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Matches 601 - 650 out of 66,307

Document Document Title
WO/2018/186427A1
Provided are a coil-integrated yoke for realizing a deflector capable of accurately deflecting the trajectory of an electron beam, and a method for manufacturing the same. Provided is a coil-integrated yoke manufacturing method comprisin...  
WO/2018/187494A1
The present disclosure relates to methods and apparatus for reducing particle contamination on substrates in a plasma process chamber. In one embodiment, by applying a DC power to an electrode surrounding a processing region, the boundar...  
WO/2018/185987A1
The present invention provides a technique for reducing the amount of an intermediate product adhering to a supply-side front end part and the inner wall surface of a gas supply pipe as much as possible, said intermediate product being p...  
WO/2018/182167A1
The present invention relates to a magnet and the like which can be used for a magnetron sputtering device. A magnet structure for a magnetron sputtering device of the present invention comprises: a permanent magnet; and a wire surroundi...  
WO/2018/181410A1
Provided is a focused ion beam device in which first maintenance processing is carried out every time a predetermined first time-period passes. The first maintenance processing causes a first heating device to raise the temperature of an...  
WO/2018/178289A1
The invention relates to a plasma generator and a method for providing electric power in a pulsed manner at a frequency of at least 40 KHz to at least two process chambers. The plasma generator has the following: a control unit which is ...  
WO/2018/181408A1
This automatic processing device for fabricating a sample piece from a sample by irradiating the sample with a charged particle beam is provided with: a structural information acquiring unit which acquires structural information indicati...  
WO/2018/183245A1
Focus ring assemblies for plasma processing apparatus are provided. In one example implementation, an apparatus includes a plasma source configured to generate a plasma. The apparatus includes a chamber configured to receive a workpiece....  
WO/2018/181409A1
This charged particle beam apparatus is provided with: a charged particle beam lens-barrel for emitting charged particle beams onto a sample; a tilting base (64A) that has a first sample holding part capable of holding the sample and tha...  
WO/2018/184023A1
A chemical vapor deposition system for coating one or more workpieces is described herein. The deposition system includes a plurality of processing chambers which may be operated independently to increase throughput of the deposition sys...  
WO/2018/177965A1
The invention provides a method and system to remotely monitor a plasma (3) comprising a magnetic field antenna (2) positioned in the near electromagnetic field of a coupled plasma source wherein the magnetic field antenna is a magnetic ...  
WO/2018/181407A1
This cross-section observation device bombards an object with a charged particle beam to repeatedly expose cross-sections of the object, bombards at least some of the cross-sections from among the plurality of the exposed cross-sections ...  
WO/2018/182168A1
The present invention relates to a system, for controlling a magnet, which can be used for a magnetron sputtering device. A magnet control system for a magnetron sputtering device of the present invention comprises: a driving power unit;...  
WO/2018/183243A1
Pedestal assemblies for processing apparatus, such as plasma processing apparatus are provided. In one example implementation, a plasma processing apparatus can include a processing chamber having a processing chamber interior. The appar...  
WO/2018/179029A1
This charged-particle beam system comprises: a charged-particle beam device containing a detection unit for detecting electrons generated by irradiating a sample with a charged-particle beam released from a charged particle source; and a...  
WO/2018/178609A1
An electron beam emitting assembly (80) comprising an emitter section (81) and a cathode section (82), wherein the cathode section (82) comprises a cathode (60) and a cathode shield (84) held in a fixed relationship to each other and the...  
WO/2018/179115A1
Provided is a charged particle beam device, comprising: a charged particle source that emits a charged particle beam; a boosting electrode disposed between the charged particle source and a sample, the boosting electrode forming a path f...  
WO/2018/175127A2
An ion implantation system may include an ion source to generate an ion beam, a substrate stage disposed downstream of the ion source; and a deceleration stage including a component to deflect the ion beam, where the deceleration stage i...  
WO/2018/173812A1
In order to provide a functional membrane for ion beam transmission whereby ion beam transmittance can be increased and improved emittance can be obtained, the functional membrane for ion beam transmission pertaining to the present inven...  
WO/2018/173242A1
The purpose of the present invention is to provide a charged particle beam apparatus that covers a wide range of detection angles of charged particles emitted from a sample. Accordingly, the present invention proposes a charged particle ...  
WO/2018/173829A1
An exposure device EX is provided with: a beam optical system (12) capable of irradiating an object (W) with charged particle beams (EB); and a magnetic field generation device (54 (541)) that generates a magnetic field in a space betwee...  
WO/2018/175758A1
A method and a system for polishing a wafer is disclosed. In one aspect, the method includes generating atmospheric plasma. The method further includes treating a component of a wafer processing system with the atmospheric plasma. The me...  
WO/2018/175689A1
A magnetron sputtering source for sputtering a target includes a magnetically permeable material yoke member and a first magnet positioned on said yoke member and having a north-south magnetic orientation that is perpendicular to the yok...  
WO/2018/172186A1
The present invention relates to a charged particle beam system comprising a charged particle source configured to generate a first charged particle beam, a multi beam generator configured to generate a plurality of charged particle beam...  
WO/2018/170981A1
Disclosed is a comparative proteomic technique. In particular, disclosed is a detection and quantitative method for post-translational modification proteomics. The method labels the protein sample to be detected and the internal standard...  
