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Matches 551 - 600 out of 66,171

Document Document Title
WO/2018/173829A1
An exposure device EX is provided with: a beam optical system (12) capable of irradiating an object (W) with charged particle beams (EB); and a magnetic field generation device (54 (541)) that generates a magnetic field in a space betwee...  
WO/2018/175758A1
A method and a system for polishing a wafer is disclosed. In one aspect, the method includes generating atmospheric plasma. The method further includes treating a component of a wafer processing system with the atmospheric plasma. The me...  
WO/2018/175689A1
A magnetron sputtering source for sputtering a target includes a magnetically permeable material yoke member and a first magnet positioned on said yoke member and having a north-south magnetic orientation that is perpendicular to the yok...  
WO/2018/172186A1
The present invention relates to a charged particle beam system comprising a charged particle source configured to generate a first charged particle beam, a multi beam generator configured to generate a plurality of charged particle beam...  
WO/2018/170981A1
Disclosed is a comparative proteomic technique. In particular, disclosed is a detection and quantitative method for post-translational modification proteomics. The method labels the protein sample to be detected and the internal standard...  
WO/2018/148044A3
Carbon materials having carbon aggregates, where the aggregates include carbon nanoparticles and no seed particles, are disclosed. In various embodiments, the nanoparticles include graphene, optionally with multi-walled spherical fullere...  
WO/2018/175276A1
Provided herein are approaches for increasing surface area of a conductive beam optic by providing grooves or surface features thereon. In one approach, the conductive beam optic may be part of an electrostatic filter having a plurality ...  
WO/2018/175647A1
A composite assembly of a relatively inexpensive ceramic, such as alumina, with a skin, or covering, of a high wear ceramic, such as sapphire, adapted to be used in semiconductor processing environments subjected to high levels of corros...  
WO/2018/175182A1
A method of performing deposition of diamond-like carbon on a workpiece in a chamber includes supporting the workpiece in the chamber facing an upper electrode suspended from a ceiling of the chamber, introducing a hydrocarbon gas into t...  
WO/2018/175320A2
The present disclosure provides a low plasma generation system. In one implementation, the system includes a plurality of electrodes with a grounded electrode and at least one high-voltage electrode. The grounded and the high-voltage ele...  
WO/2018/173241A1
The purpose of the present invention is to provide a charged particle beam apparatus that performs apparatus adjustment based on a proper evaluation of a beam. To achieve the abovementioned purpose, with the present invention, proposed i...  
WO/2018/167922A1
A charged particle beam optical apparatus EX is provided with: a plurality of irradiation optical systems 12 capable of irradiating an object W with charged particle beams EB, respectively; and a first control apparatus 3 that controls a...  
WO/2018/121896A9
In a capacitively coupled etch reactor, in which the smaller electrode is etched, the larger electrode is electrically supplied by a very high frequency supply signal and by a high frequency supply signal. The smaller electrode, acting a...  
WO/2018/166786A1
An embodiment of the invention relates to a method for carrying out a time-resolved interferometric measurement comprising the steps of generating at least two coherent waves, overlapping said at least two coherent waves and producing an...  
WO/2018/167484A1
We describe a super-resolution optical microscopy technique in which a sample is located on or adjacent to the planar surface of an aplanatic solid immersion lens and placed in a cryogenic environment.  
WO/2018/140193A3
Embodiments of the present disclosure provide a sputtering chamber with in-situ ion implantation capability. In one embodiment, the sputtering chamber comprises a target, an RF and a DC power supplies coupled to the target, a support bod...  
WO/2018/169631A1
Methods and systems for RF pulse reflection reduction are provided herein. In some embodiments, a method includes (a) receiving a process recipe for processing the substrate that includes a plurality of pulsed RF power waveforms from a p...  
WO/2018/140903A3
A microscopy system for imaging a sample (102) includes a scanning electron microscope system (120) configured for imaging a surface layer of the sample and a focused ion beam system (140) configured for generating an ion beam for millin...  
WO/2018/170010A1
A method is disclosed for monitoring and controlling a process of plasma-assisted surface modification of a layer formed on a substrate. The method includes flowing a surface modification gas into a plasma processing chamber of a plasma ...  
WO/2018/169927A1
An electrical device for electrically measuring a sample during electron microscope imaging includes: a chip through which a slit is defined, the chip having at least one peripheral edge, the slit having an open end at the at least one p...  
WO/2018/167792A1
Aspects of the invention may relate to a treatment device and method for providing plasma treatments of lenses. The treatment device for treating a lens, included in an operational device, may include: at least one first electrode locate...  
WO/2018/163240A1
A charged particle beam device provided with: a deflection part for deflecting a charged particle beam released from a charged particle source and irradiating a sample with the charged particle beam; a reflection plate for reflecting sec...  
WO/2018/162358A1
Systems and methods are provided for evacuating a chamber (101). The evacuation system comprises a cooler (320) coupled with the chamber and a controller (350). The controller is configured to determine whether a property of the cooler o...  
WO/2018/159056A1
Provided are an electron source usable stably over a long period of time even if a hexaboride compound is used, and an electron beam device using this electron source. The electron source comprises: a metallic filament (103); a metal tub...  
WO/2018/158422A1
The invention relates to an apparatus for generating accelerated electrons, comprising a housing (101), which delimits an evacuable space (102a; 102b) and has an electron exit window (104); an inlet for supplying a working gas into the e...  
