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Matches 801 - 850 out of 66,312

Document Document Title
WO/2018/089578A1
An imaging system is directed to electron microscopy of collected samples and includes a feed reel configured to initially store a tape with the collected samples. The imaging system further includes a pick-up reel configured to receive ...  
WO/2018/089536A1
Exemplary cleaning or etching methods may include flowing a fluorine-containing precursor into a remote plasma region of a semiconductor processing chamber. Methods may include forming a plasma within the remote plasma region to generate...  
WO/2018/089161A1
A method of assigning faults to a processing chamber is described. Some embodiments include applying a radio frequency (RF) signal to a processing chamber to stimulate resonance in the chamber, measuring resonances of the applied RF sign...  
WO/2018/089196A1
An active showerhead used for a plasma reactor is described. The active showerhead includes a plurality of substrate layers. The substrate layers include at least one actuator and transfer component. The actuator and transfer component i...  
WO/2018/089104A1
A method of processing a workpiece is disclosed, where the interior surfaces of the plasma chamber are first coated using a conditioning gas that contains the desired dopant species. A working gas, which does not contain the desired dopa...  
WO/2018/087189A1
The invention concerns a circuit (100) able to perform a simultaneous impedance matching between a generator (G) and a load (CH) for a power supply signal having at least two distinct frequencies, comprising: - an impedance matching stag...  
WO/2018/085108A1
Provided herein are approaches for dynamically modifying plasma volume in an ion source chamber by positioning an end plate and radio frequency (RF) antenna at a selected axial location. In one approach, an ion source includes a plasma c...  
WO/2018/083322A1
The invention relates to a device (1) for extracting electrical charge carriers from a charge carrier generating space (2) comprising a first electrode (11), which contains at least one opening (111) for the electrical charge carriers to...  
WO/2018/059609A8
A method of controlling deposition rate of a film deposition in a vacuum multi-plasma-jet system utilizing plasma-chemical reactions in an active discharge zone, wherein the system comprises at least one series of plasma nozzles (4), the...  
WO/2018/083499A1
A method of observing a solid sample (100) with a microscope (300), comprising engaging a rotating portion (110) with a first part (104) of the sample (100), holding a second part (106) of the sample (100), and rotating the rotating port...  
WO/2018/084508A1
A device for generating inductively coupled plasma according to an embodiment of the present invention includes: a dielectric tube which extends in the length direction; a first induction coil structure which is disposed to enclose the d...  
WO/2018/080647A1
A workpiece processing apparatus allowing in situ cleaning of metal deposited formed on the extraction plate and in the plasma chamber is disclosed. The apparatus includes an extraction plate having an extraction aperture through which t...  
WO/2018/077471A1
Charged-particle monitoring apparatus and method, wherein at a beam modulation member a continuous beam of charged particles and a continuous laser beam are intersected thereby particle pulses are produced which are shorter than an optic...  
WO/2018/077873A1
System and method for dynamically determining a position of stage (200) holding a sample and automatically compensating position errors comprising a plurality of interferometer units (31, 32) configured to generate signals based on a pos...  
WO/2018/078237A1
This facility comprises a support (1) for the substrate, a pressing roll (2), capable of pressing the substrate against said support, a treatment unit positioned downstream of the pressing roll, with reference to the direction of travel ...  
WO/2018/077216A1
A magnetron, a magnetron sputtering chamber and a magnetron sputtering device. The magnetron comprises a first outer magnetic pole (101) and a first inner magnetic pole (102) which have opposite polarities, the first outer magnetic pole ...  
WO/2018/073319A1
A method of forming a product using additive layer manufacture is provided. The method comprises forming the product as a series of layers, each layer being formed by fusing powder deposited as a powder bed by scanning the powder bed usi...  
WO/2018/073443A1
Microtome (1), comprising a blade (2) for cutting thin slices from a sample, a sample holder (3) for guiding the sample onto the blade (2), and a means (4) for receiving the thin slices, the means (4) being a tape (5) on which the thin s...  
WO/2018/073192A1
Systems and methods for venting gas into a chamber 304 at an accelerated speed are disclosed. The system comprises a first gas flow and a second gas flow. The first gas flow is formed by a first vent valve 312 and optionally a third vent...  
WO/2018/075165A1
A system for the generation and delivery of a pulsed, high voltage signal for a process chamber includes a remotely disposed high voltage supply to generate a high voltage signal, a pulser disposed relatively closer to the process chambe...  
WO/2018/075140A1
An apparatus an ion beam generator to provide an ion beam. A scanning system may receive the ion beam and provide a scanned beam. An electrode may receive the scanned beam. At least a portion of the electrode is normal to a propagation d...  
WO/2018/075551A1
Methods and systems for characterizing dimensions and material properties of semiconductor devices by full beam x-ray scatterometry are described herein. A full beam x-ray scatterometry measurement involves illuminating a sample with an ...  
WO/2018/072774A1
Device and method for producing defined properties of gradient layers in a system of multilayered coatings in sputtering installations with the following features: a) a pair of cathodes arranged in a common process chamber and consisting...  
WO/2018/074922A1
A high-precision linear actuator (1) comprises: a first straight- guide mechanism (11A, 11B, 11C), which guides movements of an actuator element (4) and a working device (6) relative to an actuator housing (3); a pressing mechanism (7, 8...  
WO/2018/073231A1
The invention relates to a method and to a device for processing a surface of a substrate by means of a particle beam. The method comprises an irradiating of the surface (302) of the substrate (114), wherein in a first region (308) of th...  
