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Matches 1 - 50 out of 175,209

Document Document Title
WO/2018/012440A1
Provided is a laminated body having good whiteness and high infrared shielding properties. Further provided are a kit for forming the aforementioned laminated body, a laminated body production method, and an optical sensor. The laminated...  
WO/2018/010605A1
A mixed-type photosensitive resin and a preparation method therefor. The mixed-type photosensitive resin comprises an oxetane functional group and a (methyl)acryloyloxy functional group, the functional groups supporting each other and be...  
WO/2018/010940A1
Provided is a process, including: obtaining data specifying a layout of a lithographic pattern; obtaining performance metrics of a computational analysis of the layout, the performance metrics indicating performance of one or more comput...  
WO/2018/013998A1
In some embodiments, a method may include improving a development process of a photoresist. The method may include simulating a negative-tone development process of a photoresist. The method may include determining a reaction of a develo...  
WO/2018/010961A1
There is provided an interferometer system, comprising an heterodyne interferometer and a processing system. The heterodyne interferometer is arranged to provide a reference signal and a measurement signal. The reference signal has a ref...  
WO/2018/011499A1
The invention relates to a simple and inexpensive photolithography device and method allowing an illumination pattern to be projected onto the surface of a substrate. The device includes a projector, intended to form a projection image, ...  
WO/2018/010887A1
The invention relates to a method for microlithographic production of microstructured components and a microlithographic projection exposure apparatus. In a method for microlithographic production of microstructured components, used stru...  
WO/2018/012383A1
A curable composition which contains (A) a silane compound represented by general formula (I), (B) a polymerizable compound, (C) a polymerization initiator and (D) a coloring agent. (In the formula, R' represents a hydrocarbon group whic...  
WO/2018/011953A1
This optical element angle adjustment device is provided with: a first hinge, i.e., an elastic hinge that connects a first plate and a second plate to each other; an optical element holding section attached to the first plate and/or the ...  
WO/2018/010928A1
A lithographic process is one that applies a desired pattern onto a substrate, usually onto a target portion of the substrate. During the lithographic process, the focus needs to be controlled. There is disclosed a method for determining...  
WO/2018/010960A1
A projection optical unit (7) for EUV projection lithography has a plurality of mirrors (M1 to M10) for imaging an object field (4) into an image field (8) with illumination light (3). At least one of the mirrors (M1, M9, M10) is embodie...  
WO/2018/012472A1
The present invention is a radiation sensitive resin composition which contains a polymer, a radiation sensitive acid generator and a solvent, and wherein the polymer has a first structural unit that contains a first acid-cleavable group...  
WO/2018/012534A1
Provided is an infrared LED having an insulating film formed on an element, and a microlens formed on the insulating film, wherein the infrared LED is characterized in that the insulating film and the microlens are formed using a radiati...  
WO/2018/011208A1
An apparatus is provided for texturing or patterning discrete substrates by imprinting a curable lacquer with a discrete flexible stamp and curing the imprinted lacquer resulting in an additional functional textured layer on a discrete s...  
WO/2018/012635A1
A transfer film having: a temporary support body; and a photosensitive resin layer that is disposed on the temporary support body and that contains a polymerizable compound, a compound represented by general formula (I), a compound repre...  
WO/2018/012283A1
Provided is a coating composition which can increase film thickness without increasing the concentration of a film constituent material in a coating liquid and without using an additive such as a thickener. The coating composition is obt...  
WO/2018/012253A1
[Problem] To provide a novel resist underlayer film forming composition which contains a compound having a hydantoin ring. [Solution] A resist underlayer film forming composition which contains: a compound that has at least two substitue...  
WO/2018/010979A1
A method and apparatus are described for providing an accurate and robust measurement of a lithographic characteristic or metrology parameter. The method includes providing a range or a plurality of values for each of a plurality of metr...  
WO/2018/011378A1
The present invention relates to a method for the synthesis of a polyolefin by means of a photoinitiated ROMP reaction involving a cyclic olefin in the presence of a ruthenium-based catalyst of formula (I), in which the catalyst is gener...  
WO/2018/007118A1
An inspection substrate for inspecting a component of an apparatus for processing production substrates, the inspection substrate comprising: a body having dimensions similar to the production substrates so that the inspection substrate ...  
WO/2018/008376A1
The present invention provides a photosensitive composition and an application thereof, the photosensitive composition including structural units derived from a vinyl benzene derivative, structural units having a radical polymerizable gr...  
WO/2018/008364A1
Provided is an optical device capable of highly accurately correcting a shape by suppressing heat generated with shape correction of an optical element. An optical device (10) that deforms a reflecting surface (1a) of a mirror (1) has: a...  
WO/2018/008697A1
In one aspect, the present invention provides a photosensitive resin composition which contains a binder polymer, a photopolymerizable compound and a photopolymerization initiator, wherein the binder polymer contains carboxyl groups, the...  
WO/2018/008610A1
Provided are: a photosensitive composition which is capable of forming a liquid repellent coating film that is free from coating unevenness; a method for producing this photosensitive composition; a method for producing a polymer which e...  
WO/2018/008959A1
The present invention provides an oxime ester phenylcarbazole compound useful as a photoinitiator in a photo-cross-linking reaction and, specifically, has a structure in which a carbon atom double bonded with a nitrogen atom of the oxime...  
