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Matches 1 - 50 out of 182,294

Document Document Title
WO/2019/134769A1
The invention relates to an optical arrangement for direct laser interference structuring, wherein a laser beam is directed to a reflecting element having an inclined reflecting surface. According to the invention, the reflected laser be...  
WO/2019/134525A1
A photoresist composition comprising a polymer represented by formula (I) as a film-forming resin, wherein Ra-Rd, R, and n are as defined in description. When used as the film-forming resin of a photoresist, a film-forming polymer compri...  
WO/2019/134775A1
A lithographic apparatus comprises a projection system comprising position sensors to measure a position of optical elements of the projection system. The positions sensors are referenced to a sensor frame. Damping actuators damp vibrati...  
WO/2019/135941A1
A processing system includes a processing unit that processes the flexographic printing plate with a processing liquid. The processing unit includes a hollow tube having a length extending across a cross-track dimension of the flexograph...  
WO/2019/134776A1
The present invention relates to a positioning system, comprising: a first actuator to exert an actuation force on a moveable body, the first actuator being coupled to a balance mass configured to absorb a reaction force resulting from t...  
WO/2019/134528A1
A photoresist composite using a formula (I)-containing polymer as a film-forming resin. Ra-Rd, Ra0-Rd0, Ra1-Rd1, Ra2-Rd2, n, n0, n1, and n2 are as defined in the description. A film-forming polymer contained in the photoresist composite ...  
WO/2019/098547A3
An embodiment relates to a method for manufacturing a deposition mask for depositing OLED pixels, comprising the steps of: preparing a metal plate; disposing a first photoresist layer on one surface of the metal plate and patterning the ...  
WO/2019/135819A1
A method of monitoring overlay is used in a manufacturing process in which successive layers are deposited one over another to form a stack. Each layer may include a periodic structure such as a diffraction grating to be aligned with a p...  
WO/2019/135506A1
The present invention provides a hardmask composition comprising: a polymer of a compound having a specific structure; and a solvent. From the hardmask composition, a hardmask of which etching resistance, solubility, and flatness are sim...  
WO/2019/134773A1
The invention relates to an optical system for a projection lithography system, the angle space of the illumination radiation of the projection optics on the reticle being twice as wide in a first direction than the angle space of the il...  
WO/2019/134787A1
An optical measurement method using an optical sensor apparatus (15), the optical sensor apparatus comprising an optical element (20) comprising a mark (22) configured to selectively transmit incident radiation (24), a photodetector (26)...  
WO/2019/059420A8
The present invention accurately forms a micro-scale pattern by suppressing edge errors at flat corner portions in the exposure image data for maskless exposure. The minimum exposure units of a light beam are plotted upon an exposure sur...  
WO/2019/133999A1
Provided are resin compositions, which may be used for 3D printing. The resins may be colorless and/or transparent. The resins include a photoinitiator and one or more hard cross-linker. The resins may also include one or more of soft cr...  
WO/2019/131434A1
A resist pattern forming method which comprises: a step wherein a resist film having a film thickness of 7 μm or more is formed on a supporting body with use of a resist composition; a step wherein the resist film is exposed to light; a...  
WO/2019/130306A1
The invention provides 3D printable resin formulation comprising: A) at least one flame retardant, which is an aliphatic bromine-containing acrylate and/or methacrylate monomer, said monomer being liquid at room temperature; B) non-halog...  
WO/2019/129802A1
To provide a photosensitive siloxane composition capable of forming a pattern having a desired taper angle and a desired linewidth. [Means] The present invention provides a photosensitive siloxane composition comprising : a polysiloxane ...  
WO/2019/129468A1
Methods for processing data from a metrology process and for obtaining calibration data are disclosed. In one arrangement, measurement data is obtained from a metrology process. The metrology data is applied to a target on a substrate. T...  
WO/2019/127674A1
A method for fabricating a black matrix and a spacer, comprising: providing a base substrate (10), and coating a black photoresist layer (20) onto the base substrate (10); coating a transparent photoresist layer (30) onto the black photo...  
WO/2019/132153A1
The present invention relates to: a polymer comprising a structural unit represented by the following chemical formula 1; an organic film composition comprising the polymer; and a method for forming a pattern by using the organic film co...  
WO/2019/131953A1
The present invention is a pattern-forming method provided with a step for coating the surface of a substrate with a radiation-sensitive composition containing a polymer and a radiation-sensitive acid generator, a step for exposing the c...  
WO/2019/129104A1
Provided in the present invention is a method for preparing a film layer sleeve hole: when preparing the film layer sleeve hole, fill a base hole with a substrate material before coating a photoresist layer, so as to prevent a larger pho...  
WO/2019/129465A1
A metrology apparatus for determining a characteristic of interest of a structure on a substrate, the structure having diffractive properties, the apparatus comprising: focusing optics configured to focus illumination radiation comprisin...  
WO/2019/129031A1
Disclosed are an optical compensation film, a mask, and an exposure machine. An optical compensation film (33) comprises a first area optical compensation film (331) and a second area optical compensation film (332), wherein the first ar...  
WO/2019/129485A1
A method is described herein including applying, by a metrology apparatus, an incident radiation beam to a substrate including first features on a first layer and second features on a second layer, a relationship between the first and se...  
WO/2019/130750A1
Provided are: a transfer film which enables the achievement of a cured film having reduced water vapor transmission rate (WVTR), and which has low tack properties and excellent scratch resistance in a developer liquid; an electrode prote...  
