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Patent Searching and Data


Matches 451 - 500 out of 66,317

Document Document Title
WO/2019/040554A1
A novel method, composition and system for using antimony-containing dopant materials are provided. The composition is selected with sufficient vapor pressure to flow into an arc chamber as part of an ion implant process. The antimony-co...  
WO/2019/038883A1
In order to achieve a charged particle beam device with which energy of secondary charged particles can be easily discriminated, this charged particle beam device has: a charged particle source 2; a specimen stage 14 on which a specimen ...  
WO/2019/037873A1
An assembly (100) for lifting or lowering a carrier (10) in a vacuum chamber is provided. The assembly (100) includes a carrier support (20) that is movable in an upward or downward direction, and a holding device (30) configured to cont...  
WO/2019/038917A1
In order to achieve a correction sample and an electron beam adjustment method and an electron beam device using the correction sample, with which a high-precision measurement of an incident angle can be performed, this correction sample...  
WO/2019/038841A1
The present invention quantitatively evaluates a crystal growth amount by nondestructive inspection in a wide area from an undergrowth state to an overgrowth state. According the present invention, a plurality of image feature amounts ar...  
WO/2019/035135A1
A method is provided for treating an implant in a medical care center prior to using the implant in a medical procedure. The method comprises applying a plasma- generating electromagnetic (EM) field using at least one electrode so as to ...  
WO/2019/034873A1
A substrate mount for a plasma processing apparatus comprising: a frame; an aperture within the frame, configured to accommodate an insert, the insert being configured to support a substrate for processing by the plasma processing appara...  
WO/2019/033878A1
Provided in the present invention are a liner, a reaction chamber and semiconductor processing equipment, the liner being disposed in the reaction chamber, and comprising: a liner main body, surroundingly disposed at an inner side of a s...  
WO/2019/036136A1
A magnet bar assembly for a rotary target cathode comprises a support structure, a magnet bar structure movably attached to the support structure and including a plurality of magnets, and a positioning mechanism operatively coupled to th...  
WO/2019/010312A4
A generator produces output such as delivered power, voltage, current, forward power etc. that follows a prescribed pattern of output versus time where the pattern repeats with a repetition period by controlling sections of the pattern b...  
WO/2019/032708A1
A plasma reactor for processing a workpiece includes a chamber having a dielectric window, a workpiece support to hold a workpiece in the chamber, a rotary coupling comprising a stationary stage configured to be coupled to a microwave so...  
WO/2019/032338A1
Embodiments of the present technology may include a method of etching. The method may include mixing plasma effluents with a gas in a first section of a chamber to form a first mixture. The method may also include flowing the first mixtu...  
WO/2019/032468A1
Embodiments of the disclosure relate to a multi-plate faceplate having a first plate and a second plate. The first plate has a plurality of first plate openings. The second plate has a first surface, an opposed second surface and a plura...  
WO/2019/030526A1
A system for preventing collisions between components in a particle beam instrument is disclosed. The system is particularly beneficial in use with instruments wherein moveable components are used within a chamber that obscures them from...  
WO/2019/032787A1
Embodiments of the disclosure provide a plasma source assembly and process chamber design that can be used for any number of substrate processing techniques. The plasma source may include a plurality of discrete electrodes that are integ...  
WO/2019/029291A1
Disclosed in the present invention is an ion beam etching system, comprising an etching cavity and an etching electrode, and further comprising an electrode displacement apparatus used for enabling the electrode to change a working posit...  
WO/2019/031093A1
The invention relates to an exposure apparatus and a method for projecting a charged particle beam onto a target. The exposure apparatus comprises a charged particle optical arrangement comprising a charged particle source for generating...  
WO/2019/025559A1
The present invention relates to a coating device comprising a vacuum coating chamber for conducting vacuum coating processes, said vacuum coating chamber comprising: - one or more cooled chamber walls 1 having an inner side 1 b and a co...  
WO/2019/025098A1
The invention relates to an arrangement for coating substrate surfaces by means of electric arc discharge in a vacuum chamber, wherein electric arc discharges between a target (1) which is electrically connected as a cathode and is forme...  
WO/2019/025188A1
Systems and methods for implementing charged particle flooding in a charged particle beam apparatus are disclosed. According to certain embodiments, a charged particle beam system includes a charged particle source and a controller which...  
WO/2019/028129A1
A system and method are disclosed for acquiring Electron Energy Loss Spectrometry (EELS) spectra in a transmission electron microscope. The inventive system and method maximize spectrum acquisition rate and duty cycle by exposing a first...  
WO/2019/028049A1
A magnet pack has a permeable assembly with a first cutout for a center magnet and second cutouts for peripheral magnets surrounding the center magnet. A target is attached to the permeable assembly. A heatsink is attached to the target....  
WO/2019/019780A1
Provided are a Faraday shield and a reaction chamber, comprising a conductive ring body, wherein a slit is formed on the conductive ring body; in the developed view of the conductive ring body, the length of a projection, in the axial di...  
WO/2019/019700A1
An upper electrode assembly and a reaction chamber. The upper electrode assembly comprises a coil (10). The coil (10) is provided with n power feed points (103), wherein n is an integer greater than or equal to 1. The coil (10) is furthe...  
WO/2019/022430A1
The present invention relates to a gas spraying apparatus of a substrate processing apparatus, the substrate processing apparatus and a substrate processing method. The gas spraying apparatus comprises: a first gas spraying module for sp...  
