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Matches 1 - 50 out of 37,273

Document Document Title
WO/2018/008594A1
Provided are: a pellicle film which has higher EUV transmittance; a pellicle frame; and a pellicle. Also provided are: an original plate for light exposure, which uses this pellicle film, pellicle frame or pellicle and enables the achiev...  
WO/2018/004678A1
Disclosed herein are systems and methods for treating the surface of a microelectronic substrate, and in particular, relate to an apparatus and method for scanning the microelectronic substrate through a cryogenic fluid mixture used to t...  
WO/2018/004646A1
An embodiment includes a system comprising: a photoresist solution; wherein the solution, in equilibrium, comprises: (a)(i) a stabilized metal oxide, (a)(ii) a destabilized metal oxide, and (a)(iii) an organic ligand that is not bonded t...  
WO/2018/003603A1
Provided are: a pellicle film for extreme ultraviolet (EUV), said pellicle film having reduced adhesion of dust and the like; a pellicle frame body; a pellicle; and a method for manufacturing the pellicle. In this method for manufacturin...  
WO/2018/004815A1
Embodiments described herein relate to methods and apparatus for performing immersion field guided post exposure bake processes. Embodiments of apparatus described herein include a chamber body defining a processing volume. Electrodes ma...  
WO/2017/220930A1
The invention relates to a system (2) for producing an optical mask (35) for surface microtexturing, said system (2) comprising: a substrate (10) having a surface (11) that is to be textured; a layer of material (20) which covers the sur...  
WO/2017/220929A1
The invention relates to a system (2) for producing an optical mask (35) for surface treatment, in particular surface microtexturing, said system (2) comprising: a layer of material (20) which has an outer surface (21) that is exposed to...  
WO/2017/218860A1
A metrology apparatus has an illumination source that directs collimated light to a reference surface and to an optical component having a test surface that is in parallel with the reference surface. A first imaging lens defines a Fourie...  
WO/2017/214081A1
Presented here are manufacturing techniques to create an irregularly shaped electronic display, including a hollow within which a sensor, such as a camera, can be placed. The manufacturing techniques enable the creation of the hollow any...  
WO/2017/211090A1
A mask plate and substrate spacing column, and a method for manufacturing same, and a display panel containing the substrate spacing column. In the mask plate, at least one exposure zone (30) is formed; the at least one exposure zone (30...  
WO/2017/211544A1
Disclosed is a method of determining a pellicle compensation correction which compensates for a distortion of a patterning device resultant from mounting of a pellicle onto the patterning device. The method comprises determining a pellic...  
WO/2017/210958A1
A halftone mask and a method for manufacturing a TFT substrate. The halftone mask comprises first and second non-transparent regions (910, 920) respectively corresponding to positions of a source electrode and a drain electrode of a TFT,...  
WO/2017/213817A1
Provide is a method of patterning spacers, the method comprising: providing an initial patterned structure in a substrate in a processing chamber, the initial patterned structure comprising an organic mandrel and an underlying layer; exp...  
WO/2017/207297A1
The invention relates to a method and an appliance for predicting the imaging result obtained with a mask when a lithography process is carried out, wherein the mask comprises mask structures to be imaged and the mask is destined to be i...  
WO/2017/206577A1
A mask plate, comprising a completely light transmissive region (100) and a completely light shielding region (200). A semi-light transmissive structure (300) is provided at the junction of the completely light transmissive region (100) ...  
WO/2017/206809A1
A method for correction of an optical proximity effect, comprising: parsing and dividing the periphery of a design pattern to obtain segments to process; for a segment having a corner comprising a segment side (101) and an adjacent side ...  
WO/2017/207512A2
A patterning device comprising a reflective marker, wherein the marker comprises: a plurality of reflective regions configured to preferentially reflect radiation having a given wavelength; and a plurality of absorbing regions configured...  
WO/2017/209330A1
The present invention relates to a laser exposure method capable of forming a dual line, an exposure apparatus, and a method and an apparatus for manufacturing a fine pattern having a dual line by using the laser exposure method. More sp...  
WO/2017/202665A1
A method is proposed involving obtaining data regarding an expected focus offset during a patterning process due to topography of a region of a substrate surface. A modification of a transmission or reflection of a region of a patterning...  
WO/2017/204113A1
[Problem] To be capable of generating two types of pulsed light having mutually different temporal intensity waveforms, by using a simple configuration. [Solution] A pulsed light generation device comprising: an optical coupler comprisin...  
WO/2017/202134A1
A mask management system (1) and a mask use method. The mask management system (1), comprises: a mask feeding module (11) configured to provide at least one mask group (100), each mask group (100) comprising a cartridge (101) and a plura...  
WO/2017/199728A1
This semiconductor device is provided with: first and second inspection mark regions (51a, 51b) having same patterns, each of which includes a plurality of superposition inspection marks (61a, 61b); a first element region (52) having a p...  
WO/2017/197915A1
A photolithography mask, manufacturing method thereof, and photolithography method employing the photolithography mask. The photolithography mask comprises a substrate (3), a mask pattern arranged on a surface of the substrate (3), and a...  
WO/2017/200159A1
The present invention relates to an overlay mark, and an overlay measurement method and a semiconductor device manufacturing method using the same. The present invention provides an overlay mark for determining the relative shift between...  
WO/2017/191932A1
Provided are a novel water-soluble diacetylene monomer, a photolithography composition comprising the water-soluble diacetylene monomer and a conductive polymer, and a fine pattern preparation method using same. The water-soluble diacety...  