WO/2018/148044A3
Carbon materials having carbon aggregates, where the aggregates include carbon nanoparticles and no seed particles, are disclosed. In various embodiments, the nanoparticles include graphene, optionally with multi-walled spherical fullere...  
WO/2018/175276A1
Provided herein are approaches for increasing surface area of a conductive beam optic by providing grooves or surface features thereon. In one approach, the conductive beam optic may be part of an electrostatic filter having a plurality ...  
WO/2018/175647A1
A composite assembly of a relatively inexpensive ceramic, such as alumina, with a skin, or covering, of a high wear ceramic, such as sapphire, adapted to be used in semiconductor processing environments subjected to high levels of corros...  
WO/2018/175182A1
A method of performing deposition of diamond-like carbon on a workpiece in a chamber includes supporting the workpiece in the chamber facing an upper electrode suspended from a ceiling of the chamber, introducing a hydrocarbon gas into t...  
WO/2018/175320A2
The present disclosure provides a low plasma generation system. In one implementation, the system includes a plurality of electrodes with a grounded electrode and at least one high-voltage electrode. The grounded and the high-voltage ele...  
WO/2018/173241A1
The purpose of the present invention is to provide a charged particle beam apparatus that performs apparatus adjustment based on a proper evaluation of a beam. To achieve the abovementioned purpose, with the present invention, proposed i...  
WO/2018/167922A1
A charged particle beam optical apparatus EX is provided with: a plurality of irradiation optical systems 12 capable of irradiating an object W with charged particle beams EB, respectively; and a first control apparatus 3 that controls a...  
WO/2018/121896A9
In a capacitively coupled etch reactor, in which the smaller electrode is etched, the larger electrode is electrically supplied by a very high frequency supply signal and by a high frequency supply signal. The smaller electrode, acting a...  
WO/2018/166786A1
An embodiment of the invention relates to a method for carrying out a time-resolved interferometric measurement comprising the steps of generating at least two coherent waves, overlapping said at least two coherent waves and producing an...  
WO/2018/167484A1
We describe a super-resolution optical microscopy technique in which a sample is located on or adjacent to the planar surface of an aplanatic solid immersion lens and placed in a cryogenic environment.  
WO/2018/140193A3
Embodiments of the present disclosure provide a sputtering chamber with in-situ ion implantation capability. In one embodiment, the sputtering chamber comprises a target, an RF and a DC power supplies coupled to the target, a support bod...  
WO/2018/169631A1
Methods and systems for RF pulse reflection reduction are provided herein. In some embodiments, a method includes (a) receiving a process recipe for processing the substrate that includes a plurality of pulsed RF power waveforms from a p...  
WO/2018/140903A3
A microscopy system for imaging a sample (102) includes a scanning electron microscope system (120) configured for imaging a surface layer of the sample and a focused ion beam system (140) configured for generating an ion beam for millin...  
WO/2018/170010A1
A method is disclosed for monitoring and controlling a process of plasma-assisted surface modification of a layer formed on a substrate. The method includes flowing a surface modification gas into a plasma processing chamber of a plasma ...  
WO/2018/169927A1
An electrical device for electrically measuring a sample during electron microscope imaging includes: a chip through which a slit is defined, the chip having at least one peripheral edge, the slit having an open end at the at least one p...  
WO/2018/167792A1
Aspects of the invention may relate to a treatment device and method for providing plasma treatments of lenses. The treatment device for treating a lens, included in an operational device, may include: at least one first electrode locate...  
WO/2018/163240A1
A charged particle beam device provided with: a deflection part for deflecting a charged particle beam released from a charged particle source and irradiating a sample with the charged particle beam; a reflection plate for reflecting sec...  
WO/2018/162358A1
Systems and methods are provided for evacuating a chamber (101). The evacuation system comprises a cooler (320) coupled with the chamber and a controller (350). The controller is configured to determine whether a property of the cooler o...  
WO/2018/159056A1
Provided are an electron source usable stably over a long period of time even if a hexaboride compound is used, and an electron beam device using this electron source. The electron source comprises: a metallic filament (103); a metal tub...  
WO/2018/158422A1
The invention relates to an apparatus for generating accelerated electrons, comprising a housing (101), which delimits an evacuable space (102a; 102b) and has an electron exit window (104); an inlet for supplying a working gas into the e...  
WO/2018/158013A1
The invention relates to an electrode unit, comprising: a plurality of plasma electrode pairs, which at a specific applied voltage are suited for igniting a plasma between a first plasma electrode and a second plasma electrode of each pl...  
WO/2018/158329A1
The invention provides an electron- impact ion source device having high brightness as compared to known Nier-type ion sources, while providing similar advantages in terms of flexibility of the generated ion species, for example. The ion...  
WO/2018/160501A1
A high throughput deposition apparatus includes a process chamber, a plurality of targets that form a first closed loop in the process chamber, wherein the first closed loop includes a long dimension defined by at least a first pair of t...  
WO/2018/160688A1
A method for imaging a surface of a substrate using a multibeam imaging system includes: modifying an electron beam using a multipole field device; generating beamlets from the electron beam using a beam splitting device having multiple ...  
WO/2018/160554A1
Methods and apparatus for boosting ion energies are contemplated herein. In one embodiment, the methods and apparatus comprises a controller, a process chamber with a symmetrical plasma source configured to process a wafer, one or more v...  

Matches 601 - 650 out of 66,307