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WO/2013/084651A1 |
The present invention addresses the problem of enabling a detailed inspection of a specimen and preventing a distortion of an observation image even when a specimen containing an insulating material is partially charged. For a scanning i...
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WO/2013/080543A1 |
An ion beam generator (1) according to an embodiment of the present invention comprises: a plasma generating unit which generates plasma in a discharge tank (3); an extraction electrode (7) which is provided so as to face a predetermined...
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WO/2013/081647A1 |
An ion implantation system for improving performance and extending lifetime of an ion source is disclosed whereby the selection, delivery, optimization and control of the flow rate of a co-gas into an ion source chamber is automatically ...
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WO/2013/077483A1 |
The variable ion guide can include: a variable chamber having the length thereof adjusted in one direction; one or more guide electrodes connected to the variable chamber and having the position thereof determined through the adjustment ...
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WO/2013/077555A1 |
The present invention relates to an electron cyclotron resonance (ECR) ion source apparatus and to a method for boosting extraction current. The electron cyclotron resonance ion source apparatus includes: a plasma chamber in which plasma...
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WO/2013/067851A1 |
A method for modulating arc current balancing of a double-filament ion source comprises a filament power supply 1 (1), a filament power supply 2 (2), a bias power supply 1 (3), a bias power supply 2 (4), an arc voltage power supply (5), ...
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WO/2013/057824A1 |
Provided is a laser ionization mass analysis device capable of highly sensitive analysis of a polymeric material, and capable of providing high selectivity in mass spectra and polymer types. A laser ionization mass analysis device that i...
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WO/2013/054799A1 |
Provided is a charged particle beam microscope which has an emitter tip exhibiting a small mechanical oscillation amplitude, is capable of producing ultra-high resolution sample observation images, and eliminates blurring in the sample o...
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WO/2013/055523A2 |
An ion beam source that emits an ion beam in a direction of a substrate is provided. A cathode with a discharge opening defined therein is included. An anode is also included and spaced apart from the cathode. Ions are set to be emitted ...
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WO/2013/043794A2 |
A liquid metal ion source, as well as a related system and method are disclosed. The liquid metal ion source can include a sputter shield that is made of alloy, a sputter shield configured to have a positive voltage applied thereto, and/...
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WO/2013/035411A1 |
The purpose of the present invention is to provide an emitter in which there is no ion extraction voltage fluctuation such that the axis adjustment of an ion optical system is needed even if regeneration treatment of an apex part is repe...
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WO/2013/035221A1 |
A conventional gas ionization chamber had a problem that because a reduction in the gas pressure was the only way to avoid a glow discharge, an ion current could not be increased by raising the gas introduction pressure. The purpose of t...
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WO/2013/031777A1 |
The purpose of the present invention is to provide an ion source from which highly pure polyvalent ions can be taken out. This ion source (10) comprises: a target (12) that, when irradiated with a laser (13), generates a plasma (14) in w...
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WO/2013/016061A1 |
A system for producing a charged particle beam from a photoionized cold atom beam. A vapor of neutral atoms is generated. From these atoms, an atom beam having axial and transverse velocity distributions controlled by the application of ...
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WO/2013/013086A1 |
Disclosed is a surge protection system for use with an ion source assembly. The system comprises a high voltage power source coupled in series with a thermionic diode or a thermionic triode and an ion source assembly. The high voltage po...
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WO/2013/011657A1 |
Provided are: an ion beam generating apparatus, which is provided with a movable member (for instance, a plug (205)), and is capable of reducing formation of a film attached to a side wall (205b) of the member, even if an electrode of a ...
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WO/2012/151639A1 |
A plasma micro-thruster, including: an elongate and substantially non-conductive tube having a first end to receive a supply of propellant gas, and an open second end to act as an exhaust; first, second, and third electrodes extending ci...
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WO/2012/138482A1 |
An ion implantation system (200) comprises a plasma source (204) for providing plasma (140) and a workpiece holder (210) arranged to receive a bias with respect to the plasma to attract ions across a plasma sheath toward the substrate. T...
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WO/2012/102139A1 |
A method for treating a metal film that utilizes a gas cluster beam to treat a metal film (72) formed on a surface of an object to be treated (W). A gas cluster beam is formed by adiabatically expanding a mixed gas comprising an oxidatio...
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WO/2012/096966A2 |
There is provided a high power laser system for powering a remotely located laser device, such as an ROV, using a photo-conversion device, such as a laser photovoltaic assembly. Laser device systems, such as ROV systems that utilizes a h...
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WO/2012/091851A2 |
An implantation system includes an ion extraction plate having a set of apertures configured to extract ions from an ion source to form a plurality of beamlets. A magnetic analyzer is configured to provide a magnetic field to deflect ion...
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WO/2012/091715A1 |
An exemplary ionization window assembly includes a support layer having a thickness between a first side and a second side. There is at least one opening in the support layer extending between the first and second sides. The opening has ...
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WO/2012/084968A1 |
The present invention relates to an electron cyclotron resonance ionization device (100, 100', 200, 200') comprising: a sealed vacuum chamber (2) intended to contain a plasma (15, 15'); means for injecting (12, 16) an electromagnetic wav...
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WO/2012/086419A1 |
Provided is a charged particle emission gun with which chip cleaning can be performed for a long period without stopping operation of the charged particle emission gun and without heating the chip. The charged particle emission gun is pr...
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WO/2012/080650A1 |
The invention relates to an electron cyclotron resonance ion source device comprising: a plasma chamber (1) intended to contain a plasma; means (5) for transmitting a high-frequency wave into the chamber; means (4) for generating a magne...
