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Matches 1 - 50 out of 6,486

Document Document Title
WO/2018/188804A1
The invention concerns a method for implanting multiply-charged ions on a surface of an object to be treated (30), this method comprising the step consisting of directing a beam (12) of multiply-charged ions produced by an electron cyclo...  
WO/2018/185987A1
The present invention provides a technique for reducing the amount of an intermediate product adhering to a supply-side front end part and the inner wall surface of a gas supply pipe as much as possible, said intermediate product being p...  
WO/2018/181410A1
Provided is a focused ion beam device in which first maintenance processing is carried out every time a predetermined first time-period passes. The first maintenance processing causes a first heating device to raise the temperature of an...  
WO/2018/158329A1
The invention provides an electron- impact ion source device having high brightness as compared to known Nier-type ion sources, while providing similar advantages in terms of flexibility of the generated ion species, for example. The ion...  
WO/2018/144348A1
A miniature Hall current plasma source apparatus having magnetic shielding of the walls from ionized plasma, an integrated discharge channel and gas distributor, an instant-start hollow cathode mounted internally to or on the surface of ...  
WO/2018/140118A1
An ion source having dual indirectly heated cathodes is disclosed. Each of the cathodes may be independently biased relative to its respective filament so as to vary the profile of the beam current that is extracted from the ion source. ...  
WO/2018/135153A1
The objective of the present invention is to address the problem that a small-sized ion source does not allow dense ions to be generated efficiently when an electron beam irradiation method is used on a vaporization source for vaporizing...  
WO/2018/097263A1
Provided is an arc vaporization source capable of increasing reaching efficiency, at which charged particles emitted from a target reach a subject. An arc vaporization source 1A that supplies charged particles toward a predetermined base...  
WO/2018/087594A1
An ion source is provided that includes a gas source for supplying a gas, and an ionization chamber defining a longitudinal axis extending therethrough and including an exit aperture along a side wall of the ionization chamber. The ion s...  
WO/2018/049370A1
An ion pulse generator (100) includes a triboelectric generator (110), an ion emitter (132) and a conductive surface (134). The triboelectric generator (110) includes a first electrode (114), a spaced apart second electrode (120) and a f...  
WO/2018/026786A1
Various examples related to a deployable gridded ion thruster are described. A deployable gridded ion thruster can include: a thruster body including an ion generating unit; and an expandable discharge chamber configured to expand from a...  
WO/2018/022482A1
A low temperature plasma probe, a mass spectrometry system, and a method for using a low temperature plasma probe are described. In an embodiment, a low temperature plasma probe includes an intake capillary that provides an ion flow from...  
WO/2018/011946A1
In order to provide an ion milling device in which it is possible to minimize contamination of a beam-forming electrode, this ion milling device is provided with: an ion gun (101) that includes a beam-forming electrode for forming ion be...  
WO/2018/007136A1
The invention relates to an ion microscopy device having an ion source for generating an ion beam, a detector, a voltage source and a photon pulse generator, wherein the ion microscopy device is designed to irradiate an object with the i...  
WO/2018/005707A1
Functional components of spacecraft structures can be subject to detrimental impacts by energetic particles produced from an electric propulsion system. A graphene coating applied to a functional component can maintain electrical conduct...  
WO/2018/004880A1
A vaporizer with several novel features to prevent vapor condensation and the clogging of the nozzle is disclosed. The vaporizer is designed such that there is an increase in temperature along the path that the vapor travels as it flows ...  
WO/2018/004878A1
An ion source having improved life is disclosed. In certain embodiments, the ion source is an IHC ion source comprising a chamber, having a plurality of electrically conductive walls, having a cathode which is electrically connected to t...  
WO/2017/214718A3
Methods and systems are provided for ionizing molecules for the purpose of analysis by mass spectrometry, in which gaseous material from a sample substrate is generated using laser desorption. The laser is provided having a pulse range o...  
WO/2017/211627A1
The invention relates to a device and to a method for generating, storing, and liberating ions from a residual gas atmosphere, comprising an electron source for liberating electrons, an anode that is permeable to the electrons liberated ...  
WO/2017/176843A1
A thrust producing system includes an RF ion thruster with a discharge chamber having a gas inlet and an outlet, and a coil about the discharge chamber. The system further includes an RF cathode proximate the discharge chamber outlet of ...  
WO/2017/176675A1
An arc chamber has a liner having a recessed surface and a hole having a first diameter. The liner has a lip extending upwardly from the surface toward the surface that surrounds the hole and has a second diameter. An electrode has a sha...  
WO/2017/168167A1
A method of and apparatus for ionising molecules, the method comprising passing a solution (20) containing the molecules through an electrospray emitter which has a potential difference applied thereto, in order to create a jet (23) of s...  
WO/2017/160481A1
An electron impact ion beam source is provided with a pressure chamber to confine a specific high pressure area within excited gas to a small enough volume that the source can be operated at relatively high pressure and still achieve sub...  
WO/2017/153680A1
A device for modulating the intensity of a charged particle beam emitted along an axis (A0), comprising: 4xN consecutive deflection systems (21, 22, 23, 24), with N = 1 or 2, the deflection systems (21, 22, 23, 24) being positioned along...  
WO/2017/134817A1
The objective of this invention is to decrease damage to a sample surface during beam irradiation, improve beam stability, and improve focusing capabilities which affect observation resolution and machinable width in observing or machini...  
