Login| Sign Up| Help| Contact|

Patent Searching and Data


Matches 1 - 50 out of 15,117

Document Document Title
WO/2018/160778A1
A process control system includes a controller configured to generate a reference overlay signature based on one or more overlay reference layers of a sample, extrapolate the reference overlay signature to a set of correctable fields for...  
WO/2018/153711A1
A method, involving determining a first distribution of a first parameter associated with an error or residual in performing a device manufacturing process; determining a second distribution of a second parameter associated with an error...  
WO/2018/153671A1
Methods of measuring variation across multiple instances of a pattern on a substrate or substrates after a step in a device manufacturing process are disclosed. In one arrangement, data representing a set of images is received. Each imag...  
WO/2018/149777A1
The invention concerns a lithography process on a sample (2) comprising at least one structure (1) and covered by at least a lower layer (3) of resist and a upper layer (4) of resist the process comprising: thanks to an optical device (8...  
WO/2018/149779A1
The invention concerns a lithography process on a sample (2) comprising at least one emitter (1), said process comprising : putting at least one layer (3, 4) of resist above the sample (2), exciting one selected emitter (1) with light (1...  
WO/2018/149553A1
Disclosed is a method for monitoring a lithographic process, and associated lithographic apparatus. The method comprises obtaining height variation data relating to a substrate supported by a substrate support and fitting a regression th...  
WO/2018/145972A1
The invention relates to a processing system, in particular an optical processing system, for a substrate body, comprising an exposure system having an exposure unit or a plurality of exposure units, a calibration system having at least ...  
WO/2018/145837A1
Target structures such as overlay gratings (Ta and Tb) are formed on a substrate (W) by a lithographic process. The first target is illuminated with a spot of first radiation (456a, Sa) and simultaneously the second target is illuminated...  
WO/2018/145803A1
A method of controlling a lithographic apparatus to manufacture a plurality of devices on a substrate, the method comprising: obtaining a parameter map representing a parameter variation across the substrate by measuring the parameter at...  
WO/2018/141713A1
There is provided an exposure apparatus comprising a first substrate holder, a second substrate holder, a sensor holder, a projection system, a measurement device and a further measurement device. The first substrate holder is configured...  
WO/2018/144959A1
A multi-column assembly for a scanning electron microscopy (SEM) system is disclosed. The multi-column assembly includes a plurality of electron-optical columns arranged in an array defined by one or more spacings. Each electron-optical ...  
WO/2018/137925A1
A lithographic apparatus is a machine that applies a desired pattern onto a substrate, usually onto a target portion of the substrate. As increasing numbers of layers, using increasing numbers of specific materials, are deposited on subs...  
WO/2018/131742A1
Disclosed are a method for assembling an LM guide using a half division method and a computer-readable recording medium for performing the same method. The disclosed method for assembling an LM guide using a half division method, which a...  
WO/2018/121921A1
Disclosed is a lithographic apparatus and associated method of controlling a lithographic process. The lithographic apparatus comprises a controller configured to define a control grid associated with positioning of a substrate within th...  
WO/2018/121987A1
A method including: subsequent to a first device lithographic step of a device patterning process, measuring a degraded metrology mark on an object and/or a device pattern feature associated with the degraded metrology mark, the degraded...  
WO/2018/114246A2
A method of topography determination, the method including: obtaining a first focus value derived from a computational lithography model modeling patterning of an unpatterned substrate or derived from measurements of a patterned layer on...  
WO/2018/114152A1
Disclosed is a metrology sensor system, such as a position sensor. The system comprises an optical collection system configured to collect diffracted or scattered radiation from a metrology mark on a substrate, said collected radiation c...  
WO/2018/114246A3
A method of topography determination, the method including: obtaining a first focus value derived from a computational lithography model modeling patterning of an unpatterned substrate or derived from measurements of a patterned layer on...  
WO/2018/114206A1
The present invention provides a method, system and program for determining a position of a feature referenced to a substrate. The method comprises measuring a position of the feature, receiving an intended placement of the feature and d...  
WO/2018/111043A1
The present invention relates to a photopolymerizable composition for forming a bezel pattern comprising a colorant, an epoxy compound, an oxetane compound, a photopolymerization initiator, and a solvent having a boiling point of 190 to ...  
WO/2018/110237A1
A positioning device in which a measurement unit includes an illumination unit that illuminates a first original-plate-side mark that is for rough measurement and is arranged on an original plate or on an original plate holding part, a s...  
WO/2018/108499A1
A method for monitoring a characteristic of illumination from a metrology apparatus, the method comprising: using the metrology apparatus to acquire a pupil image at different focus settings of the metrology apparatus; and calculating an...  
WO/2018/105658A1
A proximity exposure apparatus is provided with: a plane mirror (68) having a mirror transformation unit (70) capable of correcting the curvature thereof; a CCD camera (30) capable of capturing images of a mask M-side alignment mark (Ma)...  
WO/2018/104039A1
An overlay measurement (OV) is based on asymmetry in a diffraction spectrum of target structures formed by a lithographic process. Stack difference between target structures can be perceived as grating imbalance (GI), and the accuracy of...  
WO/2018/099348A1
A focusing and leveling device for calculating the defocusing amount and/or tilt amount of a substrate (60), comprising a lighting unit, a projection marking plate (10) with a projection slit marker, a projection imaging group (20), a re...  
