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Matches 1 - 50 out of 181,593

Document Document Title
WO/2019/096604A1
An illumination intensity correction device (24) serves to specify an illumination intensity over an illumination field (18) of a lithographic projection exposure apparatus. The correction device (24) has a plurality of rod-shaped indivi...  
WO/2019/096536A1
A method for positioning a substage (9), supported by a main stage (5), relative to a reference object, the substage moveable in a direction (7) between a first and second position relative to the main stage. The method includes position...  
WO/2019/098208A1
Provided is a semiconductor element intermediate which is provided with a substrate and a multilayer resist layer. A metal-containing film is provided in the multilayer resist layer. The content of germanium in the metal-containing film ...  
WO/2019/096891A1
The invention relates to block co-polymer comprising at least one first block and at least one second block which is different from the first block, wherein the first block comprises repeating units 1, and the second block comprises repe...  
WO/2019/098547A2
An embodiment relates to a method for manufacturing a deposition mask for depositing OLED pixels, comprising the steps of: preparing a metal plate; disposing a first photoresist layer on one surface of the metal plate and patterning the ...  
WO/2019/098222A1
To provide a blue curable resin composition having high brightness, in which x in the xy chromaticity diagram thereof in the XYZ color system is relatively low, a blue color filter formed from the blue curable resin composition, and a di...  
WO/2019/098493A1
The present invention relates to a chemically amplified photoresist composition comprising an alkali-soluble resin comprising a (meth)acrylate-based resin comprising a (meth)acrylate-based repeating unit having a certain heterocyclic com...  
WO/2019/098223A1
To provide a blue curable resin composition having high brightness, in which Bx in the xy chromaticity diagram thereof in the XYZ color system is relatively low, a color filter formed from the blue curable resin composition, and a displa...  
WO/2019/097630A1
This extreme ultraviolet light generation device is for generating extreme ultraviolet light by generating a plasma through irradiation of a target substance with a pulsed laser beam, the extreme ultraviolet light generation apparatus be...  
WO/2019/096554A1
A method of clamping a substrate (W) to a clamping system, the method comprising the steps of: providing a substrate holder (200) comprising; a main body (210) having a first main body surface (212) and a second main body surface (214), ...  
WO/2019/096644A1
An object stage bearing system can include an object stage, a hollow shaft coupled to the object stage, and an in-vacuum gas bearing assembly coupled to the hollow shaft and the object stage. The in-vacuum gas bearing assembly can includ...  
WO/2019/098109A1
The purpose of the present invention is to provide: a composition for forming a resist underlayer film, from which it is possible to form a resist underlayer film having excellent smoothness and pattern bending resistance while maintaini...  
WO/2019/098338A1
This composition for forming a film for lithography contains at least one resin that is selected from the group consisting of aromatic hydrocarbon formaldehyde resins, which are condensation reaction products of formaldehyde and substitu...  
WO/2019/098705A1
The present invention relates to a roll stamp and a manufacturing method therefor, the roll stamp comprising: a cylindrical metal mold comprising an engraved pattern on the outer side thereof and a hollow part on the inner side thereof; ...  
WO/2019/098262A1
The present invention provides: a light generation device and light generation method for generating light that can be used in a laser rendering exposure method that uses the core diameter dv of an optical vortex that has a donut-shaped ...  
WO/2019/096654A1
In a projection lithography system (1) comprising anamorphically imaging projection optics (7) with a non-accessible entrance pupil, various adaptations of the pupil facet mirror (14) and/or its pupil facets (14a) and/or its imaging acti...  
WO/2019/096893A1
The invention relates to a block co-polymer comprising at least one first block and at least one second block which is different from the first block, wherein the first block comprises repeating units 1, and the second block comprises re...  
WO/2019/091662A1
A lithographic apparatus comprising a substrate storage module having a controllable environment for protecting lithographically exposed substrates from ambient air. The substrate storage module is configured to store at least twenty sub...  
WO/2019/093027A1
Provided is an image exposure device which can record excellent images, and which can be downsized. This image exposure device (10) comprises: an image display device (12) having pixels (13); a photosensitive recording medium support par...  
WO/2019/091694A1
There is disclosed a substrate holder, a method of manufacturing this substrate holder and a lithographic apparatus comprising this substrate holder. In one arrangement, there is provided a substrate holder for use in a lithographic appa...  
WO/2019/094217A1
A method, apparatus, and program for build surface mapping and recovery for additive manufacturing. The method may include fabricating an object by additive manufacturing wherein the topology of a build surface is determined. An additive...  
WO/2019/093761A1
A composition for a hard mask of the present invention comprises a polymer of a linker compound having a particular structure and an aromatic compound containing a hydroxyl group, an ether group, or a thio-ether group. A hard mask having...  
WO/2019/093615A1
The present invention relates to: a monomer comprising a moiety represented by the following chemical formula 1, and a substituted or unsubstituted C6-30 aromatic ring moiety; a polymer formed by a polycondensation reaction of the monome...  
WO/2019/093244A1
Provided is a substrate treatment apparatus (1), comprising: a carrier block (3) in which carriers (11) receiving a plurality of wafers W can be placed; a liquid treating unit U1 and a heat treating unit U2 for treating the wafers W; a t...  
WO/2019/093757A1
Embodiments of the present invention provide a composition for a hard mask, the composition comprising: a polymer of a first aromatic unit containing a plurality of aryl rings and a second aromatic unit containing a cyano group; and a so...  
