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Matches 1 - 50 out of 179,861

Document Document Title
WO/2019/009001A1
Provided is a method for manufacturing a device capable of detecting light with reduced noise while increasing sensitivity with respect to target light. The method for manufacturing a device comprises: a step of manufacturing a light rec...  
WO/2019/008067A1
The invention relates to a device and to a method for producing light-exposed structures on a workpiece (12) having a light-sensitive surface (14). The device comprises a holder for the workpiece. An optical unit (20) comprises a light s...  
WO/2019/009143A1
Provided are a method for manufacturing an infrared-receiving element, and a method for manufacturing an optical sensor, wherein infrared radiation can be detected at an increased S/N ratio. Also provided are a laminate, a resist composi...  
WO/2019/008719A1
A laser system comprises: a pulse laser system that emits first laser light having a first wavelength component and a first polarized component and second laser light having the first wavelength component and a second polarized component...  
WO/2019/007927A1
The invention relates to a method for at least partially removing a contamination layer (24) from an optical surface (14a) of an optical element (14) that reflects EUV radiation, with the method comprising: performing an atomic layer etc...  
WO/2019/009499A1
The present invention relates to: a positive-type photoresist composition including a photosensitive acid-generating compound and an acrylic resin that includes repeating units of a certain structure; a photoresist pattern using same; an...  
WO/2019/009695A1
This invention relates to a precast liquid photopolymeric plate, a flexible relief plate derived therefrom and a method for producing the precast liquid photopolymeric plate. Particularly, a flexible container having a top layer, a botto...  
WO/2019/009413A1
[Problem] To provide a resist underlayer film whereby the resist underlayer film present in an underlayer of a photoresist can be moved at the same time as, and in accordance with, a resist pattern, at the same time as development of the...  
WO/2019/006799A1
A method for manufacturing a nano wire grid polarizer comprises the steps of: S1, providing a nanoimprint mold (3) and filling the nanoimprint mold (3) with a photoresist material (21a) to obtain a nanoimprint component; S2, aligning the...  
WO/2019/009363A1
The present invention addresses the problem of providing: a liquid medicine that has excellent defect suppression properties; and a liquid medicine storage body. This liquid medicine contains an organic solvent that has a conductivity of...  
WO/2019/008589A1
A composition made of a polymeric substrate having deposited on at least one surface thereof a cross-linked polymeric coating layer, with the coating layer being characterized by: (i) nanosized or microsized surface pattern; (ii) pencil ...  
WO/2019/007359A1
Disclosed is a shutter blade device for an exposure system of a lithography machine, the shutter blade device comprising two shutter blades (3, 4), and two thermal insulation plates (2), each shutter blade (3, 4) being connected to one t...  
WO/2019/006725A1
A solvent consisting essentially of: (A) a first component consisting of N, N-diethylacetamide (DEAC); (B) a second component consisting of 3-methoxy-N, N-dimethyl propionamide (M3DMPA); and (C) an optional third component consisting of ...  
WO/2019/010495A1
A lithographic method for making an out-of-plane optical coupler includes forming a photoresist layer of positive photoresist material over a substrate. The positive photoresist layer undergoes a flood exposure to light through a binary ...  
WO/2019/002003A1
A method including: for a metrology target, having a first biased target structure and a second differently biased target structure, created using a patterning process, obtaining metrology data including signal data for the first target ...  
WO/2019/004365A1
Provided is a photosensitive resin composition which exhibits excellent adhesion to a substrate and is capable of suppressing and controlling line width change during high temperature processing. A photosensitive resin composition accord...  
WO/2019/003918A1
Provided is a photosensitive resin composition comprising: a silane compound (provided with a secondary amine structure, and a specific silicon-containing structure at two ends of the molecule) having a specific structure; an alkali-solu...  
WO/2019/001877A1
Overlay error of a lithographic process is measured using a plurality of target structures, each target structure having a known overlay bias. A detection system captures a plurality of images (740) representing selected portions of radi...  
WO/2019/001871A1
A method for determining substrate deformation has the steps: (a) obtaining (402) first measurement data (X i ) associated with mark position, from measurements of a plurality of substrates; (b) obtaining (404) second measurement data (X...  
WO/2019/005170A1
Methods, systems, and apparatuses for implementing dynamic learning mask correction include: creating a mask via a lithography process; performing a learning phase to identify a set of mask shape variables that change simulated intensity...  
WO/2019/002902A1
The invention related to a method for manufacturing an article made of a polymerized material comprising the steps of: - providing a vat of polymerizable material, transparent at least in the 400-800 nanometers wavelengths range, - irrad...  
WO/2019/005542A1
Methods and apparatuses are provided that determine an offset between actual feature/mark locations and the designed feature/mark locations in a maskless lithography system. For example, in one embodiment, a method is provided that inclu...  
WO/2019/001639A1
The invention relates to a lithographic exposure device having an exposure unit (5) comprising an imaging matrix (2), a telecentric lens (1) and a workbench (4) having a rest surface (4.1) for the relative arrangement and the relative mo...  
WO/2019/002540A1
The present invention relates to a method for producing an object in an additive manufacturing process from a precursor and comprises the following steps: I) depositing a layer of a radically cross-linkable construction material, which c...  
WO/2019/001931A1
A system comprising: a substrate support configured to hold a substrate; a conductive or semi- conductive element contacting the substrate support and covering at least part of the substrate support; and a charging device configured to a...  
