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WO/2024/054050A1 |
The present invention provides a quality control slide of a cell counting device, comprising: a base layer which is capable of transmitting light therethrough; a thin film layer which is formed on top of the base layer; a fluorescent lay...
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WO/2024/054311A1 |
Various embodiments of methods are provided for forming a moisture barrier layer on an EUV-active photoresist film before patterning the EUV-active photoresist film with EUV lithography. According to one embodiment, the methods disclosed...
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WO/2024/054537A1 |
A method and apparatus for performing post-exposure bake operations is described herein. After exposure of photoresist on a substrate, the substrate is heated during a baking process to facilitate protection of the resist. The baking pro...
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WO/2024/052033A1 |
The disclosure relates to a method for preparing an object having a curved surface to be etched, the resulting etched surface being useable as a mold for manufacturing an optical article. The method comprises illuminating the curved surf...
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WO/2024/053579A1 |
The present invention provides: a photosensitive resin composition which is capable of forming a resin film that has excellent photolithographic characteristics and excellent chemical resistance; a cured product of this photosensitive re...
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WO/2024/052012A1 |
Disclosed is a method of determining at least one parameter of interest relating to a structure formed in at least one respective layer on a substrate, the method comprising: obtaining a measured metrology data relating to a measurement ...
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WO/2024/053470A1 |
This coloring composition comprises a coloring agent including a pigment, a polymerizable compound, a photopolymerization initiator, and a compound represented by formula (1), wherein the photopolymerization initiator includes an oxime c...
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WO/2024/052061A1 |
A method can include directing radiation toward at least two targets using an optical scanning system so as to generate first and second portions of scattered radiation. A first target can include a plurality of first grating line struct...
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WO/2024/052260A1 |
The invention relates to a heating assembly as well as an optical system and a method for heating an optical element in an optical system, in particular in a microlithographic projection exposure system. The heating assembly according to...
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WO/2024/052081A1 |
The invention relates to a method for calibrating a mirror array (100) having a plurality of mirror elements (20). For each of the plurality of mirror elements (20), a displacement device (40) for tilting the mirror element (20), at leas...
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WO/2024/048282A1 |
The present invention pertains to: active-ray-sensitive or radiation-sensitive resin composition that contains a compound represented by formula (Z-1) set forth in the description and a resin in which the polarity increases when being br...
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WO/2024/048625A1 |
Provided is a method for treating an aqueous developer waste liquid that is generated due to development of a flexographic printing original plate using an aqueous developer liquid, the method including: a first filtration step in which ...
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WO/2024/048387A1 |
The purpose of the present invention is to provide a reflection-type mask blank that prevents electrostatic damage from occurring, while suppressing CD changes during a dry etching process. A reflection-type mask blank 100 comprises a ...
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WO/2024/048296A1 |
The present invention addresses the problem of providing a photosensitive composition wherein photolithography properties are excellent and a cured film obtained therefrom has a low coefficient of linear expansion, as well as a transfer ...
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WO/2024/048892A1 |
Provided are a compound represented by chemical formula 1, a photosensitive resin composition including the compound, and a color filter manufactured using the photosensitive resin composition. An embodiment provides a compound represent...
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WO/2024/048451A1 |
An objective of the present invention is to provide an on-press development type planographic printing plate precursor which suppresses color development failure after time has elapsed, and which has excellent visibility. Another objecti...
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WO/2024/048397A1 |
Provided are: an actinic-ray-sensitive or radiation-sensitive resin composition having excellent resolution, LWR performance, and PED stability; an actinic-ray-sensitive or radiation-sensitive film that uses the actinic-ray-sensitive or ...
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WO/2024/048893A1 |
The present invention relates to a photosensitive resin composition, a photosensitive resin layer manufactured using same, and a color filter. Specifically, one embodiment provides a photosensitive resin composition comprising: (A) a bin...
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WO/2024/046107A1 |
The present invention relates to Zn-based organically-coordinated nanoparticles, a photoresist composition, a preparation method therefor, and the use thereof. The nanoparticles have a metal-organic one-dimensional repeatedly-arranged ch...
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WO/2024/048281A1 |
The present invention provides: an active-ray-sensitive or radiation-sensitive resin composition comprising a resin (A), which includes a repeating unit represented by formula (1) and a main chain of which is decomposed by irradiation wi...
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WO/2024/047871A1 |
A narrow-band laser apparatus according to the present invention comprises: a laser resonator that includes an output coupling mirror and a narrow-band module, the narrow-band module including a prism and a grating, a reflecting surface ...
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WO/2024/045525A1 |
The present invention relates to the technical field of nanomaterials and optical etching, and provides a photoresist-free optical patterning method for colloidal nanocrystals in a green solvent. A photosensitive ligand structurally simi...
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WO/2024/048464A1 |
Provided are: an actinic ray-sensitive or radiation-sensitive resin composition; and an actinic ray-sensitive or radiation-sensitive film, a pattern formation method, and an electronic device manufacturing method which use said actinic r...
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WO/2024/048463A1 |
This actinic ray-sensitive or radiation-sensitive resin composition comprises a resin which includes a repeating unit represented by specific general formula (1) and a repeating unit represented by specific general formula (2), and in wh...
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WO/2024/048487A1 |
A composition for forming a gap-filling material, the composition comprising: a compound and/or a polymer each having a structure represented by formula (1) and a carbonyl bond; and a solvent. (In formula (1), R1 and R2 each independentl...
