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Matches 651 - 700 out of 3,742

Document Document Title
JP3959081B2
To significantly improve problems of a filed emission element in a conventional technique such as a gate leakage current, electron discharge caused by an anode voltage and spreading of electron beams. The device includes a cathode part w...  
JP3953958B2
The invention relates to an actuating and sensing device for scanning probe microscopes. The actuating and sensing device includes a tuning fork (21) containing two prongs, connection means (23), e.g. a spring means, and a probing tip (2...  
JP2007193950A
To provide a hollow cathode discharge gun capable of maintaining discharge for a long time and having the stable discharge maintaining property. The hollow cathode discharge gun comprises a metal tube including a hollow forming a dischar...  
JP3937907B2
To provide a cold-cathode electric field electron emission display device capable of suppressing an abnormal increase of electric potential for a convergent electrode even when an abnormal discharge occurs. This cold-cathode electric fie...  
JP3936682B2
To provide a high-density information recording medium with which a probe and recording medium are non-contact and information can be recorded, reproduced and erased even if low electric fields are impressed thereto, and to provide an in...  
JP3934837B2
To provide an open-type X-ray generation apparatus aiming at the improvement of manipulability in a type enabling exchange a filament part. In this open-type X-ray generation apparatus 1, for dispensing with a high-tension cable for impr...  
JP3934836B2
To provide a nondestructive inspection device on which an open-type X-ray generation apparatus with an exchangeable filament part can be installed stably. In order to dispense with a high-voltage cable for improving manipulatability, a m...  
JP2007511881A
The present invention is a cathode part equipped with a substrate, the cathode electrode formed on this board, and the electric-field emitter connected to this cathode electrode, and a form which encloses the above-mentioned electric-fie...  
JP3913282B2
To provide a collimating extraction grid conductor to reduce divergence of an electron beam, and a method for focusing an electron source. An electron source assists in focusing an electron beam emitted from the electron source by using ...  
JP3906207B2  
JP3904628B2
To improve response time of a field emission device and provide a display apparatus with high performance. A field emission device 100 is constituted of an electron emitter 101 for radiating electrons, an extracting electrode 102 install...  
JP3900792B2
To stably actuate a smaller-sized magnetic field superposed electron gun, having an electric field of an electrostatic lens and a magnetic field of an electromagnetic lens which are superposed with each other. A magnetic pole, forming th...  
JP3902230B2  
JP3898243B2
To provide a micro chip for field-effect electron emission that is capable of uniform electron emission and can be produced with high yield even in large scale application by utilizing etching rate differences and internal stress differe...  
JP2007507064A
Creation and the method of operation of the equipment for operating ion using the method for operating ion using a two-dimensional substantial quadrupole field, equipment, and a two-dimensional substantial quadrupole field are explained....  
JP2007501391A
The optical element of nano structure includes the metal film or two or more metal islands which have an array of two or more openings which has the width of less than the 1st predetermined wavelength of at least one of the incidence rad...  
JP3862344B2
To provide an electrostatic lens that can focus charged particle beams of high energy with low voltage and low chromatic ascertain by providing accelerating electrodes for accelerating incident charged corpuscular beams generated from a ...  
JP2006527473A
The present invention relates to the electrostatic deviation system for deflecting an electron beam (132), and the matrix display device provided with such an electrostatic deviation system. The deviation system has the deflecting system...  
JP2003504803A5  
JP2006525644A
[Subject] Obtain a uniform beam, in order [in a target] to obtain uniform medication distribution substantially. [Solution means] The present invention makes manufacture of a semiconductor device easy by covering the ion beam 208 whole (...  
JP3844253B2  
JP2006524895A
Electrolysis discharge equipment (1) is used, for example in an electrolysis discharge type display (FED) in the case of electron emission. An electrolysis discharge tip part (40) is used for the electron emission of electrolysis dischar...  
JP2006286618A
To provide an electron emission element capable of improving display quality by suppressing expansion of an electron beam by realizing an even potential distribution around a gate electrode during the operation of the electron emission e...  
JP3824637B2  
JP3823537B2
To provide a field emission cathode equipped with focusing electrodes, capable of increasing the aspect ratio of an electron beam spot. This field emission cathode has extraction electrodes 1 each formed in a rectangular shape and the in...  
JP3824528B2
To obtain a multibeam scanning optical system capable of obtaining a good beam pitch and capable of suppressing the occurrence of an abnormal image such as an image of uneven density. The multibeam scanning optical system is provided wit...  
JP3825038B2
To improve resolution and color purity of a display device by focusing emitted electron beams. A gate control type field emission structure comprises an emitter electrode (46), an electric insulating layer (48) to form the upper layer, a...  
