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Patent Searching and Data


Matches 1 - 50 out of 180,763

Document Document Title
WO/2019/048342A1
A method, includes illuminating a structure of a metrology target with radiation having a linear polarization in a first direction, receiving radiation redirected from the structure to a polarizing element, wherein the polarizing element...  
WO/2019/049732A1
The present invention enables high-resolution lithography. An exposure device uses a reading unit to read a correction substrate, which has a substrate correction pattern containing a plurality of two-dimensionally arrayed cross-mark pos...  
WO/2019/047938A1
Provided in the present invention are a galvanometer correction system and method, which is implemented by means of the following steps: S1: causing the optical axis of a galvanometer to move along a first horizontal direction and a seco...  
WO/2019/049795A1
The purpose of the invention is to provide: a composition capable of forming a film exhibiting excellent flatness, wet peeling resistance, and pattern bending resistance while maintaining solvent resistance; a film; a method for forming ...  
WO/2019/048137A1
Disclosed herein is a method for determining a control parameter for an apparatus utilised in a semiconductor manufacturing process, the method comprising: obtaining performance data associated with a substrate subject to the semiconduct...  
WO/2019/048215A1
A method of determining a parameter of a patterning process applied to an object comprising two features (for example an overlay of the two features) comprises: irradiating the two features of the object with a radiation beam and receivi...  
WO/2019/048147A1
Disclosed is a method of measuring focus performance of a lithographic apparatus, and corresponding patterning device and lithographic apparatus. The method comprises using the lithographic apparatus to print one or more first printed st...  
WO/2019/048145A1
An apparatus and method for estimating a parameter of a lithographic process and an apparatus and method for determining a relationship between a measure of quality of an estimate of a parameter of a lithographic process are provided. In...  
WO/2019/047600A1
A coating device comprises: a first storage tank (20) for storing a coating material; coating tubing (100) connected to the first storage tank (20) via a first pipeline (1); and a gas output device (30) for outputting a first pressurized...  
WO/2019/049786A1
Provided is a photosensitive resin composition for a flexographic printing original plate that is a low-hardness plate capable of being used in flexographic printing, is reduced in the adhesion of dust, dirt and paper dust onto a relief ...  
WO/2019/048506A1
A method including: obtaining an optical proximity correction for a spatially shifted version of a training design pattern (5000); and training a machine learning model (5200) configured to predict optical proximity corrections for desig...  
WO/2019/049588A1
Methods and arrangement for clamping substrates to a support using adhesive material area disclosed. The method comprises providing a support comprising a first surface defining a plane; applying adhesive material on at least portions of...  
WO/2019/048200A1
The invention relates to an optical system for a projection exposure system, comprising an entrance pupil and/or an exit pupil, the entrance pupil and/or the exit pupil having an area A and a center point M and there being at least three...  
WO/2019/049721A1
The present invention provides an acid group-containing (meth)acrylate resin characterized by containing, as essential reaction raw materials, (A) a phenolic hydroxyl group-containing resin, (B1) a cyclic carbonate compound or (B2) a cyc...  
WO/2019/049940A1
While modulating the intensity of a drawing beam (LBn) to be projected as spot light (SP') to a substrate (P) on the basis of drawing data of a pattern defined by multiple pixels (PIC), this pattern drawing device (EX) relatively scans t...  
WO/2019/051348A1
Methods of cleaning a photomask may include heating residual coupling material on a surface of the photomask. The photomask may be characterized by active regions and edge regions. The residual coupling material may be located on portion...  
WO/2019/048214A1
A method comprising: evaluating a plurality of polarization characteristics associated with measurement of a metrology target of a substrate processed using a patterning process, against one or more measurement quality parameters; and se...  
WO/2019/050120A1
The present invention relates to a photoacid generator and a chemically amplified positive photoresist composition for a thick film, comprising the same. The photoacid generator is chemically and thermally stable and can exhibit high sen...  
WO/2019/050047A1
A phenolic resin composition for photoresists, which is characterized by containing a novolac type phenolic resin (A) that is represented by general formula (1) and a novolac type phenolic resin (B) that has at least one of an arylene sk...  
WO/2019/047244A1
A mechanical arm (10), an exposure machine front unit (1000) and temperature control method. The mechanical arm (10) is used with the exposure machine front unit (1000), the exposure machine front unit (1000) comprising a temperature con...  
WO/2019/048295A1
A method of determining a sensor contribution to a measurement of apodization. The method comprises directing a radiation beam through an aperture when the aperture is in a first configuration having a first aperture diameter, the first ...  
WO/2019/048198A1
A lithographic apparatus comprising an illumination system for providing a beam of radiation, a support structure for supporting a patterning device, the patterning device serving to impart the radiation beam with a pattern in its cross-...  
WO/2019/048225A1
The present invention provides a method for determining overlay. The method comprises obtaining an initial overlay estimate relating to a first set of targets and data about a second set of targets, wherein the data for a target comprise...  
WO/2019/048216A1
Disclosed herein is a target formed on a substrate, the target comprising: an alignment structure; and a metrology structure; wherein the alignment structure comprises structures that are arranged to generate a beat pattern when the alig...  
WO/2019/048633A1
The invention is directed to nanoimprint lithography mould (1) comprising: a body (2) and a plurality of protrusions (3) extending from the body (2), each protrusion (3) having a proximal area at its proximal end (3.1) and a distal area ...  
