Login| Sign Up| Help| Contact|

Patent Searching and Data


Matches 651 - 700 out of 66,307

Document Document Title
WO/2018/153430A1
The invention relates to a method for real-time monitoring of a process, comprising: performing a mass spectrometric real-time measurement of a gas mixture (4) generated in the monitored process to determine real-time mass spectrometric ...  
WO/2018/155540A1
This electron beam apparatus comprises: an optical system (80) which directs a plurality of light beams onto a photoelectric element (136); and an electron beam optical system (70) which irradiates a wafer (W) with, as a plurality of ele...  
WO/2018/153818A1
The invention describes an amplifier circuit for providing an output of at least 100 W, preferably of at least 200 W and most preferably of at least 250 W comprising a field effect transistor (111, 113). A drain of the field effect trans...  
WO/2018/154587A1
A control system is presented for use in measuring one or more parameters of a three-dimensional patterned structure. The control system is configured as a computer system comprising a data processor configured to receive and process raw...  
WO/2018/154638A1
This charged particle beam device is provided with: a charged particle beam source that emits a primary charged particle beam; an objective lens that focuses the primary charged particle beam on a sample; a path electrode, which is dispo...  
WO/2018/155539A1
This electron beam apparatus comprises a projection optical system which directs a plurality of light beams onto a photoelectric element (54), an electron beam optical system (70) which irradiates a wafer (W) with, as a plurality of elec...  
WO/2018/156486A1
Systems and methods for tuning to reduce reflected power in multiple states are described. The methods include determining values of one or more parameters of an impedance matching circuit so that reflected power is reduced for multiple ...  
WO/2018/155542A1
This electron beam apparatus comprises an optical system (80) which directs a plurality of light beams onto a photoelectric element (136), and an electron beam optical system (70) which irradiates a wafer (W) with, as a plurality of elec...  
WO/2018/152658A1
A proton microscope, a wavelength dispersive spectrometer, an energy dispersive spectrometer, and a micro-nano processing platform, which can achieve a proton transmission microscopy function; a proton scanning microscopy function; a pro...  
WO/2018/154800A1
A measuring device for irradiating charged particle beams and observing samples, wherein the measuring device is characterized by comprising a particle source for outputting charged particle beams, a lens for focusing the charged particl...  
WO/2018/154705A1
The purpose of the present invention is to provide a charged particle beam device which suppresses sample deformation caused by placing a sample on a suctioning surface of an electrostatic chuck mechanism, the sample having a temperature...  
WO/2018/154706A1
The objective of the present invention is to provide a charged-particle beam device wherein suppressing the effects of static build-up is compatible with performing high-throughput measurements and examination. In order to achieve this o...  
WO/2018/155537A1
This electron beam apparatus comprises an optical device (84) capable of providing a plurality of light beams which can be controlled individually, a projection optical system (86) which directs the plurality of light beams from the opti...  
WO/2018/156452A1
Methods and apparatus for processing substrates with a multi-cathode chamber. The multi-cathode chamber includes a shield with a plurality of holes and a plurality of shunts. The shield is rotatable to orient the holes and shunts with a ...  
WO/2018/153856A1
A load lock system for charged particle beam imaging with a particle shielding plate (204), a bottom seal plate (202) and a plurality of sensor units (301-303) is provided. The sensor units are located above the wafer, the shield plate i...  
WO/2018/155538A1
This electron beam apparatus comprises: an optical device (84) capable of providing a plurality of light beams which can be controlled individually; an illuminating system (82) which can direct illuminating light onto the optical device;...  
WO/2018/155545A1
This electron beam apparatus comprises an optical system (80) which directs a plurality of optical beams onto a photoelectric element (54), and an electron beam optical system (70) which irradiates a wafer (W) with, as a plurality of ele...  
WO/2018/155543A1
This electron beam apparatus comprises an optical system (80) which directs a plurality of light beams onto a photoelectric element (54), an electron beam optical system (70) which irradiates a wafer (W) with, as a plurality of electron ...  
WO/2018/151920A1
A voltage-current sensor enables more accurate measurement of the voltage, current, and phase of RF power that is delivered to high-temperature processing region. The sensor includes a planar body comprised of a non-organic, electrically...  
WO/2018/152142A1
Plasma processing apparatus and methods are disclosed. In one example implementation, a plasma processing apparatus can include a processing chamber. The apparatus can include a pedestal located in the processing chamber configured to su...  
WO/2018/149732A1
A method and a charged particle beam system for an automated long term processing of a sample by a charged particle beam is disclosed. The charged particle beams system comprises a charged particle source having a tip (20) emitting charg...  
WO/2018/149777A1
The invention concerns a lithography process on a sample (2) comprising at least one structure (1) and covered by at least a lower layer (3) of resist and a upper layer (4) of resist the process comprising: thanks to an optical device (8...  
WO/2018/151889A1
A substrate support for supporting a substrate within a semiconductor processing chamber is provided. A substrate support body is provided. At least one resistive heating element is embedded in or on the substrate support body comprising...  
WO/2018/150159A1
An apparatus for protecting an interior surface of a fusion reactor vessel. The apparatus comprises a power supply operably connected to an electrode for insertion into the vessel. The apparatus supports a solid material within the vesse...  
WO/2018/152126A1