WO/2018/086852A1
A measurement system is disclosed in which a first optical system splits an input radiation beam into a plurality of components. A modulator receives the plurality of components and applies a modulation to at least one of the components ...  
WO/2018/086825A1
A method of determining an optimal operational parameter setting of a metrology system is described. Free-form wafer shape measurements are performed (304). A model is applied (306), transforming the measured warp to modeled warp scaling...  
WO/2018/082892A1
A lithographic apparatus (LA) applies a pattern to a substrate (W). The lithographic apparatus includes a height sensor (LS), a substrate positioning subsystem, and a controller configured for causing the height sensor to measure the hei...  
WO/2018/077587A1
A scanning exposure of a plurality of target regions on a substrate is performed such that an image of each of a plurality of markers is formed on each of the plurality of target regions. Each of the plurality of markers is of a form suc...  
WO/2018/069015A1
A method for selecting an optimal set of locations for a measurement or feature on a substrate includes: (302): Defining constraints, and optionally cost function(s). (306): Defining a first candidate solution of locations. (308): Defini...  
WO/2018/065167A1
Method of measuring a height profile of one or more substrates is provided comprising measuring a first height profile of one or more fields on a substrate using a first sensor arrangement, the first height profile being the sum of a fir...  
WO/2018/065222A1
A method of performing a lithographic exposure of a substrate, the substrate being held on a substrate table, the substrate table comprising a cooling system operative to cool the substrate table, the method comprising performing an alig...  
WO/2018/065157A1
An alignment system configured to be substantially insensitive to thermal variations in its system during alignment measurements. The alignment system includes a sensor system, a support structure, a sensing element, a position measureme...  
WO/2018/061945A1
A measuring system (5001) to be used on the production line of a micro device is independently provided from an exposure apparatus. The measuring system (5001) is provided with: a plurality of measuring apparatuses (1001-1003), which res...  
WO/2018/062491A1
This movable body device for moving a substrate (P) is provided with: a substrate holder (32) which holds the substrate (P) and which can move in the X axis and the Y axis directions; a Y coarse movement stage (24) which can move in the ...  
WO/2018/062487A1
This movable body device is provided with: a substrate holder (32) which holds a substrate (P) and which can move in the X axis and the Y axis directions; a Y coarse movement stage (24) which can move in the Y axis direction; a first mea...  
WO/2018/059824A1
A method including evaluating a plurality of substrate measurement recipes for measurement of a metrology target processed using a patterning process, against stack sensitivity and overlay sensitivity, and selecting one or more substrate...  
WO/2018/051744A1
The present invention pertains to a detection device (25) for detecting the positions of marks on movable objects (3, 4a). The detection device (25) has: a control unit (24) that has a function as a specifying means for specifying the ti...  
WO/2018/046279A1
A method, including printing an apparatus mark onto a structure while at least partly within an apparatus. The structure is part of, or is located on, a substrate table, but is separate from a substrate to be held by the apparatus. Measu...  
WO/2018/041550A1
A method including performing a first simulation for each of a plurality of different metrology target measurement recipes using a first model, selecting a first group of metrology target measurement recipes from the plurality of metrolo...  
WO/2018/041440A1
An alignment sensor in a lithographic apparatus comprises an optical system (500; 600) configured to deliver, collect and process radiation selectively in a first waveband (e.g. 500-900 nm) and/or in a second waveband (e.g. 1500-2500 nm)...  
WO/2018/038612A1
A distance sensor (1) for estimating a distance to a surface (OS) of an object (O), the distance sensor including a micro electric mechanical system (MEMS) (5), a detection means (30) and a processing device (40). The MEMS comprises a ME...  
WO/2018/038071A1
A measuring system (500) to be used on a micro device manufacturing line is provided with: a plurality of measuring devices (1001-1003) which measure substrates, respectively; and a control device (530) capable of controlling the measuri...  
WO/2018/034380A1
The present invention relates to a high-performance mask aligner stage levelling apparatus having improved levelling maintenance force and, specifically, to an advanced concept technology for preventing the crookedness of levelling by se...  
WO/2018/033499A1
A method of determining the position of an alignment mark (29) on a substrate, the alignment mark (29) comprising a first segment (29a) and a second segment (29b), the method comprising illuminating the alignment mark with radiation, det...  
WO/2018/028880A1
The invention relates to a method for recovering alignment marks in a mark layer of a substrate, comprising the steps of: a) providing a substrate with a mark layer covered by a resist layer; b) forming alignment marks in the mark layer,...  
WO/2018/026378A1
A method of patterning with imprint lithography, a stamp for imprint lithography, an imprint roller of a roll-to-roll substrate processing apparatus, and a substrate processing apparatus are described. The method includes providing a lay...  
WO/2018/025515A1
Provided is a measuring device that measures the surface height distribution of a substrate having a surface whereon the height variation along one direction is greater than the height variation along the other direction in mutually diff...  
WO/2018/019265A1
An apparatus and a method for measuring an amplitude of a scanning reflector are provided. The apparatus for measuring an amplitude of a scanning reflector comprises: a light source (20) configured to output an optical signal, an apertur...  
WO/2018/019496A1
A method of determining topographical variation across a substrate on which one or more patterns have been applied. The method includes obtaining measured topography data representing a topographical variation across a substrate on which...  

Matches 1 - 50 out of 15,117