JP2006520918A
The liquid lens by the principle of electro wetting is used for a pickup system which affects the optic axis of a pickup system. Especially the optical division portion in the seal state of having the 1st side part and 2nd side part that...  
JP2006244980A
To provide an electron emission element for improving display characteristics, by suppressing the emission of electrons from an electron emission substance staying on a focusing electrode, and to provide a method for manufacturing the el...  
JP3819800B2
To make smaller an aperture of a gate hole formed by a photolithography with a photomask analyzer in a field emission element, reduce reactive power between a cathode conductor and a gate, and heighten withstand voltage. The cathode cond...  
JP3817498B2
To provide a probe for a near field light capable of generating the near field light efficiently, and generating deformation hardly under a production process, under use or the like, a method for generating the near field light using the...  
JP2006520078A
The source of a charged particle for the present invention to generate the charged particle beam to emit, The convergence means for making this charged particle beam to emit refracted and the lens array which has two or more lenses are p...  
JP3816428B2
To provide a field emitter tip that is capable of maintaining an optimal performance by reducing the effect of contaminant or the like. This is an improved spinned type field emitter tip (1410) and a method for manufacturing this field e...  
JP2006519462A
[Subject] It improves so that cleaning more sufficient than before by the emitter module which carries out beam emission of the charged particle of use to a major application may be enabled. [Solution means] The charged particle beam emi...  
JP3808530B2
To limit the change rate of an anode current to prevent an arc discharge between the anode and an emitter, by connecting an inductor in series between the anode and a voltage source. A cathode 14 on a base plate 11 composed of glass or S...  
JP3800040B2
To prevent distortion when making the negative electrode smaller of an electron beam spot in an electron gun provided with an electric field emission negative electrode. The negative electrode 15 is that which is provided with an electro...  
JP2006185648A
To provide a method and a device for accelerating an electron flow to a desired speed by using a cathode easily broken by an electric field and by applying a high electric field.A low electric field electron emitting part in which the ca...  
JPWO2004088703A1
An object of this invention is to provide a source of a cold cathode electron where coexistence of high-frequency-izing and a high increase in power was achieved, a microwave tube using this, and a manufacturing method for the same. In t...  
JP3792126B2  
JP3793219B2
To provide a structure of an electron emission device having high packing density of an emitter and to provide its manufacturing process. An electron emission property element suitable for a flat panel type display is manufactured by hig...  
JP3777735B2
To provide a field emission cold cathode in which a high density electron current can be obtained, and of which manufacture is easy. Plural micro-field emission cathodes are disposed as concentric circles on a substrate, and rings of def...  
JP3774682B2
To enhance the convergency of an electron beam in an electron emission element which is formed by stacking a cathode electrode, an insulating layer, and a gate electrode, and in which a through hole is formed by removing a part of the ga...  
JP2006514773A
Matrix display equipment has a cavity (20) which has the wall covered with the material (24) into which at least one has a larger secondary radiation coefficient than 1. The parallel of a cavity constitute planar arrangement substantiall...  
JP2006512753A
[Subject] By perceiving directly the position of the electron (electron beam) emitted from the source of electron emission by エクス tractor, By being able to perform alignment of the エクス tractor hole of a micro column, and the ...  
JP3764906B2
To make the electron emission quantities of respective emitters uniform and prevent line defect even if a gate electrode and an emitter are short circuited. The degree of electron movement of a channel formed on a channel forming electro...  
JP2006510905A
It is the method and equipment for completing ion, and ion is supplied to the aerodynamic ion convergence assembly 14 which has the entrance opening 12 and the exit opening 16. When coming out of a convergence assembly, it converges the ...  
JP3757156B2
To provide an inductive coupling high-frequency electron source for reduced power requirement. The inductive coupling high-frequency electron source comprises a plasma chamber 1 where an open section is provided at least to a first end, ...  
JP2006508549A
Beam Branka Alley has a base plate, two or more contact pads, and a grounding plate. A contact pad is arranged by the base plate in the state of a one dimensional array. A grounding plate covers two or more contact pad top in the state w...  
JP2006040835A
To reduce loss of electron beams, enhance electron beam density, realize compactness, and enable a high speed treatment in an electron beam irradiation device having a plane type electron beam source.In this electron beam irradiation dev...  
JP3742447B2
To provide an electron source constructed of emitters having almost equal ballast resistance values. In a display element 10, emitters 34, 36, 37, 38, 41, 42, 43, 44, 46, 47 are spaced equally from a meander conductor 26. The meander con...  

Matches 651 - 700 out of 3,742