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Patent Searching and Data


Matches 501 - 550 out of 3,739

Document Document Title
WO/1984/001673A1
An overvoltage protector in an apparatus having two moving parts (1, 5). The parts are in mutual communication via a bearing (2, 3, 4), one part being stationary in relation to a substructure (13) at an electrical earth potential. The mo...  
WO/1982/004350A1
Thermionic cathode (12) for a plasma ion source (10) has tungsten wire (64) advanced by wheels (56) from supply (50) to take-up spool (58). In chamber (48), the active cathode region (64) acts with anode (16) to supply electrons for ioni...  
WO/1981/003579A1
The electronic gun intended for the shaping of materials, particularly for the production of printing blocks, comprises a heated cathode (1), a perforated anode (3) and an auxiliary electrode (2) brought to a negative potential higher th...  
WO/1981/001220A1
A means is provided for compensating for spherical aberration in charged particle beam devices. The means includes a sextupole (22) positioned between two focusing lenses (18, 24).  
WO/1981/000929A1
The cathode (2) of an electron beam source (1) for an electron beam apparatus consists of a metal wire with a transverse profile which is flattened at the emission side in order to reduce the directional spread in an electron beam to be ...  
WO/1980/000282A1
A gun for a linear-beam electron tube has a control grid (40) for modulating the beam current which consists of an array of conductive web elements (50, 52) whose spacing from each other is much larger than their spacing from the concave...  
JP6590811B2  
JP6573099B2  
JP6571907B1
An electron gun is provided with the following. A cathode which has an electron emission part, A drawer electrode which pulls out an electron emitted from the electron emission part, A convergence electrode as which an electron pulled ou...  
JP6521500B2  
JP2019057385A
To enable an ion source 101 mounted on an ion source support base X to assume a lain posture in a stable condition.There is provided an ion source support base X on which an ion source 101 comprising a long-shaped plasma generation conta...  
JP6462805B2  
JP2018190709A
To provide a compact magnet for deflection and focusing of electrons and ion beams.A particle beam device including a magnet includes: a particle beam source configured to emit electrons and ion beams; a plurality of yokes arranged in a ...  
JP2018032861A
To provide an electron gun thermionic cathode for electron beam lithography having favorable performance over improved lifetime for a longer period.A cathode formation body 20 is provided including: a thermionic cathode having an emissio...  
JP2016110827A5  
JP6208371B2  
JP2017523562A
Ion source chamber 132 for an ion implantation system has the surface by which texture processing was carried out, in order to reduce surface exfoliation of a film on an inner wall of an ion source chamber. Remaining stress which arose b...  
JP6135827B2  
JPWO2016104484A1
At a vacuum room (1), it counters mutually, an emitter (3) and a target (7) are arranged, and the perimeter side of an electron generation part (31) of an emitter (3) is equipped with a guard electrode (5). An emitter (3) is supported to...  
JP6087961B2  
JP2017501553A
A negative pole main part (22) which has stored the discharge surface (32) where a boundary was appointed by the periphery of discharge (35) for the present invention to emit electrons to a longitudinal direction (Z), In order to converg...  
JP2016186876A
To enhance the reliability of an ion source.An ion source 10 includes: a plasma chamber 12 having an ion extraction part 22 provided with an extraction opening 24, and a sidewall 20 extending in the axial direction from the ion extractio...  
JP2016139536A
To provide a technique advantageous in replacement and positioning of a charged particle source.Supporting equipment supports a charged particle source 106 replaceably and includes: a holding part 103 selectively holding the charged part...  
JP2016110827A
To convey an ion source while surely bringing it into a stable state.The ion source comprises: a housing 10 including an ion lead-out opening O; an electrode hold member 50 which is connected to the housing 10 and holds a plurality of el...  
JP2015116490A
To provide an electron beam sterilizing device which enables adequate and uniform irradiation of all surfaces of a package which has a neck portion where a cap is located, a tapering shoulder portion, and a body portion terminated by a b...  
JP5650461B2  
JP5519789B2  
JP5425753B2  
JP5333708B2
A system for inhibiting the transport of contaminant particles with an ion beam includes a pair of electrodes that provide opposite electric fields through which the ion beam travels. A particle entrained in the ion beam is charged to a ...  
JP5296821B2
A confocal laser scanning microscope acquires confocal images of a sample. The microscope is provided with an optical-microscope optical system which acquires non-confocal images of the sample by detecting measurement light coming from t...  
JP5171977B2  
JP5168528B2  
JP5168532B2  
JP5159011B2  
JP5059903B2  
JP5027507B2  
JP5026858B2  
JP4991539B2  
JP4976344B2  
JP4928506B2  
JP4900620B2  
JP2012504980A
An electron beam sterilization device is provided with an electronic generating filament (110), a grid (114a, b) connected to a source of voltage, a beam molding machine (128), and an output window (118). A source of the high voltage gen...  
JP4869573B2  
JP4863599B2  
JP4855428B2  
JP4854711B2  
JP4854691B2  
JP4850542B2
An energy ray generating device (1a) comprises an electron gun (2), a vacuum vessel (3), and an outgoing window forming part (10a or 10b). The electron gun (2) comprises a resin member (4), a case (5), a connector (6), a filament (7), an...  
JP4830217B2  
JP4826871B2  

Matches 501 - 550 out of 3,739