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Matches 1 - 50 out of 177,664

Document Document Title
WO/2018/127467A1
[Problem]To provide a chemically amplified positive type photoresist composition capable of forming a pattern having an excellent cross-sectional shape,and a pattern forming method using the same. [Means for Solution] A chemically amplif...  
WO/2018/127654A1
The present invention relates to a functionalised cellulose material, to a method for preparing same and to the use thereof for labeling cellulose-containing articles.  
WO/2018/127565A2
A radiation source including a chamber including a plasma formation region, a radiation collector arranged in the chamber, the radiation collector configured to collect radiation emitted at the plasma formation region and to direct the c...  
WO/2018/128830A1
A lithographic printing plate precursor has an infrared radiation- sensitive imageable layer that includes one or more free radically polymerizable components, an initiator composition that provides free radicals upon exposure of the inf...  
WO/2018/128159A1
The purpose of the present invention is to provide a quality inspection method by which defect performance can be conveniently evaluated. The quality inspection method of the present invention is a method for inspecting the quality of a ...  
WO/2018/126507A1
Disclosed is a photoresist coating device and a photoresist coating method. The photoresist coating device comprises: a gas supply unit (10) for supplying gas to a photoresist coating unit (20); the photoresist coating unit (20) comprisi...  
WO/2018/123462A1
Provided are a pattern manufacturing method having a wide process window, a color filter manufacturing method, a method of manufacturing a solid-state imaging element, and a method of manufacturing an image display device. The pattern ma...  
WO/2018/120105A1
An optical element supporting device and an optical system. The supporting device comprises an outer frame (2), at least three supporting elastic sheets (3), and a drive element (5). Each supporting elastic sheet comprises a first end an...  
WO/2018/125249A1
In accordance with disclosed embodiments, there are provided methods, systems, and apparatuses for implementing Optical Proximity Correction (OPC) model enhancement for Negative Tone Development (NTD) processes by including polymer compa...  
WO/2018/125220A1
In accordance with disclosed embodiments, there are provided methods, systems, and apparatuses for implementing Optical Proximity Correction (OPC) modeling via machine learning on simulated 2D optical images for Spin Exposure Develop (SE...  
WO/2018/122003A1
The invention relates to a substrate exposure system comprising a frame, a substrate support module for carrying a substrate, an exposure apparatus for exposing said substrate, and adjustment assembly for adjusting the position of the ex...  
WO/2018/123388A1
The present invention is a radiation-sensitive composition used for extreme UV light or radiation beam exposure, the radiation-sensitive composition containing a first polymer and a solvent, wherein the radiation-sensitive composition is...  
WO/2018/124664A1
The present invention relates to a method for transferring a micro electric element, comprising the steps of: transferring a plurality of element chips, formed on one surface of a wafer, to an adhesive layer of a first adhesive film incl...  
WO/2018/123826A1
The present invention is able to provide: a negative photocurable resin composition which is capable of forming a cured product that has excellent resolution, high heat resistance and high elongation; a dry film which has a resin layer t...  
WO/2018/123035A1
A target photographing apparatus according to one aspect of the present invention is provided with: a delay circuit that receives a timing signal from the outside, and outputs a first trigger signal at a timing delayed from the time of r...  
WO/2018/123626A1
The present invention provides a negative resist composition for a protruding electrode with a resist film having a light transmittance of 30% or less at a wavelength of 365 nm on producing a resist film with a thickness of 3.5 ┬Ám.  
WO/2018/125513A1
A method of fabricating a circuit element, such as a quantum computing circuit element, including obtaining a lithography mask write file that includes mask information characterizing one or more mask features, obtaining a uniformity fun...  
WO/2018/125219A1
In accordance with disclosed embodiments, there are provided methods, systems, and apparatuses for implementing geometric kernel based machine learning for reducing Optical Proximity Correction (OPC) model error. For instance, there is i...  
WO/2018/123537A1
The purpose of the present invention is to provide a radiation sensitive composition which has excellent sensitivity. The present invention is a radiation sensitive composition which contains a metal oxide having a structural unit repres...  
WO/2018/120481A1
A direct-write screen platemaking apparatus and a use method therefor. The direct-write screen platemaking apparatus and a focal plane control method utilize a Z-axis controller (7) to pre-establish a mapping relation between a focal pla...  
WO/2018/124087A1
Provided is a coloring resin composition for color filters, which has excellent colorant dispersion stability, and which is capable of forming a colored layer that has improved contrast, while being reduced in the retardation value. A co...  
WO/2018/123836A1
Provided are the following: a photosensitive resin composition with which a pattern can be formed by means of photo-radical polymerization, and with which a cured film exhibiting high breaking elongation cane be obtained; a cured film; a...  
WO/2018/122958A1
This method for manufacturing an electroconductive substrate includes: a layer formation step for forming, on a substrate 2, a resin layer 3 having an electroconductive network 6 obtained using electroconductive metal fibers 5; and a pat...  
WO/2018/119730A1
An optical integrated testing platform, comprising: a platform body frame used for supporting other components; a testing system used for testing an optical element or a mechanical element; an adjusting system used for adjusting the posi...  
WO/2018/122992A1
In processes for manufacturing semiconductor devices, etc., curing is performed at a temperature higher than in conventional practice to avoid defective curing of resists. A removal solution having a removing power greater than in conven...  
