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JP2007511881A |
Provided are a field emission device and a field emission display device using the same. The field emission device includes a cathode portion having a substrate, a cathode electrode formed on the substrate, and a field emitter connected ...
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JP3913282B2 |
To provide a collimating extraction grid conductor to reduce divergence of an electron beam, and a method for focusing an electron source. An electron source assists in focusing an electron beam emitted from the electron source by using ...
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JP3906207B2 |
The channel spark source assembly, to generate a stable and bundled electron beam (2), has a sleeve (21) in the hollow cathode (1) as an open cone towards the anode (17), away from the trigger plasma side, as a component part of the holl...
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JP3904628B2 |
To improve response time of a field emission device and provide a display apparatus with high performance. A field emission device 100 is constituted of an electron emitter 101 for radiating electrons, an extracting electrode 102 install...
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JP3900792B2 |
To stably actuate a smaller-sized magnetic field superposed electron gun, having an electric field of an electrostatic lens and a magnetic field of an electromagnetic lens which are superposed with each other. A magnetic pole, forming th...
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JP3902230B2 |
An electron source includes a negative electron affinity photocathode on a light-transmissive substrate and a light beam generator for directing a light beam through the substrate at the photocathode for exciting electrons into the condu...
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JP3898243B2 |
To provide a micro chip for field-effect electron emission that is capable of uniform electron emission and can be produced with high yield even in large scale application by utilizing etching rate differences and internal stress differe...
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JP2007501391A |
A nanostructured optical device includes a metal film or a plurality of metal islands having an array of a plurality of openings having a width that is less than at least one first predetermined wavelength of incident radiation to be pro...
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JP3862344B2 |
To provide an electrostatic lens that can focus charged particle beams of high energy with low voltage and low chromatic ascertain by providing accelerating electrodes for accelerating incident charged corpuscular beams generated from a ...
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JP2006527473A |
The invention relates to an electrostatic deflection system for deflecting an electron beam ( 132 ), and to a matrix display device provided with such an electrostatic deflection system. The deflection system has deflectors ( 112, 114 ) ...
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JP3844253B2 |
A particle-beam column comprising a needle-type ions source (1) such as a liquid metal ion source, one or more round lenses (2), and a plurality of interleaved quadrupole lenses (14, 16). Also an ion-beam column comprising a liquid alloy...
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JP2006524895A |
A field emission device ( 1 ) may be used for emitting electrons in, for example, a field emission display (FED). Field emission tips ( 40 ) are used for the emitting of electrons in the field emission device ( 1 ). In operation of the f...
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JP2006286618A |
To provide an electron emission element capable of improving display quality by suppressing expansion of an electron beam by realizing an even potential distribution around a gate electrode during the operation of the electron emission e...
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JP3824637B2 |
A gated field-emission structure contains a emitter electrode (46), an overlying electrically insulating layer (48, and one or more electron-emissive elements (52) situated in one or more apertures extending through the insulating layer....
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JP3823537B2 |
To provide a field emission cathode equipped with focusing electrodes, capable of increasing the aspect ratio of an electron beam spot. This field emission cathode has extraction electrodes 1 each formed in a rectangular shape and the in...
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JP3824528B2 |
To obtain a multibeam scanning optical system capable of obtaining a good beam pitch and capable of suppressing the occurrence of an abnormal image such as an image of uneven density. The multibeam scanning optical system is provided wit...
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JP3825038B2 |
To improve resolution and color purity of a display device by focusing emitted electron beams. A gate control type field emission structure comprises an emitter electrode (46), an electric insulating layer (48) to form the upper layer, a...
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JP2006244980A |
To provide an electron emission element for improving display characteristics, by suppressing the emission of electrons from an electron emission substance staying on a focusing electrode, and to provide a method for manufacturing the el...
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JP3819800B2 |
To make smaller an aperture of a gate hole formed by a photolithography with a photomask analyzer in a field emission element, reduce reactive power between a cathode conductor and a gate, and heighten withstand voltage. The cathode cond...
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JP3817498B2 |
To provide a probe for a near field light capable of generating the near field light efficiently, and generating deformation hardly under a production process, under use or the like, a method for generating the near field light using the...
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JP3816428B2 |
To provide a field emitter tip that is capable of maintaining an optimal performance by reducing the effect of contaminant or the like. This is an improved spinned type field emitter tip (1410) and a method for manufacturing this field e...
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JP3808530B2 |
To limit the change rate of an anode current to prevent an arc discharge between the anode and an emitter, by connecting an inductor in series between the anode and a voltage source. A cathode 14 on a base plate 11 composed of glass or S...
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JP3800040B2 |
To prevent distortion when making the negative electrode smaller of an electron beam spot in an electron gun provided with an electric field emission negative electrode. The negative electrode 15 is that which is provided with an electro...
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JP2006185648A |
To provide a method and a device for accelerating an electron flow to a desired speed by using a cathode easily broken by an electric field and by applying a high electric field.A low electric field electron emitting part in which the ca...
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JPWO2004088703A1 |
An object of the present invention is to provide a cold cathode electron source capable of achieving both high frequency and high output, a microwave tube using the same, and a method for manufacturing the same. In the cold cathode elect...
