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WO/2011/155917 |
An ion source includes an arc chamber having an extraction aperture, and a plasma sheath modulator. The plasma sheath modulator is configured to control a shape of a boundary between plasma and a plasma sheath proximate the extraction ap...
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WO/2011/139909 |
An electromagnetic field generator includes a semiconductive material shaped to form a complex electromagnetic field including a magnetic field and an electric field. An instrument includes a passage configured such that charged particle...
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WO/2011/140492 |
A system and method is disclosed for extracting a sample from a sample surface. A sample is provided and a sample surface receives the sample which is deposited on the sample surface. A hydrophobic material is applied to the sample surfa...
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WO/2011/133817 |
An ion transfer tube having an ion inlet and an ion outlet is characterized by: a first tube member comprising an electrically resistive material and having a first end comprising the ion inlet and a second end; a first electrode electri...
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WO/2011/132767 |
Disclosed is a gas field ionization source (GFIS) that enables the inclination of an emitter chip to be adjusted, and the operation of which is stable and low cost. The gas field ionization source (GFIS) comprises a support body having a...
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WO/2011/122687 |
A liquid metal ion source 10 consists of a needle electrode 11 which is made from two metal wires 11a and 11b arranged in parallel with their outer surfaces being in contact with each other. The needle electrode 11 has a guide passage 11...
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WO/2011/119849 |
Suspended nanotubes are used to capture and ionize neutral chemical units, such as individual atoms, molecules, and condensates, with excellent efficiency and sensitivity. Applying a voltage to the nanotube(s) (with respect to a groundin...
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WO/2011/114832 |
The disclosed electron generation method is provided with: a first introduction step for introducing argon to the inside of a housing (10); an evacuation step for evacuating the inside of the housing (10); and an electron discharge step ...
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WO/2011/111343 |
Provided is an ion-beam generating apparatus, wherein uniform substrate processing is made possible by dispersing ion beams pulled out from a plasma chamber, and reducing deviation in the directions of ion beams entering a substrate. Ion...
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WO/2011/106768 |
A mass spectrometer system is provided that is configurable for operation in both a Kinetic Energy Discrimination (KED) and Dynamic Reaction Cell (DRC). A pressurized or collision cell included in the mass spectrometer encloses a quadrup...
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WO/2011/096227 |
In order to provide a safe and environmentally-friendly charged gas particle microscope that exhibits a superior ionized gas-utilization efficiency and economic efficiency, the gas field ionization ion source of a charged particle micros...
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WO/2011/081927 |
Herein an improved technique for generating uniform ion beam is disclosed. In one particular exemplary embodiment, the technique may be realized as a method for processing a substrate with an ion implanter comprising an ion source. The m...
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WO/2011/055521 |
Provided is a mechanism whereby an ion irradiation system can be made more compact, the length of the ion optics can be reduced, and the direction in which ions are discharged from an emitter tip (21) toward a sample can be adjusted accu...
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WO/2011/055047 |
The invention relates to an aqueous composition used in the laser repair treatment of fibrous connective tissue, including: gold nanoparticles in a concentration of between 1.5 x 109 particles per ml and 1 x 1010 particles per ml; and al...
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WO/2011/051481 |
An innovative device is proposed for the radiological treatment of tumours, in particular per irradiating a surgical site according to the so-called IORT (Intra- Operative Radiological Therapy) technique. It operates with a not excessive...
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WO/2011/046897 |
Certain embodiments described herein are directed to devices that can be used to align the components of a source assembly in a source housing. In some examples, a terminal lens configured to couple to the housing through respective alig...
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WO/2011/046116 |
Disclosed is a gas field ionization ion source that can emit, with a high luminance, heavy ions which are suitable for processing a sample. The gas field ionization ion source is provided with a temperature control unit which separately ...
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WO/2011/037488 |
A plasma ion source comprises a cathode chamber (1) including a gas-inlet branch pipe (2). A hollow anode (3) forms an anode chamber (4). An emission electrode (11) of an ion extraction system is arranged in an outlet of the anode chambe...
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WO/2011/035260 |
An ion beam system uses a separate accelerating electrode, such as a resistive tube, to accelerate the ions while maintaining a low electric field at an extended, that is, distributed, ion source, thereby improving resolution. A magneto-...
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WO/2011/035260 |
An ion beam system uses a separate accelerating electrode, such as a resistive tube, to accelerate the ions while maintaining a low electric field at an extended, that is, distributed, ion source, thereby improving resolution. A magneto-...
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WO/2011/035260 |
An ion beam system uses a separate accelerating electrode, such as a resistive tube, to accelerate the ions while maintaining a low electric field at an extended, that is, distributed, ion source, thereby improving resolution. A magneto-...
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WO/2011/028863 |
The invention provides improvements in reagents for use in electron transfer dissociation ionization techniques for use in mass spectrometry, particularly for sequencing peptides and proteins using mass spectrometric techniques involving...
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WO/2011/007546 |
Provided is an ion-beam generating device that can achieve high-precision uniformity in substrate processing, and reduction in power consumption, without having a substrate-rotating mechanism installed. The ion-beam generating device (1a...
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WO/2011/006109 |
A microwave charged particle source is provided according to various embodiments of the invention. The microwave charged particle source can include a coaxial antenna for generating microwaves and a dielectric layer surrounding the anten...
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WO/2011/006109 |
A microwave charged particle source is provided according to various embodiments of the invention. The microwave charged particle source can include a coaxial antenna for generating microwaves and a dielectric layer surrounding the anten...