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WO/2012/057107A1 |
Provided is a laser ion source which generates ions by the illumination of a laser beam, comprising: an evacuated container (110); an illumination box (120) which is positioned within the container (110) and wherein a target (121), which...
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WO/2012/042143A1 |
The invention relates to a method and device for forming a plasma beam. According to the invention: the quality of the electroneutrality of the plasma beam (PB) is detected (in 12 and/or 13); and the alternating polarisation potentials o...
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WO/2012/044977A2 |
An inductively coupled plasma ion source for a focused ion beam (FIB) system is disclosed, comprising an insulating plasma chamber with a feed gas delivery system, a compact radio frequency (RF) antenna coil positioned concentric to the ...
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WO/2012/027123A1 |
An apparatus includes an arc chamber housing (203) defining an arc chamber (204), and a feed system (210) configured to feed a sputter target (212) into the arc chamber. A method includes feeding a sputter target into an arc chamber defi...
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WO/2012/017789A1 |
Provided is a gas field ionization ion source having a high emission angle current density. At least the base body of an emitter chip constituting the gas field ionization ion source is a single crystal metal. The tip of the emitter chip...
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WO/2011/155917A1 |
An ion source includes an arc chamber having an extraction aperture, and a plasma sheath modulator. The plasma sheath modulator is configured to control a shape of a boundary between plasma and a plasma sheath proximate the extraction ap...
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WO/2011/140492A2 |
A system and method is disclosed for extracting a sample from a sample surface. A sample is provided and a sample surface receives the sample which is deposited on the sample surface. A hydrophobic material is applied to the sample surfa...
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WO/2011/133817A1 |
An ion transfer tube having an ion inlet and an ion outlet is characterized by: a first tube member comprising an electrically resistive material and having a first end comprising the ion inlet and a second end; a first electrode electri...
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WO/2011/132767A1 |
Disclosed is a gas field ionization source (GFIS) that enables the inclination of an emitter chip to be adjusted, and the operation of which is stable and low cost. The gas field ionization source (GFIS) comprises a support body having a...
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WO/2011/122687A1 |
A liquid metal ion source 10 consists of a needle electrode 11 which is made from two metal wires 11a and 11b arranged in parallel with their outer surfaces being in contact with each other. The needle electrode 11 has a guide passage 11...
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WO/2011/119849A1 |
Suspended nanotubes are used to capture and ionize neutral chemical units, such as individual atoms, molecules, and condensates, with excellent efficiency and sensitivity. Applying a voltage to the nanotube(s) (with respect to a groundin...
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WO/2011/114832A1 |
The disclosed electron generation method is provided with: a first introduction step for introducing argon to the inside of a housing (10); an evacuation step for evacuating the inside of the housing (10); and an electron discharge step ...
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WO/2011/111343A1 |
Provided is an ion-beam generating apparatus, wherein uniform substrate processing is made possible by dispersing ion beams pulled out from a plasma chamber, and reducing deviation in the directions of ion beams entering a substrate. Ion...
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WO/2011/106768A1 |
A mass spectrometer system is provided that is configurable for operation in both a Kinetic Energy Discrimination (KED) and Dynamic Reaction Cell (DRC). A pressurized or collision cell included in the mass spectrometer encloses a quadrup...
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WO/2011/096227A1 |
In order to provide a safe and environmentally-friendly charged gas particle microscope that exhibits a superior ionized gas-utilization efficiency and economic efficiency, the gas field ionization ion source of a charged particle micros...
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WO/2011/081927A1 |
Herein an improved technique for generating uniform ion beam is disclosed. In one particular exemplary embodiment, the technique may be realized as a method for processing a substrate with an ion implanter comprising an ion source. The m...
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WO/2011/055521A1 |
Provided is a mechanism whereby an ion irradiation system can be made more compact, the length of the ion optics can be reduced, and the direction in which ions are discharged from an emitter tip (21) toward a sample can be adjusted accu...
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WO/2011/055047A1 |
The invention relates to an aqueous composition used in the laser repair treatment of fibrous connective tissue, including: gold nanoparticles in a concentration of between 1.5 x 109 particles per ml and 1 x 1010 particles per ml; and al...
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WO/2011/051481A1 |
An innovative device is proposed for the radiological treatment of tumours, in particular per irradiating a surgical site according to the so-called IORT (Intra- Operative Radiological Therapy) technique. It operates with a not excessive...
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WO/2011/046116A1 |
Disclosed is a gas field ionization ion source that can emit, with a high luminance, heavy ions which are suitable for processing a sample. The gas field ionization ion source is provided with a temperature control unit which separately ...
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WO/2011/046897A1 |
Certain embodiments described herein are directed to devices that can be used to align the components of a source assembly in a source housing. In some examples, a terminal lens configured to couple to the housing through respective alig...
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WO/2011/037488A1 |
A plasma ion source comprises a cathode chamber (1) including a gas-inlet branch pipe (2). A hollow anode (3) forms an anode chamber (4). An emission electrode (11) of an ion extraction system is arranged in an outlet of the anode chambe...
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WO/2011/035260A2 |
An ion beam system uses a separate accelerating electrode, such as a resistive tube, to accelerate the ions while maintaining a low electric field at an extended, that is, distributed, ion source, thereby improving resolution. A magneto-...
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WO/2011/028863A1 |
The invention provides improvements in reagents for use in electron transfer dissociation ionization techniques for use in mass spectrometry, particularly for sequencing peptides and proteins using mass spectrometric techniques involving...
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WO/2011/007546A1 |
Provided is an ion-beam generating device that can achieve high-precision uniformity in substrate processing, and reduction in power consumption, without having a substrate-rotating mechanism installed. The ion-beam generating device (1a...
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