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Matches 1 - 50 out of 38,420

Document Document Title
WO/2019/199697A1
Computer implemented methods and computer program products have instructions for generating transfer functions that relate segments on lithography photomasks to features produced by photolithography and etching using such segments. Such ...  
WO/2019/200049A1
Methods for making molecular sieves are provided. The molecular sieves are comprised of thin semiconductors films in which a plurality of apertures is defined. The apertures are non-circular, nanoscale openings with tapered sidewalls tha...  
WO/2019/195105A1
A method for etching features in a stack below a mask with features is provided. A fill layer is deposited on the mask, wherein the fill layer fills the features of the mask. The fill layer is etched back to expose the mask. The mask is ...  
WO/2019/184694A1
A substrate edge processing method and a mask. The substrate edge processing method comprises: using a first device to form a first photoresist layer on a substrate to be processed (S20); in an exposure machine, using a mask to expose th...  
WO/2019/190566A1
A method for optical proximity correction (OPC) comprises creating a semi-physical model of a mask for a current layer in an IC design layout using physical parameters of a lithography process used to create the mask, the semi-physical m...  
WO/2019/188397A1
A mask blank (100) is provided with a phase shift film (2) on a translucent substrate (1), wherein the phase shift film (2) includes a structure in which a bottom layer (21), a middle layer (22), and a top layer (23) are laminated in thi...  
WO/2019/189310A1
The present invention addresses the problem of providing a mask adhesive that plastically deforms easily in the temperature region in which exposure is performed, the mask adhesive being configured so that almost no adhesive residue rema...  
WO/2019/188445A1
Provided is a supporting frame in which a vent hole with a detachably-attached filter can be provided and to which a pellicle film for extreme ultraviolet lithography can be pasted. A supporting frame according to an embodiment of the pr...  
WO/2019/184224A1
A display panel and a mask plate (500) used for manufacturing a display panel. The mask plate (500) is used to manufacture a display panel and comprises: a display zone (520), which is opened with a plurality of first through holes (521)...  
WO/2019/185296A1
The invention relates to a method and a device for inspecting a mask, wherein the method comprises the following steps: measuring a first intensity distribution (14, 24) generated upon illumination of a mask structure (11, 21) present on...  
WO/2019/184908A1
Provided are an optical mask plate (400) and a method for preparing an optical mask substrate (200) based on the optical mask plate (400). The optical mask plate (400) comprises a light-transmitting region (420) and a light-blocking regi...  
WO/2019/179786A1
Disclosed is a method of, and associated apparatus for, determining an edge position relating to an edge of a feature comprised within an image, such as a scanning electron microscope image, which comprises noise. The method comprises de...  
WO/2019/179747A1
Described herein is a method to determine a curvilinear pattern of a patterning device that includes obtaining (i) an initial image of the patterning device corresponding to a target pattern to be printed on a substrate subjected to a pa...  
WO/2019/182689A1
Embodiments of the present disclosure generally relate to an image projection system. The image projection system includes an active matrix solid state emitter (SSE) device. The active matrix solid state emitter includes a substrate, a s...  
WO/2019/177116A1
Provided is a large-sized photomask comprising a translucent substrate and a light-shielding pattern provided on the surface of the translucent substrate, wherein the large-sized photomask is characterized in that: the light-shielding pa...  
WO/2019/176410A1
The present invention addresses the problem of providing a pellicle which has high EUV transmittance and contains a carbonaceous film. The present invention relates to a pellicle containing a carbonaceous film, the pellicle being charact...  
WO/2019/176481A1
Provided is a mask blank for a phase shift mask comprising an etching stopper film having a high transmittance of at least 80% with respect to ArF exposure light and with which a transmittance difference of 5% or more can be obtained in ...  
WO/2019/172141A1
Provided is a pellicle wherein the generation of outgas from an adhesive layer is suppressed. The pellicle (100) comprises a pellicle film (101), a support frame (103) supporting the pellicle film, a protruding part (105) disposed on the...  
WO/2019/170356A1
A catalyst comprising: a first layer comprising molybdenum; a base layer; and an interlayer, wherein the interlayer is disposed between the base layer and the first layer is disclosed. Also disclosed are method of preparing a catalyst as...  
WO/2019/172170A1
A conventional pellicle has a problem in maintaining a higher transmittance for extreme ultraviolet (EUV) light while making the EUV transmittance uniform. The present invention provides a pellicle capable of maintaining a higher transmi...  
WO/2019/169703A1
A mask plate (10), an array substrate, and a manufacturing method of an array substrate. The mask plate (10) is provided with first optically-transmissive regions (101) and at least two second optically-transmissive regions (102) spaced ...  
WO/2019/167622A1
Provided is a mask blank for a phase-shift mask, said mask blank being provided with an etching stopper film that has a high transmittance with respect to ArF exposure light and being capable of achieving a high contrast ratio with respe...  
WO/2019/162346A1
Described herein are different methods of training machine learning models related to a patterning process. Described herein is a method for training a machine learning model configured to predict a mask pattern. The method including obt...  
WO/2019/162280A1
Described herein is a method for inspection of a patterning device. The method includes obtaining (i) patterning device apparatus data of a patterning device making process, (ii) a patterning device substrate map based on the patterning ...  
WO/2019/162013A1
The present application relates to a carbon dioxide snow cleaning apparatus comprising: a carbon dioxide source; a carbon dioxide snow nozzle in fluid communication with the carbon dioxide source; a charging element; and a collection sur...  