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WO/2024/046225A1 |
Provided in the present application are an ester type photosensitive polyimide material and a preparation method therefor. By means of introducing fluorinated graphene quantum dots containing low-polarity fluorine atoms, the dielectric c...
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WO/2024/048365A1 |
A foreign matter removal device according to the present disclosure comprises: a vacuum ultraviolet light generation unit that generates vacuum ultraviolet light; an irradiation container for irradiating a pellicle film with the vacuum u...
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WO/2024/046691A1 |
Disclosed is method for configuring a field of view configuration of an inspection apparatus with respect to a pattern on a patterned substrate to be measured. The method comprises: obtaining metrology data comprising at least one parame...
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WO/2024/048605A1 |
Provided are: a photosensitive resin composition comprising a polyimide precursor having a radical-polymerizable group, a photopolymerization initiator, and a compound having a coumarin skeleton; a cured product; a layered body; a method...
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WO/2024/045270A1 |
A laminated structure and a preparation method therefor, a pattern transfer method, and a reworking method. A stripping layer (100) capable of being etched and removed by means of a wetting method is arranged below a bottom anti-reflecti...
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WO/2024/049919A1 |
Mono-substituted tin silanolate compounds and related methods are provided. A method comprises contacting a mono-substituted tin (IV) compound with a silanolate reactant to form a mono-substituted tin silanolate compound. A composition c...
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WO/2024/048280A1 |
In this screen mask manufacturing method, a positive image formation step involves forming a recess-forming positive image in a position other than that of a pattern-opening-forming positive image on a side that will become a first surfa...
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WO/2024/046111A1 |
A preparation method for a diffractive optical waveguide, and an imprinting master mode (104). The preparation method for a diffractive optical waveguide comprises: providing a waveguide substrate (101); forming a graphical imprinting ad...
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WO/2024/046835A1 |
A dose controller is configured to: receive a measurement of an extreme ultraviolet (EUV) pulse energy created from an EUV interaction, the EUV interaction occurring between a target light pulse produced by a target light source and a ta...
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WO/2024/048317A1 |
The present invention addresses a first problem of providing a photosensitive composition from which it is possible to form a pattern having a low relative permittivity and excellent resolution. The present invention addresses a second p...
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WO/2024/046108A1 |
A Zn-based organic coordination nanoparticle and a preparation method therefor, a photoresist composition containing same, and a use thereof. The Zn-based organic coordination nanoparticle is obtained by mixing and stirring a zinc-contai...
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WO/2024/048894A1 |
The present description relates to a photosensitive resin composition, a photosensitive resin film prepared by using same, and a color filter. An embodiment provides a photosensitive resin composition comprising: (A) a coloring agent; (B...
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WO/2024/016380A9 |
The present disclosure relates to the technical field of semiconductors, and relates to a processing method, processing apparatus and processing system for a semiconductor structure. The processing method of the present disclosure compri...
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WO/2024/048604A1 |
A resin composition containing a polyimide precursor that includes a repeating unit represented by formula (1-1) and that has a polymerizable group content of 2 mmol/g or more and an amide bond content of 1.5 mmol/ g or less, a polymeriz...
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WO/2024/048104A1 |
Provided are a method and a system that are for manufacturing a metasurface, that can be easily adapted for substrates of various sizes, and that can realize reduction in manufacturing cost. This method for manufacturing a metasurface co...
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WO/2024/048603A1 |
Provided are: a resin composition comprising a polyimide precursor containing a repeating unit represented by formula (2); a cured product; a laminate; a method for producing a cured product; a method for producing a laminate; a method f...
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WO/2024/047256A1 |
The present invention relates to the field of substrate patterning with periodic dot patterns in the micrometer or submicrometer range, in particular a patterned substrate and a method for patterning surfaces of a transparent substrate b...
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WO/2024/048436A1 |
Provided are: a resin composition comprising at least one resin selected from the group consisting of cyclic resins and precursors thereof, and compound A corresponding to at least one of compound a1 and compound a2; a cured product; a l...
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WO/2024/045679A1 |
The present invention relates to Zn-based organic coordination nanoparticles and a preparation method therefor, a photoresist composition, and the use thereof. Zinc acetate, m-methyl benzoic acid and a nitrogen-containing organic ligand ...
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WO/2024/048462A1 |
The present invention provides an actinic-ray-sensitive or radiation-sensitive resin composition comprising (A) an onium salt compound and (B) a polymer which has a repeating unit including an acid group having an acidic proton and in wh...
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WO/2024/040625A1 |
A liquid crystal display panel (1) and a manufacturing method therefor. According to the liquid crystal display panel (1), the thickness of an insulating layer (17) in an opening area (191a) is smaller than the thickness of the insulatin...
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WO/2024/041827A1 |
A system includes an illumination system, a scanning system, an optical system, a detector system, and a processor. The illumination system directs an optical beam to illuminate a target structure. The scanning system scans the optical b...
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WO/2024/043110A1 |
This photosensitive composition, film, and optical sensor comprise particles A containing a rare earth element, a photopolymerization initiator B, and a resin C. The resin C includes a resin having at least one selected from an acid numb...
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WO/2024/041875A1 |
An intermediate product for producing an optical element for a projection exposure apparatus (1) comprises a substrate (20) for specifying a basic topography of an optical surface, multiple etchable layers being applied onto the substrat...
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WO/2024/041831A1 |
Disclosed are methods, systems, and computer software for predicting after-etch profiles of features at varying depths. A method can include accessing after-development resist profiles of features. The method can also include applying an...
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