WO/2018/069299A1
The invention relates to a plasma treatment device comprising a treatment chamber, at least one pair of microwave plasma sources and at least one voltage source. Each pair of microwave plasma sources consists of a first microwave plasma ...  
WO/2018/068833A1
According to one aspect of the present disclosure, a magnet arrangement (100) for a sputter deposition source is provided. The magnet arrangement comprises a first magnet (110) and a second magnet (120) adapted to confine a plasma in a p...  
WO/2018/069147A1
An apparatus for moderation of positrons comprises a positron trap (10), a positron source arranged in the positron trap (10), and a moderator (22) arranged in the positron trap (10) in such a manner that positrons emitted from the posit...  
WO/2018/068506A1
A charged particle beam system includes: a particle source (101), a column (103) and a specimen chamber (105) with a first movable vacuum window (106). The particle source (101) is configured to generate a charged particle beam (102) whi...  
WO/2018/070324A1
In the present invention, a part of a sample where nanoparticles are to be quantitatively observed with precision by an electron microscope (TEM, SEM), an atomic force microscope (AFM), etc., is selected by a simple method using an optic...  
WO/2017/183980A3
A charged particle beam system is disclosed, comprising: • a charged particle beam generator for generating a beam (8) of charged particles; • a charged particle optical column (226) arranged in a vacuum chamber, wherein the charged ...  
WO/2018/069438A1
A method for working a surface (110), which has an original topology, by means of a particle jet (106), may comprise working the surface (110) by means of the particle jet (106) at a first angle of the particle jet (106) in relation to t...  
WO/2018/071710A2
A multi-column electron beam device includes an electron source comprising multiple field emitters fabricated on a surface of a silicon substrate. To prevent oxidation of the silicon, a thin, contiguous boron layer is disposed directly o...  
WO/2018/070635A1
An embodiment of the present invention can provide a magnetic field generating device including a three-dimensional coil structure, and a method for manufacturing the same device. A magnetic field generating device including a three-dime...  
WO/2018/071211A1
Plasma reactors and methods are provided for reducing the volume of radioactive nuclear wastes or toxic wastes where the surface contamination is the main source of radioactivity or toxicity. The radioactive or toxic wastes are prepared ...  
WO/2018/070010A1
Provided is an electron beam apparatus with which it is possible to stably achieve a high spatial resolution even in a case in which low-acceleration observation is performed by using CeB6 in a CFE electron source. In an electron beam ap...  
WO/2018/071181A1
A method for selectively etching an etch layer with respect to a mask is provided. An etch process is provided comprising a plurality of etch cycles, wherein each etch cycle comprises providing a deposition phase and an etch phase. The d...  
WO/2018/069091A1
A sputtering source comprises two facing plate shaped targets (5, 7) and a magnet arrangement (185,187) along each of the targets. An open coating outlet area (12) from the reaction space between the targets is limited by facing rims (9,...  
WO/2018/041744A3
Systems and methods are provided for dynamically compensating position errors of a sample 350. The system can comprise one or more sensing units 311,321,331 configured to generate a signal based on a position of a sample 350 and a contro...  
WO/2018/065315A1
The present invention concerns a gas circulation device (1) for conveying a gas into a chemical vapour deposition reactor, comprising a conduit (2) with a first end (4) intended to open into said reactor, being polarised at a radiofreque...  
WO/2018/064157A1
An ion source assembly and method is provided for improving ion implantation performance. The ion source assembly has an ion source chamber and a source gas supply provides a molecular carbon source gas to the ion source chamber. An exci...  
WO/2018/062710A1
A ground clamping unit for grounding a hollow member having a hollow and a ground load mounted in the hollow comprises: a clamping body having a penetration groove so as to encompass an external part of the ground load; an elastic connec...  
WO/2018/064391A1
Systems and related methods are disclosed for atmospheric plasma processing of microelectronic workpieces, such as semiconductor wafers. For disclosed embodiments, a radio frequency (RF) generator generates an RF signal that is distribut...  
WO/2018/063865A1
An apparatus designed to sputter a material onto a plurality of substrates includes a rotating metal frame, a plurality of carriers, and an insulator disposed between the metal frame and the plurality of carriers. The plurality of carrie...  
WO/2018/061960A1
The purpose of the present invention is to obtain, in a highly accurate manner and in a short period of time, the exposure intensity distribution on a layer to be shaped. The exposure intensity distribution, when lithography data in whic...  
WO/2018/059609A1
A method of controlling deposition rate of a film deposition in a vacuum multi-plasma-jet system utilizing plasma-chemical reactions in an active discharge zone, wherein the system comprises at least one series of plasma nozzles (4), the...  
WO/2018/055715A1
The problem addressed by the present invention is to provide an electron microscope that can be activated at a suitable temperature by disposing a non-evaporative getter (NEG) at an extraction electrode in the vicinity of an electron sou...  
WO/2018/057396A1
In one implementation, a sputtering showerhead assembly is provided. The sputtering showerhead assembly comprises a faceplate comprising a sputtering surface comprising a target material and a second surface opposing the sputtering surfa...  
WO/2018/052083A1
The present invention makes it possible to measure a correct inclined state with an electron microscope device, even if the contour of the bottom of a hole in a semiconductor pattern is blocked by a sample surface. This electron microsco...  
WO/2018/052533A1
A chamber component for a processing chamber is disclosed herein. In one embodiment, a chamber component for a processing chamber has a base component body. The base component body has an exterior surface configured to face a processing ...  

Matches 801 - 850 out of 66,312