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Patent Searching and Data


Matches 701 - 750 out of 66,186

Document Document Title
WO/2018/096145A1
Disclosed is a method comprising the irradiation of a wafer (8) by means of an ion beam (2) that passes through an implantation filter (6), the ion beam (2) being electrostatically deviated in a first direction and a second direction in ...  
WO/2018/094982A1
A method for inducing and exciting a radio frequency plasma with laser in a low air pressure environment. In the method, hardware comprises a pulse laser light source (1), a convex lens (3), a target material (5), an ion source system (6...  
WO/2018/098002A1
Processes and systems for carbon ion implantation include utilizing phosphine as a co-gas with a carbon oxide gas in an ion source chamber 300. In one or more embodiments, carbon implantation with the phosphine co-gas is in combination w...  
WO/2018/096235A1
This electrode (1), with which an apparatus furthermore possessing a holder (102) for the substrate, a counter-electrode and means (120, 121, 122) for injecting a plasma gas towards this holder, is equipped comprises a body (2) made from...  
WO/2018/098004A1
Processes and systems for carbon ion implantation include utilizing phosphorous trifluoride (PF3) as a co-gas with carbon oxide gas, and in some embodiments, in combination with the lanthanated tungsten alloy ion source components advant...  
WO/2018/094903A1
A vacuum condition controlling apparatus (104), the top of which is connected with an electron beam generating instrument. The apparatus is rotationally symmetric, comprises the following parts deployed outward from the central axis: the...  
WO/2018/098100A1
Embodiments of process kits for process chambers and methods for processing a substrate are provided herein. In some embodiments, a process kit includes a non-conductive upper shield having an upper portion to surround a sputtering targe...  
WO/2018/096575A1
The invention addresses the problem that, in order to perform an observation in situ with a charged-particle beam device, an observer, who is not an expert in charged-particle beam devices, needs to maintain an ever-changing observation ...  
WO/2018/095514A1
The present disclosure provides an apparatus (100) for layer deposition on a substrate (10). The apparatus (100) includes a vacuum chamber (101), at least one sputter source (110) in the vacuum chamber (101), wherein the at least one spu...  
WO/2018/097263A1
Provided is an arc vaporization source capable of increasing reaching efficiency, at which charged particles emitted from a target reach a subject. An arc vaporization source 1A that supplies charged particles toward a predetermined base...  
WO/2018/091888A1
Methods and apparatus for applying atomic hydrogen to an object are disclosed. In one arrangement, the method comprises passing atomic hydrogen through a membrane and onto a portion of an object that is spaced apart from the membrane. Th...  
WO/2018/094064A1
The present invention provides a method for using ion filtering to adjust the number of ions delivered to a substrate (170). The method comprising a process chamber (100) being provided that is operatively connected to a plasma source (1...  
WO/2018/092115A1
Systems and methods are disclosed for plasma discharge ignition to reduce surface particles and thereby decrease defects introduced during plasma processing. A microelectronic workpiece is positioned on a holder within a process chamber ...  
WO/2018/093537A1
Methods and systems include supplying pulsed microwave radiation through a waveguide, where the microwave radiation propagates in a direction along the waveguide. A pressure within the waveguide is at least 0.1 atmosphere. A supply gas i...  
WO/2018/094383A1
A technique for estimating a whole object surface area and volume of a micro-scale three-dimensional model with a partially visible surface includes receiving a single-view stereoscopic image of an object of interest and an unconstrained...  
WO/2018/093874A1
Apparatus and methods to process a substrate comprising a gas distribution assembly comprising a plasma process region with an array of individual plasma sources. A controller is connected to the array of individual plasma sources and th...  
WO/2018/092050A1
Controlling an etch process applied to a multi-layered structure, by calculating a spectral derivative of reflectance of an illuminated region of interest of a multi-layered structure during an etch process applied to the multi-layered s...  
WO/2018/093157A1
The present invention relates to an electron gun which maintains a vacuum by sealing a vacuum exhaust line connection portion after vacuum evacuation and comprising a getter in the electron gun and which is exchangeable, and an electron ...  
WO/2018/093414A1
A corrosion-resistant component configured for use with a semiconductor processing reactor, the corrosion-resistant component comprising: a) a ceramic insulating substrate; and, b) a white corrosion-resistant non-porous outer layer assoc...  
WO/2018/093191A1
The present invention relates to a glass frit composition for melt-coating for ceramics for plasma resistance and a method for forming a coating layer. More specifically, the present invention provides a method for preparing ceramics for...  
WO/2018/091797A1
This unit comprises a housing (50) for receiving an electrode suitable for creating an electrical discharge, and first means (20, 21, 22) for injecting treatment gas, comprising at least one plasma-forming gas, towards the support of the...  
WO/2018/094024A1
Embodiments of process kits and process chambers incorporating same are provided herein. In some embodiments, a process kit includes an adapter having an adapter body and a shield portion radially inward of the adapter body; a heat trans...  
WO/2018/094022A1
Embodiments of collimators and process chambers incorporating same are provided herein. In some embodiments, a collimator for use in a substrate processing chamber includes a ring; an adapter surrounding the ring and having an inner annu...  
WO/2018/090618A1
Disclosed are a microwave transmission apparatus and a semiconductor processing device, the apparatus comprising a waveguide (1) and an impedance matching structure (2) arranged in the waveguide (1). The waveguide (1) is used for transmi...  
WO/2018/087594A1
An ion source is provided that includes a gas source for supplying a gas, and an ionization chamber defining a longitudinal axis extending therethrough and including an exit aperture along a side wall of the ionization chamber. The ion s...  
