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Matches 1 - 50 out of 176,445

Document Document Title
WO/2018/070489A1
Disclosed is a photosensitive element which is provided with a support, a photosensitive layer, and a protective layer in that order, wherein the support has either an olefin resin layer or an amino-alkyd resin layer as a superficial lay...  
WO/2018/070477A1
Provided is a photosensitive colored composition which can be used to form a pattern having high light-shielding properties and superior solvent resistance and mechanical characteristics, and is particularly preferably used to form a col...  
WO/2018/070303A1
Provided is a resist underlayer film-forming composition which is capable of providing a resist underlayer film, said resist underlayer film exerting a sufficient anti-reflection function particularly in a KrF process, a high solvent res...  
WO/2018/070327A1
The purpose of the present invention is to provide a radiation-sensitive resin composition having superior LWR performance, CDU performance, resolution, cross-sectional-shape rectangularity, and exposure margin. Provided is a radiation-s...  
WO/2018/069052A1
Metrology apparatus and methods are disclosed. In one arrangement, a substrate is inspected. A source beam of radiation (131) emitted by a radiation source (50) is split into a measurement beam (132) and a reference beam (133). A first t...  
WO/2018/069274A1
The present invention relates to a photosensitive resin composition suitable for forming a thick film, which comprises (A) an alkali-soluble resin, (B) at least one plasticizer selected from a group consisting of an alkali- soluble vinyl...  
WO/2018/071063A1
Diffraction-based focus target cells, targets and design and measurement methods are provided, which enable sensitive focus measurements to be carried out by overlay measurement tools. Cells comprise a periodic structure having a coarse ...  
WO/2018/069015A1
A method for selecting an optimal set of locations for a measurement or feature on a substrate includes: (302): Defining constraints, and optionally cost function(s). (306): Defining a first candidate solution of locations. (308): Defini...  
WO/2018/070785A1
In order to provide a hard mask composition having high etch resistance useful in a semiconductor lithography process, the present invention provides: a spin-on hard mask composition comprising a dibenzo carbazole polymer; and a patterni...  
WO/2018/069242A1
The invention relates to a composite plate for use in the production of a surface printing plate, comprising a carrier layer (4) and at least one photo layer (6), which can be structured by means of electromagnetic radiation (12) in a wa...  
WO/2018/066517A1
[Problem] To provide a method for producing a coating composition for reversing a pattern by being applied onto a resist film which has been patterned by a solvent development lithography process. [Solution] A method for producing a comp...  
WO/2018/065222A1
A method of performing a lithographic exposure of a substrate, the substrate being held on a substrate table, the substrate table comprising a cooling system operative to cool the substrate table, the method comprising performing an alig...  
WO/2018/065267A1
The invention relates to a projection exposure apparatus for semiconductor lithography, comprising - a light source for generating optical used radiation by way of which structures, which are arranged on a reticle, can be imaged onto a w...  
WO/2018/064827A1
Provided is a system wave aberration measurement method capable of calibrating system error; subtraction is performed between the system error of a tested projection lens (8) and the system error of a shear interference measurement syste...  
WO/2018/065157A1
An alignment system configured to be substantially insensitive to thermal variations in its system during alignment measurements. The alignment system includes a sensor system, a support structure, a sensing element, a position measureme...  
WO/2018/065180A1
The invention relates to a projection exposure system for semiconductor lithography comprising a mirror arrangement that is subjected to thermal stress during operation. The mirror arrangement comprises a mirror carrier (23) having an op...  
WO/2018/066338A1
A pattern drawing apparatus (EX) is provided with: a beam switching unit that has a plurality of selective optical members (OSn) for directing beams toward drawing units (Un) under electrical control and the optical members being arrange...  
WO/2018/066606A1
A resist composition that generates an acid upon exposure to light, while having a solubility in a developer liquid, which is changed by the action of an acid. This resist composition is characterized by containing a polymer compound tha...  
WO/2018/066296A1
The present invention addresses the problem of providing a dispersion composition from which a cured film having an excellent film surface form can be formed and which has excellent dispersion stability. The present invention also addres...  
WO/2018/066372A1
The purpose of the invention is to provide: a phenolic hydroxyl group-containing resin that has excellent flowability and provides excellent heat resistance and dry etching resistance in a cured product; and a curable composition and a r...  
WO/2018/066159A1
This pattern drawing device (EX) is provided with: a position measurement unit (MU) which measures the position of an area to be exposed on a substrate (P) to be drawn on by a plurality of drawing units (Un); a first adjustment member (H...  
WO/2018/066716A1
The present invention pertains to a pattern formation method comprising: a step for forming a basic pattern on a front face side of a substrate; a step for filling, in a recess of the basic pattern, a first composition containing a solve...  
WO/2018/064774A1
There is accordingly provided a stereolithography system comprising an emitting device and a tank disposed above the emitting device. The tank has an optically transparent bottom wall. There is a linear stage that extends away from the t...  
WO/2018/066395A1
A resin composition which is composed of (A) one or more resins selected from among polyimides, polyimide precursors, polybenzoxazoles, polybenzoxazole precursors, other polyamides and copolymers of these compounds, and (D) a thermal cro...  
WO/2018/065183A1
The invention relates to a projection exposure system (1) for semiconductor lithography, comprising at least one component (22) and a support device having at least one support actuator (23) which acts on at least one support point (27) ...  
