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WO/2022/190706A1 |
The purpose of the present invention is to provide a technique with which it is possible to radiate light from an exposure head to an appropriate position on a substrate mounted on a stage while a driven object such as the stage or an ex...
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WO/2022/184405A1 |
Disclosed is a method for determining a set of correction weights to correct metrology data. The method comprises obtaining first metrology data relating to a plurality of illumination settings of measurement radiation used to perform a ...
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WO/2022/184479A1 |
A method of processing a data set comprising equispaced and/or non-equispaced data samples is disclosed. The method comprises filtering of the data, wherein a kernel defined by a probability density function is convoluted over samples in...
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WO/2022/177854A1 |
A photonic integrated circuit (PIC) system, preferably including a substrate, one or more photonic connections, and a plurality of circuit blocks. The circuit blocks preferably include one or more waveguides that are optically coupled to...
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WO/2022/164113A1 |
The present invention relates to an apparatus and method for aligning a plurality of photomasks for manufacturing a fine metal mask for a large display. More specifically, provided is an apparatus for aligning a plurality of photomasks f...
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WO/2022/161728A1 |
Disclosed is a method for determining a focus actuation profile for one or more actuators of a lithographic exposure apparatus in control of a lithographic exposure process for exposure of an exposure area comprising at least two topogra...
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WO/2022/164123A1 |
The present invention relates to a device and a method for aligning multiple photomasks for manufacturing a fine metal mask for a large-area display and, more specifically, to a device for aligning multiple photomasks for manufacturing a...
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WO/2022/158980A1 |
A grid plate encoder based positioning system (1) for positioning of an element is provided, the positioning system (1) comprises a grid plate (2) with a grid plate surface (21); an encoder unit (3) with one or more optical sensors (31) ...
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WO/2022/156249A1 |
A method for reducing impact of phase grating asymmetry on position measurement precision, comprising the following steps: determining an asymmetry change range according to a design value and processing precision of a phase grating, and...
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WO/2022/158687A1 |
The present invention relates to a fine metal mask for a large-area display and a method for manufacturing same and, more particularly, to a method for manufacturing a fine metal mask which comprises: an effective portion in which a thro...
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WO/2022/144185A1 |
The present disclosure relates to a metrology apparatus for measuring a parameter of interest of a targets on a substrate comprising: m x n detectors, wherein m≥1 and n≥1; a first frame; and (n-1) second frames; and (m-1) x n interme...
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WO/2022/145621A1 |
The present invention addresses the technical problem of providing a method for quickly and accurately processing the volume and position of an ink drop. In order to solve the above problem, a pad for measuring the volumes and positions ...
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WO/2022/135870A1 |
A method includes irradiating a target structure with sequential illumination shots, directing scattered beams from the target structure towards an imaging detector, generating a detection signal using the imaging detector, and determini...
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WO/2022/133638A1 |
Provided are an array substrate, a display panel and an electronic apparatus. The array substrate comprises: a base substrate; a first electrode, which is arranged on the base substrate; a gate line, which is arranged on the base substra...
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WO/2022/127216A1 |
The present disclosure relates to the technical field of micro-nano processing, and provides a double-sided few-layer metasurface device and a processing method therefor. The method comprises: performing etching to make an alignment mark...
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WO/2022/128687A1 |
A method of simulating an electromagnetic response of a metrology target comprising first and second gratings, wherein the second grating is below the first grating, the method comprising: receiving a model defining (i) the first grating...
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WO/2022/129531A1 |
An apparatus for aligning an edge, typically a leading edge of a plate, in particular a printing plate or a printing plate precursor, said apparatus comprising a support (100) configured for supporting the plate on a support surface, and...
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WO/2022/122546A1 |
Disclosed is a method of metrology. The method comprises measuring at least one surrounding observable parameter relating to a surrounding signal contribution to a metrology signal which comprises a contribution to said metrology signal ...
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WO/2022/117325A1 |
Disclosed is an optical imaging system, and associated method, comprising a stage module configured to support an object such that an area of the object is illuminated by an illumination beam; an objective lens configured to collect at l...
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WO/2022/119796A1 |
Embodiments described herein relate to a system, methods, and non- transitory computer-readable mediums that accurately align subsequent patterned layers in a photoresist utilizing a deep learning model and utilizing device patterns to r...
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WO/2022/116959A1 |
A stepping photoetching machine and an operating method therefor, and a photoetching pattern alignment device. A plurality of three-dimensional marks (1201,1221) are set on a wafer (110) to serve as preset coordinates of wafer (110) surf...
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WO/2022/112064A1 |
A metrology or inspection system, a lithographic apparatus, and a method are provided. The system includes an illumination system, an optical system, a first optical device, a second optical device, a detector, and a processor. The optic...
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WO/2022/111967A2 |
Disclosed is a method to determine a performance indicator for a metrology process, comprising obtaining first measurement data relating to a first set of measurement conditions and determining a first measurement recipe based on said fi...
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WO/2022/109411A1 |
An alignment or overlay target that has an optically opaque layer disposed between the top and bottom target structure is measured using opto-acoustic metrology. A classifier library is generated for classifying whether an opto-acoustic ...
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WO/2022/106182A1 |
Disclosed is a metrology system comprising: a pre-alignment metrology tool operable to measure a plurality of targets on a substrate to obtain measurement data; and a processing unit. The processing unit is operable to: process said meas...