WO/2019/091932A1
A pellicle comprising a metal oxysilicide layer. Also disclosed in a pellicle comprising a molybdenum layer, a ruthenium layer and a silicon oxynitride layer, wherein the molybdenum layer is disposed between the ruthenium layer and the s...  
WO/2019/091708A1
A method of cleaning a surface to remove a contaminant therefrom, the method comprising the steps of oxidizing at least a portion of the contaminant and passing a stream of carbon dioxide snow over the contaminant. An apparatus for clean...  
WO/2019/094923A1
Disclosed are photo-responsive pressure sensitive adhesives, wound dressings that contain the photo-responsive pressure sensitive adhesives, and methods to remove the wound dressing. The photo-responsive pressure sensitive adhesive compr...  
WO/2019/091678A1
A metrology apparatus for and a method of determining a characteristic of interest relating to at least one structure on a substrate. The metrology apparatus comprises a sensor and an optical system. The sensor is for detecting character...  
WO/2019/094223A1
A compound lens assembly and method for making a compound lens assembly useful for deep ultraviolet lithography are described. The compound lens assembly includes a first lens component having an optical surface bonded to an optical surf...  
WO/2019/092831A1
Provided is an extreme ultraviolet light generation device which generates plasma by irradiating a target material with pulsed laser light, thereby generating extreme ultraviolet light, the extreme ultraviolet light generation device com...  
WO/2019/093145A1
The purpose of the present invention is to provide: a composition for forming a resist film that is excellent in terms of easiness of removal, while maintaining high sensitivity; and a resist pattern forming method. The present invention...  
WO/2019/086167A1
Methods and apparatus for estimating an unknown value of at least one of a plurality of sets of data, each set of data comprising a plurality of values indicative of radiation diffracted and/or reflected and/or scattered by one or more f...  
WO/2019/089483A1
Scatterometry overlay (SCOL) single cell targets are provided, along with target design methods and measurement methods which employ the single cell SCOL targets for in-die metrology measurements, utilizing the small size of the target a...  
WO/2019/089196A1
Methods of and apparatuses for processing a metal oxide film are provided. Methods involve (a) exposing the metal oxide film to a boron halide reactant and igniting a first plasma with a first bias power to modify a surface of the metal ...  
WO/2019/085901A1
Disclosed are a mobile platform moving mechanism, a mobile platform system and a photoetching device. The mobile platform moving mechanism comprises a roller (1), a fixing member (4), multiple springs (5), multiple guide rods (3) and a c...  
WO/2019/088396A1
The present invention relates to: a polymer comprising a moiety represented by the following chemical formula 1; an organic film composition comprising the polymer; and a method for forming a pattern by using the organic film composition...  
WO/2019/085932A1
Disclosed are a substrate alignment method and device, and a mask aligner. The substrate alignment method comprises: selecting a reference substrate, and obtaining an image of the reference substrate; selecting an image of the a to-be-al...  
WO/2019/087626A1
Provided are: a compound which can be used suitably as a photodegradable base in a resist composition that has good sensitivity to an active energy, has excellent resolution in lithography and enables the reduction in line width roughnes...  
WO/2019/086397A1
A method is described to clean a surface of an optic (115) within a chamber (125) of an extreme ultraviolet (EUV) light source (100). The chamber is held at a pressure below atmospheric pressure. The method includes generating a material...  
WO/2019/088569A1
The present invention relates to: a chemically amplified photoresist composition minimizing crack formation in a photoresist to be obtained from the composition, and capable of improving adhesion to a substrate and sensitivity; and a pho...  
WO/2019/087985A1
The purpose of the present invention is to obtain: a cured film that has high sensitivity, enables formation of a pattern of a low-tapered shape after development, is capable of suppressing a change in the dimensional width of pattern op...  
WO/2019/043253A3
A flowable liquid formulation for 3D printing is described. The formulation comprises from 0.1 to 25wt.% radiopaque particles, wherein at least 50% by weight of the particles have a diameter of at most 100 nm. The formulation further com...  
WO/2019/085059A1
Disclosed is a nano-imprint template, comprising a template main body (11), several photoresist microstructures (12) provided on the template main body (11), and a fluororubber polymer layer (13) covering the outer layer of the photoresi...  
WO/2019/086234A1
Nanostructured polymeric compositions having a plurality of phases are prepared by the curing of compositions containing a first reactive component (such as a hydrophilic reactive component), a second reactive component (such as a hydrop...  
WO/2019/089007A1
The present disclosure involves a method for performing an additive manufacturing operation to form a part, wherein the part is created from a photopolymer resist material. The method may involve generating a laser beam and directing the...  
WO/2019/089411A1
Embodiments are related to manufacturing using sol-gel materials and, more particularly, to systems and methods for forming structural elements using sol-gel material.  
WO/2019/086402A1
The present invention provides a resist underlayer forming composition, which is well in heat resistance and gap filling. Further, the present invention provides methods of manufacturing a resist underlayer and semiconductor device using...  
WO/2019/087516A1
The present invention addresses the problem of providing a planographic printing plate original plate that has excellent resistance to small-dot plate wear when used as a planographic printing plate, a method for manufacturing a planogra...  
WO/2019/088268A1
A photosensitive resin laminate provided with a support film and a photosensitive resin composition layer that includes a photosensitive resin composition, wherein: the photosensitive resin composition includes (A) an alkali-soluble poly...  

Matches 1 - 50 out of 181,593