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Matches 1 - 50 out of 178,854

Document Document Title
WO/2018/188859A1
A mirror array, at least some of the mirrors of the array comprising a reflective surface and an arm which extends from a surface opposite to the reflective surface, wherein the mirror array further comprises a support structure provided...  
WO/2018/190526A1
The present invention relates to a compound having a novel structure, a photosensitive resin composition containing same, and a photosensitive material, a color filter, and a display element manufactured using same.  
WO/2018/190273A1
When a substrate is being brought into a treatment chamber, a mounting plate is moved by a drive device to a standby position so that the mounting plate is in the standby position inside the treatment chamber. When the mounting plate is ...  
WO/2018/188876A1
The invention relates to a wavefront correction element for use in an optical system, in particular in an optical system of a microlithographic projection lighting system, comprising a substrate (220, 230), an assembly of electrically co...  
WO/2018/189817A1
Disclosed is a multi-beam exposure device in which fluctuations in optical systems of electronic beams are reduced, and in which vacuum leakage is prevented. Provided is an exposure device comprising: a barrel that is decompressed such t...  
WO/2018/189164A1
The invention relates to a device for treating the surface of objects, having a treatment chamber (14) receiving the object (12) to be treated, a radiation source (16), oriented toward the object (12), for UV radiation and a device (24) ...  
WO/2018/188828A1
A lithographic apparatus arranged to project a pattern from a patterning device onto a substrate, comprising at least one housing comprising at least one internal wall, at least one optical component arranged within at least one chamber ...  
WO/2018/190380A1
[Problem] To provide a plasma-curable multileveled substrate coating film forming composition for forming a coating having pattern-filling properties and planarization properties. [Solution] A plasma-curable multileveled substrate coatin...  
WO/2018/190088A1
The present invention is a radiation-sensitive composition containing particles and a solvent, wherein each of the particles contains a hydrolysate of a metal compound having a hydrolyzable group, a hydrolytic condensation product of the...  
WO/2018/190529A1
The present invention relates to an extreme ultraviolet (EUV) developer composition in a semiconductor manufacturing process and, more specifically, the purpose of the present invention is to provide a developer composition for forming a...  
WO/2018/189816A1
Provided is an exposure device comprising: a barrel that is decompressed such that the interior thereof reaches a vacuum state; a plurality of charged particle beam sources that are provided inside the barrel and that respectively emit a...  
WO/2018/191049A1
A method of producing a relief image or mold from a liquid photopolymer resin, said method comprising the steps of: a) placing an image film onto an exposure glass; b) placing a cover film over the image film and drawing a vacuum c) plac...  
WO/2018/188134A1
A method for fabricating a multi-color color resistor, comprising: moving a photomask so that alignment marks (604) are respectively aligned with marks (601, 602, 603) positioned on a black matrix layer; respectively forming color resist...  
WO/2018/191051A1
A photocurable relief image printing blank comprising: (a) a support layer; (b) one or more photocurable layers disposed on the support layer, wherein the one or more photocurable layers comprise: i) a binder; ii) one or more monomers; i...  
WO/2018/188891A1
Methods and apparatus for measuring a plurality of structures formed on a substrate are disclosed. In one arrangement, a method comprises obtaining data from a first measurement process. The first measurement process comprises individual...  
WO/2018/189516A1
The present invention relates to radiation curable coatings for use in a printing and/or moulding process. More particularly, the present invention relates to pressure sensitive force sensing resistor formed from radiation curable coatin...  
WO/2018/191237A1
The present invention provides a photoresist composition Part A, comprising a carboxylic functional ethylenically unsaturated resin having an acid value equal to or greater than 10 mg KOH/g, and an organosulphur compound. The photoresist...  
WO/2018/186494A1
Provided is a high-sensitivity black positive-acting photosensitive resin composition. The photosensitive resin composition according to the present invention contains (A) a binder resin, (B) a quinonediazide adduct on a phenol compound ...  
WO/2018/184934A1
The present invention relates to an optical arrangement and a method for laser-interference structuring of a specimen (10). The optical arrangement comprises a laser radiation source (1) for emitting a laser beam (11), a beam splitter el...  
WO/2018/185323A1
The present invention concerns an optical system for spatiotemporally shaping the wavefront of the electric field of a light beam (1) to be projected into a target volume (5), where the propagation axis is axis z, to create 3D patterned ...  
WO/2018/186600A1
The present invention provides an electronic device manufacturing method for allowing large-area transfer to be efficiently performed in a transfer process, comprising the steps of: positioning a transfer film on a plurality of functiona...  
WO/2018/184793A1
A method of forming an anti-reflection layer, the method including applying a first mixture to an object, the first mixture made from a combination of aluminum tri-sec-butoxide (ATSB), a first chelating agent, water and an alcohol; remov...  
WO/2018/184783A1
A method of reducing an aberration arising during operation of a lithographic apparatus, the method comprising measuring the aberration to obtain an aberration signal, the aberration signal comprising a first component and a second compo...  
WO/2018/186310A1
[Problem] To provide a composition for coating a substrate with height difference, which has high fillability into patterns and forms a film having planarization properties, said film being formed into a coating film by means of photocur...  
WO/2018/184375A1
A nano-scale structured light diffraction device based on random laser speckle, the diffractive structured unit being only a few hundred nanometres or even tens of nanometres, having the advantages of a high resolution, a high contrast r...  