WO/2018/158013A1
The invention relates to an electrode unit, comprising: a plurality of plasma electrode pairs, which at a specific applied voltage are suited for igniting a plasma between a first plasma electrode and a second plasma electrode of each pl...  
WO/2018/158329A1
The invention provides an electron- impact ion source device having high brightness as compared to known Nier-type ion sources, while providing similar advantages in terms of flexibility of the generated ion species, for example. The ion...  
WO/2018/160501A1
A high throughput deposition apparatus includes a process chamber, a plurality of targets that form a first closed loop in the process chamber, wherein the first closed loop includes a long dimension defined by at least a first pair of t...  
WO/2018/160688A1
A method for imaging a surface of a substrate using a multibeam imaging system includes: modifying an electron beam using a multipole field device; generating beamlets from the electron beam using a beam splitting device having multiple ...  
WO/2018/160554A1
Methods and apparatus for boosting ion energies are contemplated herein. In one embodiment, the methods and apparatus comprises a controller, a process chamber with a symmetrical plasma source configured to process a wafer, one or more v...  
WO/2018/153430A1
The invention relates to a method for real-time monitoring of a process, comprising: performing a mass spectrometric real-time measurement of a gas mixture (4) generated in the monitored process to determine real-time mass spectrometric ...  
WO/2018/155540A1
This electron beam apparatus comprises: an optical system (80) which directs a plurality of light beams onto a photoelectric element (136); and an electron beam optical system (70) which irradiates a wafer (W) with, as a plurality of ele...  
WO/2018/153818A1
The invention describes an amplifier circuit for providing an output of at least 100 W, preferably of at least 200 W and most preferably of at least 250 W comprising a field effect transistor (111, 113). A drain of the field effect trans...  
WO/2018/154587A1
A control system is presented for use in measuring one or more parameters of a three-dimensional patterned structure. The control system is configured as a computer system comprising a data processor configured to receive and process raw...  
WO/2018/154638A1
This charged particle beam device is provided with: a charged particle beam source that emits a primary charged particle beam; an objective lens that focuses the primary charged particle beam on a sample; a path electrode, which is dispo...  
WO/2018/155539A1
This electron beam apparatus comprises a projection optical system which directs a plurality of light beams onto a photoelectric element (54), an electron beam optical system (70) which irradiates a wafer (W) with, as a plurality of elec...  
WO/2018/156486A1
Systems and methods for tuning to reduce reflected power in multiple states are described. The methods include determining values of one or more parameters of an impedance matching circuit so that reflected power is reduced for multiple ...  
WO/2018/155542A1
This electron beam apparatus comprises an optical system (80) which directs a plurality of light beams onto a photoelectric element (136), and an electron beam optical system (70) which irradiates a wafer (W) with, as a plurality of elec...  
WO/2018/152658A1
A proton microscope, a wavelength dispersive spectrometer, an energy dispersive spectrometer, and a micro-nano processing platform, which can achieve a proton transmission microscopy function; a proton scanning microscopy function; a pro...  
WO/2018/154800A1
A measuring device for irradiating charged particle beams and observing samples, wherein the measuring device is characterized by comprising a particle source for outputting charged particle beams, a lens for focusing the charged particl...  
WO/2018/154705A1
The purpose of the present invention is to provide a charged particle beam device which suppresses sample deformation caused by placing a sample on a suctioning surface of an electrostatic chuck mechanism, the sample having a temperature...  
WO/2018/154706A1
The objective of the present invention is to provide a charged-particle beam device wherein suppressing the effects of static build-up is compatible with performing high-throughput measurements and examination. In order to achieve this o...  
WO/2018/155537A1
This electron beam apparatus comprises an optical device (84) capable of providing a plurality of light beams which can be controlled individually, a projection optical system (86) which directs the plurality of light beams from the opti...  
WO/2018/156452A1
Methods and apparatus for processing substrates with a multi-cathode chamber. The multi-cathode chamber includes a shield with a plurality of holes and a plurality of shunts. The shield is rotatable to orient the holes and shunts with a ...  
WO/2018/153856A1
A load lock system for charged particle beam imaging with a particle shielding plate (204), a bottom seal plate (202) and a plurality of sensor units (301-303) is provided. The sensor units are located above the wafer, the shield plate i...  
WO/2018/155538A1
This electron beam apparatus comprises: an optical device (84) capable of providing a plurality of light beams which can be controlled individually; an illuminating system (82) which can direct illuminating light onto the optical device;...  
WO/2018/155545A1
This electron beam apparatus comprises an optical system (80) which directs a plurality of optical beams onto a photoelectric element (54), and an electron beam optical system (70) which irradiates a wafer (W) with, as a plurality of ele...  
WO/2018/155543A1
This electron beam apparatus comprises an optical system (80) which directs a plurality of light beams onto a photoelectric element (54), an electron beam optical system (70) which irradiates a wafer (W) with, as a plurality of electron ...  
WO/2018/151920A1
A voltage-current sensor enables more accurate measurement of the voltage, current, and phase of RF power that is delivered to high-temperature processing region. The sensor includes a planar body comprised of a non-organic, electrically...  
WO/2018/152142A1
Plasma processing apparatus and methods are disclosed. In one example implementation, a plasma processing apparatus can include a processing chamber. The apparatus can include a pedestal located in the processing chamber configured to su...  

Matches 551 - 600 out of 66,171