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WO/2006/093076A1 |
A small ion source excellent in operability. The ion source comprises a tubular insulation tube (2) opened upward and opened at part of its lower surface, a plurality of hollow, tubular permanent magnets (3) provided on the outer periphe...
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WO/2006/085576A1 |
A thermal electrode for generating ions by spraying steam or gas containing atoms to be ionized onto the surface thereof. A thermal electrode (1) constituted of layers of metal sheets each having a plurality of openings significantly inc...
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WO/2006/075691A1 |
With respect to the plasma source of contact ionization method for use in the production of endohedral fullerene, etc., it is common practice to jetting a metal vapor as ion generation object against a heated flat disc-shaped metal body ...
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WO/2006/070744A1 |
A charged particle generator having a structure hardly causing electric discharge to the outside and an accelerator having such a charged particle generator and an acceleration tube. The charged particle generator (1) comprises a first b...
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WO/2006/065520A2 |
An apparatus for use in atmospheric pressure ionization includes a sample receiving chamber, a sample droplet source communicating with the sample receiving chamber, an outlet conduit, and a boundary. The outlet conduit defines a samplin...
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WO/2006/055296A2 |
In certain example embodiments of this invention, there is provide an ion source including an anode (25) and a cathode (5). In certain example embodiments, the cathode does not overhang over the anode, or vice versa. Since no, or fewer, ...
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WO/2006/047609A2 |
An ionizer (640, Fig.10) for forming a gas-cluster ion beam is disclosed (Fig. 10) including inlet and outlet ends partially defining an ionization region traversed by a gas-cluster jet and one or more plasma electron source(s) (642) for...
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WO/2006/042740A2 |
A process is disclosed for sterilising ambient air conducted in an air duct (401), as well as a use of a device for breaking down gaseous hydrocarbon emissions in order to sterilise ambient air conducted in an air duct (104), and a devic...
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WO/2006/040850A1 |
An easy-to-manufacture multivalent ion generation source exhibiting excellent operability and maintainability while having a high degree of ionization and a high beam intensity, and a charged particle beam apparatus employing it. The mul...
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WO/2006/019489A1 |
An engine power booster comprises an electronic voltage generator (106) that converts the direct current (DC) battery voltage of a vehicle at a power input, into an AC ripple voltage of 2.8-5.0 kV peak-to-peak at 2.4-14.0 kHz, that inclu...
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WO/2005/122265A2 |
A field emission ion source has nanostructure materials on at least an emitting edge of the anode electrode. Metal is transferred from a metal reservoir to the emitting edge of the anode, where the metal is transferred to an emitting end...
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WO/2005/119732A2 |
The charged-particle beam system includes a non-axisymmetric diode (2) that forms a non-axisymmetric beam (8) having an elliptic cross-section. A focusing element utilizes a magnetic field for focusing and transporting the non-axisymmetr...
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WO/2005/117080A1 |
Disclosed is a plasma generator which is capable of efficiently generating both molecular ions and atomic ions by using a single ion source. By providing a channel for passing a refrigerant through and a heater for heating in a part of o...
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WO/2005/114701A2 |
A releasable anode liner that is fitted within the interior of the anode of an ion source. The cover permit; electrons to be projected into the anode wherein any insulating deposits adhere to the interior of the anode liner, thereby incr...
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WO/2005/114691A2 |
Charged droplet spray is formed from a solution with all or a portion of the charged droplet spray current generated from reduction or oxidation (redox) reactions occurring on surfaces removed from the first or sample solution flow path....
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WO/2005/094389A2 |
A new method and system for desorption ionization is described and applied to the ionization of various compounds, including peptides and proteins present on metal, polymer, and mineral surfaces. Desorption electrospray ionization (DESI)...
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WO/2005/093777A2 |
The invention relates to methods of controlling the effect of ions of an ionisable source gas that can react with interior surfaces of an arc chamber, by introducing ions of a displacement gas into the arc chamber, where the displacement...
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WO/2005/091990A2 |
Apparatus and methods for improving processing of workpieces with gas-cluster ion beams and modifying the gas-cluster ion energy distribution in the GCIB. In a reduced-pressure environment, generating an energetic gas-cluster ion beam an...
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WO/2005/089459A2 |
Apparatus and methods for improving beam stability in high current gas-cluster ion beam systems by reducing the frequency of transients occurring in the vicinity of the ionizer through use of shielding conductors and distinct component e...
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WO/2005/081285A1 |
The present invention relates to a steel fiber, attached to a charge tube of a high voltage generator, for increasing anions emitted when charged, and an ozoneless/NOxless anion lamp using the same comprising: a steel fiber for increasin...
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WO/2005/069904A2 |
One embodiment of the present invention provides a system for ionizing airborne particulates. The system includes an insulating substrate and a first electroplated structure on the insulating substrate. This first electroplated structure...
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WO/2005/050694A2 |
A metal ion emission device for emitting a metal ion by applying voltage to a molten liquid metal, characterized inthat the device for emitting a metal ion comprises a needle-like part having holes in which the liquid metal can be moved,...
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WO/2005/048290A2 |
An ion source for use in a mass spectrometer includes an electron emitter assembly (30) configured to emit electron beams, wherein the electron emitter assembly comprises carbon nanotube bundles fixed to a substrate for emitting the elec...
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WO/2005/048286A1 |
The invention relates to a device for producing ion beams for processing product surfaces and for coating said surfaces and, more specifically to ion beam sources provided with a closed electron drift which makes it possible to produce a...
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WO/2005/045419A2 |
Provided are MALDI ion sources, methods of forming ions and mass analyzer systems. In various embodiments, provided are MALDI ion sources configured to irradiate a sample on a sample surface with a pulse of laser energy at angle within 1...