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WO/2022/108449A1 |
An alignment system and method for aligning an object (O) having an object marker. An image of the object marker is projected onto an imaging sensor (11) having sensor elements. At least one reference marker is projected onto the imaging...
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WO/2022/101204A1 |
Disclosed is a method for modeling measurement data over a substrate area relating to a substrate in a lithographic process. The method comprises obtaining measurement data relating to said substrate and performing a combined fitting to ...
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WO/2022/096249A1 |
An inspection system, a lithographic apparatus, and a method are provided. The inspection system includes an illumination system, an optical system, a shutter system, an objective system and a detector. The illumination system is configu...
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WO/2022/083954A1 |
A lithographic apparatus is disclosed. The lithographic apparatus comprises a substrate table configured to support a substrate; actuators configurable to move the substrate table in a plane substantially parallel to the surface of the s...
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WO/2022/077941A1 |
A method and device for controlling overlay accuracy. The method comprises: before determining an overlay error compensation value for a current layer, determining whether or not a layer similar to the current layer is present, wherein b...
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WO/2022/069274A1 |
An inspection apparatus for adjusting a working height for a substrate for multiple target heights is disclosed. The inspection apparatus includes a radiation source configured to provide a radiation beam and a beam splitter configured t...
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WO/2022/070886A1 |
A design wiring data acquisition unit (820) acquires design wiring data indicating a design wiring (411D) for connecting an element electrode (311) at a design position (311pd) on a substrate (W) and a connection destination electrode (3...
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WO/2022/057214A1 |
The present application provides an overlay mark, an overlay error measurement method for a wafer, and a wafer stacking method. The overlay mark comprises a first overlay mark on a first layer and a second overlay mark on a second layer,...
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WO/2022/057981A1 |
The invention relates to a device for exposure control in photolithographic direct exposure methods for two-dimensional structures in photo-sensitive coatings and to a method for converting registration data into direct exposure data. Th...
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WO/2022/057735A1 |
Disclosed in the present application are a method for increasing the precision of a flat edge of a semiconductor wafer, and a laser chip. The method comprises: cleaving an obtained epitaxial wafer to obtain at least one cleavage edge; me...
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WO/2022/054544A1 |
A projection exposure device (10) that comprises a mask mark illumination light source (21) that can radiate exposure light or first alignment light (L1) that has the same wavelength as the exposure light at a mask mark (MM), a work mark...
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WO/2022/052598A1 |
An alignment mark evaluation method and an alignment mark evaluation system. The alignment mark evaluation method comprises: setting a process step code of a wafer having an alignment mark to be evaluated as an evaluation code (101); est...
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WO/2022/054724A1 |
This control device, which generates a control signal for controlling a controlled object, comprises a first compensator that generates a first signal on the basis of control deviation of the controlled object, a corrector that generates...
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WO/2022/042034A1 |
A marker coordinates determination method, a marker coordinates determination apparatus, a computer readable medium, and an electronic device, relating to the technical field of semiconductor manufacturing. The marker coordinates determi...
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WO/2022/042966A1 |
A metrology system includes a beam splitter and first and second sensors. The beam splitter splits scattered radiation scattered by a target into first and second portions of radiation. The first sensor receives the first portion. The se...
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WO/2022/033793A1 |
Methods and associated apparatus for identifying contamination in a semiconductor fab are disclosed. The methods comprise determining contamination map data for a plurality of semiconductor wafers clamped to a wafer table after being pro...
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WO/2022/033221A1 |
A semiconductor structure, comprising: several first patterns arranged in a first direction and several second patterns arranged in a second direction which are located in a photoresist layer having a thickness greater than 1.2 um, an an...
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WO/2022/028805A1 |
Method and apparatus for adapting a distribution model of a machine learning fabric. The distribution model is for mitigating the effect of concept drift, and is configured to provide an output as input to a functional model of the machi...
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WO/2022/029939A1 |
Provided is an optical waveguide having little optical loss at a connection portion, in an optical circuit divided into a plurality of sub-circuits. Further provided is a photomask (110) in which a waveguide pattern of an optical circuit...
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WO/2022/022069A1 |
A photolithography alignment method and system. The photolithography alignment method comprises: performing alignment measurement on the surface condition of a wafer to obtain alignment information of the wafer (S110); and dividing, acco...
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WO/2022/023546A1 |
The present invention relates to a method (1700, 1800) for determining an alignment of a photomask (270, 410, 700) on a sample stage (100) which is displaceable along at least one axis that is parallel to a chuck surface (195, 265) of th...
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WO/2022/022949A1 |
Disclosed is a method for focus measurement of a lithographic process. The method comprises receiving a substrate on which a metrology pattern has been printed with a lithographic apparatus with an illumination pupil, illuminating the me...
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WO/2022/012927A1 |
A metrology system comprises a radiation source, an optical element, first and second detectors, an integrated optical device comprising a multimode waveguide, and a processor. The radiation source generates radiation. The optical elemen...
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WO/2022/009456A1 |
This exposure device divides a plurality of exposure target areas arranged along the direction of feeding the substrate 10 into a first exposure target area 22A and a second exposure target area 22B with a division line of a given shape,...
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WO/2022/008160A1 |
Disclosed is an illumination arrangement for spectrally shaping a broadband illumination beam to obtain a spectrally shaped illumination beam. The illumination arrangement comprises a beam dispersing element for dispersing the broadband ...
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