WO/2018/186208A1
The present invention provides a photosensitive resin composition for a flexographic printing plate, the composition containing at least a hydrophilic copolymer (A), a thermoplastic elastomer (B), a photopolymerizable monomer (C), a phot...  
WO/2018/186183A1
The present invention provides an acid group-containing (meth)acrylate resin comprising, as essential reaction materials, an epoxy resin (A), an unsaturated monocarboxylic acid or a derivative thereof (B), and a polycarboxylic acid anhyd...  
WO/2018/184802A1
A radiation receiving system for an inspection apparatus, used to perform measurements on target structures on lithographic substrates as part of a lithographic process, comprises a spectrometer with a number of inputs. The radiation rec...  
WO/2018/184720A2
The invention relates to a refractive projection lens (PO) for reproducing a pattern, arranged in an object plane (OS) of the projection lens, in an image plane (IS) of the projection lens using an electromagnetic radiation of a mercury ...  
WO/2018/182186A1
A blue photosensitive resin composition according to the present invention comprises: an alkali soluble resin; a blue colorant; and scattering particles having an average particle diameter of 30-500nm and comprising metal oxide. The alka...  
WO/2018/182133A1
The present invention relates to: a blue photo-sensitive resin composition containing scattered particles, a thiol compound represented by chemical formula 1, a blue colorant, a cardo-based binder resin as a binder resin, a photo-polymer...  
WO/2018/180308A1
The purpose of the present invention is to provide a resist material which can achieve both of high sensitivity and excellent lithographic properties at high levels in a pattern formation technique utilizing a radioactive ray having a wa...  
WO/2018/180045A1
The purpose of the present invention is to provide a resist pattern forming method by which a resist pattern having an inverse taper shape with a good cross-section and having a reduced amount of residual moisture and residual organic co...  
WO/2018/182127A1
A photosensitive resin composition according to the present invention comprises: an alkali soluble resin; and scattering particles having an average particle diameter of 30-500nm and comprising metal oxide. The alkali soluble resin compr...  
WO/2018/180069A1
Provided is a pattern forming method which forms a pattern that is capable of providing an object to be etched, which has excellent pattern uniformity. Also provided is a method for producing an electronic device, which comprises the abo...  
WO/2018/179094A1
The laser system according to the present disclosure is provided with: a laser device that outputs laser light; a transmission optical system that is disposed in a path between the laser device and a target supplied to the inside of an E...  
WO/2018/182134A1
The present invention relates to a blue photo-sensitive resin composition, a color filter manufactured using same, and an image display device, the blue photo-sensitive resin composition comprising scattered particles, a blue colorant, a...  
WO/2018/177659A1
A method of optimizing an apparatus for multi-stage processing of product units such as wafers, the method comprising: (a) receiving object data (210, 230) representing one or more parameters measured (206, 208) across wafers (204, 224) ...  
WO/2018/181722A1
According to one embodiment of the present invention, a protective film for a touch panel electrode is obtained by curing a photosensitive resin composition containing: a binder polymer having a weight average molecular weight of 100000 ...  
WO/2018/180592A1
The present invention provides a photosensitive resin composition that exhibits a light blocking effect, is of high sensitivity, and provides excellent halftone characteristics. This photosensitive resin composition comprises (A) an alka...  
WO/2018/181913A1
According to the present invention, a substrate stage device (20) is provided with: a fine movement stage (22) having an upper surface part (104) and a lower surface part (102), wherein the upper surface part (104) holds a substrate (P) ...  
WO/2018/179259A1
Provided is a photosensitive resin composition which: is applicable to both projection exposure and direct-write exposure machines without fine composition adjustments; is not prone to an undercut in which the bottom of a resist pattern ...  
WO/2018/179367A1
This photosensitive element is provided with: a support film that contains a resin; and a photosensitive resin layer that is arranged on one surface of the support film. With respect to the one surface, the density of broken bubble marks...  
WO/2018/179417A1
This extreme ultraviolet light generation device is provided with: a chamber; an EUV light collecting mirror positioned inside of the chamber; and a hydrogen gas discharge section positioned inside of the chamber, said hydrogen gas disch...  
WO/2018/182135A1
The present invention relates to a blue photosensitive resin composition, a color filter produced by using same, and an image display device, the blue photosensitive resin composition comprising scattering particles, a blue coloring, a c...  
WO/2018/177724A1
The invention relates to an optical system (200) for a lithography machine (100A, 100B), comprising a main mirror element (206), a manipulator device (400) for positioning and/or orienting said main mirror element (206), an optically act...  
WO/2018/179807A1
The purpose of the present invention is to provide a radiation-sensitive resin composition with which it is possible to form a resin film that sufficiently inhibits generation of development residues and that exhibits superior elongation...  
WO/2018/179641A1
Disclosed is a photosensitive transferring material comprising: a temporary support; and a photosensitive resin composition layer including a photoacid generator, and a polymer component including a polymer that includes a constituent un...  
WO/2018/181872A1
This resist composition contains at least one type of tannin compound selected from the group consisting of a tannin containing at least one crosslinkable reactive group in the structure, a derivative of said tannin, and a resin obtained...  
WO/2018/181406A1
A planographic printing original plate, and a method for manufacturing the same, having a water-soluble or water-dispersible negative image recording layer on a hydrophilized aluminum support body, the arithmetic average height Sa of the...  

Matches 1 - 50 out of 178,854