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Matches 1 - 50 out of 38,013

Document Document Title
WO/2019/035636A1
The present application provides a substrate and a manufacturing method therefor. The present application can provide a substrate having a structure comprising a base layer, a black layer and a spacer, which are sequentially formed, wher...  
WO/2019/036582A1
A method of patterning a substrate may include providing a blanket photoresist layer on the substrate; performing an ion implantation procedure of an implant species into the blanket photoresist layer, the implant species comprising an e...  
WO/2019/023890A1
A method for determining a metal mask plate (700) defect and a manufacturing device (100) used for determining a metal mask plate (700) defect. The metal mask plate (700) is adapted to be attached to a pixel substrate (800) so as to assi...  
WO/2019/024091A1
A laser repairing method and device, for use in removing impurities (30) on a substrate (20). The laser repairing method comprises the steps of: acquiring an initial position of an impurity (30) on a substrate (20) (S1); bombarding the i...  
WO/2019/024193A1
Provided is a mask. The mask comprises an alignment zone (101). The alignment zone (101) is used for obtaining a preset reflectivity under illumination with certain intensity for alignment. The alignment zone (101) is subjected to reflec...  
WO/2019/025082A1
A method of manufacturing a pellicle for a lithographic apparatus, said method comprising: locally heating the pellicle (4) using radiative heating (3), and depositing coating material simultaneously on both sides of the pellicle. Also d...  
WO/2019/027714A1
A magnetic gun lens and an electrostatic gun lens can be used in an electron beam apparatus and can help provide high resolutions for all usable electron beam currents in scanning electron microscope, review, and/or inspection uses. An e...  
WO/2019/025109A1
The disclosure also relates to a reflective optical element (1) for reflecting light having at least one wavelength in an EUV wavelength range. The optical element (1) comprises an optically effective region configured for reflecting the...  
WO/2019/021154A1
Method for compensating at least one defect (820, 920, 1020) of a mask blank (800, 900, 1000), wherein the method includes the following steps: (a) obtaining data in respect of a position of the at least one defect (820, 920, 1020) of th...  
WO/2019/016224A1
The present application relates to a method for disposing of excess material (590, 595) of a photolithographic mask (500), wherein the method comprises the following steps: (a) enlarging a surface of the excess material (590, 595); (b) d...  
WO/2019/015905A1
An optical membrane (16) for use in or with a lithographic apparatus, the membrane comprising a first layer (18) comprising a first material, and a second layer (20) comprising a second material, the first layer being arranged on the sec...  
WO/2019/014947A1
A method for manufacturing a mask (100). The method comprises the following steps: forming a reinforcing layer (20) on a substrate (10); forming a conductive magnetic layer (30) on the reinforcing layer (20); subjecting the conductive ma...  
WO/2019/014376A1
Embodiments described herein generally relate to a wave guide and a method of creating a wave guide. In one embodiment, a method of forming a wave guide is disclosed herein. An inverse master substrate having a plurality of projections e...  
WO/2019/012887A1
Lithography based on a unit figure (10) simulates the formation of a real pattern on a real substrate. First, the unit figure (10) is divided into polygons (Fig. (a)) to define vectors (Va1 through Vd4) on individual sides of the polygon...  
WO/2019/009211A1
A reflective photomask blank (10) according to one embodiment of the present invention comprises a substrate (1), a reflective layer (2) that is formed on the substrate (1), and a light absorption layer (4) that is formed on the reflecti...  
WO/2019/009212A1
A reflective photomask blank (10) according to one embodiment of the present invention comprises a substrate (1), a reflective layer (2) that is formed on the substrate (1), and a light absorption layer (4) that is formed on the reflecti...  
WO/2019/005170A1
Methods, systems, and apparatuses for implementing dynamic learning mask correction include: creating a mask via a lithography process; performing a learning phase to identify a set of mask shape variables that change simulated intensity...  
WO/2019/003486A1
This mask blank is provided with: a transparent substrate; a phase shift layer laminated on the surface of the transparent substrate, said phase shift layer having Cr as a major component; an etching stopper layer laminated on the phase ...  
WO/2018/233182A1
A photomask structure, comprising a plurality of photomask units (102) distributed in an array. The photomask unit (102) comprises a first photomask used for forming a first transparent electrode in a corresponding area of the surface of...  
WO/2018/234747A1
Various implementations described herein are directed to a method for manufacturing an integrated circuit. The method may include defining multiple lithographic regions for the integrated circuit, and the multiple lithographic regions ma...  
WO/2018/235721A1
Provided is a substrate (110) with a multilayer reflective film, which is used for the purpose of producing a reflective mask (200) having a multilayer reflective film (5) that has a high reflectance with respect to exposure light, while...  
WO/2018/233951A1
Disclosed is a method and associated inspection apparatus for detecting variations on a surface of a substrate. The method comprises providing patterned inspection radiation to a surface of a substrate. The inspection radiation is patter...  
WO/2018/230090A1
This simulation device (1) capable of running a simulation accurately at a high speed is provided with: a factor amount conversion information storage unit (111) for storing factor amount conversion information indicating the corresponde...  
WO/2018/230476A1
According to the present invention, the shape of a real figure pattern formed on a real substrate is estimated by simulating a lithography process. An evaluation point (E) is set on a contour of an original figure pattern (10) included i...  
WO/2018/228933A2
The invention relates to a pellicle assembly comprising a pellicle frame defining a surface onto which a pellicle is attached. The pellicle assembly comprises one or more three-dimensional expansion structures that allow the pellicle to ...  