WO/2019/050490A1
The present invention proposes a system for processing water washable flexo photopolymer printing plates, the system (100) comprises a washing line (10) including one or more brushes (11) and a surface (12) essentially facing said brushe...  
WO/2019/050507A1
Method of handling a mask device are described. According to m embodiment, the method includes: Loading the mask device on a holding arrangement for holding the mask device; moving the holding arrangement from a first state into a second...  
WO/2019/048191A1
The invention relates to an optical system (200) for a lithography unit (100A, 100B), having: a first mirror (202); a second mirror (206) which, together with the first mirror (202), defines a beam path (204) and also has a hole (208), t...  
WO/2019/044874A1
Provided are: a photosensitive resin composition which enables the achievement of a cured body that is further decreased in dielectric constant and dielectric loss tangent; a method for producing a cured relief pattern with use of this p...  
WO/2019/043253A2
A flowable liquid formulation for 3D printing is described. The formulation comprises from 0.1 to 25wt.% radiopaque particles, wherein at least 50% by weight of the particles have a diameter of at most 100 nm. The formulation further com...  
WO/2019/045763A1
A method of fabricating a device is presented. The method includes forming a multilayer stack (101', 102', 103') on a substrate (10', 100') which has a principal surface. The multilayer stack includes a supporting layer (102') formed ove...  
WO/2019/044817A1
This negative photosensitive resin composition contains a thermosetting resin, a photopolymerization initiator and a coupling agent which contains an acid anhydride as a functional group. It is preferable that the thermosetting resin con...  
WO/2019/044087A1
The purpose of the present invention is to provide a planographic printing plate original plate having excellent image visibility and printing durability when used as a planographic printing plate, a method for manufacturing a planograph...  
WO/2019/044270A1
Provided is an active-light-sensitive or radiation-sensitive resin composition with which it is possible to form a pattern in which ion leakage can be suppressed in an ion implantation step. Also provided are a resist film using the acti...  
WO/2019/045377A1
The present invention relates to a photo-acid generator and a chemical amplification type photoresist composition comprising the same for a thick film, wherein the photo-acid generator has, besides effects as a photo-acid generator, rema...  
WO/2019/043773A1
[Problem] To enable easy measurement of the film thickness of debris adhered to the surface of a component without the need for the extensive disassembly of the in-chamber component in an extreme ultraviolet light generator. [Solution] A...  
WO/2019/042726A1
A substrate comprising a plurality of features for use in measuring a parameter of a device manufacturing process and associated methods and apparatus. The measurement is by illumination of the features with measurement radiation from an...  
WO/2019/044469A1
Provided is a method for forming a pattern with which it is possible to obtain a pattern that excels in rectangularity. Also provided are a resist composition used in the method for forming the pattern, and a method for manufacturing an ...  
WO/2019/044510A1
The present invention provides a pattern formation method and an ion-injection method in which said pattern formation method is used, the pattern formation method comprising: (1) a step for forming a resist underlayer film on a substrate...  
WO/2019/043780A1
The data analysis device according to the present invention is provided with: a data collection unit which, from each of a plurality of devices including a light source device, an exposure device for exposing a wafer with pulsed light ou...  
WO/2019/044319A1
Provided is a conveyance-based washing device allowing maintainability and productivity to be achieved simultaneously. This conveyance-based washing device uses a washing solution to develop a flexographic printing plate precursor after ...  
WO/2019/044277A1
The present invention provides a method which is for manufacturing a color filter and with which pattern formability of pixels is good and the generation of residue on another pixel after pixel formation and the generation of color migra...  
WO/2019/046495A1
Techniques are provided that can select defects based on criticality of design pattern as well as defect attributes for process window qualification (PWQ). Defects are sorted into categories based on process conditions and similarity of ...  
WO/2019/044871A1
The present invention addresses the problem of providing a drug solution purification method with which it is possible to obtain a drug solution exhibiting excellent impairment suppression performance. The drug solution purification meth...  
WO/2019/044483A1
Provided are a lithographic printing original plate having an image recording layer provided on a support, and a method for producing a lithographic printing plate using the lithographic printing original plate, wherein the lithographic ...  
WO/2019/042682A1
Methods and systems are described for cleaning a support such as a clamp of a chuck that holds a patterning device or a wafer in a lithographic apparatus. The method includes loading a electrostatic cleaning substrate into a lithographic...  
WO/2019/042783A1
Multilayered product structures are formed on substrates by a combination of patterning steps, physical processing steps and chemical processing steps. An inspection apparatus illuminates a plurality of target structures and captures pup...  
WO/2019/042656A1
A system for heating an optical component of a lithographic apparatus, the system comprising a heating radiation source, the heating radiation source being configured to emit heating radiation for heating of the optical component, wherei...  
WO/2019/044259A1
Provided is an actinic ray-sensitive or radiation-sensitive resin composition which can form a pattern having excellent LER properties, and can inhibit pattern collapse. Also, provided are a resist film using the actinic ray-sensitive or...  
WO/2019/044547A1
Provided is an active light sensitive or radiation sensitive resin composition which enables the formation of a pattern having excellent resolution and shape characteristics even if used in thick film applications. Also provided are: a r...  

Matches 1 - 50 out of 180,763