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WO/2023/208475A1 |
Systems, apparatuses, and methods are provided for manufacturing a thermally actuated cooling apparatus. An example method can include providing a cooling member. The cooling member can include a contact plate, fins extending from the co...
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WO/2023/210579A1 |
The present invention addresses the problem of providing a pattern-forming method that is capable of forming a pattern that has excellent limit resolution properties and excellent in-plane uniformity of resolution. In addition, the prese...
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WO/2023/208153A1 |
The present invention provides a branched organosilicon material having an ABmCn branched structure, wherein A = Si(OSI)aD(4-a), a is the integer 3 or 4, m is an integer equal to or greater than 0, n is an integer equal to or greater tha...
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WO/2023/209825A1 |
A multi-charged particle beam drawing apparatus according to one aspect of the present invention is characterized by comprising: a calculation processing unit that executes a calculation process regarding a temperature increase caused by...
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WO/2023/208557A1 |
An illumination optical unit (4) for projection lithography serves for illuminating an object field (5) of a downstream imaging optical unit, an object to be illuminated being arrangeable in said object field, with illumination light (16...
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WO/2023/208526A1 |
The present invention relates to a method for characterizing a lithography apparatus. In particular, the present invention relates to a method for characterizing a lithography apparatus configured to cause an obscuration of radiation, an...
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WO/2023/210181A1 |
Provided is an interference exposure apparatus capable of monitoring the state of interference fringes in two-beam interference exposure or adjusting the state of interference fringes to a target state. An interference exposure apparat...
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WO/2023/208590A1 |
The present invention relates to an optical arrangement of a microlithographic imaging device, particularly for using light in the extreme UV (EUV) range, comprising a group of optical elements, a support structure (104.2), an active sup...
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WO/2023/210629A1 |
One aspect of the present invention relates to a resin composition for an optical waveguide, the resin composition containing an epoxy resin (A) and a photoacid generator (B). The epoxy resin (A) contains: a polyfunctional epoxy resin (a...
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WO/2023/210757A1 |
Provided is a resin composition or the like that is capable of achieving both low warpage and high reflectance after a reflow step. A resin composition containing (A) a carboxyl-group-containing urethane resin and (E) a colorant that yie...
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WO/2023/210432A1 |
A substrate-processing method comprising: (A) a step for applying a resist liquid to a substrate to form a resist film; (B) a step for performing an auxiliary exposure process of irradiating the resist film with light having a predetermi...
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WO/2023/179434A9 |
An array substrate and a liquid crystal panel. The array substrate (000) comprises a substrate (100), and a plurality of patterned film layer structures (100a), which are located on the substrate (100) and arranged in a stacked manner. T...
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WO/2023/210756A1 |
Provided is a photosensitive resin composition or the like that is capable of achieving both low warpage and high reflectance after a reflow process. The present invention is characterized by containing (A) a carboxyl group-containing ur...
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WO/2023/212381A1 |
A system for nanoscale precision programmable profiling. The system includes a first film stack with a superstrate, a substrate and a liquid profiling material in between the superstrate and the substrate, where the first film stack abso...
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WO/2023/208487A1 |
Disclosed is a source selection module for selecting spectral characteristics of a broadband illumination beam to obtain a modulated illumination beam. The source selection module comprises a first beam dispersing element for dispersing ...
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WO/2023/210574A1 |
The present invention provides a remover agent for semiconductors, the remover agent being used for the purpose of removing a resin that has an ether bond from a substrate for semiconductors. This remover agent for semiconductors contain...
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WO/2023/208556A1 |
In order to measure an illumination angle distribution, which is established by means of a multiplicity of illumination channels (16i) of an illumination optics unit, on an object field by means of an obscured projection optics unit, a s...
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WO/2023/097540A9 |
A method of fabricating quantum dots layer is provided. The method includes converting a plurality of first block regions of a substrate from having a first property into having a second property different from the first property, the fi...
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WO/2023/211989A1 |
A method of patterning an underlying layer that includes: depositing a metal-free polymer film over the underlying layer; exposing the film to an EUV to form an exposed region and a masked region of the film, the exposed region photoreac...
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WO/2023/210488A1 |
The purpose of the present invention is to provide an electroconductive substrate production method which makes it possible to produce an electroconductive substrate having an electroconductive thin wire which exhibits excellent electroc...
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WO/2023/211110A1 |
The present invention relates to a composition for cleaning a metal mask and a cleaning method using same. Particularly, disclosed are: a composition for cleaning a metal mask, comprising 70 to 90 wt% of a phosphonic acid metal chelating...
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WO/2023/211573A1 |
A mask element for flexographic printing is provided. The mask element can be used for preparing a mask that has a mask image. The mask element can include: a transparent polymeric carrier sheet; a barrier layer on the transparent polyme...
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WO/2023/210472A1 |
The present invention relates to a resist composition that generates an acid via light exposure, and whose solubility in a liquid developer changes through the action of the acid, said resist composition containing a base material compon...
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WO/2023/208491A1 |
The invention relates to an actuator (100) for adjusting an optical element (300) in a lithography device, comprising an electrostatic actuator (101) which has an electrode pair (102) consisting of two electrodes (103, 104) which are at ...
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WO/2023/208565A1 |
The invention relates to an actuator (100) for semiconductor lithography, comprising an actuator element (102) having a first coefficient of thermal expansion and a connection site (103) at its first end for the active adjustment of an o...
