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Matches 1 - 50 out of 183,940

Document Document Title
WO/2019/215848A1
This photosensitive element is provided with a support film, a barrier layer, and a photosensitive layer in this order, wherein the barrier layer contains a water-soluble resin and an ultraviolet light absorber.  
WO/2019/214892A1
The invention relates to a testing device and a method for testing the surface shape of an optical element, in particular a mirror or a lens of a microlithographic projection exposure system. According to one aspect, the testing device a...  
WO/2019/217749A1
Methods for making thin-films on semiconductor substrates, which may be patterned using EUV, include: mixing a vapor stream of an organometallic precursor with a vapor stream of a counter-reactant so as to form a polymerized organometall...  
WO/2019/216007A1
The present invention allows marks for positional alignment to be formed while avoiding the risk of light leakage, and suppresses a reduction in the degree of freedom of circuit design. The present invention is provided with: a semicondu...  
WO/2019/216107A1
The present invention addresses the problem of providing: a photosensitive resin composition that, when used as a spacer, provides a photospacer which has a high restoration ratio and has inhibited plastic deformation, and that is greatl...  
WO/2019/216174A1
The purpose of the present invention is to provide a non-ionic photoacid generator having a naphthalimide structure and having all of the properties of compatibility, high sensitivity, thermal stability, and base resistance required of h...  
WO/2019/214930A1
The invention provides a vibration isolation system (IS), comprising a piston (402) to carry a payload, a connecting member (410), a spring (404) and a flexible member (408). The spring is arranged to support the piston along a direction...  
WO/2019/216353A1
This photosensitive element is provided with a support film, a barrier layer, and a photosensitive layer in the order listed, the barrier layer containing a water-soluble resin and a UV ray absorber.  
WO/2019/214909A1
Described herein is a method for determining electromagnetic fields associated with a mask model of a patterning process. The method comprises obtaining a mask stack region of interest and an interaction order corresponding to the mask s...  
WO/2019/216118A1
Provided is a resist composition capable of maintaining line-width roughness performance and exposure latitude performance, even when stored over time under an environment wherein the temperature may vary; also provided are a resist film...  
WO/2019/216600A1
The present invention relates to an oxime ester group-substituted aromatic compound, a preparation method therefor, and a photoresist composition comprising same and is useful for providing a photosensitive composition, which effectively...  
WO/2019/216287A1
The present invention is characterized in that: a first photomask group is provided with a plurality of first photomasks, is set such that adjacent exposure regions of the first photomasks overlap each other, and has first gradation part...  
WO/2019/214197A1
A cantilever linear motion reference device employing two-layer air suspension. By means of a two-layer force sealed air suspension structure, the invention realizes two-dimensional air suspension support and motion guiding and improves ...  
WO/2019/217463A1
Methods for patterning a film stack are provided. In one embodiment, a method for patterning a film stack disposed on a substrate includes performing a first etching process to etch a film stack disposed on a substrate, wherein the film ...  
WO/2019/217584A1
Embodiments of methods and systems for patterning of low aspect ratio stacks are described. In one embodiment, a method may include receiving a substrate comprising a patterned organic planarizing layer (OPL) mask wherein a surface of th...  
WO/2019/217386A1
Extracting shapes from a pixelated SRAF bitmap image of pixels for mask making is disclosed. A method includes receiving the pixelated SRAF bitmap image of pixels, each pixel having a respective brightness value; selecting a ridge point ...  
WO/2019/214946A1
The invention relates to a mirror, in particular for a microlithographic projection exposure system. According to one aspect, a mirror according to the invention has a mirror substrate (12), a reflection layer stack (21) for reflecting e...  
WO/2019/215110A1
An optical system serves to transfer the original structure portions (13) of a lithography mask (10). The original structure portions (13), which have an x/y-aspect ratio of greater than 4:1, are arranged in a line next to one another on...  
WO/2019/212046A1
Provided are: a heated ozone water production method capable of producing a heated ozone water having a very high ozone concentration by inhibiting the reduction of the ozone concentration of a high-concentration heated ozone water; a he...  
WO/2019/210976A1
The invention relates to a stamp (3) comprising a soft stamp (2) and a support (1) attached to the soft stamp (2).  
WO/2019/211827A1
A method for extending scatterometry measurements of periodic structures created on a substrate into the deep UV and soft X-ray regions of the electromagnetic spectrum is presented. The method comprises measuring the scattering of a high...  
WO/2019/211061A1
A method of determining a measurement sequence for an inspection tool inspecting a structure generated by a lithographic process performed by a lithographic system is presented, the method comprising: - deriving a model for the lithograp...  
WO/2019/211888A1
[Problem] To provide a transistor that exhibits excellent properties. [Solution] Provided is a method for forming a gate insulation film for a bottom gate-type transistor, the method comprising: forming a resist layer on a gate electrode...  
WO/2019/211083A1
A wafer comprising a mask on one face and at least one layer on the opposite face, wherein the mask comprises at least one scribeline which overlies at least a portion of the opposite face which is substantially free of the at least one ...  
WO/2019/212037A1
[Problem] The resist removal rate and cleaning ability of conventional ozone water are still not enough to meet the requirements of the semiconductor production field of the present day, and conventional ozone water does not fully live u...  
WO/2019/208443A1
A photosensitive resin composition for bump protecting films according to the present invention comprises a heat-curable resin, a photosensitizing agent and a solvent, wherein, when a dried film having a thickness of 15 μm and produced ...  