WO/2018/066247A1
Provided are: an active light sensitive or radiation sensitive resin composition from which a resist film can be formed having excellent water repellency and having, after coming into contact with an alkali developing solution, improved ...  
WO/2018/066515A1
[Problem] To provide a pattern-inversion coating composition that is not only for filling spaces within a pattern of an organic underlayer film to which a resist pattern formed over a substrate to be processed has been transferred, but a...  
WO/2018/058866A1
Solvents useful for removing, among other things, photoresists and poly (amic acid) /polyimide from display/semiconductor substrates or electronic processing equipment, consist essentially of: (A) a first component consisting of a sulfox...  
WO/2018/061988A1
This photosensitive composition contains a polysiloxane compound, a photoacid generator, a coloring agent and a solvent. The content of the coloring agent relative to the total solid content of this composition is 5% by weight or more. T...  
WO/2018/062861A1
A light source module unit for exposure is disclosed. The disclosed light source module unit for exposure comprises: a light source panel having multiple ultraviolet light-emitting elements configured in an array structure; and an optica...  
WO/2018/062870A1
Provided are a vehicular interior material manufacturing method and a vehicular interior material, the method comprising the steps of: forming a molded article including a surface having an uneven shape; and forming a print layer on the ...  
WO/2018/061945A1
A measuring system (5001) to be used on the production line of a micro device is independently provided from an exposure apparatus. The measuring system (5001) is provided with: a plurality of measuring apparatuses (1001-1003), which res...  
WO/2018/062508A1
A substrate holder (70) holding a substrate (P) comprises: multiple chucks (74) each provided with a holding surface for holding a substrate (P) and a suction part and non-suction part disposed on the back side of the holding surface; ba...  
WO/2018/062491A1
This movable body device for moving a substrate (P) is provided with: a substrate holder (32) which holds the substrate (P) and which can move in the X axis and the Y axis directions; a Y coarse movement stage (24) which can move in the ...  
WO/2018/060126A1
The invention relates to a projection lithography system (1) for semiconductor lithography and comprises, inter alia, a projection lens (2) for transferring a reticle (3) onto a wafer (15), a liquid layer (51), which is located in the pa...  
WO/2018/058341A1
Solvents useful for removing, among other things, photoresists and poly(amic acid)/polyimide from display/semiconductor substrates or electronic processing equipment, consist essentially of: (A) a first component consisting of a sulfoxid...  
WO/2018/062497A1
This movable body device is provided with: a substrate holder (32) which holds a substrate (P) and which can move in the X axis and the Y axis directions; a Y coarse movement stage (24) which can move in the Y axis direction; a first mea...  
WO/2018/061811A1
Provided is a determination device (50) comprising calculation units (10, 12), wherein, where respective pitches in a first direction and a second direction that intersect with each other in a predetermined plane of a plurality of detect...  
WO/2018/063784A1
Imprinted substrates are often used to produce miniaturized devices for use in electrical, optic and biochemical applications. Imprinting techniques, such as nanoimprinting lithography, may leave residues in the surface of substrates tha...  
WO/2018/061512A1
Provided are: a pattern forming method which is capable of forming a pattern with excellent surface properties when an active light sensitive or radiation sensitive film having a thick film thickness is formed; a method for producing an ...  
WO/2018/062470A1
The present invention provides: a method for producing a semiconductor chip excellent in production yield; and a kit. The method for producing a semiconductor chip according to the present invention comprises: step 1 for forming an insul...  
WO/2018/062487A1
This movable body device is provided with: a substrate holder (32) which holds a substrate (P) and which can move in the X axis and the Y axis directions; a Y coarse movement stage (24) which can move in the Y axis direction; a first mea...  
WO/2018/062663A1
Provided are: a compound represented by a particular chemical formula; a core-shell dye including a core, which includes the compound, and a shell, which surrounds the core; a photosensitive resin composition including same; and a color ...  
WO/2018/061891A1
Provided are a dispersion and a composition which have satisfactory particle dispersibility and are capable of forming films having a high color value. Also provided are a film, a process for producing the film, and a dispersant. The dis...  
WO/2018/062500A1
This movable body device is provided with: a substrate holder (32) which holds a substrate (P) and which can move in the X axis and the Y axis directions; a Y coarse movement stage (24) which can move in the Y axis direction; a first mea...  
WO/2018/061212A1
[Problem] To prevent oxidation of molten tin in a chamber device that includes a chamber, and a target generation device for supplying tin, i.e., a target material, to a predetermined region in the chamber. [Solution] Disclosed is a cham...  
WO/2018/061525A1
Provided is a negative photosensitive resin composition which is highly sensitive and suppresses the formation of a development residue due to a pigment, and which enables the achievement of a cured film having excellent heat resistance ...  
WO/2018/062105A1
The purpose of the present invention is to provide a photosensitive colored resin composition for a color filter, the composition exhibiting good sensitivity and enabling a colored layer having improved brightness to be formed. This phot...  
WO/2018/063625A1
Focusing methods and modules are provided for metrology tools and systems. Methods comprise capturing image(s) of at least two layers of a ROI in an imaging target, binning the captured image(s), deriving a focus shift from the binned ca...  
WO/2018/062471A1
The purpose of the present invention is to provide a pattern formation method exhibiting superior developability and defect suppression performance. Another purpose of the present invention is to provide a method for manufacturing an ele...  

Matches 1 - 50 out of 176,445