask is fabricated. This phase shift mask blank is f...  
WO/2018/181985A1
A pattern calculation apparatus (2) calculates a mask pattern (1311d) formed on a mask (131) for forming, on a substrate (151) using exposure light (EL), a device pattern in which a plurality of unit device pattern sections (1511u) are a...  
WO/2018/176603A1
A photomask and a method for fabricating an active switch array substrate thereof, the photomask (201) comprising: a light transmitting region (220); a light shielding region (230); and a light semi-transmitting region (210, 212) which i...  
WO/2018/171988A1
Disclosed is a method for mitigating an effect of non-uniform pellicle degradation on control of a substrate patterning process and an associated lithographic apparatus. The method comprises quantifying an effect of the non-uniform pelli...  
WO/2018/174464A1
Provided is a method for selectively bonding a polymer substrate. A mask pattern and plasma treatment can be used to carry out selective interfacial bonding between the polymer substrate and parylene layer, and a fluid can be injected in...  
WO/2018/172036A1
The invention relates to a metrology target. The invention further relates to a method and to a device for characterizing a structured element in the form of a wafer, a mask, or a CGH. According to one aspect, a metrology target has a pe...  
WO/2018/170973A1
Disclosed are a photomask for manufacturing a TFT by means of a 4M process, and a TFT array manufacturing method using a 4M process. In a TFT layout structure of a photomask, a line pattern arranged along the direction of an outer edge o...  
WO/2018/166741A1
Disclosed is gas delivery system which is suitable for a high harmonic generation (HHG) radiation source which may be used to generate measurement radiation for an inspection apparatus. In such a radiation source, a gas delivery element ...  
WO/2018/168464A1
Provided is a mask blank (100) wherein a light-blocking film (2) that is configured of a single layer film formed from a silicon nitride material has high light blocking performance with respect to ArF exposure light, and which is capabl...  
WO/2018/162316A1
The present invention relates to a method for analyzing at least one defective location (230, 730) of a photolithographic mask (200, 700), having the following steps: (a) obtaining measurement data for the at least one defective location...  
WO/2018/162281A1
The present invention relates to a method for ascertaining a repair shape (195) for processing at least one defect (140) of a photolithographic mask (100) including the following steps: (a) determining at least one correction value (185)...  
WO/2018/159785A1
Provided are: a reflective mask blank which is capable of reducing a shadowing effect of extreme ultraviolet (EUV) lithography, and which is capable of forming fine patterns; and a reflective mask. As a result, a semiconductor device can...  
WO/2018/159193A1
Provided is a substrate processing method comprising: a substrate rotating step for rotating a substrate, which has at least a portion of a circumferential end being an arc-shape, at a predetermined processing rotation speed around an ax...  
WO/2018/159392A1
Provided are: a reflective mask blank provided with a phase shift film having a phase difference and a reflectance which have little dependence on film thickness; and a reflective mask. The reflective mask blank is characterized in that:...  
WO/2018/158394A1
The invention relates to a device (1) for applying to a substrate (2) a liquid medium which is exposed to UV radiation. The device (1) has the following: a housing (114, 14) having an elongate chamber (122, 22), having at least one inlet...  
WO/2018/159163A1
Provided is a substrate processing device comprising: a substrate holding unit; a substrate rotating unit; a circumferential edge height position measuring unit; a processing-liquid nozzle; a processing-liquid supply unit; a nozzle drive...  
WO/2018/153654A1
The present invention relates to a method for transforming measurement data (640) of a photolithographic mask (300) for the extreme ultraviolet (EUV) wavelength range from first surroundings (150) into second surroundings. The method inc...  
WO/2018/153872A1
A patterning device (100), includes: an absorber layer (106) on a patterning device substrate (102); and a reflective or transmissive layer (104) on the patterning device substrate, wherein the absorber layer and the reflective or transm...  
WO/2018/156080A1
Methods and systems for fabricating gray scale photomasks and a gray scale photomask are provided. The method includes optically writing gray scale photomasks in a phase change chalcogenide thin film using tightly focused femtosecond las...  
WO/2018/155047A1
A light-shielding film 2 made up of a material containing one or more elements selected from silicon and tantalum and a hard mask film 3 made up of a material containing chrome, oxygen, and carbon are laminated on a translucent substrate...  
WO/2018/151056A1
Provided are an EUV pellicle that has a high EUV transmittance and that causes less outgas and less contamination, and a method for manufacturing the EUV pellicle. A pellicle (100) is characterized by having: a pellicle film (101); a sup...  
WO/2018/148659A1
Methods of fabricating a damascene template for electrophoretic assembly and transfer of patterned nanoelements are provided which do not require chemical mechanical polishing to achieve a uniform surface area. The methods include conduc...  
WO/2018/141450A1
A method including: obtaining error information indicative of accuracy of positioning a pattern formed on a layer on a substrate relative to a target position, wherein the pattern has been formed by irradiating the layer with a radiation...  
WO/2018/140502A1
Antireflection coatings for metasurfaces are described herein. In some embodiments, the metasurtace may include a substrate, a plurality of nanostructures thereon, and an antireflection coating disposed over the nanostructures. The antir...  
WO/2018/135467A1
Provided are a reflective mask blank and a reflective mask with which it is possible to reduce the shadowing effect of extreme ultraviolet lithography and to form an intricate pattern. By doing so, a semiconductor device is produced in a...  
WO/2018/135468A1
Provided is a substrate with a conductive film, which is used for the purpose of producing a reflective mask that is configured such that a positional shift thereof is able to be corrected by a laser beam or the like from the back side. ...  
WO/2018/136168A1
Aspects describing modified self-aligned quadruple patterning (SAQP) processes using cut pattern masks to fabricate integrated circuit (IC) cells with reduced area are disclosed. In one aspect, a modified SAQP process includes disposing ...  
WO/2018/136197A1
Embodiments of the present disclosure generally relate to methods and apparatus for processing one or more substrates, and more specifically to improved spatial light modulators for digital lithography systems and digital lithography met...  
WO/2018/122028A1
A method including: obtaining a first image location for an image feature of a first image of at least part of an object surface, obtaining a second image location for an image feature in a second image of at least part of the object sur...  
WO/2018/125249A1
In accordance with disclosed embodiments, there are provided methods, systems, and apparatuses for implementing Optical Proximity Correction (OPC) model enhancement for Negative Tone Development (NTD) processes by including polymer compa...  
WO/2018/121141A1
A method for adding an auxiliary graph comprises: providing an OPC target graph, selecting a rule of adding only one auxiliary graph part according to an auxiliary graph benchmark rule, and establishing an additional rule of the auxiliar...  
WO/2018/125220A1
In accordance with disclosed embodiments, there are provided methods, systems, and apparatuses for implementing Optical Proximity Correction (OPC) modeling via machine learning on simulated 2D optical images for Spin Exposure Develop (SE...  
WO/2018/125513A1
A method of fabricating a circuit element, such as a quantum computing circuit element, including obtaining a lithography mask write file that includes mask information characterizing one or more mask features, obtaining a uniformity fun...  

Matches 1 - 50 out of 37,899