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Matches 501 - 550 out of 66,332

Document Document Title
WO/2019/008699A1
The present invention provides a technology whereby a charged particle beam device that observes a sample by irradiating a charged particle beam on the sample is capable of accurately ascertaining crystal grains in a crystalline sample. ...  
WO/2019/008738A1
Provided are: a field emission-type electron source with which the influence of an electric field can be suppressed and stable long-term emission characteristics can be obtained even when a diffusion supply source is disposed close to th...  
WO/2019/008117A1
Electronic optical device for manipulating electron energy beams comprised in a given energy band, comprising a self-supporting ultra thin film (1) of given thickness that is transparent in said energy band, said film (1) comprising thro...  
WO/2019/008031A1
The invention relates to a method of forming a surface texture on a process chamber component in the form of an annular shield element for use in a substrate processing chamber which is designed for manufacturing wafers, chips or dies, t...  
WO/2018/222430A3
A substrate processing system includes a processing chamber. A pedestal is arranged in the processing chamber. An edge coupling ring is arranged adjacent to the pedestal and around a radially outer edge of the substrate. An actuator is c...  
WO/2019/000532A1
Disclosed in the present application is an ionization chamber, applied to an ion implanting device. The ionization chamber comprises a chamber, gas supply tubes and filaments, the gas supply tubes and the filaments being located within t...  
WO/2019/005483A1
An ion implantation system has an ion source forming an ion beam. An mass analyzer defines and varies a mass analyzed beam along a beam path. A moveable mass resolving aperture assembly has a resolving aperture whose position is selectiv...  
WO/2018/213272A3
Plasma source assemblies comprising an RF hot electrode having a body and at least one return electrode spaced from the RF hot electrode to provide a gap in which a plasma can be formed. An RF feed is connected to the RF hot electrode at...  
WO/2019/000021A1
Specimen control means are disclosed for use with multipurpose particle beam instruments, such as with SEM, ESEM, TESEM, TEM, ETEM and ion microscopes. It provides a control stage located outside a chamber with a flexible wall that allow...  
WO/2019/000533A1
A filament, an ionization chamber and an ion implantation device. The filament comprises a first end part (10), a second end part (20) and a connection part (30) between the first end part and the second end part, the first end part and ...  
WO/2019/002014A1
The invention relates to a device for transporting a substrate into or away from a treatment device, a treatment device, a method for processing a substrate and a treatment facility with a movement arrangement for moving a device of this...  
WO/2018/236574A1
A protein powder is exposed to plasma at a specified temperature and power for a specified time period wherein the plasma treated protein powder includes an increased fluorescence in a melt curve at room temperature in comparison to an u...  
WO/2018/234930A1
A multipurpose membraneless sample platform for supporting a target material, includes a substrate (402); a dielectric layer (414) formed over a side of the substrate; first and second electrodes (410, 412) formed over the dielectric lay...  
WO/2018/237113A1
A processing tool for a plasma process includes a chamber body that has an interior space that provides a plasma chamber and that has a ceiling and an opening on a side opposite the ceiling, a workpiece support to hold a workpiece such t...  
WO/2018/236087A1
The present invention relates to a power supply device. The power supply device, according to the present invention, comprises: an inverter for converting a direct current power into an alternating current power; an impedance matching ci...  
WO/2018/233039A1
A gas inlet mechanism (202), and pre-clean chamber (201). The gas inlet mechanism comprises: a cover plate (6), and a gas inlet channel (61) provided within the cover plate; a protection plate (7) and a gas outlet (71) provided within th...  
WO/2018/235194A1
This charged-particle beam device comprises: a stage for placing a sample thereon; a cleaner for removing a contaminating substance present on the sample; and a stage control unit for moving the stage, thereby adjusting the relative posi...  
WO/2018/233455A1
The present invention provides a bias modulation method, a bias modulation system and a plasma processing device. The bias modulation method comprises: during loading of a bias power to a base for bearing a workpiece to be machined, incr...  
WO/2018/233192A1
A lower electrode mechanism and a reaction chamber, the lower electrode mechanism comprising: a base (1), which is used for carrying a workpiece being processed; a lower electrode chamber (12), which is disposed below the base and which ...  
WO/2018/233337A1
An ion implantation amount adjustment apparatus, comprising: an adjustment member, which is used for opening and closing an ion outlet of an ion implantation device; and a drive structure, which is used for controlling the adjustment mem...  
WO/2018/236088A1
The present invention relates to a power supply device. The power supply device, according to the present invention, comprises: an inverter for converting a direct current power into an alternating current power; an impedance matching ci...  
WO/2018/231837A1
An electrical power pulse generator system and a method of the system's operation are described herein. A main energy storage capacitor supplies a negative DC power and a kick energy storage capacitor supplies a positive DC power. A main...  
WO/2018/228133A1
Disclosed are an impedance matching method, an impedance matching apparatus and a plasma generation device. The impedance matching method is used for matching the impedance between a radio-frequency source and a load connected to the rad...  
WO/2018/229482A1
A plasma processing apparatus for processing a substrate using a plasma, comprising: a process chamber in which the processing takes place; a plasma source for providing a plasma to the process chamber; a substrate mount within the proce...  
WO/2018/231260A1
An expansion mount, electrode arrangement and a surface treater station include a mounting block with one or more clamps pivotally coupled to the mounting block to move between a connect position and a release position. When the mounting...  