WO/2018/123773A1
Provided are the following: a photosensitive resin composition which can be developed using a solution containing a lower alcohol, exhibits excellent abrasion resistance and exhibits excellent ink wiping properties on a plate surface whe...  
WO/2018/121965A1
A method including: simulating an image or characteristics thereof, using characteristics of a design layout and of a patterning process, determining deviations between the image or characteristics thereof and the design layout or charac...  
WO/2018/121921A1
Disclosed is a lithographic apparatus and associated method of controlling a lithographic process. The lithographic apparatus comprises a controller configured to define a control grid associated with positioning of a substrate within th...  
WO/2018/125023A1
Disclosed herein are methods for manufacturing devices by combining mask-based and maskless lithography. For example, in some embodiments, a method of forming a semiconductor device may include performing a mask-based lithographic proces...  
WO/2018/123940A1
[Problem] To provide a halftone mask with which both a finer pattern and multi-gradation can be achieved. [Solution] A first semitransparent region comprising a first semitransparent film, a second semitransparent region comprising a lam...  
WO/2018/123939A1
[Problem] To provide a multi-gray level halftone mask which enables the exposure of a fine photoresist pattern. [Solution] On a transparent substrate, a semi-transmitting part comprising a pattern of a semi-transmitting film and a phase ...  
WO/2018/121988A1
A method where deviations of a characteristic of an image simulated by two different process models or deviations of the characteristic simulated by a process model and measured by a metrology tool, are used for various purposes such as ...  
WO/2018/125115A1
Accounting for predicted mask infidelities is disclosed. A computer-readable medium includes computer-readable instructions configured to instruct a processor to predict mask infidelities and workpiece infidelities resulting from the pre...  
WO/2018/122696A1
Method for the calibration of a plurality of light sources (3) belonging to an additive manufacturing machine adapted to manufacture layered three- dimensional objects by selective solidification of corresponding layers of a basic materi...  
WO/2018/123994A1
The present invention provides: a composition which is capable of forming a cured product that has excellent storage stability and heat resistance; a cured product of this composition; a pattern forming method which uses this composition...  
WO/2018/119927A1
Provided is a method for manufacturing a thin film transistor, comprising etching a second metal layer and a semiconductor layer to form a boundary area of the thin film transistor (S250); re-etching the second metal layer to form a sour...  
WO/2018/120317A1
A method for manufacturing a planarized liquid crystal display film layer (3'). The method for manufacturing the planarized liquid crystal display film layer (3') can reduce the impact that wiring thickness has on array film topography a...  
WO/2018/121967A1
A method including: obtaining a thin-mask transmission function of a patterning device and a M3D model for a lithographic process, wherein the thin-mask transmission function is a continuous transmission mask (CTM) and the M3D model at l...  
WO/2018/123667A1
The purpose of the present invention is to provide a polymer capable of adequately suppressing the collapse of a resist pattern, satisfactorily forming a clear resist pattern, and furthermore improving sensitivity when used as a main cha...  
WO/2018/119041A1
A method determines an amount of sediment in a ceramic dispersion. The ceramic dispersion includes a free-radical curable monomer, silica, and metal particles. The method includes providing a centrifuge to apply a gravitational force to ...  
WO/2018/114159A1
The invention relates to an optical element, in particular for a microlithographic projection exposure apparatus, wherein the optical element has an optical effective surface. According to one aspect, the optical element comprises a subs...  
WO/2018/118932A1
An imprinting apparatus includes a silicon master having a plurality of nanofeatures defined therein. An anti-stick layer coats the silicon master, the anti-stick layer including a molecule having a cyclosiloxane with at least one silane...  
WO/2018/114246A2
A method of topography determination, the method including: obtaining a first focus value derived from a computational lithography model modeling patterning of an unpatterned substrate or derived from measurements of a patterned layer on...  
WO/2018/116914A1
Provided is a negative photosensitive resin composition which enables the achievement of a partition wall that has high development adhesion, while having good ink repellency in the upper surface, and which is sufficiently reduced in dev...  
WO/2018/114117A1
The present invention provides a lithography system (200) having a projection lens (104) comprising: a first optical element (208), a first sensor subframe (212), a first sensor (218), which is configured to detect a position of the firs...  
WO/2018/114152A1
Disclosed is a metrology sensor system, such as a position sensor. The system comprises an optical collection system configured to collect diffracted or scattered radiation from a metrology mark on a substrate, said collected radiation c...  
WO/2018/117047A1
This photosensitive layer roll has a support body film, and a photosensitive layer that is provided on the support body film and includes a photosensitive resin composition, wherein the photosensitive resin composition includes at least ...  
WO/2018/114210A1
The invention relates to a plunger coil actuator (1), comprising at least one first coil (15) and one second coil (16) and a magnet arrangement (10), wherein the coils (15, 16) interact with the magnet arrangement (10) in such a way that...  
WO/2018/117167A1
Provided are a photosensitive compound, a photoacid generator, a resist composition using the same, and a method for manufacturing a device, wherein the photosensitive compound has good sensitivity to short-wavelength light such as KrF, ...  
WO/2018/114816A1
The invention relates to an optical system in which, in order to control positioning of a component (34), a stray magnetic field (25) is detected using a sensor device, and a correction signal is determined which compensates for the effe...  

Matches 1 - 50 out of 177,664