WO/2018/008068A1
In a wafer process, polysilicon films (P1, P2) are respectively formed on a wafer (W1) and a monitor wafer (W2) simultaneously and under the same growth conditions. A measurement value is obtained by measuring at least one of the film th...  
WO/2018/007081A1
The invention relates to an optical system, in particular for a microlithographic projection exposure apparatus, with at least one mirror (200) which has an optically effective surface and, for electromagnetic radiation of a predefined o...  
WO/2018/007211A1
A measuring method and a measuring system for interferometrically measuring the imaging quality of an optical imaging system are configured, by adapted design of measurement structures of associated structure carriers, to carry out a wav...  
WO/2018/008366A1
The purpose of the present invention is to provide a holding device advantageous for reducing the effects of gravity deformation of an optical element having a curved surface. Provided is a holding device 110 for holding an optical eleme...  
WO/2018/007108A1
Disclosed is an illumination source for generating measurement radiation for an inspection apparatus. The source generates at least first measurement radiation and second measurement radiation such that the first measurement radiation an...  
WO/2018/007119A1
An inspection substrate for inspecting a component of an apparatus for processing production substrates, the inspection substrate comprising: a body having dimensions similar to the production substrates so that the inspection substrate ...  
WO/2018/008300A1
Provided are: a method for forming a negative resist pattern that has great exposure latitude and little film thinning; and a method for manufacturing an electronic device, said method including the method for forming a negative resist p...  
WO/2018/007498A1
There is disclosed a substrate holder, a method of manufacturing a substrate holder, a lithographic apparatus comprising the substrate holder, and a method of manufacturing devices using the lithographic apparatus. In one arrangement, th...  
WO/2018/007126A1
A method of determining electromagnetic scattering properties of a finite periodic structure has the steps: 1002: Calculating a single-cell contrast current density, within a unit-cell supporting domain of a single one of a finite collec...  
WO/2018/007008A1
The invention relates to a measurement system (10) for determining a wavefront aberration of an optical imaging system (12), comprising an irradiation device (24) for passing measurement radiation (26) through the imaging system (12), an...  
WO/2018/008599A1
Disclosed is a photosensitive conductive film which is provided with a photosensitive resin layer comprising a conductive network formed by using conductive fibers on one primary surface side thereof, wherein the thickness of the photose...  
WO/2018/007098A1
The invention relates to an appliance for the moirĂ© measurement of an optical test object, comprising a grating arrangement made of a first grating (11) which is positionable in the optical beam path upstream of the test object (12) and...  
WO/2018/007273A1
[Problem] To provide a composition, which is a reverse pattern formation composition comprising an aqueous solvent having little influence on a resist pattern, and which is excellent in flatness and filling properties after coating and h...  
WO/2018/007086A1
The invention relates to an optical grating (8) comprising the following: a substrate (9), on the surface (9a) of which a periodic structure (10) is formed that is designed to diffract incident radiation (11), in particular incident EUV ...  
WO/2018/009026A1
Disclosed are a nanoimprint replica mold, a manufacturing method therefor, and a nanoimprint replica mold manufacturing device. The nanoimprint replica mold of the present invention comprises: a base made of a plastic film; a stamping un...  
WO/2018/001652A1
The invention relates to a microlithographic illumination unit for post-exposure of a photoresist provided on a wafer in a microlithography process, having at least one light source (121, 321, 421, 521 ) and a light-guiding and light-mix...  
WO/2018/004678A1
Disclosed herein are systems and methods for treating the surface of a microelectronic substrate, and in particular, relate to an apparatus and method for scanning the microelectronic substrate through a cryogenic fluid mixture used to t...  
WO/2018/000602A1
Provided is a method for exposure/development machining of 3D glass, comprising: first, spray-coating a colored photosensitive ink onto the entire concave surface of a 3D glass; then, feeding a profiled 3D photomask along with the 3D gla...  
WO/2018/005338A1
A nanoimprint lithography method includes disposing a pretreatment composition including a polymerizable component on a substrate to form a pretreatment coating. Discrete imprint resist portions are disposed on the pretreatment coating, ...  
WO/2018/005127A1
A processing system or processing a photosensitive flexographic printing plate having an aqueous-processable photopolymer. A main processing unit is used to develop a relief image by removing unexposed photopolymer using an aqueous proce...  
WO/2018/004646A1
An embodiment includes a system comprising: a photoresist solution; wherein the solution, in equilibrium, comprises: (a)(i) a stabilized metal oxide, (a)(ii) a destabilized metal oxide, and (a)(iii) an organic ligand that is not bonded t...  
WO/2018/003603A1
Provided are: a pellicle film for extreme ultraviolet (EUV), said pellicle film having reduced adhesion of dust and the like; a pellicle frame body; a pellicle; and a method for manufacturing the pellicle. In this method for manufacturin...  
WO/2018/004699A1
Lined photoresist structures to facilitate fabricating back end of line (BEOL) interconnects are described. In an embodiment, a hard mask has recesses formed therein, wherein liner structures are variously disposed each on a sidewall of ...  
WO/2018/001972A1
A method of applying a measurement correction includes calculating a first correction value based on a first coefficient and the measurement; calculating a second correction value based on a second coefficient, greater than the first coe...  
WO/2018/003808A1
The present invention provides a negative photosensitive resin composition which has high dispersion stability of a pigment and is capable of reducing residue in an unexposed portion during the development. The present invention is a neg...  

Matches 1 - 50 out of 175,209