WO/2018/227668A1
Provided is an ion implantation system. The ion implantation system comprises an ion emitting device and a target plate device. The target plate device comprises a graphite electrode unit and a power supply unit. The graphite electrode u...  
WO/2018/225563A1
Provided are: a radiation detector which has improved detection efficiency of radiation by being increased in the portion where radiation is able to be detected; and a radiation detection device. A radiation detector (1) according to the...  
WO/2018/226275A1
Plasma strip tools with process uniformity control are provided. In one example implementation, a plasma processing apparatus includes a processing chamber. The apparatus includes a first pedestal in the processing chamber operable to su...  
WO/2018/226574A1
An ion implantation system is provided having an ion source configured to form an ion beam from aluminum iodide. A beamline assembly selectively transports the ion beam to an end station configured to accept the ion beam for implantation...  
WO/2018/225148A1
The device comprises a scanning coil for causing a charged particle beam emitted from a charged particle source to scan over a sample, a scan control unit for controlling the scanning coil, a detector for detecting electrons generated fr...  
WO/2018/225546A1
Provided is a technology that provides attenuation while maintaining rigidity of a support member for reducing vibrations of a sample stage, when disturbance such as an environmental sound affects a device and the sample stage is vibrate...  
WO/2018/226683A1
Process kits for use in a multi-cathode process chamber are disclosed. Process kits include one or more of a conical shield, rotatable shield, shroud, inner deposition ring, outer deposition ring, or a cover ring. In some embodiments, a ...  
WO/2018/226273A1
Plasma processing apparatus for processing a workpiece are provided. In one example embodiment, a plasma processing apparatus for processing workpiece includes a processing chamber, a plasma chamber separated from the processing chamber ...  
WO/2018/226274A1
Plasma processing with post plasma gas injection is provided. In one example implementation, a plasma processing apparatus includes a plasma chamber. The apparatus includes a processing chamber separated from the plasma chamber. The proc...  
WO/2018/226276A1
Plasma processing apparatus are provided. In one example implementation, a plasma processing apparatus includes a processing chamber. The apparatus includes a pedestal operable to support a workpiece in the processing chamber. The appara...  
WO/2018/226468A1
A substrate processing system includes a processing chamber including a substrate support to support a substrate. A coil is arranged around the processing chamber. A first RF source provides first RF power at a first magnitude and a firs...  
WO/2018/226370A1
Implementations of the present disclosure generally relate to the fabrication of integrated circuits. More particularly, the implementations described herein provide techniques for deposition of high-density films for patterning applicat...  
WO/2018/224307A1
The invention relates to a method for ionizing gaseous samples by means of dielectric barrier discharge and for subsequently analysing the produced sample ions in an analysis appliance, in particular a mass spectrometer or an ion mobilit...  
WO/2018/220067A1
The present invention discloses a target assembly which allows safe, fracture-free and economic operation of target materials with low fracture toughness and/or bending strength during arc evaporation processes as well as in sputtering p...  
WO/2018/221636A1
The present invention provides an inclination angle amount calculation device used in a charged particle beam device in which a charged particle beam is impinged on the surface of a sample mounted on a sample stand, the inclination angle...  
WO/2018/222430A2
A substrate processing system includes a processing chamber. A pedestal is arranged in the processing chamber. An edge coupling ring is arranged adjacent to the pedestal and around a radially outer edge of the substrate. An actuator is c...  
WO/2018/220809A1
The present invention makes it possible to detect high-energy signal electrons that pass through the vicinity of an optical axis, e.g., backscattered electrons (BSE) or secondary electrons (SE) in a booster optical system. For this purpo...  
WO/2018/222256A1
Embodiments of the present disclosure generally relate to a process chamber for conformal oxidation of high aspect ratio structures. The process chamber includes a liner assembly located in a first side of a chamber body and two pumping ...  
WO/2018/218797A1
The present invention provides a plasma reaction device for processing workpieces, the plasma reaction device comprising: an electron beam generating chamber, a filtering device and a process chamber. The electron beam generating chamber...  
WO/2018/223061A1
A sanitizing system for sanitizing a laundry sling that is moveable along one or more support rails includes a motor, a cable operatively coupled to the motor, a sanitizing lamp coupled to the cable, and a controller configured to cause ...  
WO/2018/217167A1
A cathode structure for cold field electron emission and method of fabricating a single-tip cathode structure for cold field electron emission. The cathode structure comprises a pointed cathode wire; and a graphene-based coating on at le...  
WO/2018/148243A3
A sputtering device and method including a chamber, a target disposed within the chamber, and a substrate support including at least a portion consisting essentially of a non-aluminous and non-magnetic metallic material disposed within t...  
WO/2018/214243A1
A bearing base (1) and a pre-cleaning device. The bearing base (1) is used for bearing a workpiece to be processed (2); a first recessed portion (11) is formed on the bearing base (1); the workpiece to be processed (2) can be received in...  
WO/2018/215263A1
The invention relates to a high frequency amplifier arrangement (1) comprising: a) an amplifier part (2), which has an output (100) having two output connections (101,102), b) a balun transformer (7), which has an input (105) having two ...  
WO/2018/214332A1
Disclosed are a process chamber and a semiconductor processing apparatus. The process chamber comprises: a chamber body (1), an upper electrode plate (3), a heat source (13) arranged at the top in the chamber body, and a substrate (2) ar...  

Matches 501 - 550 out of 66,332