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JP3792126B2 |
A miniaturized terahertz radiation source based on the Smith-Purcell effect is provided, in which, from a focused electron source, a high-energy bundle of electrons is transmitted at a defined distance over a reflection diffraction grati...
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JP3793219B2 |
To provide a structure of an electron emission device having high packing density of an emitter and to provide its manufacturing process. An electron emission property element suitable for a flat panel type display is manufactured by hig...
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JP3777735B2 |
To provide a field emission cold cathode in which a high density electron current can be obtained, and of which manufacture is easy. Plural micro-field emission cathodes are disposed as concentric circles on a substrate, and rings of def...
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JP3774682B2 |
To enhance the convergency of an electron beam in an electron emission element which is formed by stacking a cathode electrode, an insulating layer, and a gate electrode, and in which a through hole is formed by removing a part of the ga...
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JP2006514773A |
A matrix display device comprises cavities ( 20 ) having walls at least one of which is covered with a material ( 24 ) having a secondary emission coefficient of more than unity. The cavities form a planar arrangement substantially paral...
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JP2006512753A |
The present invention provides a new extractor for a micro-column and an alignment method of the aperture of the extractor and an electron emitter for a micro-column. Further, the present invention provides a measuring system, a method f...
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JP3764906B2 |
To make the electron emission quantities of respective emitters uniform and prevent line defect even if a gate electrode and an emitter are short circuited. The degree of electron movement of a channel formed on a channel forming electro...
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JP2006510905A |
A method and apparatus for focusing ions for delivery to an ion detection device using an aerodynamic ion focusing system that uses a high-velocity converging gas flow at an entrance aperture to focus an ion plume by reducing spreading a...
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JP3757156B2 |
To provide an inductive coupling high-frequency electron source for reduced power requirement. The inductive coupling high-frequency electron source comprises a plasma chamber 1 where an open section is provided at least to a first end, ...
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JP2006508549A |
A beam blanker array includes a base plate, a plurality of conductor pads, and a ground plate. The conductor pads are arranged in a one-dimensional array on the base plate. The ground plate is coupled to the base plate over the plurality...
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JP2006040835A |
To reduce loss of electron beams, enhance electron beam density, realize compactness, and enable a high speed treatment in an electron beam irradiation device having a plane type electron beam source.In this electron beam irradiation dev...
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JP3742447B2 |
To provide an electron source constructed of emitters having almost equal ballast resistance values. In a display element 10, emitters 34, 36, 37, 38, 41, 42, 43, 44, 46, 47 are spaced equally from a meander conductor 26. The meander con...
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JP2006503299A |
A single, hard-mounted set of optics is utilized to replace a two field-of-view system for directed countermeasures. It includes within one continuous but distorted field of view the capability to detect, acquire and characterize targets...
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JP2006502538A |
The invention relates to a field emission device, and a method of manufacturing same. The field emission device comprises a gate electrode ( 140, 340, 440 ) which is provided with a pattern of electron passing apertures ( 135, 335, 435 )...
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JP3734173B2 |
To enable a deflection by a required high-perveance beam by limiting an eddy current induced at a beam line to a restrictive value. A deflection device for a high-perveance ion beam is made to have a magnetic structure acting at a fundam...
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JP2006500741A |
System and method of gas-cluster ion beam processing is realized by incorporating improved beam and workpiece neutralizing components. Larger GCIB current transport is enabled by low energy electron neutralization of space charge of the ...
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JP2005352440A |
To provide the adjustment method of scanning timing and beam quantity by which the manufacturing process is comparatively simplified and the manufacturing cost is reduced without using an expensive fθ lens, and to provide a scanner empl...
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JP2005353923A |
To provide a low cost optical module wherein an LD and a surface incident photoreceptor for monitoring the optical output from the LD are mounted on the same substrate.Wiring 14a-c, 15 for driving the LD 11 and the photoreceptor 12 are f...
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JP2005351839A |
To obtain tomographic image equipment which dispenses with a drive mechanism for moving a reference mirror and can accurately detect the amplitude of an interference signal, while having very simple constitution.An interferometer device ...
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JP2005347232A |
To provide an electron emission element preventing static charge from being stored on a surface of an insulating layer without increasing the number of components.By providing: cathode electrodes 6 being first electrodes formed on a subs...
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JP2005345378A |
To provide a small-sized inexpensive photodetector capable of simply displaying the presence of weak fluorescence or the like which produces a change by the irradiation of a sample with light.A microplate reader 1 is equipped with one li...
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JP2005537619A |
A display device has a display screen for displaying image information, and cathode means comprising an emitter material for emitting electrons. The emitted electrons are collected by an electron concentrator which redistributes the elec...
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JP2005340194A |
To provide a field emission element and a field emission display element applied with it.The field emission element comprises a substance layer which is formed on a glass substrate and has a concave shape portion, a cathode electrode for...
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JP3723577B2 |
An electron beam device has a cathode that generates a fan-shaped electron beam. A first focusing lens includes first and second plates on opposed sides of a filament. The edges of the plates closest to a positively charged anode are arc...
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JP2005317535A |
To provide an electron emitting element whereby deterioration of landing characteristics of emitted electrons classified by each coloring matter due to dislocation of the alignment of a first substrate and a second substrate which is cau...
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