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WO/2023/208055A1 |
Provided in the present invention are a suction disc, a silicon wafer suction device, an exposure apparatus and a warping silicon wafer suction method. The suction disc comprises a suction disc body, a sealing ring group, and flexible su...
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WO/2023/210520A1 |
Provided are: a resist composition having favorable sensitivity, roughness characteristics, and etching resistance; a resist pattern formation method; and a new compound that is useful as a resin component for said resist composition. Th...
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WO/2023/210777A1 |
An embodiment of the present invention is: a transfer film having a temporary support, a surfactant-containing middle layer, and a photosensitive layer and having a surface free energy, for the surface on the side not containing the temp...
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WO/2023/210428A1 |
Provided is a coloring composition including a colorant, a resin, and a solvent, wherein the colorant includes a metal azo colorant in which at least one azo compound selected from the group consisting of compounds represented by formula...
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WO/2023/204314A1 |
Provided is a pigment dispersion that has excellent viscosity stability and yields a photosensitive resin composition in which the generation of pigment-derived foreign substances is suppressed. This pigment dispersion contains (A) a pig...
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WO/2023/183218A9 |
A method of manufacturing a photomask including the steps of receiving initial photomask design data associated with one or more patterns to be formed on a photomask and optimizing the initial photomask design data to minimize printing e...
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WO/2023/204046A1 |
Provided is a coloring composition comprising a coloring agent, a resin, and a solvent. The coloring agent comprises metal azo pigment comprising: at least one anion selected from among a specific azo compound and an azo compound having ...
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WO/2023/202822A1 |
There is provided a pellicle membrane comprising emissive crystals in a matrix containing at least one element which forms a chemical bond with silicon having a bond dissociation energy of at least 447 kJ mol-1. Also provided is a method...
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WO/2023/204078A1 |
Provided are a method for producing a semiconductor substrate and a silicon-containing composition which are capable of forming a silicon-containing film with good resist pattern collapse suppression properties and good film thickness un...
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WO/2023/202725A1 |
An integrated treatment device, which comprises a base platform (100), a rotation apparatus (200), and a flow guide apparatus (300). The rotation apparatus (200) comprises an angle of inclination adjusting unit ( 210) and a rotating unit...
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WO/2023/204123A1 |
Provided is a novel compound which has such acid generating capability that the compound is decomposed by the irradiation with i line to generate a sulfonic acid and which can keep the acid generating capability thereof at a satisfactory...
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WO/2023/202454A1 |
Disclosed is a polymer for a black matrix. The polymer is prepared by performing a reaction on a dianhydride monomer and hydroxyethyl methacrylate to obtain an intermediate, and then performing a reaction on the intermediate, a diamine m...
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WO/2023/204165A1 |
[Problem] To provide a method for efficiently mass-producing a polymer solution which has a high polymer concentration, contains a plurality of solvents at a desired content ratio, and is useful for the preparation of a resist compositio...
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WO/2023/202390A1 |
A photoresist composition, comprising: a polymer which is formed by polymerizing a first monomer and a second monomer, wherein the first monomer is an acrylic monomer containing a polymerizable group and a fluorine-containing atom group,...
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WO/2023/203827A1 |
Provided are a radiation-sensitive resin composition and a pattern formation method by which sensitivity, critical dimension uniformity (CDU) performance, and development residue performance can be exhibited on a sufficient level when ne...
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WO/2023/205172A1 |
Various technologies are described herein pertaining to laser ablation of material from a workpiece. An ablation system includes a laser, a focusing system, and a computing device configured to control operation of the laser and the focu...
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WO/2023/204295A1 |
This light exposure method is a method for exposing a first resist layer located on a deposition mask base material to light. In the first resist layer, a region used for the formation of a single deposition mask by etching is a unit mas...
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WO/2023/204287A1 |
A composition for resist underlayer film formation which comprises a polymer comprising a repeating unit (1) represented by formula (1) and a repeating unit (2) that is not the repeating unit (1) and a solvent, wherein the polymer in a p...
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WO/2023/203025A1 |
The disclosure relates to a method for detecting and/or quantifying manufacturing inaccuracies made by a lithographic process. The method comprises: providing at least one design for fabrication of structures on a substrate using a set o...
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WO/2023/198382A1 |
A method of spatially aligning a patterning device and a substrate, wherein the patterning device and the substrate are separated by an optical path comprising one or more moveable optical components is described, the method comprising: ...
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WO/2023/198732A1 |
The present invention relates to a microlithographic optical arrangement, in particular for the use of light in the extreme UV (EUV) range, comprising an optical element unit (109), in particular a facet element unit, a support device (1...
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WO/2023/200656A1 |
A conductive polymeric layer on an electrostatic chuck. The conductive polymeric layer comprises a conductive polymer and a photosensitive polymer. The conductivity of the conductive polymer promotes charge dissipation by the conductive ...
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WO/2023/200676A1 |
A method of forming patterned features on a substrate is provided. The method includes: positioning a first mask over a first portion of a substrate; directing radiation through the patterned area of the first mask at the first portion o...
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WO/2023/199841A1 |
The present invention provides a novel compound which has photosensitivity to both h-rays and i-rays and is easily decomposed and generates a sulfonic acid, which is a strong acid, when irradiated with either h-rays or i-rays. A compou...
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WO/2023/199907A1 |
The present invention employs a resist composition which generates an acid upon exposure to light and changes the solubility with respect to a developer solution by the action of the acid, and which contains a compound that is represente...
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