WO/2018/230233A1
This mask blank (100) has a structure wherein a phase shift film (2) and a light-blocking film (3) are sequentially laminated in this order on a light-transmitting substrate (1). The optical density of the multilayer structure composed o...  
WO/2018/228933A3
The invention relates to a pellicle assembly comprising a pellicle frame defining a surface onto which a pellicle is attached. The pellicle assembly comprises one or more three-dimensional expansion structures that allow the pellicle to ...  
WO/2018/227962A1
A mask (10) and a method for forming a hole (21). The mask (10) is used for forming the hole (21) on a film layer, and comprises: a light-transmitting pattern (11) used for forming the hole (21), the light-transmitting pattern (11) havin...  
WO/2018/226004A1
The present invention relates to a method for manufacturing a pellicle for lithography, which is used as a dustproof film when manufacturing a semiconductor device, a liquid crystal display or the like, and more particularly, to a method...  
WO/2018/219572A1
A patterning device for use with a lithographic apparatus, the device comprising an absorber portion configured to absorb incident radiation and to reflect a portion of incident radiation, the absorber portion comprising a first layer an...  
WO/2018/221201A1
Provided are a mask blank, a method for manufacturing a transfer mask, and a method for manufacturing a semiconductor device, with which it is possible to minimize the incidence of surface roughness in a translucent substrate when EB def...  
WO/2018/219032A1
A mask plate, a substrate and a display device. The mask plate is provided with a plurality of light-transmitting regions (2), each light-transmitting region (2) being provided with a plurality of corners (3), and the transition between ...  
WO/2018/215188A1
A method including: obtaining a portion (505) of a design layout; determining (520) characteristics (530) of assist features based on the portion or characteristics (510) of the portion; and training (550) a machine learning model using ...  
WO/2018/218092A1
In one embodiment, disclosed are apparatus, methods, and targets for determining a phase shift of a photomask having a phase-shift target. An inspection or metrology system is used to direct an incident beam towards the target and then d...  
WO/2018/212604A1
The present invention relates to a method for manufacturing a lithography pellicle used as an anti-dust film when manufacturing a semiconductor device, a liquid crystal display, etc. and, more specifically, to a method for manufacturing ...  
WO/2018/208791A1
A method for detecting defects in objects includes: controlling, by a processor, one or more depth cameras to capture a plurality of depth images of a target object; computing, by the processor, a three-dimensional (3-D) model of the tar...  
WO/2018/205345A1
A mask and a method for preparing an array substrate. The mask comprises: at least two first sub-regions (101) that are arranged at intervals and are semi-transparent regions; at least one second sub-region (201) arranged in the gap betw...  
WO/2018/205588A1
A mask and an assembly thereof, an exposure machine and a method for inspecting shielding effect of test windows, and a photoetching method. The mask (10) comprises a light-transmitting region, and a functional window (12/13) provided at...  
WO/2018/205752A1
A mask plate, a preparation method for a patterned film layer, and a preparation method for a thin film transistor. The mask plate (200) comprises: a first pattern (201) and a second pattern (202), wherein the first pattern (201) compris...  
WO/2018/204193A1
Disclosed are methods of generating a proximity-corrected design layout for photoresist to be used in an etch operation. The methods may include identifying a feature in an initial design layout, and estimating one or more quantities cha...  
WO/2018/201545A1
A photomask and a manufacturing method for an active switch array substrate using same. The photomask (201) comprises: a light-transmitting area (220), which has a light-transmitting base material; a half light-transmitting area (210) pr...  
WO/2018/200871A1
A notch detection system receives images of a sample from the imaging detector, in which the sample includes a notched surface and an un-notched surface bounded by a sidewall and further includes at least one notch known notch specificat...  
WO/2018/186325A1
The purpose of the present invention is to provide a photomask blank and a photomask having favorable wafer transfer characteristics and irradiation resistance. A photomask blank (200) is for fabricating a photomask for an exposure wavel...  
WO/2018/186320A1
In the present invention, an etching stopper film (2), a light-blocking film (3) comprising a material containing one or more elements selected from among silicon and tantalum, and a hard mask film (4) are laminated in that order on a tr...  
WO/2018/176783A1
Provided are a mask plate and a manufacturing method thereof, and a display device. The mask plate comprises an optically transmissive substrate and a mask pattern formed at the optically transmissive substrate. The optically transmissiv...  
WO/2018/180592A1
The present invention provides a photosensitive resin composition that exhibits a light blocking effect, is of high sensitivity, and provides excellent halftone characteristics. This photosensitive resin composition comprises (A) an alka...  
WO/2018/181891A1
The purpose of the present invention is to obtain a phase shift mask with an improved size, wherein an undercut does not occur in a lower layer light-blocking film when the phase shift mask is fabricated. This phase shift mask blank is f...  
WO/2018/181985A1
A pattern calculation apparatus (2) calculates a mask pattern (1311d) formed on a mask (131) for forming, on a substrate (151) using exposure light (EL), a device pattern in which a plurality of unit device pattern sections (1511u) are a...  
WO/2018/176603A1
A photomask and a method for fabricating an active switch array substrate thereof, the photomask (201) comprising: a light transmitting region (220); a light shielding region (230); and a light semi-transmitting region (210, 212) which i...  
WO/2018/171988A1
Disclosed is a method for mitigating an effect of non-uniform pellicle degradation on control of a substrate patterning process and an associated lithographic apparatus. The method comprises quantifying an effect of the non-uniform pelli...  

Matches 1 - 50 out of 38,013