Embodiments disclosed herein generally relate to a plasma processing system. The plasma processing system includes a processing chamber, a chamber seasoning system, and a remote plasma cleaning system. The processing chamber has a chambe...  
WO/2018/149894A1
The present invention relates to a method for the evaporation of a cathode by means of cathodic arc evaporation, wherein the focal spot of the arc is forced to a predetermined track on the cathode surface by means of temporally and spati...  
WO/2018/148044A2
Carbon materials having carbon aggregates, where the aggregates include carbon nanoparticles and no seed particles, are disclosed. In various embodiments, the nanoparticles include graphene, optionally with multi-walled spherical fullere...  
WO/2018/147537A2  
WO/2018/146204A1
A charge control apparatus for controlling charge on a substrate in a vacuum chamber is described. The apparatus includes a light source emitting a beam of radiation having a divergence; a mirror con figured to reflect the beam of radiat...  
WO/2018/145983A1
Systems and methods are provided for charged particle detection. The detection system comprises a signal processing circuit (502) configured to generate a set of intensity gradients based on electron intensity data received from a plural...  
WO/2018/148091A1
Embodiments of a tantalum (Ta) target pasting process for deposition chambers using RF powered processes include pasting at least a portion of the inner surfaces of the process chamber with Ta after using RF sputtering to deposit dielect...  
WO/2018/148150A1
A scanning electron microscopy (SEM) system includes a plurality of electron-optical columns and a plurality of electron beam sources. The electron beam sources include an emitter including one or more emitter tips configured to generate...  
WO/2018/146804A1
The purpose of the invention is to provide a device with which the same field of view is observed with a charged particle beam device and a camera, without increasing the size of a housing. A charged particle beam device according to an ...  
WO/2018/148043A1
A processing reactor includes a microwave energy source and a field-enhancing waveguide. The field-enhancing waveguide has a field-enhancing zone between a first cross-sectional area and a second cross-sectional area of the waveguide, an...  
WO/2018/148062A1
Implementations of the present disclosure relate to systems and techniques for abating F-gases present in the effluent of semiconductor manufacturing processes. In one implementation, a water and oxygen delivery system for a plasma abate...  
WO/2018/146312A1
The present invention provides a method for cleaning a component for use in an ultra-high vacuum. The method may comprise the steps of placing the component to be cleaned in a vacuum furnace chamber; plasma cleaning the component at a te...  
WO/2018/142179A1
The invention relates to an apparatus (1) for applying a deposition onto a substrate (2) by a deposition process, wherein the apparatus (1) comprises a first vacuum chamber (3) which can be evacuated by means of a first evacuation pump (...  
WO/2018/145101A1
In one embodiment, an A/V interconnection architecture is provided that includes a TX A/V endpoint that supports native audio and stereo down-mixed audio on separate networks. The TX A/V endpoint outputs native audio over a video network...  
WO/2018/143054A1
The present invention provides a charged particle detector comprising a scintillator for obtaining high light emission intensity while emitting light of a stable intensity, without using energy of incident electrons. The present inventio...  
WO/2018/144947A1
A multi-column scanning electron microscopy (SEM) system includes a column assembly, where the column assembly includes a first substrate array assembly and at least a second substrate array assembly. The system also includes a source as...  
WO/2018/144613A1
A system includes a process chamber, a housing that defines a waveguide cavity, and a first conductive plate within the housing. The first conductive plate faces the process chamber. The system also includes one or more adjustment device...  
WO/2018/144374A1
Systems and methods for tunable workpiece biasing in a plasma reactor are provided herein. In some embodiments, a system includes: a plasma chamber that performs plasma processing on a workpiece, a first pulsed voltage source, coupled di...  
WO/2018/140493A1
A method for isotropically etching film on a substrate with atomic layer control includes a) providing a substrate including a material selected from a group consisting of silicon (Si), germanium (Ge) and silicon germanium (SiGe). The me...  
WO/2018/140120A1
An apparatus which has the capability of filtering unwanted species from an extracted ion beam without the use of a mass analyzer magnet is disclosed. The apparatus includes an ion source having chamber walls that are biased by an RF vol...  
WO/2018/140903A2
A microscopy system for imaging a sample can include a scanning electron microscope system configured for imaging a surface layer of the sample and a focused ion beam system configured for generating an ion beam for milling the surface l...  
WO/2018/138874A1
The purpose of the present invention is to provide a charged particle beam device with which it is possible to identify, to a high degree of accuracy, repeat patterns generated by a multiple exposure method such as SADP or SAQP. In order...  
WO/2018/138875A1
The purpose of the present invention is to provide a charged particle beam device which adjusts brightness and contrast or adjusts focus and the like appropriately in a short time even if there are few detected signals. Proposed as an as...  
WO/2018/140118A1
An ion source having dual indirectly heated cathodes is disclosed. Each of the cathodes may be independently biased relative to its respective filament so as to vary the profile of the beam current that is extracted from the ion source. ...  
WO/2018/140119A1
An apparatus for improving the uniformity of an ion beam is disclosed. The apparatus includes a heating element to heat an edge of the suppression electrode that is located furthest from the suppression aperture. In operation, the edge o...  
WO/2018/140369A1
A method for affixing an RFID tag to sputtering targets is disclosed. A cavity is formed on the back of the backing plate adjacent to the outer edge. Within the cavity, an RFID tag is secured with an encapsulant. The encapsulant is cured...  

Matches 651 - 700 out of 66,307