WO/2019/206014A1
A bearing apparatus (10) and an exposure machine. The bearing apparatus (10) comprises a bearing platform (100) provided in a first preset height range, multiple bearing platforms (101) provided in a second preset height range, and a tra...  
WO/2019/209395A1
A method for producing a patterned silicone layer; said method comprising steps of: (a) depositing on a substrate a composition comprising: (i) a polysiloxane comprising alkenyl groups, (ii) a silane crosslinker comprising silicon-hydrog...  
WO/2019/206595A1
The invention provides a lithographic apparatus or frame assembly, comprising: - a first and a second pneumatic support, being arranged to control a position of a frame, each of said pneumatic supports accommodating a pressure chamber, -...  
WO/2019/206531A1
The present invention provides a tubular linear actuator, comprising: a tubular coil assembly comprising multiple tubular coils arranged next to each other in longitudinal direction of the tubular linear actuator and concentric with resp...  
WO/2019/209049A1
The present invention relates to a sprayable photolithography color ink for performing color printing on the back side of a display window and the inner surface of a back cover, comprising: 10-20 wt% of a photobinder; 1-5 wt% of a photoi...  
WO/2019/209527A1
A manufacturing system for fabricating self-aligned grating elements with a variable refractive index includes a patterning system, a deposition system, and an etching system. The manufacturing system performs a lithographic patterning o...  
WO/2019/208837A1
A developer recycling device according to the present invention comprises: a waste developer supply means for supplying a waste developer recovered after a developing process; a recycled developer generating means for receiving the waste...  
WO/2019/206906A1
An apparatus (1000) for preparing a relief plate precursor, such as a printing plate precursor (P), that has to be treated, comprising: a transport bar (100) provided with at least one penetration element (110), preferably a plurality of...  
WO/2019/206586A1
An alignment sensor apparatus includes an illumination system, a first optical system, a second optical system, a detector system, and a processor. The illumination system is configured to transmit an illumination beam along an illuminat...  
WO/2019/209591A1
Methods, apparatuses, and systems for determining a binary mask pattern from a pixelated mask pattern include: determining, by a processor, based on a fast marching method (FMM), arrival values for pixels of a portion of the pixelated ma...  
WO/2019/208762A1
A resist underlayer film-forming composition comprising a compound represented by formula (1), and a silicon-containing compound. (1) [LxTe(OR1)y] (In formula (1): L is a ligand other than OR1; R1 represents any among a hydrogen atom, ...  
WO/2019/209047A1
The present invention relates to a photolithography color ink comprising: 16.0-31.0 wt% of a photobinder; 7.5-15.2 wt% of a photoinitiator; 10.0-19.5 wt% of a monomer and an oligomer in total; 0.9-1.8 wt% of an additive; and 35.0-65.6 wt...  
WO/2019/207677A1
A photosensitive film which comprises a substrate film and a photosensitive resin layer disposed on the substrate film, wherein the photosensitive resin layer includes a binder polymer having, in a side chain, an ethylenically unsaturate...  
WO/2019/208761A1
Provided is a resist underlayer film forming composition containing a compound represented by formula (1). (1): [LxTe(OR1)y] (In formula (1), L is a ligand other than OR1; R1 is any one among a hydrogen atom, a substituted or unsubstitut...  
WO/2019/209449A1
Systems and methods discussed herein relate to patterning substrates during lithography and microlithography to form features to a set or sets of critical dimensions using dose. The dose maps are generated based upon images captured duri...  
WO/2019/207768A1
A target supply device according to an aspect of the present invention comprises: a nozzle for outputting a liquid target substance and an excitation unit for oscillating a target substance supplied by the nozzle. The excitation unit inc...  
WO/2019/206517A1
The invention provides a pneumatic support device for a lithographic apparatus and a lithographic apparatus with such support device. The support device comprises a gas spring. The gas spring comprises a suspending part, a suspended part...  
WO/2019/208354A1
The present invention provides a positive resist composition for EUV lithography, which is capable of forming a resist film that has high sensitivity to extreme ultraviolet light. A positive resist composition according to the present in...  
WO/2019/205390A1
A developing device and method. The developing device comprises a developing chamber (101), a conveyor platform (102), and an air jet structural component (103). A spray coating structural component (104) in the developing chamber (101) ...  
WO/2019/206498A1
A method of grouping data associated with substrates undergoing a process step of a manufacturing process is disclosed. The method comprises obtaining first data associated with substrates before being subject to the process step and obt...  
WO/2019/206767A1
A system configured for testing a collector mirror having a first focus and a second focus is disclosed, the system comprises: a test radiation sub-system operative to project test radiation from the second focus onto the collector mirro...  
WO/2019/206637A1
A system comprises a reflective optical element with a reflective surface that is configured to reflect a radiation beam. The reflective optical element also has a body. The system includes a thermal conditioning mechanism operative to t...  
WO/2019/209396A1
Embodiments of the present disclosure provide improved photolithography systems and methods using a solid state emitter device. The solid state emitter device includes an array of solid state emitters arranged in a plurality of horizonta...  
WO/2019/209493A1
Disclosed here is a method for making a three-dimensional micro-architected aerogel, comprising: (a) curing a reaction mixture comprising a co-sol-gel material (e.g., graphene oxide (GO)) and at least one catalyst to obtain a crosslinked...  

Matches 1 - 50 out of 183,940