WO/2018/087026A1
The invention relates to a plasma indicator for detecting a plasma treatment, particularly with a plasma jet (22), preferably under atmospheric gas pressure. The plasma indicator can comprise a thin, plate-shaped sheet (12), particularly...  
WO/2018/086697A1
According to one aspect of the present disclosure, an apparatus for vacuum deposition on a substrate is provided. The apparatus comprises: a vacuum chamber (110) comprising a first side wall (112) with a first pump opening (113) and a se...  
WO/2018/087593A1
An ion implanter (200) is provided that includes an ion source (210) configured to generate an ion beam and an analyzer magnet (202) defining a chamber (204) having a magnetic field therein. The chamber provides a curved path between a f...  
WO/2018/089180A1
A method for suppressing arcing in helium distribution channels of an electrostatic chuck in a plasma processing chamber, wherein the electrostatic chuck is connected to a voltage source for providing a chucking voltage and wherein the p...  
WO/2018/086698A1
A holding arrangement (100) for holding a substrate (101) is described. The holding arrangement includes a body (110) having a first wall (120) of flexible material; an adhesive arrangement (130) configured for attach ing the substrate, ...  
WO/2018/089578A1
An imaging system is directed to electron microscopy of collected samples and includes a feed reel configured to initially store a tape with the collected samples. The imaging system further includes a pick-up reel configured to receive ...  
WO/2018/089536A1
Exemplary cleaning or etching methods may include flowing a fluorine-containing precursor into a remote plasma region of a semiconductor processing chamber. Methods may include forming a plasma within the remote plasma region to generate...  
WO/2018/089161A1
A method of assigning faults to a processing chamber is described. Some embodiments include applying a radio frequency (RF) signal to a processing chamber to stimulate resonance in the chamber, measuring resonances of the applied RF sign...  
WO/2018/089196A1
An active showerhead used for a plasma reactor is described. The active showerhead includes a plurality of substrate layers. The substrate layers include at least one actuator and transfer component. The actuator and transfer component i...  
WO/2018/089104A1
A method of processing a workpiece is disclosed, where the interior surfaces of the plasma chamber are first coated using a conditioning gas that contains the desired dopant species. A working gas, which does not contain the desired dopa...  
WO/2018/087189A1
The invention concerns a circuit (100) able to perform a simultaneous impedance matching between a generator (G) and a load (CH) for a power supply signal having at least two distinct frequencies, comprising: - an impedance matching stag...  
WO/2018/085108A1
Provided herein are approaches for dynamically modifying plasma volume in an ion source chamber by positioning an end plate and radio frequency (RF) antenna at a selected axial location. In one approach, an ion source includes a plasma c...  
WO/2018/083322A1
The invention relates to a device (1) for extracting electrical charge carriers from a charge carrier generating space (2) comprising a first electrode (11), which contains at least one opening (111) for the electrical charge carriers to...  
WO/2018/059609A8
A method of controlling deposition rate of a film deposition in a vacuum multi-plasma-jet system utilizing plasma-chemical reactions in an active discharge zone, wherein the system comprises at least one series of plasma nozzles (4), the...  
WO/2018/083499A1
A method of observing a solid sample (100) with a microscope (300), comprising engaging a rotating portion (110) with a first part (104) of the sample (100), holding a second part (106) of the sample (100), and rotating the rotating port...  
WO/2018/084508A1
A device for generating inductively coupled plasma according to an embodiment of the present invention includes: a dielectric tube which extends in the length direction; a first induction coil structure which is disposed to enclose the d...  
WO/2018/080647A1
A workpiece processing apparatus allowing in situ cleaning of metal deposited formed on the extraction plate and in the plasma chamber is disclosed. The apparatus includes an extraction plate having an extraction aperture through which t...  
WO/2018/077471A1
Charged-particle monitoring apparatus and method, wherein at a beam modulation member a continuous beam of charged particles and a continuous laser beam are intersected thereby particle pulses are produced which are shorter than an optic...  
WO/2018/077873A1
System and method for dynamically determining a position of stage (200) holding a sample and automatically compensating position errors comprising a plurality of interferometer units (31, 32) configured to generate signals based on a pos...  
WO/2018/078237A1
This facility comprises a support (1) for the substrate, a pressing roll (2), capable of pressing the substrate against said support, a treatment unit positioned downstream of the pressing roll, with reference to the direction of travel ...  
WO/2018/077216A1
A magnetron, a magnetron sputtering chamber and a magnetron sputtering device. The magnetron comprises a first outer magnetic pole (101) and a first inner magnetic pole (102) which have opposite polarities, the first outer magnetic pole ...  
WO/2018/073319A1
A method of forming a product using additive layer manufacture is provided. The method comprises forming the product as a series of layers, each layer being formed by fusing powder deposited as a powder bed by scanning the powder bed usi...  
WO/2018/073443A1
Microtome (1), comprising a blade (2) for cutting thin slices from a sample, a sample holder (3) for guiding the sample onto the blade (2), and a means (4) for receiving the thin slices, the means (4) being a tape (5) on which the thin s...  
WO/2018/073192A1
Systems and methods for venting gas into a chamber 304 at an accelerated speed are disclosed. The system comprises a first gas flow and a second gas flow. The first gas flow is formed by a first vent valve 312 and optionally a third vent...  
WO/2018/075165A1
A system for the generation and delivery of a pulsed, high voltage signal for a process chamber includes a remotely disposed high voltage supply to generate a high voltage signal, a pulser disposed relatively closer to the process chambe...  

Matches 701 - 750 out of 66,186