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WO/2005/046296A2 |
The invention relates to a device which is used to control the electronic temperature in an ECR plasma chamber (1). The inventive device comprises at least one moderator (100) which is placed on the path of electrons having an energy gre...
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WO/2005/045874A1 |
A gridless ion source operates from a control system (201) that generates an anode voltage (215) comprising a mains rectified signal such that the anode voltage modulates between a first voltage above a threshold and a second voltage bel...
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WO/2005/045877A1 |
In a gridless ion source, there is provided a cathode system having dual thermionic filaments (515, 516). The first filament (515) is operated at an electron emission temperature to provide a source of electrons to the ion source. The st...
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WO/2005/038849A1 |
An ion source (100) for producing a beam of ions from a plasma is disclosed. A plasma is created at the centre of an anode (112) by collisions between energetic electrons and molecules of an ionizable gas. The electrons are sourced from ...
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WO/2005/031788A2 |
The invention provides a system (10) and a method for controlling a source (20) of liquid metal ions, the source comprises a tip a first electrode (30) and a second electrode (40), the method includes the steps of : (i) maintaining the f...
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WO/2005/029532A2 |
The invention relates to a mass spectrometer comprising an ion source for producing a primary ion beam, which has a heatable ion emitter coated by a liquid-metal layer, which is essentially comprised of pure metallic bismuth or of a low-...
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WO/2005/027191A2 |
An ion source is provided, which generates or emits an ion beam which may be used to deposit a layer on a substrate, or to perform other functions. The ion source includes at least one anode and at least one cathode. In certain example e...
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WO/2005/024880A2 |
A cold-cathode closed-drift ion source includes an anode (25), a cathode (5) and a power supply. In certain example embodiments, neither the positive nor negative terminals of the power supply are connected to ground (GND), and the anode...
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WO/2005/022577A2 |
The invention adds one or more surface contour(s) (84) to the bombarded area(s) (84) within ion columns (22) to greatly reduce the back sputtered material (88) that will reach the ion source (24). A number of different surface contours (...
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WO/2005/017943A2 |
An RF-driven plasma source, including a pair of spaced-apart plasma electrodes, wherein the electrodes act as plates of a capacitor, the gas electrically discharges and creates a plasma of both positive and negative ions, in a clean proc...
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WO/2005/010911A2 |
An ion source design and manufacturing techniques allows longitudinal cathode expansion along the length of the anode layer source (ALS) (300). Cathode covers (304) are used to secure the cathode plates (302) to the source body assembly ...
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WO/2004/114354A2 |
A magnetic deflector for an ion beam is disclosed and comprises first and second coils. The coils are positioned above and below the beam, respectively, and extend along a width of the beam. Current passes through the coils to generate a...
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WO/2004/109784A1 |
An ion doping system comprising a chamber (11), a section (13) for exhausting gas in the chamber, an ion source (12) that is disposed in the chamber, includes an inlet (14) for introducing a gas containing an element to be doped, a filam...
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WO/2004/079765A2 |
A radio-frequency quadrupole ion guide (14) having a symmetrical magnetic field (22) disposed along an axis of the ion guide (20), wherein the system (10) provides prolonged interaction between electrons and uncharged compounds within an...
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WO/2004/057643A2 |
The invention relates to a liquid-metal ion source comprising an electro-conductive housing (2) which is preferably made of metal and provided with a hollow space (4) for liquid or fusable metal (3), preferably indium, or a metal alloy. ...
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WO/2004/048964A1 |
The present invention relates to a pyro-electric electron source, comprising a hermetic chamber (1), provided with at least a beryllium window (3) and internally containing a crystal (2) of pyro-electric material arranged in front of sai...
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WO/2004/038754A2 |
A method and/or system for cleaning an ion source is/are provided. In certain embodiments of this invention, both the anode and cathode of the ion source are negatively biased during at least part of a cleaning mode. Ions generated are d...
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WO/2004/026448A1 |
The present invention provides an apparatus and method for use with a mass spectrometer. The multimode ionization source (2) of the present invention provides one or more atmospheric pressure ionization sources (3, 4). These sources may ...
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WO/2004/027813A1 |
System (350) and method of gas-cluster ion beam processing is realized by incorporating improved beam and workpiece neutralizing components (122). Larger GCIB current transport is enabled by low energy electron neutralization of space ch...
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WO2003100806A9 |
An indirectly heated cathode ion source includes an arc chamber housing that defines an arc chamber, an indirectly heated cathode and a filament for heating the cathode. The cathode may include an emitting portion having a front surface,...
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WO/2004/019462A1 |
A negative ion generator (10) comprising a needle electrode (2), a counter electrode (3), an insulator (4), a supporting member (5), a power supply circuit (6), and wiring (7, 8). The counter electrode (3) is covered by the insulator (4)...
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WO/2004/015735A2 |
An ion source (2) is disclosed having an elongated slit (18) for providing a ribbon ion beam for use in an ion implantation system. The source comprises a coaxial inductive coupling antenna (20) for RF excitation of plasma within a cylin...
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WO/2004/015737A1 |
Ion implantation systems and beamlines therefor are disclosed, in which a ribbon beam of a relatively large aspect ratio is mass analyzed and collimated to provide a mass analyzed ribbon beam for use in implanting one or more workpieces....
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WO/2004/006284A1 |
A RF sensor for sensing and analyzing parameters of plasma processing. The RF sensor is provided with a plasma processing tool and an antenna for receiving RF energy radiated from the plasma processing tool. The antenna is located proxim...
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WO/2004/006280A2 |
A wafer support for an ion implanter includes a wafer holder and a support arm for the holder in the implant chamber. A portion of the support arm adjacent the wafer holder is at least intermittently exposed to the ion beam during implan...
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