WO/2019/131226A1
A coating and developing device comprises a first laser unit for illuminating a coating solution with a laser light to acquire the status of the coating solution on the basis of changes to the laser light, and an illuminability designati...  
WO/2019/131629A1
[Problem] To obtain a highly purified refined material composition by removing polyvalent metals, polyvalent metal ions and charged metal oxide colloid particles thereof from a composition in which a material to be refined is dissolved o...  
WO/2019/132486A1
The present invention relates to a photopolymerizable composition for forming a bezel pattern developed to be applied on a display substrate, a method for forming a bezel pattern using the same, a bezel pattern manufactured thereby, a di...  
WO/2019/130807A1
Provided is a composition which has excellent dispersion stability of a pigment. Also provided are a film, a color filter, a solid-state imaging element, an image display device and a method for producing a compound. A composition accord...  
WO/2019/129052A1
Provided are a flood exposure compensation plate (4), a flood exposure apparatus comprising the flood exposure compensation plate (4), and an optical lithography apparatus, as well as a method used for performing flood exposure on an exp...  
WO/2019/130866A1
Provided is an active ray- or radiation-sensitive resin composition which has excellent storage stability and can enable a pattern with excellent LWR performance to be obtained. Also provided are a resist film, a pattern forming method, ...  
WO/2019/128057A1
A forming method for a silicon-based display panel, comprising: providing a silicon substrate (11), the silicon substrate comprising a display area (11a) and a peripheral area (11b) surrounding the display area; providing a first set of ...  
WO/2019/128449A1
Provided is a displacement device (1). The device comprises: a stator magnet array (10), comprising first magnets (11) and second magnets (12), with the first magnets (11) and the second magnets (12) being periodically arranged in a firs...  
WO/2019/130970A1
A cooling device comprises: a tank; a first path in which a pump circulates liquid phase refrigerant so that the liquid phase refrigerant is taken from the tank, cooled, and returned to the tank; and a second path branched off from the f...  
WO/2019/131144A1
This light irradiation device is provided with: a plurality of deuterium lamps that irradiate a wafer W with vacuum ultraviolet light the wavelength of which is 200 nm or less and the optical path of which has a conical shape with a ligh...  
WO/2019/133457A1
An improved stage for the processing of large, thin substrates, such as glass and semiconductor panels. Processing includes lithography, inspection, metrology, grinding, and the like. The stage includes a chuck that moves over a base rel...  
WO/2019/130784A1
Provided is a flexographic printing plate precursor which is effective in inhibiting relief image chipping while maintaining printing characteristics. The flexographic printing plate precursor 10 includes a photosensitive layer 16 compri...  
WO/2019/133579A1
A stepper (100) for lithographic processing of semiconductor substrates includes a base (102), a chuck (104) that moves only along an X axis of a coordinate system, a bridge (114) mounted over the base and the chuck, and at least one pro...  
WO/2019/129109A1
A method for fabricating a black matrix (33b), comprising the following steps: providing a substrate (31), the substrate (31) being provided thereon with an alignment mark (32); coating a black matrix thin film (33a) onto the substrate (...  
WO/2019/129051A1
An optical system of a projection objective lens for imaging a pattern on an object plane to an image plane, the optical system sequentially comprising, from the side of the object plane along an optical axis direction: a first lens grou...  
WO/2019/128256A1
Disclosed are a curable resin composition of a cured product, wherein same not only has an excellent heat resistance but also has excellent bending and buckling properties, a dry film, a cured product, and a printed circuit board. The cu...  
WO/2019/130802A1
The present invention provides a mask blank capable of suppressing the surface roughness of a transmissive substrate when EB defect correction is performed and suppressing spontaneous etching of the pattern of a phase shift film. A phase...  
WO/2019/129038A1
A photoresist softbaking apparatus, comprising: a chamber (30) for accommodating a substrate (37) coated with photoresist; a hot plate for heating the substrate (37); a hot air knife (31) for causing the chamber to generate an airflow in...  
WO/2019/127882A1
A photoresist and a preparation method therefor, said photoresist comprising: at least one resin, a photoinitiator, a solvent, and at least one type of scattering particle, the scattering particles being used for scattering ultraviolet l...  
WO/2019/132901A1
Apparatuses, methods and storage medium associated with generating a machine learning model to place sub-resolution enhancement features (SRAFs) are disclosed herein. An apparatus may generate, using exploratory SRAF placements, a machin...  
WO/2019/129613A1
An object is to provide a resist composition which can form fine resist patterns and keep them. Another object is to provide a negative tone lift off resist composition that defects of resist patterns made from the composition can be dec...  
WO/2019/131384A1
The present invention relates to a method for evaluating the thermal expansion properties of a titania-containing glass body. On the basis of measured values, obtained at a certain temperature, for a physical parameter that changes depen...  
WO/2019/128257A1
Provided are a curable resin composition from which a cured article can be obtained with excellent resistance to welding and thermal performance and also excellent flexibility and warpage, a dry film, a cured article, and a printed circu...  
WO/2019/132178A1
The present invention relates to: a polymer comprising a structural unit represented by the following chemical formula 1 and a structural unit represented by the following chemical formula 2 or 3; an organic film composition comprising t...  
WO/2019/132138A1
The present specification provides a compound represented by formula 1, and a colorant composition, a resin composition, a photosensitive material, a color filter, and a display device comprising the same.  

Matches 1 - 50 out of 182,294