WO/2019/163310A1
A mask blank in which a phase shift film provided on a light-permeable substrate includes at least a nitrogen-containing layer and an oxygen-containing layer, the nitrogen-containing layer is made from a silicon nitride-based material an...  
WO/2019/158682A1
Described herein is a method to determine a mask pattern for a patterning device. The method includes obtaining a target pattern to be printed on a substrate, (ii) an initial continuous tone image of the patterning device corresponding t...  
WO/2019/153804A1
A display panel includes a method of fabricating an array substrate. The method includes forming a metal layer (1) on a substrate, and patterning the metal layer (1) using a phase shift mask to form a pattern of metal wiring. The phase s...  
WO/2019/153796A1
A phase shift mask includes a transparent substrate (01) and light-shielding portions. The light-shielding portions include a first light-shielding portion (02), and over one side of it, a first compensating light-shielding portion (03),...  
WO/2019/153754A1
A manufacturing method for a phase shift mask plate, and a phase shift mask, said manufacturing method comprising: forming a metal shielding layer pattern (201) on a base substrate (100); sequentially forming a phase change layer (400) a...  
WO/2019/154725A1
A method and an apparatus for cleaning a substrate having at least one surface having a residue to be removed thereon is described. The method comprises: scanning at least an area of the surface having the residue thereon with laser ligh...  
WO/2019/149477A1
Disclosed is a method of inspection for defects on a substrate, such as a reflective reticle substrate, and associated apparatuses. The method comprises performing the inspection using first inspection radiation obtained from a high harm...  
WO/2019/145101A1
A sensor is disclosed, wherein a transducer generates acoustic waves, which are received by a lens assembly. The lens assembly transmits and directs at least a part of the acoustic waves to a target. The lens assembly then receives at le...  
WO/2019/146544A1
The present invention makes it possible to press a substrate against a reference surface and suppress vibration of the substrate. A clamp unit has: a first unit capable of moving in a substantially horizontal direction between a contact ...  
WO/2019/146547A1
The present invention makes it possible to confirm that a pellicle is reliably affixed to a mask. A pellicle frame (101) is gripped using a pellicle gripping part (20) provided to a frame body (10), and an adhesive member of the pellicle...  
WO/2019/140914A1
A mask and method for use in preparing the mask, the mask comprising: a substrate (1), and at least one first photoresist structure (C) and at least one second photoresist structure (D) which are located on the substrate (1), wherein the...  
WO/2019/138940A1
In this photomask, the linewidth of a photomask pattern transferred by scanning exposure using connecting parts (J1 to J4) of multiple lenses and/or the linewidth of a photomask pattern transferred by scanning exposure using non-connecti...  
WO/2019/137725A1
A lithographic apparatus comprising a support structure (MT) constructed to support a mask (MA) and associated pellicle (P), the mask being capable of imparting a radiation beam with a pattern in its cross-section to form a patterned rad...  
WO/2019/133285A1
Disclosed are methods and apparatus for inspecting a photolithographic reticle. A near field reticle image is generated via a deep learning process based on a reticle database image produced from a design database, and a far field reticl...  
WO/2019/131506A1
Provided is a substrate with a conductive film for manufacturing a reflective mask which has a rear-surface conductive film with high mechanical strength and is capable of correcting positional deviation of the reflective mask from the r...  
WO/2019/129031A1
Disclosed are an optical compensation film, a mask, and an exposure machine. An optical compensation film (33) comprises a first area optical compensation film (331) and a second area optical compensation film (332), wherein the first ar...  
WO/2019/130802A1
The present invention provides a mask blank capable of suppressing the surface roughness of a transmissive substrate when EB defect correction is performed and suppressing spontaneous etching of the pattern of a phase shift film. A phase...  
WO/2019/132901A1
Apparatuses, methods and storage medium associated with generating a machine learning model to place sub-resolution enhancement features (SRAFs) are disclosed herein. An apparatus may generate, using exploratory SRAF placements, a machin...  
WO/2019/131384A1
The present invention relates to a method for evaluating the thermal expansion properties of a titania-containing glass body. On the basis of measured values, obtained at a certain temperature, for a physical parameter that changes depen...  
WO/2019/125872A1
Methods for reticle enhancement technology (RET) include representing a target wafer pattern or a predicted wafer pattern as a smooth function captured as a function sample array, which is an array of function values. A continuous tone m...  
WO/2019/123842A1
[Problem] The present invention provides an active light-sensitive or radiation-sensitive resin composition with which it is possible to obtain a resist film that excels in sensitivity and obtain a pattern that excels in LER performance,...  
WO/2019/115218A1
An apparatus for determining a condition associated with a pellicle (19) for use in a lithographic apparatus (LA), the apparatus comprising a sensor (26, 32, 52, 60), wherein the sensor (26, 32, 52, 60) is configured to measure a propert...  
WO/2019/116755A1
Provided are: a pellicle frame body for a flat panel display (FPD) having high dimensional accuracy and flatness, the pellicle frame body being capable of maintaining the rigidity required for a pellicle for a large flat panel display (F...  
WO/2019/112896A1
A purge system (100) includes a purge gas distribution manifold (110) that includes at least one port (124) through which light beam (132) from an optical metrology or inspection head (130) is transmitted. The purge gas distribution mani...  
WO/2019/108164A1
A mask process development having consistent mask targeting is described. A method includes receiving an integrated (IC) design. A test mask is generated that converts the IC design into one or more physical layouts. A set of one or more...  

Matches 1 - 50 out of 38,420