WO/2017/190905A1
A lithographic method for measuring a position of a target grating with a mask sensor apparatus which comprises a plurality of detector modules each comprising a diffraction grating located at a mask side of a projection system of a lith...  
WO/2017/185438A1
A mask (100) and a preparation method for a color filter substrate. The mask (100) comprises: a substrate (10); multiple light shading portions (30), respectively disposed on the surface of the substrate (10) at intervals; and multiple s...  
WO/2017/186486A1
Membranes for EUV lithography are disclosed. In one arrangement, a membrane comprises a stack having layers in the following order: a first capping layer comprising an oxide of a first metal; a base layer comprising a compound comprising...  
WO/2017/186421A1
A method including obtaining a first image of an object, generating a second image by convolving the first image with a filter kernel, wherein each pixel value of the second image is a weighted combination of a plurality of accumulation ...  
WO/2017/182558A1
The invention relates to a method for detecting the position of a mask holder (1) for masks (2) for photolithography, comprising the following steps: Positioning the mask holder (1) with masks (2) on a measuring table of a measuring devi...  
WO/2017/183941A1
The present invention may provide a pellicle structure manufacturing method comprising the steps of: preparing an extreme ultraviolet (EUV) transmitting layer; forming a graphene layer on the EUV transmitting layer; providing a linking m...  
WO/2017/179199A1
The present invention provides a pellicle enabling to achieve high qualities of semiconductor patterns, and long service-lives of pellicles and masks. According to an embodiment of the present invention, an EUV pellicle is provided on an...  
WO/2017/178276A1
Disclosed herein is a method comprising: obtaining at least a clip of a design layout; and determining a representation of the clip on a patterning device, under a condition that a reduction ratio from the representation to the clip is a...  
WO/2017/176282A1
Two-stage bake photoresists with releasable quenchers for fabricating back end of line (BEOL) interconnects are described. In an example, a photolyzable composition includes an acid-deprotectable photoresist material having substantial t...  
WO/2017/175556A1
The purpose of the present invention is to provide a surface treatment method with which it is possible to perform, efficiently and at a high resolution, a surface treatment using vacuum UV light on an item to be treated, a mask 10a (10b...  
WO/2017/169973A1
The present invention comprises: forming a multilayer reflective film-equipped substrate by depositing a multilayer reflective film for reflecting EUV light on a substrate; performing a defect inspection on the multilayer reflective film...  
WO/2017/169587A1
The purpose of the present invention is to provide a mask blank for manufacturing a transfer mask wherein a thin film has high chemical resistance and film loss is minimized. The mask blank is characterized in that: the thin film (2) com...  
WO/2017/169658A1
Provided is a reflective mask blank which comprises a phase shift film that has low film thickness dependence of the phase difference. A reflective mask blank which is obtained by forming, on a substrate in the following order, a multila...  
WO/2017/171890A1
In accordance with disclosed embodiments, there are provided methods, systems, and apparatuses for reducing Optical Proximity Correction (OPC) model error via a machine learning algorithm. For instance, in accordance with one embodiment,...  
WO/2017/169635A1
A substrate processing device (1) comprises: a substrate holding and rotating mechanism (41) which holds a substrate (W) in horizontal attitude and causes the substrate (W) to rotate about a vertical rotating axis (AX) passing through a ...  
WO/2017/161644A1
Disclosed is a mask plate (4), comprising a plurality of baffles (5), a frame body (6) and a light-transmitting region (7). The frame body (6) is provided with supporting components (8) and moving components (9). The baffles (5) are conf...  
WO/2017/156842A1
Disclosed are a system for generating mask patterns, a method for generating mask patterns and an exposure system, wherein the system for generating mask patterns comprises mask pattern providing equipment (101), mask pattern transmittin...  
WO/2017/156388A1
High etch contrast materials provide the basis for using pre-patterned template structure with a template hardmask having periodic holes and filler within the holes that provides the basis for rapidly obtaining high resolution patterns g...  
WO/2017/153152A1
A reflector for EUV radiation, the reflector comprising a reflector substrate and a reflective surface, the reflector substrate having a plurality of coolant channels formed therein, the coolant channels being substantially straight, sub...  
WO/2017/155872A1
A method may include providing a surface feature on a substrate, the surface feature comprising a feature shape, feature location, and dimension along a first direction within a substrate plane; depositing a layer comprising a layer mate...  
WO/2017/153085A1
A measurement system to determine a deformation of an object having a front surface and a back surface and being provided with a pattern is described, the measurement system comprising: ∙ a processor and ∙ an interferometer system co...  
WO/2017/148350A1
Provided are a pattern structure and an exposure method of a patterned sapphire substrate mask. The pattern structure is formed by joining a plurality of identical polygons. Each polygon has at least two fan-shaped non-optically transmis...  
WO/2017/151383A1
Methods and systems for selective silicon anti-reflective coating (SiARC) removal are described. An embodiment of a method includes providing a substrate in a process chamber, the substrate comprising: a resist layer, a SiARC layer, a pa...  
WO/2017/144252A1
The present invention discloses methods and a system for scanning scattering contrast inspection for the identification of defects (4) in an actual pattern block (6) on a sample (2) as compared to the desired pattern block on the sample ...  
WO/2017/143662A1
A mask, a mask exposure method, a mask system, and a pattern control device. The mask is provided with a pattern control layer (100) and a light conversion layer (200). The pattern control layer (100) comprises multiple transparent units...  

Matches 1 - 50 out of 37,273