WO/2017/131895A1
The IHC ion source comprises an ion source chamber having a cathode and a repeller on opposite ends. The repeller is made of two discrete parts, each comprising a different material. The repeller includes a repeller head, which may be a ...  
WO/2017/127525A1
An ion source has an arc chamber having an arc chamber body. An electrode extends into an interior region of the arc chamber body, and a cathode shield has a body that is cylindrical having an axial hole. The axial hole is configured to ...  
WO/2017/123438A1
An ion implanter may include an electrostatic clamp to hold a substrate; a plasma flood gun generating a flux of electrons impinging upon the substrate; and a controller coupled to the plasma flood gun and including a component generatin...  
WO/2017/100393A3
Disclosed are methods for the surface cleaning and passivation of PV absorbers, such as CdTe substrates usable in solar cells, and devices made by such methods. In some embodiments, the method involves an anode layer ion source (ALIS) pl...  
WO/2017/089699A1
The present invention relates to a method for ionising argon, as well as, in particular, to a propulsion method and a surface treatment method implementing the method of the invention. The present invention also relates to a device for i...  
WO/2017/083516A1
An elongate insulator (302). The insulator may be positioned between the apertured ground electrode (308) and apertured suppression electrode (306) of an ion source. The insulator has an elongate body having a first end (316) and a secon...  
WO/2017/079588A1
An ion source liner 204 comprises a plate having an exposure surface. The plate comprises a hole and a lip 234 surrounding the hole and extending outward from the exposure surface, and optionally a recess having a second surface recessed...  
WO/2017/072434A1
The invention concerns a device for producing an amorphous carbon layer by electron cyclotron resonance plasma, the device comprising: - a plasma chamber (3); - means for conveying a gas (4), - a magnetic mirror (15), - a waveguide (5) e...  
WO/2017/069912A1
An indirectly heated cathode (IHC) ion source having improved life is disclosed. The IHC ion source comprises a chamber having a cathode and a repeller on opposite ends of the ion source. Biased electrodes are disposed on one or more sid...  
WO/2017/066023A1
Provided herein are approaches for controlling an ion beam within an accelerator/decelerator. In an exemplary approach, an ion implantation system includes an ion source for generating an ion beam, and a terminal suppression electrode co...  
WO/2017/064299A1
The invention refers to a method for generating an ultrashort ion bunch (22) comprising the steps of emitting a laser pulse (16) whose length is four periods or less, preferably one period, and whose power is 1 PW or more, preferably 10 ...  
WO/2017/051469A1
The purpose of the present invention is to provide an ion milling device in which the trajectory of an observation electron beam emitted from an electron microscope column can be prevented from being shifted. The ion milling device is pr...  
WO/2017/040359A1
A solution-cathode glow discharge (SCGD) spectrometry apparatus may comprise an SCGD source and a mass or ion mobility spectrometer. A method for ionizing a molecular analyte may comprise contacting the molecular analyte with a plasma di...  
WO/2017/029742A1
This ion beam device suppresses variations in ion release currents by cleaning the interior of a chamber without wearing the emitter electrode. This ion beam device contains a GFIS 1 comprising: an emitter electrode 21 having a needle-sh...  
WO/2016/201253A1
Embodiments related to the use and production of porous carbon materials in ion emitters and other applications are described.  
WO/2016/201253A8
Embodiments related to the use and production of porous carbon materials in ion emitters and other applications are described.  
WO/2016/189614A1
The present invention addresses the problem of providing: an ion milling device (100) capable of treating a deposited material adhered on an ion gun (1); and an ion milling method capable of treating the deposited material adhered on the...  
WO/2016/170703A1
To improve maintainability of an ion beam extraction electrode. An ion beam extraction electrode (E) is equipped with: an electrode unit (1) that is provided with openings which ion beams pass through; and a supporting frame (11) that fi...  
WO/2016/147232A1
Provided is a grid that is readily machined, wherein the likelihood of a protruding portion of carbon fiber being formed on the wall surface of a hole during machining of the hole is low. The plate-shaped grid (200) has holes (202), the ...  
WO/2016/148608A1
The invention relates to sources of broadband optical radiation with high spectral brightness, and is of interest for use in the fields of microelectronics, spectroscopy and photochemistry, amongst others. The technical result of the cla...  
WO/2016/142481A1
The invention relates to a novel ion source, which uses method for the production of highly charged ions in the local ion traps created by an axially symmetric electron beam in the thick magnetic lens. The highly charged ions are produce...  
WO/2016/138547A1
The invention relates to an ion implanter which comprises at least one component of a refractory metal of the group W, W alloy, Mo and Mo alloy. The surface of said component comprises, at least in sections, a layer that is formed, at le...  
WO/2016/129026A1
This mirror ion microscope comprises: irradiation optics (5, 7, 8) for irradiating onto a sample (9) an ion beam generated by a gas electric field ionization ion source (1); an electric potential control unit for controlling a positive e...  
WO/2016/126518A1
An apparatus to control an ion beam for treating a substrate. The apparatus may include a fixed electrode configured to conduct the ion beam through a fixed electrode aperture and to apply a fixed electrode potential to the ion beam, a g...  
WO/2016/110505A3
The invention relates to a device for the extraction of electrical charge carriers from a charge carrier generation space, comprising at least one electrode assembly (1a) for the extraction of charge carriers, the at least one electrode ...  

Matches 1 - 50 out of 6,486