WO/2019/001922A1
A lithographic apparatus comprising a projection system configured to project a patterned radiation beam to form an exposure area on a substrate, a cooling apparatus located in use above the substrate adjacent to the exposure area, the c...  
WO/2019/004427A1
Provided are: a photosensitive coloring composition which is capable of forming a colored spacer that is suppressed in leakage of light within the wavelength range of from 400 nm to 500 nm, while having excellent mechanical characteristi...  
WO/2019/003284A1
An extreme ultraviolet light generation device comprises: a chamber that focuses laser light in the inner space to plasmatize a target substance at the focal point of laser light; a collector mirror that collects extreme ultraviolet ligh...  
WO/2019/001412A1
An optical path compensation device, comprising a wedge plate group (100), a driving mechanism (200) and a pre-tightening unit, wherein the wedge plate group includes a movable wedge plate (120) and a fixed wedge plate (100); the movable...  
WO/2019/003913A1
This photosensitive resin composition comprises an alkali-soluble resin, a photosensitizer, and a solvent, wherein the solvent contains a urea compound, or, an amide compound having an acyclic structure. The structure of the urea compoun...  
WO/2019/006266A1
A method includes obtaining a composition (1016) disposed on a surface of a substrate (1010), irradiating a first portion (1017a) of the composition for a first irradiation dosage, and irradiating a second portion (1017b) of the composit...  
WO/2019/004829A1
This document is directed at a method of manufacturing a semiconductor element, the method comprising manipulating a surface of a substrate using an atomic force microscope, the atomic force microscope including a probe, the probe includ...  
WO/2019/004142A1
Provided is a film-forming material that comprises a triazine-based compound represented by formula (1), that can be used in a wet process, and that is useful for forming: a lithographic film that has excellent heat resistance, resist pa...  
WO/2019/004471A1
Provided are: a lithographic printing original plate which has an image recording layer on a hydrophilic supporting body, and which is configured such that the image recording layer contains an infrared absorbing dye that is decomposed w...  
WO/2019/006221A1
Methods and systems for generating a high resolution image for a specimen from a low resolution image of the specimen are provided. One system includes one or more computer subsystems configured for acquiring a low resolution image of a ...  
WO/2019/002082A1
A method for adjusting an illumination system (20) comprising an illumination beam path (34) for a multiplicity of individual beams (39) for irradiating a mask plane (44) of a projection exposure apparatus for microlithography, and also ...  
WO/2019/000256A1
A dust removal system within an exposure machine and a method for controlling a dust removal system within an exposure machine. The dust removal system within the exposure machine is disposed within a sealed box body (10) and comprises a...  
WO/2019/001873A1
Focus metrology patterns and methods are disclosed which do not rely on sub-resolution features. Focus can be measured by measuring asymmetry of the printed pattern (T), or complementary pairs of printed patterns (TN/TM). Asymmetry can b...  
WO/2019/001934A1
Microtransfer molding process and patterned substrate obtainable therefrom The present invention pertains to the field of nanoimprint lithography (NIL) processes and more specifically to a MicroTransfer Molding process used for providing...  
WO/2018/236653A1
Designs for a hybrid overlay target design that includes a target area with both an imaging-based target and a scatterometry-based target are disclosed. The imaging-based overlay target design can include side-by-side grating structure. ...  
WO/2018/235209A1
A method of manufacturing an optical article, wherein an output light flux generating process of generating an output light flux by inputting a light from a light source to an output setting element having a repetition structure; a cured...  
WO/2018/236770A1
Techniques are disclosed for magnification compensation and/or beam steering in optical systems. An optical system may include a lens system to receive first radiation associated with an object and direct second radiation associated with...  
WO/2018/235664A1
A polymerizable composition according to the present invention is a polymerizable composition containing a polymerization initiator (A), a coloring agent (B), an alkali-developable compound (C) and an ethylenically unsaturated compound (...  
WO/2018/236651A1
Methods for forming flat panel displays, and more particularly, methods for forming high pixel density flat panel displays are provided. A method of etching can include depositing a copper layer on a substrate, depositing a hard mask on ...  
WO/2018/233929A1
The invention relates to a sensor (SE) comprising: • - a radiation source (LS) to emit radiation (LI) having a coherence length towards a sensor target (GR); and • - a polarizing beam splitter (PBS) to split radiation diffracted by t...  
WO/2018/235949A1
[Problem] To provide a method including a step of applying onto an upper surface of a semiconductor substrate having a terraced part and an non-terraced part to produce a resist underlayer film, whereby it becomes possible to reduce the ...  
WO/2018/234747A1
Various implementations described herein are directed to a method for manufacturing an integrated circuit. The method may include defining multiple lithographic regions for the integrated circuit, and the multiple lithographic regions ma...  
WO/2018/235665A1
A polymerizable composition according to the present invention is a polymerizable composition containing a coloring agent (A), an alkali-developable compound (B) and a polymerization initiator (C), wherein the coloring agent (A) is a col...  
WO/2018/235669A1
In the present invention, an actual graphic pattern (20) is formed on an actual substrate (S) by lithography based on an original graphic pattern (10). An assessment point setting unit (110) sets assessment points on the original graphic...  
WO/2018/233966A1
A method, system and program for determining a fingerprint of a parameter. The method includes determining a contribution from a device out of a plurality of devices to a fingerprint of a parameter. The method comprising: obtaining param...  

Matches 1 - 50 out of 179,861