WO/2019/021420A1
A charged particle beam device provided with an irradiation optical system for irradiating a sample with a primary electron beam, and an imaging optical system for causing transmitted electrons transmitted through the sample to form an i...  
WO/2019/022672A1
An ionization chamber chip, a nano-aperture ion source, a proton beam writing system, and a method of fabricating an ionization chamber chip. The method comprises the step of providing a first substrate comprising a first depression form...  
WO/2019/021057A1
The disclosure relates to a chemical deposition, treatment and/or infiltration apparatus for providing a chemical reaction on and/or in a surface of a substrate. The apparatus may have a top and a bottom reaction chamber part forming tog...  
WO/2019/021455A1
The objective of the present invention is to achieve to a high degree the correction of chromatic aberration, spherical aberration, or both using simple configuration and adjustment. Provided for this purpose is the aberration correction...  
WO/2019/020214A1
The invention relates to a method for producing a single-phase layer (1) formed by intermetallic compounds on a substrate (2), comprising the following steps: providing a substrate; positioning the substrate in a process chamber of a DC ...  
WO/2019/021454A1
The purpose of the present invention is to provide a charged-particle beam device capable of stable performance of processes such as a measurement or test, independent of fluctuations in sample electric potential or the like. To this end...  
WO/2019/021536A1
Provided is an electron beam observation device, comprising: an electron source; and an objective lens for converging electron beams emitted from the electron source, the electron beam observation device generating an image from a second...  
WO/2019/020396A1
Systems and methods are provided for compensating dispersion of a beam separator in a single-beam or multi-beam apparatus. Embodiments of the present disclosure provide a dispersion device comprising an electrostatic deflector and a magn...  
WO/2019/018019A2
Methods and systems for etching substrates using a remote plasma are described. Remotely excited etchants are formed in a remote plasma and flowed through a showerhead into a substrate processing region to etch the substrate. Optical emi...  
WO/2019/016857A1
The present invention prevents breakage of a chip by using a simple configuration even when an extraction-electrode power source cannot apply voltage to an extraction electrode due to a malfunction, etc. This charged particle beam device...  
WO/2019/015451A1
A gaseous corrosion cavity having a wafer position detection device, comprising an upper cavity, a lower cavity, a lifting and lowering control device, a wafer carrying platform, a wafer ejector pin, and a mechanical hand loaded with a s...  
WO/2019/018283A1
Embodiments of a magnetron assembly and a processing system incorporating same are provided herein. In some embodiments, a magnetron assembly includes a body extending along a central axis of the magnetron assembly; a coolant feed struct...  
WO/2019/016221A1
Plasma device (2) for depositing a functional composite film on a substrate (4) at atmospheric pressure, said device comprising a conduit (6) extending along a longitudinal axis with a gas inlet (8); a discharge area (12) configured to e...  
WO/2019/015452A1
Disclosed in the present invention is a gaseous corrosion cavity capable of adjusting an internal and external pressure difference, comprising an upper cavity, a lower cavity, and a lifting and lowering control device. The lifting and lo...  
WO/2019/016559A1
A method and system for analyzing a specimen in a microscope are disclosed. The method comprises: acquiring a series of compound image frames using a first detector and a second detector, different from the first detector, wherein acquir...  
WO/2019/018078A1
Systems and methods for tuning a radio frequency (RF) generator are described. One of the methods includes supplying, by a high frequency RF generator, a high frequency RF signal to the IMN. The method includes accessing a plurality of m...  
WO/2019/015136A1
An electro static chuck, comprising a base (5), a heating layer (6) provided on the base, and an insulating layer (7) provided on the heating layer. An annular protection member (8) which surrounds the outer circumferential wall of the h...  
WO/2019/015388A1
Disclosed is a spray head for a plasma etching system, the main body having a disc shape, a first annular flange (1), an intake channel (2), second annular flanges (3), and air guide passages (4) are provided on the upper surface of the ...  
WO/2019/013524A1
The substrate processing method according to one embodiment of the present invention comprises: a step of arranging a substrate comprising silicon in a chamber; a reaction step of exposing the surface of the substrate to ammonium fluorid...  
WO/2019/013280A1
In order to shorten time to treat a substrate when irradiating the substrate in an inclined state with an ion beam, this ion beam irradiation device (100), which scans and irradiates the substrate W with an ion beam IB in a state in whic...  
WO/2019/013633A1
The present invention is in the field of a cryo transfer system for use in microscopy, and a microscope comprising said system. The present invention is in the field of microscopy, specifically in the field of electron and focused ion be...  
WO/2019/014002A1
A method of processing a material layer on a substrate is provided. The method includes delivering RF power from an RF power source through a match network to a showerhead of a capacitively coupled plasma chamber; igniting a plasma withi...  
WO/2019/011507A1
A method (14) for the controlled removal of a protective layer (3) from a surface of a component (10), the component comprising: - a main body (1); - an intermediate layer (2) which at least partially covers the main body; and - said pro...  
WO/2019/013688A1
The present invention relates to a method for determining the three dimensional structure of biomolecules,such as proteins, protein fragments and peptides. The biomolecule is encapsulated in an amorphous silica matrix,from which a needle...  
WO/2019/010312A1
A generator produces output such as delivered power, voltage, current, forward power etc. that follows a prescribed pattern of output versus time where the pattern repeats with a repetition period by controlling sections of the pattern b...  

Matches 451 - 500 out of 66,317