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WO/2011/001051 |
The invention relates to a device for generating a magnetic field so as to be able to create closed isomodule surfaces and to do so in the context of planar symmetry and cusp magnetic structures. The invention also relates to an ECR (Ele...
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WO/2011/001051 |
The invention relates to a device for generating a magnetic field so as to be able to create closed isomodule surfaces and to do so in the context of planar symmetry and cusp magnetic structures. The invention also relates to an ECR (Ele...
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WO/2011/001051 |
The invention relates to a device for generating a magnetic field so as to be able to create closed isomodule surfaces and to do so in the context of planar symmetry and cusp magnetic structures. The invention also relates to an ECR (Ele...
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WO/2011/001797 |
Provided is a gas field ionization ion source device which is small in size, has high performance, and is capable of performing a tilt adjustment with the tip position of an emitter maintained approximately constant. The emitter (1) is s...
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WO/2011/001600 |
Provided are a large-current and highly stable gas field ionization ion source, and a high-resolution ion microscope with a large focal depth. In an ion microscope provided with a gas field ionization ion source, a refrigerator for cooli...
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WO/2010/151523 |
In an ion implanter, a Faraday cup is utilized to receive an ion beam generated during ion source cleaning. The detected beam has an associated mass spectrum which indicates when the ion source cleaning process is complete. The mass spec...
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WO/2010/141763 |
Disclosed herein are systems and methods for mass spectrometry using laserspray ionization (LSI). LSI can create multiply-charged ions at atmospheric pressure for analysis and allows for analysis of high molecular weight molecules includ...
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WO/2010/137476 |
Disclosed is a liquid metal ion gun (3) comprising a liquid metal ion source (31) having a reservoir (36) which is formed of tungsten (W) and holds liquid metal gallium (Ga) and an emitter (35) formed of W, and a beam limiting aperture (...
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WO/2010/132069 |
An isotope generation apparatus (20) is disclosed including: an ion beam source (10) of any of the types described herein; an extractor (59) for extracting the ion beam (56) from the confinement region, where the beam includes a portion ...
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WO/2010/132068 |
An ion source (10) is disclosed including: a chamber (30) disposed about a longitudinal axis (A) and containing a gas, a magnetic confinement system (36, 38) configured to produce a magnetic field in a confinement region within the chamb...
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WO/2010/093943 |
The invention relates generally to sample ionization, and provides ionization probe assemblies, systems, computer program products, and methods useful for this purpose.
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WO/2010/084167 |
The invention relates to a surface ionization gas detector (10) comprising an ionization area (12), over which an analysis gas can be conducted, and further comprising at least one detection device for detecting analysis gas ions, wherei...
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WO/2010/082466 |
Provided is an ion beam device provided with a gas electric field ionization ion source which can prevent an emitter tip from vibrating in a non-contact manner. The gas electric field ionization ion source is comprised of an emitter tip ...
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WO/2010/081465 |
The invention relates to a molding compound-enclosed power semiconductor element, wherein a power semiconductor is surrounded with metal contacts guided to the outside of a molded module in enveloping syringes by being encased with therm...
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WO/2010/069213 |
A surface ionization detector comprises an emitter, a heating rod, a collecting electrode, a diameter-changing connecting lining tube and a house. The emitter is made of molybdenum, platinum or alloy, and winds cylindrically or spirally....
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WO/2010/065170 |
This disclosure describes a multibeam doubly convergent electron gun. Two or more beamlets can be run parallel to the axis at a prescribed radius to produce sufficient current to drive the VED. In order to obtain sufficient cathode surfa...
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WO/2010/057463 |
The invention relates to an ion drive (1) for a spacecraft, comprising a high frequency generator (4) for generating an alternating electromagnetic field for the ionization of a propellant and an acceleration system (7) for the charge ca...
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WO/2010/043831 |
The invention relates to a plasma source including a first rod (3) forming a quarter-wave antenna, surrounded by at least one parallel rod forming a coupler (6, 7, 8) and which is substantially the same length as the first rod, set to a ...
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WO/2010/040805 |
An apparatus (900) and methods are disclosed for ion beam extraction. In an implementation, the apparatus includes a plasma source (or plasma) (802) and an ion extractor (804). The plasma source is adapted to generate ions and the ion ex...
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WO/2010/039675 |
A heated DESI spray device provides improved resolution or control of analyte desoiption at a target locus on a sample. Heating controls spot size and enhances resolution in an imaging mode without impairing signal level. Additionally or...
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WO/2010/029929 |
Provided is an ion irradiation device (10) wherein an intermediate electrode (24) having a voltage slightly lower than that of an ionizing chamber (31) is arranged between the ionizing chamber (31) and an extraction electrode (25), and t...
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WO/2010/029270 |
This device (2) for generating an ion beam (4), which includes a liquid metal ion source (18), is characterized in that the ion source is surrounded by a cryogenic trap (28) maintained at a low temperature, this cryogenic trap being capa...
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WO/2010/029269 |
The invention relates to a device (2) for generating an ion beam (4), comprising a support (6), an ion source (18), this ion source having a lower end (8) connected to the support (6) and an upper end (10) opposite the lower end (8), and...
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WO/2010/025211 |
Ion microscope methods and systems are disclosed. In general, the systems and methods provide high ion beam stability. In a method an ion beam is formed using a gas field ion source having a tip operating at voltage that is at least 5% g...
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WO/2010/025211 |
Ion microscope methods and systems are disclosed. In general, the systems and methods provide high ion beam stability.
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